SG186675A1 - Apparatus and methods for supporting workpieces during plasma processing - Google Patents
Apparatus and methods for supporting workpieces during plasma processing Download PDFInfo
- Publication number
- SG186675A1 SG186675A1 SG2012093902A SG2012093902A SG186675A1 SG 186675 A1 SG186675 A1 SG 186675A1 SG 2012093902 A SG2012093902 A SG 2012093902A SG 2012093902 A SG2012093902 A SG 2012093902A SG 186675 A1 SG186675 A1 SG 186675A1
- Authority
- SG
- Singapore
- Prior art keywords
- workpieces
- carrier plate
- plasma
- annular
- openings
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 53
- 238000012545 processing Methods 0.000 title claims abstract description 46
- 230000002093 peripheral effect Effects 0.000 claims abstract description 16
- 238000001312 dry etching Methods 0.000 claims description 10
- 239000000615 nonconductor Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 30
- 238000012546 transfer Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 230000007717 exclusion Effects 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/496,369 US10026436B2 (en) | 2009-07-01 | 2009-07-01 | Apparatus and methods for supporting workpieces during plasma processing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG186675A1 true SG186675A1 (en) | 2013-01-30 |
Family
ID=43412054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2012093902A SG186675A1 (en) | 2009-07-01 | 2010-06-24 | Apparatus and methods for supporting workpieces during plasma processing |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10026436B2 (enExample) |
| JP (1) | JP5758594B2 (enExample) |
| KR (2) | KR20110002432A (enExample) |
| CN (1) | CN101944366B (enExample) |
| SG (1) | SG186675A1 (enExample) |
| TW (1) | TWI536447B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9685186B2 (en) * | 2009-02-27 | 2017-06-20 | Applied Materials, Inc. | HDD pattern implant system |
| US8556566B1 (en) * | 2011-09-30 | 2013-10-15 | WD Media, LLC | Disk stacking method and apparatus |
| KR101419515B1 (ko) * | 2012-09-24 | 2014-07-15 | 피에스케이 주식회사 | 배플 및 배플의 표면처리장치, 그리고 기판 처리 장치 및 표면 처리 방법 |
| CN105529283B (zh) * | 2014-09-29 | 2020-06-30 | 盛美半导体设备(上海)股份有限公司 | 晶圆的双面气相刻蚀装置 |
| SG11202100703SA (en) * | 2018-07-30 | 2021-02-25 | Nordson Corp | Systems for workpiece processing with plasma |
| JP2022538202A (ja) * | 2020-05-22 | 2022-09-01 | フン リ，チャン | 大気圧プラズマ発生装置を用いた円筒状及び環状の被処理物の表面処理システム及び方法 |
| KR102440727B1 (ko) * | 2020-12-17 | 2022-09-05 | 현대자동차주식회사 | 소음 및 진동 측정 장치 및 이를 이용한 소음 및 진동 측정 방법 |
| DE102021003330B3 (de) | 2021-06-28 | 2022-09-01 | Singulus Technologies Aktiengesellschaft | Substratträger |
| DE102021003326B3 (de) | 2021-06-28 | 2022-09-08 | Singulus Technologies Aktiengesellschaft | Substratträger |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3469686A (en) * | 1967-02-08 | 1969-09-30 | Monsanto Co | Retaining trays for semiconductor wafers and the like |
| US4735701A (en) * | 1984-08-21 | 1988-04-05 | Komag, Inc. | Disk carrier |
| US4634512A (en) * | 1984-08-21 | 1987-01-06 | Komag, Inc. | Disk and plug |
| US4595481A (en) * | 1984-08-21 | 1986-06-17 | Komag, Inc. | Disk carrier |
| JPS62240879A (ja) | 1986-04-14 | 1987-10-21 | Mitsubishi Electric Corp | 観測デ−タの位置決定方法 |
| JPS63287933A (ja) | 1987-05-21 | 1988-11-25 | Canon Inc | 交換レンズのレンズキヤツプ |
