SG97201A1 - Substrate holding apparatus - Google Patents

Substrate holding apparatus

Info

Publication number
SG97201A1
SG97201A1 SG200106234A SG200106234A SG97201A1 SG 97201 A1 SG97201 A1 SG 97201A1 SG 200106234 A SG200106234 A SG 200106234A SG 200106234 A SG200106234 A SG 200106234A SG 97201 A1 SG97201 A1 SG 97201A1
Authority
SG
Singapore
Prior art keywords
substrate holding
holding apparatus
substrate
holding
Prior art date
Application number
SG200106234A
Other languages
English (en)
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of SG97201A1 publication Critical patent/SG97201A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B24B41/061—Work supports, e.g. adjustable steadies axially supporting turning workpieces, e.g. magnetically, pneumatically

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG200106234A 2000-10-11 2001-10-09 Substrate holding apparatus SG97201A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000311071 2000-10-11
JP2001013899A JP2002187060A (ja) 2000-10-11 2001-01-22 基板保持装置、ポリッシング装置、及び研磨方法

Publications (1)

Publication Number Publication Date
SG97201A1 true SG97201A1 (en) 2003-07-18

Family

ID=26601900

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200106234A SG97201A1 (en) 2000-10-11 2001-10-09 Substrate holding apparatus

Country Status (7)

Country Link
US (4) US6852019B2 (enExample)
EP (4) EP1197292B1 (enExample)
JP (1) JP2002187060A (enExample)
KR (5) KR100874148B1 (enExample)
DE (1) DE60137007D1 (enExample)
SG (1) SG97201A1 (enExample)
TW (1) TW576773B (enExample)

