TW200602365A - Hollow resin fine particles, organic/inorganic hybrid fine particles, and method for producing hollow resin fine articles - Google Patents

Hollow resin fine particles, organic/inorganic hybrid fine particles, and method for producing hollow resin fine articles

Info

Publication number
TW200602365A
TW200602365A TW094107968A TW94107968A TW200602365A TW 200602365 A TW200602365 A TW 200602365A TW 094107968 A TW094107968 A TW 094107968A TW 94107968 A TW94107968 A TW 94107968A TW 200602365 A TW200602365 A TW 200602365A
Authority
TW
Taiwan
Prior art keywords
fine particles
hollow resin
resin fine
organic
inorganic hybrid
Prior art date
Application number
TW094107968A
Other languages
English (en)
Chinese (zh)
Other versions
TWI379842B (https=
Inventor
Hiroshi Maenaka
Michiya Nakagawa
Hiroyuki Nishimoto
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Publication of TW200602365A publication Critical patent/TW200602365A/zh
Application granted granted Critical
Publication of TWI379842B publication Critical patent/TWI379842B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/12—Bonding of a preformed macromolecular material to the same or other solid material such as metal, glass, leather, e.g. using adhesives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/22—After-treatment of expandable particles; Forming foamed products
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/65—Additives macromolecular
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/67—Particle size smaller than 100 nm
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/14—Polymer mixtures characterised by other features containing polymeric additives characterised by shape
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2998—Coated including synthetic resin or polymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Paints Or Removers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW094107968A 2004-04-05 2005-03-16 Hollow resin fine particles, organic/inorganic hybrid fine particles, and method for producing hollow resin fine articles TW200602365A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004111369 2004-04-05
JP2004258424 2004-09-06
JP2004318300 2004-11-01
JP2005022221 2005-01-28

Publications (2)

Publication Number Publication Date
TW200602365A true TW200602365A (en) 2006-01-16
TWI379842B TWI379842B (https=) 2012-12-21

Family

ID=35125020

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094107968A TW200602365A (en) 2004-04-05 2005-03-16 Hollow resin fine particles, organic/inorganic hybrid fine particles, and method for producing hollow resin fine articles

Country Status (6)

Country Link
US (1) US7981511B2 (https=)
EP (1) EP1739116A4 (https=)
JP (1) JP4059912B2 (https=)
KR (1) KR101238514B1 (https=)
TW (1) TW200602365A (https=)
WO (1) WO2005097870A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI458762B (zh) * 2008-09-29 2014-11-01 Sekisui Chemical Co Ltd Single hole hollow polymer microparticle manufacturing method