| DE68926577T2 (de) * | 1988-03-30 | 1996-10-02 | Rohm Co Ltd | Einrichtung zur Molekularstrahlepitaxie |
| JPH04173974A (ja) | 1990-11-02 | 1992-06-22 | Tdk Corp | 反応性連続スパッタ方法、磁気ディスクの製造方法および基板搬送用トレー |
| EP0577766B1 (en) * | 1991-04-04 | 1999-12-29 | Seagate Technology, Inc. | Apparatus and method for high throughput sputtering |
| US5244555A (en) * | 1991-11-27 | 1993-09-14 | Komag, Inc. | Floating pocket memory disk carrier, memory disk and method |
| DE4203456A1 (de) | 1992-02-07 | 1993-08-12 | Basf Ag | Verfahren zur kontinuierlichen herstellung von 3-cyano-3,5,5-trimethylcyclohexanon |
| JP3273979B2 (ja) | 1992-10-06 | 2002-04-15 | 株式会社アルバック | 両面同時エッチング装置 |
| JPH10324980A (ja) | 1997-05-27 | 1998-12-08 | Ulvac Japan Ltd | 両面エッチング装置用電極装置 |
| DE19847101C1 (de) * | 1998-10-13 | 2000-05-18 | Wacker Siltronic Halbleitermat | CVD-Reaktor und Verfahren zur Herstellung einer mit einer epitaktischen Schicht versehenen Halbleiterscheibe |
| JP4537566B2 (ja) * | 2000-12-07 | 2010-09-01 | 大陽日酸株式会社 | 基板回転機構を備えた成膜装置 |
| US6900881B2 (en) * | 2002-07-11 | 2005-05-31 | Molecular Imprints, Inc. | Step and repeat imprint lithography systems |
| US7942971B2 (en) * | 2003-04-04 | 2011-05-17 | Panasonic Corporation | Method of manufacturing plasma display panels |
| US6805054B1 (en) * | 2003-05-14 | 2004-10-19 | Molecular Imprints, Inc. | Method, system and holder for transferring templates during imprint lithography processes |
| US7235139B2 (en) * | 2003-10-28 | 2007-06-26 | Veeco Instruments Inc. | Wafer carrier for growing GaN wafers |
| US7547504B2 (en) * | 2004-09-21 | 2009-06-16 | Molecular Imprints, Inc. | Pattern reversal employing thick residual layers |
| WO2007043528A1 (ja) * | 2005-10-12 | 2007-04-19 | Matsushita Electric Industrial Co., Ltd. | プラズマ処理装置、プラズマ処理方法、及びトレイ |
| US20070241454A1 (en) * | 2006-04-13 | 2007-10-18 | Jun-Ming Chen | Capture ring |
| US8852349B2 (en) * | 2006-09-15 | 2014-10-07 | Applied Materials, Inc. | Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects |
| JP2008159097A (ja) * | 2006-12-20 | 2008-07-10 | Hitachi Ltd | 基板ホルダ及び基板のエッチング方法及び磁気記録媒体の製造方法 |
| JP2009116927A (ja) | 2007-11-02 | 2009-05-28 | Hitachi High-Technologies Corp | ディスク反転機構、ディスクの表面処理方法およびディスクの表面処理装置 |
-
2009
- 2009-07-01 US US12/496,369 patent/US10026436B2/en not_active Expired - Fee Related
-
2010
- 2010-06-24 SG SG2012093902A patent/SG186675A1/en unknown
- 2010-06-30 KR KR1020100062506A patent/KR20110002432A/ko not_active Ceased
- 2010-07-01 JP JP2010151009A patent/JP5758594B2/ja not_active Expired - Fee Related
- 2010-07-01 TW TW099121708A patent/TWI536447B/zh not_active IP Right Cessation
- 2010-07-01 CN CN201010221024.1A patent/CN101944366B/zh not_active Expired - Fee Related
-
2017
- 2017-12-14 KR KR1020170172237A patent/KR101925279B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20110000882A1 (en) | 2011-01-06 |
| TW201123297A (en) | 2011-07-01 |
| CN101944366B (zh) | 2015-08-19 |
| TWI536447B (zh) | 2016-06-01 |
| KR20110002432A (ko) | 2011-01-07 |
| JP2011014229A (ja) | 2011-01-20 |
| KR101925279B1 (ko) | 2018-12-06 |
| JP5758594B2 (ja) | 2015-08-05 |
| CN101944366A (zh) | 2011-01-12 |
| US10026436B2 (en) | 2018-07-17 |
| KR20170141637A (ko) | 2017-12-26 |
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