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7198561B2 (en) * 2000-07-25 2007-04-03 Applied Materials, Inc. Flexible membrane for multi-chamber carrier head
JP2002187060A (ja) * 2000-10-11 2002-07-02 Ebara Corp 基板保持装置、ポリッシング装置、及び研磨方法
JP2002208563A (ja) * 2001-01-09 2002-07-26 Ebara Corp 被加工物の加工装置及び加工方法
US6855037B2 (en) 2001-03-12 2005-02-15 Asm-Nutool, Inc. Method of sealing wafer backside for full-face electrochemical plating
US6939206B2 (en) 2001-03-12 2005-09-06 Asm Nutool, Inc. Method and apparatus of sealing wafer backside for full-face electrochemical plating
KR100470227B1 (ko) * 2001-06-07 2005-02-05 두산디앤디 주식회사 화학기계적 연마장치의 캐리어 헤드
JP3970561B2 (ja) 2001-07-10 2007-09-05 株式会社荏原製作所 基板保持装置及び基板研磨装置
US6863771B2 (en) * 2001-07-25 2005-03-08 Micron Technology, Inc. Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods
WO2003049168A1 (en) * 2001-12-06 2003-06-12 Ebara Corporation Substrate holding device and polishing device
JP4353673B2 (ja) * 2002-04-18 2009-10-28 株式会社荏原製作所 ポリッシング方法
TWI238754B (en) * 2002-11-07 2005-09-01 Ebara Tech Inc Vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof
CN100566938C (zh) * 2002-12-27 2009-12-09 株式会社荏原制作所 基片抛光方法
JP4448297B2 (ja) * 2002-12-27 2010-04-07 株式会社荏原製作所 基板研磨装置及び基板研磨方法
KR100481872B1 (ko) * 2003-01-14 2005-04-11 삼성전자주식회사 폴리싱 헤드 및 화학적 기계적 연마 장치
EP1593148B1 (en) * 2003-02-10 2015-04-29 Ebara Corporation Substrate holding apparatus and polishing apparatus
US7288465B2 (en) * 2003-04-15 2007-10-30 International Business Machines Corpoartion Semiconductor wafer front side protection
JP2005011977A (ja) 2003-06-18 2005-01-13 Ebara Corp 基板研磨装置および基板研磨方法
WO2005005101A1 (de) * 2003-07-09 2005-01-20 Peter Wolters Surface Technologies Gmbh & Co. Kg Halter für flache werkstücke, insbesondere halbleiterwafer zum chemisch-mechanischen polieren
US7055229B2 (en) * 2003-12-31 2006-06-06 Intel Corporation Support system for semiconductor wafers and methods thereof
US7566385B2 (en) * 2004-02-23 2009-07-28 E. I. Du Pont De Nemours And Company Apparatus adapted for membrane-mediated electropolishing
JP2005268566A (ja) * 2004-03-19 2005-09-29 Ebara Corp 化学機械研磨装置の基板把持機構のヘッド構造
JP4822744B2 (ja) * 2004-06-04 2011-11-24 三星電子株式会社 化学機械的研磨装置、キャリアヘッド及び区画リング
CN105904335B (zh) * 2004-11-01 2019-04-30 株式会社荏原制作所 抛光设备
TWI386989B (zh) * 2005-02-25 2013-02-21 荏原製作所股份有限公司 研磨裝置及研磨方法
TWI424260B (zh) * 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
JP2006305713A (ja) * 2005-03-28 2006-11-09 Nikon Corp 吸着装置、研磨装置、半導体デバイス及び半導体デバイス製造方法
US7207871B1 (en) * 2005-10-06 2007-04-24 Applied Materials, Inc. Carrier head with multiple chambers
JP4787063B2 (ja) * 2005-12-09 2011-10-05 株式会社荏原製作所 研磨装置及び研磨方法
US7364496B2 (en) * 2006-03-03 2008-04-29 Inopla Inc. Polishing head for polishing semiconductor wafers
DE202006004193U1 (de) * 2006-03-14 2006-06-08 Richter, Harald Adapterplatte für einen Vakuumsauger
JP4814677B2 (ja) * 2006-03-31 2011-11-16 株式会社荏原製作所 基板保持装置および研磨装置
US20070238261A1 (en) * 2006-04-05 2007-10-11 Asml Netherlands B.V. Device, lithographic apparatus and device manufacturing method
JP4996331B2 (ja) * 2007-05-17 2012-08-08 株式会社荏原製作所 基板研磨装置および基板研磨方法
JP4703608B2 (ja) * 2007-06-28 2011-06-15 株式会社東芝 ディスクリートトラック媒体の製造方法
US8194232B2 (en) * 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
DE102007041209B4 (de) * 2007-08-31 2017-11-23 Globalfoundries Dresden Module One Limited Liability Company & Co. Kg Polierkopf, der Zonenkontrolle verwendet
WO2009066351A1 (ja) * 2007-11-20 2009-05-28 Shin-Etsu Handotai Co., Ltd. 研磨ヘッド及び研磨装置
JP5248127B2 (ja) * 2008-01-30 2013-07-31 株式会社荏原製作所 研磨方法及び研磨装置
JP5377873B2 (ja) * 2008-03-18 2013-12-25 株式会社東京精密 ウェーハ研磨装置及び該研磨装置を用いたウェーハ研磨方法
JP5390807B2 (ja) * 2008-08-21 2014-01-15 株式会社荏原製作所 研磨方法および装置
JP4833355B2 (ja) 2008-08-29 2011-12-07 信越半導体株式会社 研磨ヘッド及び研磨装置
USD633452S1 (en) 2009-08-27 2011-03-01 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD634719S1 (en) 2009-08-27 2011-03-22 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
JP5392483B2 (ja) * 2009-08-31 2014-01-22 不二越機械工業株式会社 研磨装置
JP5197644B2 (ja) * 2010-02-08 2013-05-15 株式会社荏原製作所 研磨装置及び研磨方法
JP5648954B2 (ja) * 2010-08-31 2015-01-07 不二越機械工業株式会社 研磨装置
USD711330S1 (en) 2010-12-28 2014-08-19 Ebara Corporation Elastic membrane for semiconductor wafer polishing
KR101283285B1 (ko) 2011-07-07 2013-07-11 단국대학교 산학협력단 유체 누설 공급 장치
US20130078812A1 (en) * 2011-09-23 2013-03-28 Strasbaugh Wafer Carrier with Flexible Pressure Plate
JP2011255505A (ja) * 2011-09-26 2011-12-22 Ebara Corp 研磨装置
KR101244221B1 (ko) 2011-12-08 2013-03-18 주식회사 케이씨텍 캐리어 헤드의 멤브레인
US9706605B2 (en) * 2012-03-30 2017-07-11 Applied Materials, Inc. Substrate support with feedthrough structure
US9016675B2 (en) * 2012-07-06 2015-04-28 Asm Technology Singapore Pte Ltd Apparatus and method for supporting a workpiece during processing
JP6158637B2 (ja) * 2012-08-28 2017-07-05 株式会社荏原製作所 弾性膜及び基板保持装置
TWI589396B (zh) * 2014-03-27 2017-07-01 荏原製作所股份有限公司 彈性膜、基板保持裝置、及研磨裝置
US9610672B2 (en) 2014-06-27 2017-04-04 Applied Materials, Inc. Configurable pressure design for multizone chemical mechanical planarization polishing head
JP6463303B2 (ja) * 2016-05-13 2019-01-30 株式会社荏原製作所 弾性膜、基板保持装置、基板研磨装置、基板保持装置における基板吸着判定方法および圧力制御方法
JP2017094441A (ja) * 2015-11-24 2017-06-01 株式会社荏原製作所 基板研磨装置の校正方法、校正装置および校正プログラム
CN108885984B (zh) 2016-04-01 2024-03-08 姜準模 形成有基板容纳部件的化学机械研磨装置用载体头
KR102160328B1 (ko) * 2017-02-01 2020-09-25 강준모 화학기계적연마장치용 캐리어헤드
CN208584374U (zh) * 2018-02-26 2019-03-08 凯斯科技股份有限公司 基板处理装置
JP7003838B2 (ja) * 2018-05-17 2022-01-21 株式会社Sumco 研磨ヘッド及びこれを用いたウェーハ研磨装置及び研磨方法
US12017322B2 (en) 2018-08-14 2024-06-25 Taiwan Semiconductor Manufacturing Co., Ltd. Chemical mechanical polishing method
JP7349791B2 (ja) * 2019-01-16 2023-09-25 株式会社東京精密 Ｃｍｐ装置
US11325223B2 (en) * 2019-08-23 2022-05-10 Applied Materials, Inc. Carrier head with segmented substrate chuck
JP7352168B2 (ja) * 2019-11-06 2023-09-28 三益半導体工業株式会社 搬送ヘッドおよび搬送装置
KR102783310B1 (ko) * 2019-11-19 2025-03-19 가부시키가이샤 에바라 세이사꾸쇼 기판을 보유 지지하기 위한 톱링 및 기판 처리 장치
JP7436684B2 (ja) * 2020-06-26 2024-02-22 アプライド マテリアルズ インコーポレイテッド 変形可能な基板チャック
JP7447285B2 (ja) * 2020-06-29 2024-03-11 アプライド マテリアルズ インコーポレイテッド 複数の角度方向加圧可能区域を有する研磨キャリアヘッド
CN111823129B (zh) * 2020-07-17 2021-11-19 中国科学院微电子研究所 研磨头气动装置及研磨头
CN112355887B (zh) * 2020-11-10 2021-09-17 蚌埠高华电子股份有限公司 一种磁吸定位式揭片辅助器及其使用方法
WO2022196631A1 (ja) * 2021-03-17 2022-09-22 ミクロ技研株式会社 研磨ヘッド及び研磨処理装置
CN113977451B (zh) * 2021-10-25 2023-08-25 长鑫存储技术有限公司 半导体设备的检测系统及检测方法
WO2025019606A1 (en) * 2023-07-20 2025-01-23 Axus Technology, Llc Apparatus and method for closed loop controlled cooling in a wafer processing system
CN118617363B (zh) * 2024-06-13 2024-11-15 东莞聚信精密制造有限公司 一种铝阀芯阀轴装配设备
CN119635525B (zh) * 2024-12-23 2025-09-30 清华大学 一种电磁振动空化辅助的化学机械抛光装置及方法