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4662804B2 (ja) * 2005-04-13 2011-03-30 積水化学工業株式会社 中空樹脂微粒子、中空樹脂微粒子の製造方法、及び、複合材
JP2007070484A (ja) * 2005-09-07 2007-03-22 Sekisui Chem Co Ltd 中空微粒子及び複合材
JP4847747B2 (ja) * 2005-12-19 2011-12-28 レノボ・シンガポール・プライベート・リミテッド コーティング剤および携帯用電子機器
EP1818694A1 (en) 2006-02-14 2007-08-15 DSMIP Assets B.V. Picture frame with an anti reflective glass plate
JP5563762B2 (ja) * 2006-03-02 2014-07-30 株式会社カネカ 中空シリコーン系微粒子の製造方法
JP4141487B2 (ja) * 2006-04-25 2008-08-27 横浜ゴム株式会社 繊維強化複合材料用エポキシ樹脂組成物
JP5341357B2 (ja) * 2008-01-25 2013-11-13 株式会社カネカ 粒子径と空隙率の分布が制御された中空シリコーン系微粒子とその製造法
JP5763874B2 (ja) * 2008-02-28 2015-08-12 株式会社日本触媒 塗料組成物およびこれを用いた光学フィルム
JP2009242475A (ja) * 2008-03-28 2009-10-22 Sekisui Chem Co Ltd 中空有機・無機ハイブリッド微粒子、反射防止性樹脂組成物、反射防止フィルム用コーティング剤、反射防止積層体及び反射防止フィルム
JP2010032719A (ja) * 2008-07-28 2010-02-12 Sekisui Chem Co Ltd 光学シート及びバックライトユニット
US20100239844A1 (en) * 2009-03-20 2010-09-23 Eric William Hearn Teather Diffusively light reflective paint composition, method for making paint composition, and diffusively light reflective articles
US8361611B2 (en) * 2009-03-20 2013-01-29 Whiteoptics Llc Diffusively light reflective paint composition, method for making paint composition, and diffusively light reflective articles
WO2010108160A2 (en) * 2009-03-20 2010-09-23 Eric William Hearn Teather Diffusive light reflectors with polymeric coating
JP2010237565A (ja) * 2009-03-31 2010-10-21 Sekisui Chem Co Ltd 光学シート及びバックライトユニット
EP2558543B1 (en) 2010-04-16 2017-08-30 Valspar Sourcing, Inc. Coating compositions for packaging articles and methods of coating
CN102030483B (zh) * 2010-10-29 2012-07-04 浙江大学 由纳米聚合物中空粒子组成的多孔防反射薄膜的制备方法
EP3878912B1 (en) 2011-02-07 2023-04-05 Swimc Llc Coating compositions for containers and other articles and methods of coating
EP2882658B1 (en) 2012-08-09 2021-09-08 Swimc Llc Container coating system
AU2013299578A1 (en) 2012-08-09 2015-02-19 Valspar Sourcing, Inc. Compositions for containers and other articles and methods of using same
WO2015138164A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Process for preparing surface functionalized polymeric and polymeric/silica hybrid hollow nanospheres
WO2015138163A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Process for preparing fluorinated polymeric hollow nanospheres
WO2015138154A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Process for preparing silica/polymer hybrid hollow nanospheres using water-based silica precursors
CN110790914A (zh) 2014-04-14 2020-02-14 宣伟投资管理有限公司 制备用于容器和其它制品的组合物的方法以及使用所述组合物的方法
JP6468780B2 (ja) * 2014-09-30 2019-02-13 積水化成品工業株式会社 中空樹脂粒子及びその製造方法
WO2016110839A1 (en) * 2015-01-05 2016-07-14 B.G. Negev Technologies And Applications Ltd., At Ben-Gurion University Nanoparticles and methods for preparation thereof
KR102019707B1 (ko) 2015-01-08 2019-09-09 세키스이가세이힝코교가부시키가이샤 중공 입자, 그 제조 방법, 그 용도 및 마이크로 캡슐 입자의 제조 방법
JP5998302B1 (ja) * 2015-03-18 2016-09-28 積水化成品工業株式会社 有機−無機ハイブリッド中空粒子及びその用途
TWI614275B (zh) 2015-11-03 2018-02-11 Valspar Sourcing Inc 用於製備聚合物的液體環氧樹脂組合物
JP6728334B2 (ja) * 2016-03-22 2020-07-22 積水化成品工業株式会社 中空粒子及びその用途
KR102081764B1 (ko) 2016-09-01 2020-02-26 주식회사 엘지화학 딥 성형용 라텍스 조성물 및 이로부터 제조된 성형품
JP6736678B2 (ja) * 2016-09-16 2020-08-05 積水化成品工業株式会社 中空粒子及びその用途
JP2018115265A (ja) * 2017-01-18 2018-07-26 積水化学工業株式会社 樹脂微粒子含有組成物
WO2019177013A1 (ja) * 2018-03-14 2019-09-19 積水化成品工業株式会社 中空粒子分散体
US11883790B2 (en) 2018-03-14 2024-01-30 Sekisui Kasei Co., Ltd. Hollow particles, method for producing same, and usage of same
JP7352804B2 (ja) * 2019-05-09 2023-09-29 ダイキン工業株式会社 中空微粒子の製造方法及び中空微粒子
CN113993918B (zh) * 2019-06-27 2024-01-16 日本瑞翁株式会社 中空树脂颗粒的制造方法
JP7297559B2 (ja) * 2019-06-28 2023-06-26 東京応化工業株式会社 硬化性樹脂組成物及び硬化物
EP4166579A4 (en) * 2020-07-09 2024-07-10 Daikin Industries, Ltd. Manufacturing method for hollow fine particles, and hollow fine particles
CN116694210B (zh) * 2023-05-30 2025-08-15 韶关南田精细化工技术有限公司 一种涂料、其制备方法及其应用

