SG177114A1 - Compound, copolymer comprising the compound, and resist protective film composition comprising the copolymer - Google Patents

Compound, copolymer comprising the compound, and resist protective film composition comprising the copolymer Download PDF

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Publication number
SG177114A1
SG177114A1 SG2011046703A SG2011046703A SG177114A1 SG 177114 A1 SG177114 A1 SG 177114A1 SG 2011046703 A SG2011046703 A SG 2011046703A SG 2011046703 A SG2011046703 A SG 2011046703A SG 177114 A1 SG177114 A1 SG 177114A1
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SG
Singapore
Prior art keywords
group
formula
carbon atoms
alkyl group
hydrogen atom
Prior art date
Application number
SG2011046703A
Other languages
English (en)
Inventor
Hyun Sang Joo
Joo Hyeon Park
Joon Hee Han
Hyun Soon Lim
Original Assignee
Korea Kumho Petrochem Co Ltd
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Publication date
Application filed by Korea Kumho Petrochem Co Ltd filed Critical Korea Kumho Petrochem Co Ltd
Publication of SG177114A1 publication Critical patent/SG177114A1/en

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG2011046703A 2010-06-25 2011-06-24 Compound, copolymer comprising the compound, and resist protective film composition comprising the copolymer SG177114A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20100060587 2010-06-25
KR1020110051930A KR101335313B1 (ko) 2010-06-25 2011-05-31 화합물, 이를 포함하는 공중합체 및 상기 공중합체를 포함하는 레지스트 보호막 조성물

Publications (1)

Publication Number Publication Date
SG177114A1 true SG177114A1 (en) 2012-01-30

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ID=45608361

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2011046703A SG177114A1 (en) 2010-06-25 2011-06-24 Compound, copolymer comprising the compound, and resist protective film composition comprising the copolymer

Country Status (3)

Country Link
KR (1) KR101335313B1 (zh)
SG (1) SG177114A1 (zh)
TW (1) TWI462901B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101434659B1 (ko) * 2012-10-15 2014-08-28 금호석유화학 주식회사 광산발생제 및 이를 포함하는 레지스트 조성물
JP7509068B2 (ja) 2020-04-28 2024-07-02 信越化学工業株式会社 フルオロカルボン酸含有モノマー、フルオロカルボン酸含有ポリマー、レジスト材料及びパターン形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100985929B1 (ko) * 2007-06-12 2010-10-06 샌트랄 글래스 컴퍼니 리미티드 불소 함유 화합물, 불소 함유 고분자 화합물, 포지티브형레지스트 조성물 및 이것을 사용한 패턴 형성방법
JP5401910B2 (ja) * 2008-10-17 2014-01-29 セントラル硝子株式会社 重合性アニオンを有する含フッ素スルホン塩類とその製造方法、含フッ素樹脂、レジスト組成物及びそれを用いたパターン形成方法

Also Published As

Publication number Publication date
KR20120000496A (ko) 2012-01-02
TWI462901B (zh) 2014-12-01
KR101335313B1 (ko) 2013-12-03
TW201213300A (en) 2012-04-01

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