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03234468A (ja) * 1990-02-06 1991-10-18 Canon Inc スタンパの金型取付面の研磨方法およびその研磨機
JP3311116B2 (ja) 1993-10-28 2002-08-05 株式会社東芝 半導体製造装置
US5643053A (en) 1993-12-27 1997-07-01 Applied Materials, Inc. Chemical mechanical polishing apparatus with improved polishing control
US5820448A (en) * 1993-12-27 1998-10-13 Applied Materials, Inc. Carrier head with a layer of conformable material for a chemical mechanical polishing system
JPH07241764A (ja) 1994-03-04 1995-09-19 Fujitsu Ltd 研磨装置と研磨方法
JP3158934B2 (ja) * 1995-02-28 2001-04-23 三菱マテリアル株式会社 ウェーハ研磨装置
US5559428A (en) * 1995-04-10 1996-09-24 International Business Machines Corporation In-situ monitoring of the change in thickness of films
US5908530A (en) 1995-05-18 1999-06-01 Obsidian, Inc. Apparatus for chemical mechanical polishing
JP3724869B2 (ja) 1995-10-09 2005-12-07 株式会社荏原製作所 ポリッシング装置および方法
US6183354B1 (en) * 1996-11-08 2001-02-06 Applied Materials, Inc. Carrier head with a flexible membrane for a chemical mechanical polishing system
US6146259A (en) * 1996-11-08 2000-11-14 Applied Materials, Inc. Carrier head with local pressure control for a chemical mechanical polishing apparatus
US5941758A (en) 1996-11-13 1999-08-24 Intel Corporation Method and apparatus for chemical-mechanical polishing
JP3303963B2 (ja) 1997-01-20 2002-07-22 株式会社東京精密 ウェーハの厚み加工量測定装置
US6056632A (en) 1997-02-13 2000-05-02 Speedfam-Ipec Corp. Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head
US5882245A (en) * 1997-02-28 1999-03-16 Advanced Ceramics Research, Inc. Polymer carrier gears for polishing of flat objects
TW431942B (en) * 1997-04-04 2001-05-01 Tokyo Seimitsu Co Ltd Polishing device
JP3027551B2 (ja) 1997-07-03 2000-04-04 キヤノン株式会社 基板保持装置ならびに該基板保持装置を用いた研磨方法および研磨装置
US5964653A (en) * 1997-07-11 1999-10-12 Applied Materials, Inc. Carrier head with a flexible membrane for a chemical mechanical polishing system
JPH11129154A (ja) 1997-10-31 1999-05-18 Tokyo Seimitsu Co Ltd 半導体ウェーハの研磨装置
JPH11226865A (ja) 1997-12-11 1999-08-24 Speedfam Co Ltd キャリア及びｃｍｐ装置
JP3086437B2 (ja) 1997-12-15 2000-09-11 松下電器産業株式会社 化学的機械研磨装置及び化学的機械研磨方法
US6080050A (en) * 1997-12-31 2000-06-27 Applied Materials, Inc. Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
JPH11262857A (ja) 1998-03-18 1999-09-28 Rohm Co Ltd 半導体ウェハの研磨装置
JPH11294503A (ja) 1998-04-06 1999-10-29 Shinko Electric Co Ltd 無人搬送車の位置決め装置
US6210255B1 (en) * 1998-09-08 2001-04-03 Applied Materials, Inc. Carrier head for chemical mechanical polishing a substrate
US6159079A (en) * 1998-09-08 2000-12-12 Applied Materials, Inc. Carrier head for chemical mechanical polishing a substrate
US6165058A (en) * 1998-12-09 2000-12-26 Applied Materials, Inc. Carrier head for chemical mechanical polishing
US6422927B1 (en) * 1998-12-30 2002-07-23 Applied Materials, Inc. Carrier head with controllable pressure and loading area for chemical mechanical polishing
US6093089A (en) * 1999-01-25 2000-07-25 United Microelectronics Corp. Apparatus for controlling uniformity of polished material
JP3859381B2 (ja) 1999-02-09 2006-12-20 株式会社荏原製作所 基板把持装置及び研磨装置
US6368189B1 (en) 1999-03-03 2002-04-09 Mitsubishi Materials Corporation Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure
JP2000263421A (ja) 1999-03-11 2000-09-26 Toshiba Mach Co Ltd ポリシング装置
US6527624B1 (en) * 1999-03-26 2003-03-04 Applied Materials, Inc. Carrier head for providing a polishing slurry
US6077151A (en) * 1999-05-17 2000-06-20 Vlsi Technology, Inc. Temperature control carrier head for chemical mechanical polishing process
US6776692B1 (en) 1999-07-09 2004-08-17 Applied Materials Inc. Closed-loop control of wafer polishing in a chemical mechanical polishing system
DE60024559T2 (de) 1999-10-15 2006-08-24 Ebara Corp. Verfahren und Gerät zum Polieren eines Werkstückes
US6450868B1 (en) * 2000-03-27 2002-09-17 Applied Materials, Inc. Carrier head with multi-part flexible membrane
US6857945B1 (en) * 2000-07-25 2005-02-22 Applied Materials, Inc. Multi-chamber carrier head with a flexible membrane
JP2002187060A (ja) * 2000-10-11 2002-07-02 Ebara Corp 基板保持装置、ポリッシング装置、及び研磨方法

