TW200511387A - Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and recording medium to record the template creation program - Google Patents

Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and recording medium to record the template creation program

Info

Publication number
TW200511387A
TW200511387A TW093114405A TW93114405A TW200511387A TW 200511387 A TW200511387 A TW 200511387A TW 093114405 A TW093114405 A TW 093114405A TW 93114405 A TW93114405 A TW 93114405A TW 200511387 A TW200511387 A TW 200511387A
Authority
TW
Taiwan
Prior art keywords
pattern
template
template creation
detection method
optical
Prior art date
Application number
TW093114405A
Other languages
English (en)
Inventor
Yuji Kokumai
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200511387A publication Critical patent/TW200511387A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Image Analysis (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093114405A 2003-05-23 2004-05-21 Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and recording medium to record the template creation program TW200511387A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003146409 2003-05-23
JP2003153821 2003-05-30
JP2004011901 2004-01-20

Publications (1)

Publication Number Publication Date
TW200511387A true TW200511387A (en) 2005-03-16

Family

ID=34084257

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093114405A TW200511387A (en) 2003-05-23 2004-05-21 Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and recording medium to record the template creation program

Country Status (4)

Country Link
US (1) US20060126916A1 (zh)
JP (1) JPWO2005008753A1 (zh)
TW (1) TW200511387A (zh)
WO (1) WO2005008753A1 (zh)

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TWI657728B (zh) * 2017-02-13 2019-04-21 日商芝浦機械電子裝置股份有限公司 電子元件的安裝裝置及顯示用構件的製造方法
TWI740266B (zh) * 2018-11-20 2021-09-21 新加坡商先進科技新加坡有限公司 檢查鍵合的半導體晶片的設備和方法
US11788972B2 (en) 2021-04-29 2023-10-17 Industrial Technology Research Institute Method of automatically setting optical parameters and automated optical inspection system using the same

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TWI657728B (zh) * 2017-02-13 2019-04-21 日商芝浦機械電子裝置股份有限公司 電子元件的安裝裝置及顯示用構件的製造方法
TWI740266B (zh) * 2018-11-20 2021-09-21 新加坡商先進科技新加坡有限公司 檢查鍵合的半導體晶片的設備和方法
US11788972B2 (en) 2021-04-29 2023-10-17 Industrial Technology Research Institute Method of automatically setting optical parameters and automated optical inspection system using the same

Also Published As

Publication number Publication date
JPWO2005008753A1 (ja) 2006-11-16
WO2005008753A1 (ja) 2005-01-27
US20060126916A1 (en) 2006-06-15

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