SG147455A1 - Sheet peeling apparatus and peeling method - Google Patents

Sheet peeling apparatus and peeling method

Info

Publication number
SG147455A1
SG147455A1 SG200807817-2A SG2008078172A SG147455A1 SG 147455 A1 SG147455 A1 SG 147455A1 SG 2008078172 A SG2008078172 A SG 2008078172A SG 147455 A1 SG147455 A1 SG 147455A1
Authority
SG
Singapore
Prior art keywords
peeling
sheet
adhesive tape
stuck
pulling
Prior art date
Application number
SG200807817-2A
Other languages
English (en)
Inventor
Masaki Tsujimoto
Takahisa Yoshioka
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintec Corp filed Critical Lintec Corp
Publication of SG147455A1 publication Critical patent/SG147455A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386—Separation by peeling
    • H01L2221/68395—Separation by peeling using peeling wheel
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
    • Y10T156/1168—Gripping and pulling work apart during delaminating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/195—Delaminating roller means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1978—Delaminating bending means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG200807817-2A 2003-10-27 2004-10-21 Sheet peeling apparatus and peeling method SG147455A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003365859A JP4494753B2 (ja) 2003-10-27 2003-10-27 シート剥離装置及び剥離方法

Publications (1)

Publication Number Publication Date
SG147455A1 true SG147455A1 (en) 2008-11-28

Family

ID=34510197

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200807817-2A SG147455A1 (en) 2003-10-27 2004-10-21 Sheet peeling apparatus and peeling method

Country Status (8)

Country Link
US (1) US7686916B2 (enExample)
EP (1) EP1679739B1 (enExample)
JP (1) JP4494753B2 (enExample)
KR (1) KR101059430B1 (enExample)
CN (1) CN1871692B (enExample)
SG (1) SG147455A1 (enExample)
TW (1) TW200518215A (enExample)
WO (1) WO2005041282A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4541237B2 (ja) * 2005-06-29 2010-09-08 リンテック株式会社 半導体ウエハ処理テープ巻装体およびそれを用いた半導体ウエハ処理テープ貼着装置ならびに半導体ウエハ加工処理装置
JP4697014B2 (ja) * 2006-04-06 2011-06-08 株式会社デンソー 半導体装置の製造方法および半導体製造装置。
JP2011116486A (ja) * 2009-12-02 2011-06-16 Sharp Corp フィルム剥離装置
JP5563349B2 (ja) * 2010-03-30 2014-07-30 日本板硝子株式会社 転写体の製造方法
KR101929527B1 (ko) * 2012-09-17 2018-12-17 삼성디스플레이 주식회사 필름 박리 장치
KR101981639B1 (ko) * 2012-11-13 2019-05-27 삼성디스플레이 주식회사 시트 커팅 장치 및 그것을 이용한 시트 커팅 방법
CN107210247A (zh) * 2014-11-19 2017-09-26 康宁股份有限公司 包括剥离的加工方法
JP2016160072A (ja) * 2015-03-04 2016-09-05 株式会社ジャパンディスプレイ 剥離装置及び剥離ヘッド
WO2017043862A1 (ko) * 2015-09-07 2017-03-16 주식회사 엘지화학 판상 물질의 박리 장치
JP2017224671A (ja) * 2016-06-14 2017-12-21 株式会社ディスコ 剥離装置
TWI685905B (zh) * 2017-07-12 2020-02-21 日商新川股份有限公司 接合裝置和接合方法
JP6954611B2 (ja) * 2017-11-13 2021-10-27 Uht株式会社 テープ貼付装置及びテープ貼付方法
JP7033310B2 (ja) * 2018-04-27 2022-03-10 三星ダイヤモンド工業株式会社 端材除去機構並びに端材除去方法
US11889742B2 (en) * 2020-11-04 2024-01-30 Samsung Display Co., Ltd. Apparatus of manufacturing display device and method of manufacturing display device
JP2022074816A (ja) * 2020-11-05 2022-05-18 三菱電機株式会社 清掃装置および清掃方法
CN115256539B (zh) * 2021-03-31 2024-05-17 苏州壬和控股有限公司 一种保护膜的零损伤式加工设备
US11505457B2 (en) * 2021-04-16 2022-11-22 Xintec Inc. Semiconductor removing apparatus and operation method thereof
JP2023059151A (ja) * 2021-10-14 2023-04-26 株式会社東京精密 ワーク加工装置
TWI803340B (zh) * 2022-06-07 2023-05-21 精材科技股份有限公司 撕膠設備及其操作方法
CN115876689B (zh) * 2022-12-30 2024-04-05 浙江京华激光科技股份有限公司 一种剥离性能检测设备及剥离检测方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04336428A (ja) * 1991-05-13 1992-11-24 Nitto Denko Corp ウエハのテープ貼合わせ剥離装置
JPH06302572A (ja) * 1993-04-12 1994-10-28 Hitachi Ltd 半導体装置の製造方法及びテープ貼付剥離装置
US6149758A (en) * 1997-06-20 2000-11-21 Lintec Corporation Sheet removing apparatus and method
JP4204653B2 (ja) * 1997-06-20 2009-01-07 リンテック株式会社 シート剥離装置および方法
KR100420390B1 (ko) * 1998-09-11 2004-02-26 히다찌 가세이 고오교 가부시끼가이샤 적층 장치 및 적층 방법
DE19845624C1 (de) 1998-10-05 2000-05-11 Duerkopp Adler Ag Nähanlage zur Herstellung einer paspelierten Taschenöffnung
JP2001291760A (ja) * 2000-01-31 2001-10-19 Hitachi Chem Co Ltd 剥離方法及び剥離用テープ
JP4166920B2 (ja) 2000-02-24 2008-10-15 リンテック株式会社 シート剥離装置および方法
JP4502547B2 (ja) * 2000-08-07 2010-07-14 日東電工株式会社 半導体ウエハの保護テープ除去方法およびその装置
JP3892703B2 (ja) * 2001-10-19 2007-03-14 富士通株式会社 半導体基板用治具及びこれを用いた半導体装置の製造方法
JP3880397B2 (ja) 2001-12-27 2007-02-14 日東電工株式会社 保護テープの貼付・剥離方法
JP3990264B2 (ja) * 2002-12-10 2007-10-10 富士フイルム株式会社 保護シート剥離装置
JP2004349591A (ja) * 2003-05-26 2004-12-09 Shinko Electric Ind Co Ltd 接着剤付きウェーハの製造方法及び製造装置
JP4538242B2 (ja) * 2004-01-23 2010-09-08 株式会社東芝 剥離装置及び剥離方法

Also Published As

Publication number Publication date
KR101059430B1 (ko) 2011-08-25
JP4494753B2 (ja) 2010-06-30
US7686916B2 (en) 2010-03-30
TW200518215A (en) 2005-06-01
EP1679739B1 (en) 2015-06-24
EP1679739A1 (en) 2006-07-12
WO2005041282A1 (ja) 2005-05-06
CN1871692A (zh) 2006-11-29
EP1679739A4 (en) 2010-01-13
US20090014124A1 (en) 2009-01-15
JP2005129829A (ja) 2005-05-19
CN1871692B (zh) 2010-06-09
TWI376738B (enExample) 2012-11-11
KR20060121917A (ko) 2006-11-29

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