Also Published As

Publication number Publication date
US7083507B2 (en) 2006-08-01
EP1197292B1 (en) 2008-12-17
DE60137007D1 (de) 2009-01-29
TW576773B (en) 2004-02-21
EP1197292A3 (en) 2002-07-31
KR100939555B1 (ko) 2010-01-29
KR100973766B1 (ko) 2010-08-04
US20050118935A1 (en) 2005-06-02
KR20080058318A (ko) 2008-06-25
KR20090099037A (ko) 2009-09-21
EP1944123A3 (en) 2008-07-23
KR101000420B1 (ko) 2010-12-13
KR100874712B1 (ko) 2008-12-18
EP1852220A1 (en) 2007-11-07
US6852019B2 (en) 2005-02-08
EP1944123B1 (en) 2011-07-13
JP2002187060A (ja) 2002-07-02
EP1197292A2 (en) 2002-04-17
EP1944123A2 (en) 2008-07-16
KR20090082329A (ko) 2009-07-30
US20060234609A1 (en) 2006-10-19
EP1935566B1 (en) 2012-05-16
KR20020028845A (ko) 2002-04-17
EP1935566A2 (en) 2008-06-25
KR20080011240A (ko) 2008-01-31
KR100874148B1 (ko) 2008-12-15
EP1935566A3 (en) 2008-07-23
US20020042246A1 (en) 2002-04-11
US20090061748A1 (en) 2009-03-05
US7491117B2 (en) 2009-02-17
US7850509B2 (en) 2010-12-14

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