SG115701A1 - Lithographic apparatus - Google Patents

Lithographic apparatus

Info

Publication number
SG115701A1
SG115701A1 SG200402963A SG200402963A SG115701A1 SG 115701 A1 SG115701 A1 SG 115701A1 SG 200402963 A SG200402963 A SG 200402963A SG 200402963 A SG200402963 A SG 200402963A SG 115701 A1 SG115701 A1 SG 115701A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
lithographic
Prior art date
Application number
SG200402963A
Other languages
English (en)
Inventor
Jacobus Frederik Molenaar
Den Hoven Gerbrand Petrus Van
Michael Johanne Vervoordeldonk
Michel Gerardus Pardoel
Gerardus Johannes Verdoes
Antoine Hendrik Verweij
Eijk Jan Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG115701A1 publication Critical patent/SG115701A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200402963A 2003-05-30 2004-05-26 Lithographic apparatus SG115701A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03076673A EP1482363A1 (en) 2003-05-30 2003-05-30 Lithographic apparatus

Publications (1)

Publication Number Publication Date
SG115701A1 true SG115701A1 (en) 2005-10-28

Family

ID=33104143

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200402963A SG115701A1 (en) 2003-05-30 2004-05-26 Lithographic apparatus

Country Status (7)

Country Link
US (1) US8059261B2 (ko)
EP (1) EP1482363A1 (ko)
JP (1) JP4200120B2 (ko)
KR (1) KR100768947B1 (ko)
CN (1) CN1573566B (ko)
SG (1) SG115701A1 (ko)
TW (1) TWI286677B (ko)

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JP4630567B2 (ja) * 2004-04-23 2011-02-09 キヤノン株式会社 露光装置およびデバイス製造方法
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US7382439B2 (en) * 2005-05-31 2008-06-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7671970B2 (en) * 2005-07-13 2010-03-02 Asml Netherlands B.V. Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch
US7417715B2 (en) * 2005-07-13 2008-08-26 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method using two patterning devices
US7924406B2 (en) * 2005-07-13 2011-04-12 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels
JP2007242774A (ja) * 2006-03-07 2007-09-20 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
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US20080073596A1 (en) * 2006-08-24 2008-03-27 Asml Netherlands B.V. Lithographic apparatus and method
US7518705B2 (en) * 2006-09-14 2009-04-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2009022506A1 (ja) * 2007-08-10 2009-02-19 Nikon Corporation 照明光学装置、露光装置、およびデバイス製造方法
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CN101526754B (zh) * 2009-03-26 2012-02-01 上海微电子装备有限公司 掩模版承版台及其光刻设备
WO2010118927A1 (en) 2009-04-13 2010-10-21 Asml Holding N.V. Mask inspection with fourier filtering and image compare
KR101719219B1 (ko) * 2009-06-09 2017-03-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 스트레이 방사선을 감소시키는 방법
JP5787472B2 (ja) * 2009-07-14 2015-09-30 セイコーインスツル株式会社 半導体露光装置
WO2014016163A1 (en) 2012-07-23 2014-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102799081A (zh) * 2012-09-11 2012-11-28 上海华力微电子有限公司 步进式重复曝光光刻机的掩模板工件台及曝光工艺
CN103901731B (zh) * 2012-12-28 2016-02-03 上海微电子装备有限公司 可动刀口装置
TWI561327B (en) * 2013-10-16 2016-12-11 Asm Tech Singapore Pte Ltd Laser scribing apparatus comprising adjustable spatial filter and method for etching semiconductor substrate
CN104777716B (zh) * 2014-01-10 2017-08-29 上海微电子装备有限公司 一种光刻机机械式快门叶片结构
CN107219729B (zh) * 2017-07-17 2018-10-26 深圳市华星光电技术有限公司 曝光机及遮光叶片
WO2019115196A1 (en) * 2017-12-14 2019-06-20 Asml Netherlands B.V. Lithographic apparatus with improved patterning performance
CN108663911B (zh) * 2018-05-09 2019-05-07 哈尔滨工业大学 一种窗口扫描式曝光装置
JP7198659B2 (ja) * 2018-12-26 2023-01-04 株式会社オーク製作所 露光装置
KR20210149168A (ko) * 2019-04-09 2021-12-08 쿠릭케 ＆ 소파 라이테큐 비.브이. 리소그래피 시스템 및 그 작동 방법
US10866519B1 (en) * 2019-10-01 2020-12-15 Taiwan Semiconductor Manufacturing Company Ltd. Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same
CN112782938B (zh) * 2019-11-05 2022-10-14 上海微电子装备（集团）股份有限公司 一种可动狭缝装置及光刻系统
CN110908250A (zh) * 2019-12-16 2020-03-24 华虹半导体(无锡)有限公司 投影光刻系统的积分棒和刀口狭缝的防摩擦装置和方法
CN113311666B (zh) * 2020-02-27 2022-07-29 上海微电子装备（集团）股份有限公司 一种可移动刀口模块及可变狭缝系统

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JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法
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JP3416373B2 (ja) * 1996-02-20 2003-06-16 キヤノン株式会社 反射型ｘ線マスク構造体、ｘ線露光装置、ｘ線露光方法ならびに該反射型ｘ線マスク構造体を用いて作製されるデバイス
JP3286184B2 (ja) 1996-09-25 2002-05-27 キヤノン株式会社 走査露光装置および方法
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DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
DE69933903T2 (de) 1998-04-14 2007-05-24 Asml Netherlands B.V. Lithograpischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
WO1999063585A1 (fr) 1998-06-02 1999-12-09 Nikon Corporation Organe d'alignement de balayage, son procede de fabrication et procede de fabrication de dispositif
JP2000173900A (ja) * 1998-12-08 2000-06-23 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP4432139B2 (ja) 1999-01-25 2010-03-17 株式会社ニコン ステージ装置及び露光装置
US6302192B1 (en) * 1999-05-12 2001-10-16 Thermal Corp. Integrated circuit heat pipe heat spreader with through mounting holes
JP2001218424A (ja) 2000-02-03 2001-08-10 Canon Inc 流体軸受けモータ
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US6717651B2 (en) * 2000-04-12 2004-04-06 Nikon Corporation Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
JP2002374027A (ja) * 2001-06-14 2002-12-26 Mitsubishi Electric Corp 半導体レーザ装置
JP3679736B2 (ja) 2001-07-04 2005-08-03 キヤノン株式会社 露光装置、露光方法、デバイス製造方法、並びに、デバイス
US6806943B2 (en) * 2002-08-09 2004-10-19 International Business Machines Corporation Mask clamping device

Also Published As

Publication number Publication date
JP4200120B2 (ja) 2008-12-24
US8059261B2 (en) 2011-11-15
JP2004363589A (ja) 2004-12-24
TWI286677B (en) 2007-09-11
US20050012913A1 (en) 2005-01-20
CN1573566B (zh) 2010-06-23
EP1482363A1 (en) 2004-12-01
KR20040104401A (ko) 2004-12-10
TW200517788A (en) 2005-06-01
KR100768947B1 (ko) 2007-10-19
CN1573566A (zh) 2005-02-02

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