SG11201802203UA - Sputtering target material - Google Patents

Sputtering target material

Info

Publication number
SG11201802203UA
SG11201802203UA SG11201802203UA SG11201802203UA SG11201802203UA SG 11201802203U A SG11201802203U A SG 11201802203UA SG 11201802203U A SG11201802203U A SG 11201802203UA SG 11201802203U A SG11201802203U A SG 11201802203UA SG 11201802203U A SG11201802203U A SG 11201802203UA
Authority
SG
Singapore
Prior art keywords
target material
sputtering target
sputtering
target
Prior art date
Application number
SG11201802203UA
Other languages
English (en)
Inventor
Hiroyuki Hasegawa
Noriaki Matsubara
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Priority claimed from PCT/JP2016/077459 external-priority patent/WO2017047754A1/ja
Publication of SG11201802203UA publication Critical patent/SG11201802203UA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05—Metallic powder characterised by the size or surface area of the particles
    • B22F1/052—Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
    • C22C33/0285—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5% with Cr, Co, or Ni having a minimum content higher than 5%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/16—Ferrous alloys, e.g. steel alloys containing copper
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
SG11201802203UA 2015-09-18 2016-09-16 Sputtering target material SG11201802203UA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015184846 2015-09-18
JP2016010266A JP2017057490A (ja) 2015-09-18 2016-01-22 Ｃｏ−Ｆｅ−Ｂ系合金ターゲット材
PCT/JP2016/077459 WO2017047754A1 (ja) 2015-09-18 2016-09-16 スパッタリングターゲット材

Publications (1)

Publication Number Publication Date
SG11201802203UA true SG11201802203UA (en) 2018-04-27

Family

ID=58391141

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201802203UA SG11201802203UA (en) 2015-09-18 2016-09-16 Sputtering target material
SG10201913475PA SG10201913475PA (en) 2015-09-18 2016-09-16 Sputtering target material

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10201913475PA SG10201913475PA (en) 2015-09-18 2016-09-16 Sputtering target material

Country Status (6)

Country Link
US (2) US20180265963A1 (enrdf_load_stackoverflow)
EP (1) EP3351655A4 (enrdf_load_stackoverflow)
JP (2) JP2017057490A (enrdf_load_stackoverflow)
KR (1) KR102635337B1 (enrdf_load_stackoverflow)
SG (2) SG11201802203UA (enrdf_load_stackoverflow)
TW (1) TWI712698B (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4039392A1 (en) * 2017-04-21 2022-08-10 Raytheon Technologies Corporation Systems, devices and methods for spark plasma sintering
TWI642800B (zh) * 2017-10-03 2018-12-01 光洋應用材料科技股份有限公司 鈷鉑錸基濺鍍靶材、其製法及磁記錄層
TWI658150B (zh) * 2018-02-05 2019-05-01 光洋應用材料科技股份有限公司 含鈷鉻鉑硼錸濺鍍靶材、含鈷鉻鉑硼錸層及其製法
JP7382142B2 (ja) * 2019-02-26 2023-11-16 山陽特殊製鋼株式会社 スパッタリングターゲット材に適した合金
JP7492831B2 (ja) * 2020-01-06 2024-05-30 山陽特殊製鋼株式会社 スパッタリングターゲット材
JP7506477B2 (ja) 2020-01-06 2024-06-26 山陽特殊製鋼株式会社 スパッタリングターゲット材の製造方法
CN112371987A (zh) * 2020-11-13 2021-02-19 河南东微电子材料有限公司 一种铁钴硼铬铝合金粉末的制备方法
JP7205999B1 (ja) 2021-09-09 2023-01-17 山陽特殊製鋼株式会社 スパッタリングターゲット材

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4127474B2 (ja) * 2002-02-04 2008-07-30 株式会社東芝 スパッタリングターゲット
US7141208B2 (en) 2003-04-30 2006-11-28 Hitachi Metals, Ltd. Fe-Co-B alloy target and its production method, and soft magnetic film produced by using such target, and magnetic recording medium and TMR device
JP4016399B2 (ja) 2003-04-30 2007-12-05 日立金属株式会社 Ｆｅ−Ｃｏ−Ｂ合金ターゲット材の製造方法
JP2005320627A (ja) 2004-04-07 2005-11-17 Hitachi Metals Ltd Ｃｏ合金ターゲット材の製造方法、Ｃｏ合金ターゲット材および垂直磁気記録用軟磁性膜ならびに垂直磁気記録媒体
US20070017803A1 (en) 2005-07-22 2007-01-25 Heraeus, Inc. Enhanced sputter target manufacturing method
JP4331182B2 (ja) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 軟磁性ターゲット材
EP2511397B1 (en) * 2009-12-11 2018-09-26 JX Nippon Mining & Metals Corporation Magnetic material sputtering target
JP5631659B2 (ja) 2010-08-24 2014-11-26 山陽特殊製鋼株式会社 垂直磁気記録媒体用軟磁性合金およびスパッタリングターゲット材並びに磁気記録媒体
JP5769059B2 (ja) * 2011-03-30 2015-08-26 日立金属株式会社 永久磁石薄膜用スパッタリングターゲット及びその製造方法
CN105102670B (zh) * 2013-03-22 2017-06-23 吉坤日矿日石金属株式会社 钨烧结体溅射靶及其制造方法
JP6215329B2 (ja) * 2013-08-09 2017-10-18 Ｊｘ金属株式会社 ネオジム、鉄、ボロンを主成分とする希土類粉末又はスパッタリングターゲットの製造方法、同希土類元素からなる粉末又はスパッタリングターゲット及びネオジム、鉄、ボロンを主成分とする希土類磁石用薄膜又はその製造方法
WO2015080009A1 (ja) * 2013-11-28 2015-06-04 Jx日鉱日石金属株式会社 磁性材スパッタリングターゲット及びその製造方法
JP6405261B2 (ja) 2014-05-01 2018-10-17 山陽特殊製鋼株式会社 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体
EP3211116B1 (en) * 2015-03-04 2020-10-21 JX Nippon Mining & Metals Corporation Magnetic-material sputtering target and method for producing same

Also Published As

Publication number Publication date
JP2020143372A (ja) 2020-09-10
EP3351655A4 (en) 2019-04-17
TWI712698B (zh) 2020-12-11
SG10201913475PA (en) 2020-03-30
EP3351655A1 (en) 2018-07-25
US11377726B2 (en) 2022-07-05
KR102635337B1 (ko) 2024-02-07
JP7084958B2 (ja) 2022-06-15
US20180265963A1 (en) 2018-09-20
KR20180054595A (ko) 2018-05-24
US20200362451A1 (en) 2020-11-19
TW201726954A (zh) 2017-08-01
JP2017057490A (ja) 2017-03-23

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