KR20110002432A - 플라즈마 처리 동안 작업편을 지지하기 위한 장치 및 방법 - Google Patents

플라즈마 처리 동안 작업편을 지지하기 위한 장치 및 방법 Download PDF

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Publication number
KR20110002432A
KR20110002432A KR1020100062506A KR20100062506A KR20110002432A KR 20110002432 A KR20110002432 A KR 20110002432A KR 1020100062506 A KR1020100062506 A KR 1020100062506A KR 20100062506 A KR20100062506 A KR 20100062506A KR 20110002432 A KR20110002432 A KR 20110002432A
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KR
South Korea
Prior art keywords
workpieces
carrier plate
annular
plasma
openings
Prior art date
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Ceased
Application number
KR1020100062506A
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English (en)
Korean (ko)
Inventor
데이비드 케이. 푸트
제임스 디. 게티
Original Assignee
노드슨 코포레이션
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Publication date
Application filed by 노드슨 코포레이션 filed Critical 노드슨 코포레이션
Publication of KR20110002432A publication Critical patent/KR20110002432A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020100062506A 2009-07-01 2010-06-30 플라즈마 처리 동안 작업편을 지지하기 위한 장치 및 방법 Ceased KR20110002432A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/496,369 US10026436B2 (en) 2009-07-01 2009-07-01 Apparatus and methods for supporting workpieces during plasma processing
US12/496,369 2009-07-01

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020170172237A Division KR101925279B1 (ko) 2009-07-01 2017-12-14 플라즈마 처리 동안 작업편을 지지하기 위한 장치 및 방법

Publications (1)

Publication Number Publication Date
KR20110002432A true KR20110002432A (ko) 2011-01-07

Family

ID=43412054

Family Applications (2)

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KR1020100062506A Ceased KR20110002432A (ko) 2009-07-01 2010-06-30 플라즈마 처리 동안 작업편을 지지하기 위한 장치 및 방법
KR1020170172237A Expired - Fee Related KR101925279B1 (ko) 2009-07-01 2017-12-14 플라즈마 처리 동안 작업편을 지지하기 위한 장치 및 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020170172237A Expired - Fee Related KR101925279B1 (ko) 2009-07-01 2017-12-14 플라즈마 처리 동안 작업편을 지지하기 위한 장치 및 방법

Country Status (6)

Country Link
US (1) US10026436B2 (enExample)
JP (1) JP5758594B2 (enExample)
KR (2) KR20110002432A (enExample)
CN (1) CN101944366B (enExample)
SG (1) SG186675A1 (enExample)
TW (1) TWI536447B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9685186B2 (en) * 2009-02-27 2017-06-20 Applied Materials, Inc. HDD pattern implant system
US8556566B1 (en) * 2011-09-30 2013-10-15 WD Media, LLC Disk stacking method and apparatus
KR101419515B1 (ko) * 2012-09-24 2014-07-15 피에스케이 주식회사 배플 및 배플의 표면처리장치, 그리고 기판 처리 장치 및 표면 처리 방법
CN105529283B (zh) * 2014-09-29 2020-06-30 盛美半导体设备(上海)股份有限公司 晶圆的双面气相刻蚀装置
SG11202100703SA (en) * 2018-07-30 2021-02-25 Nordson Corp Systems for workpiece processing with plasma
JP2022538202A (ja) * 2020-05-22 2022-09-01 フン リ，チャン 大気圧プラズマ発生装置を用いた円筒状及び環状の被処理物の表面処理システム及び方法
KR102440727B1 (ko) * 2020-12-17 2022-09-05 현대자동차주식회사 소음 및 진동 측정 장치 및 이를 이용한 소음 및 진동 측정 방법
DE102021003330B3 (de) 2021-06-28 2022-09-01 Singulus Technologies Aktiengesellschaft Substratträger
DE102021003326B3 (de) 2021-06-28 2022-09-08 Singulus Technologies Aktiengesellschaft Substratträger

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Publication number Priority date Publication date Assignee Title
US3469686A (en) * 1967-02-08 1969-09-30 Monsanto Co Retaining trays for semiconductor wafers and the like
US4735701A (en) * 1984-08-21 1988-04-05 Komag, Inc. Disk carrier
US4634512A (en) * 1984-08-21 1987-01-06 Komag, Inc. Disk and plug
US4595481A (en) * 1984-08-21 1986-06-17 Komag, Inc. Disk carrier
JPS62240879A (ja) 1986-04-14 1987-10-21 Mitsubishi Electric Corp 観測デ−タの位置決定方法
JPS63287933A (ja) 1987-05-21 1988-11-25 Canon Inc 交換レンズのレンズキヤツプ
DE68926577T2 (de) * 1988-03-30 1996-10-02 Rohm Co Ltd Einrichtung zur Molekularstrahlepitaxie
JPH04173974A (ja) 1990-11-02 1992-06-22 Tdk Corp 反応性連続スパッタ方法、磁気ディスクの製造方法および基板搬送用トレー
EP0577766B1 (en) * 1991-04-04 1999-12-29 Seagate Technology, Inc. Apparatus and method for high throughput sputtering
US5244555A (en) * 1991-11-27 1993-09-14 Komag, Inc. Floating pocket memory disk carrier, memory disk and method
DE4203456A1 (de) 1992-02-07 1993-08-12 Basf Ag Verfahren zur kontinuierlichen herstellung von 3-cyano-3,5,5-trimethylcyclohexanon
JP3273979B2 (ja) 1992-10-06 2002-04-15 株式会社アルバック 両面同時エッチング装置
JPH10324980A (ja) 1997-05-27 1998-12-08 Ulvac Japan Ltd 両面エッチング装置用電極装置
DE19847101C1 (de) * 1998-10-13 2000-05-18 Wacker Siltronic Halbleitermat CVD-Reaktor und Verfahren zur Herstellung einer mit einer epitaktischen Schicht versehenen Halbleiterscheibe
JP4537566B2 (ja) * 2000-12-07 2010-09-01 大陽日酸株式会社 基板回転機構を備えた成膜装置
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7942971B2 (en) * 2003-04-04 2011-05-17 Panasonic Corporation Method of manufacturing plasma display panels
US6805054B1 (en) * 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
US7235139B2 (en) * 2003-10-28 2007-06-26 Veeco Instruments Inc. Wafer carrier for growing GaN wafers
US7547504B2 (en) * 2004-09-21 2009-06-16 Molecular Imprints, Inc. Pattern reversal employing thick residual layers
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JP2009116927A (ja) 2007-11-02 2009-05-28 Hitachi High-Technologies Corp ディスク反転機構、ディスクの表面処理方法およびディスクの表面処理装置

Also Published As

Publication number Publication date
US20110000882A1 (en) 2011-01-06
TW201123297A (en) 2011-07-01
CN101944366B (zh) 2015-08-19
TWI536447B (zh) 2016-06-01
JP2011014229A (ja) 2011-01-20
KR101925279B1 (ko) 2018-12-06
SG186675A1 (en) 2013-01-30
JP5758594B2 (ja) 2015-08-05
CN101944366A (zh) 2011-01-12
US10026436B2 (en) 2018-07-17
KR20170141637A (ko) 2017-12-26

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