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2668909B2 (ja) 1988-01-20 1997-10-27 日本合成ゴム株式会社 アルカリ膨潤性のポリマー粒子、内部に孔を有するポリマー粒子およびこれらを用いた紙被覆用組成物
JP2733087B2 (ja) 1989-03-29 1998-03-30 花王株式会社 中空ポリマー微粒子及びその製造方法並びにその用途
JPH0540770A (ja) 1991-08-02 1993-02-19 Canon Inc 情報処理装置
JP2713081B2 (ja) 1993-02-22 1998-02-16 日本ゼオン株式会社 中空重合体粒子の製造方法
JP3456664B2 (ja) 1993-09-24 2003-10-14 大日本印刷株式会社 低屈折率反射防止膜、反射防止フィルムおよびその製造方法
JPH0820604A (ja) 1994-07-06 1996-01-23 Kanebo Nsc Ltd 中空重合体粒子の製法
JP2890391B2 (ja) 1994-08-04 1999-05-10 日本製紙株式会社 マイクロカプセル並びに該マイクロカプセルを用いた感圧複写紙
JPH08131816A (ja) 1994-11-04 1996-05-28 Fuji Photo Film Co Ltd マイクロカプセルの製造方法
JPH09101518A (ja) 1995-07-27 1997-04-15 Canon Inc 液晶表示装置及び反射防止膜、これを用いた表示装置
JPH1024233A (ja) 1996-07-11 1998-01-27 Asahi Chem Ind Co Ltd 真球状マイクロカプセルの製造方法
JPH10142402A (ja) 1996-11-06 1998-05-29 Fuji Photo Film Co Ltd 反射防止膜およびそれを配置した表示装置
JP3557823B2 (ja) * 1996-12-28 2004-08-25 日本ゼオン株式会社 中空重合体粒子、その水性分散液およびそれらの製造方法
DE19709490A1 (de) * 1997-03-07 1998-09-10 Basf Ag Polymerisate mit mehr als einem Hohlraum
JP2001240627A (ja) * 1999-12-20 2001-09-04 Jsr Corp カチオン性中空架橋重合体粒子およびその製造方法
US6624272B2 (en) * 1999-12-20 2003-09-23 Jsr Corporation Hollow crosslinked cationic polymer particles, method of producing said particles, and paint composition, cationic electrodeposition paint composition, resin composition, filled paper, paper coating composition, and coated paper
JP4046921B2 (ja) * 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
JP4918743B2 (ja) 2001-02-16 2012-04-18 凸版印刷株式会社 反射防止フィルム
JP3963759B2 (ja) * 2002-04-01 2007-08-22 株式会社日本触媒 低屈折率組成物及び反射防止膜
JP2003292831A (ja) * 2002-04-02 2003-10-15 Toppan Printing Co Ltd 低屈折率コーティング剤及び反射防止フィルム
JP2003344603A (ja) 2002-05-23 2003-12-03 Sony Corp 反射防止膜
JP4378972B2 (ja) * 2003-02-25 2009-12-09 パナソニック電工株式会社 反射防止膜、反射防止膜の製造方法、反射防止部材

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI458762B (zh) * 2008-09-29 2014-11-01 Sekisui Chemical Co Ltd Single hole hollow polymer microparticle manufacturing method

Also Published As

Publication number Publication date
KR20070019713A (ko) 2007-02-15
US20070251422A1 (en) 2007-11-01
JP4059912B2 (ja) 2008-03-12
EP1739116A4 (en) 2008-10-22
TWI379842B (https=) 2012-12-21
KR101238514B1 (ko) 2013-02-28
WO2005097870A1 (ja) 2005-10-20
JPWO2005097870A1 (ja) 2008-02-28
EP1739116A1 (en) 2007-01-03
US7981511B2 (en) 2011-07-19

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