SG11201500762SA - Fe-Pt-BASED SINTERED COMPACT SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR - Google Patents
Fe-Pt-BASED SINTERED COMPACT SPUTTERING TARGET AND MANUFACTURING METHOD THEREFORInfo
- Publication number
- SG11201500762SA SG11201500762SA SG11201500762SA SG11201500762SA SG11201500762SA SG 11201500762S A SG11201500762S A SG 11201500762SA SG 11201500762S A SG11201500762S A SG 11201500762SA SG 11201500762S A SG11201500762S A SG 11201500762SA SG 11201500762S A SG11201500762S A SG 11201500762SA
- Authority
- SG
- Singapore
- Prior art keywords
- manufacturing
- sputtering target
- method therefor
- sintered compact
- based sintered
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/04—Alloys based on a platinum group metal
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012233999 | 2012-10-23 | ||
PCT/JP2013/078264 WO2014065201A1 (ja) | 2012-10-23 | 2013-10-18 | Fe-Pt系焼結体スパッタリングターゲット及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201500762SA true SG11201500762SA (en) | 2015-05-28 |
Family
ID=50544581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201500762SA SG11201500762SA (en) | 2012-10-23 | 2013-10-18 | Fe-Pt-BASED SINTERED COMPACT SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5913620B2 (zh) |
CN (1) | CN104781446B (zh) |
MY (1) | MY175025A (zh) |
SG (1) | SG11201500762SA (zh) |
TW (1) | TWI616548B (zh) |
WO (1) | WO2014065201A1 (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10600440B2 (en) | 2014-09-22 | 2020-03-24 | Jx Nippon Mining & Metals Corporation | Sputtering target for forming magnetic recording film and method for producing same |
SG11201806169UA (en) * | 2016-02-19 | 2018-09-27 | Jx Nippon Mining & Metals Corp | Sputtering target for magnetic recording medium, and magnetic thin film |
WO2017222682A1 (en) * | 2016-06-24 | 2017-12-28 | Tosoh Smd, Inc. | Tungsten-boron sputter targets and films made thereby |
JP6526837B2 (ja) * | 2016-09-12 | 2019-06-05 | Jx金属株式会社 | 強磁性材スパッタリングターゲット |
JP6798627B2 (ja) * | 2018-03-19 | 2020-12-09 | 住友電気工業株式会社 | 表面被覆切削工具 |
JP7057692B2 (ja) * | 2018-03-20 | 2022-04-20 | 田中貴金属工業株式会社 | スパッタリングターゲット用Fe-Pt-酸化物-BN系焼結体 |
JP6989427B2 (ja) | 2018-03-23 | 2022-01-05 | 昭和電工株式会社 | 磁気記録媒体および磁気記録再生装置 |
JP7049182B2 (ja) | 2018-05-21 | 2022-04-06 | 昭和電工株式会社 | 磁気記録媒体および磁気記憶装置 |
JP7104001B2 (ja) * | 2019-06-28 | 2022-07-20 | 田中貴金属工業株式会社 | Fe-Pt-BN系スパッタリングターゲット及びその製造方法 |
US20220267892A1 (en) * | 2019-07-12 | 2022-08-25 | Tanaka Kikinzoku Kogyo K.K. | Fe-pt-bn-based sputtering target and production method therefor |
TWI752655B (zh) * | 2020-09-25 | 2022-01-11 | 光洋應用材料科技股份有限公司 | 鐵鉑基靶材及其製法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2934120B2 (ja) * | 1992-07-02 | 1999-08-16 | 信越化学工業株式会社 | 熱分解窒化ほう素容器 |
JP2694110B2 (ja) * | 1993-09-09 | 1997-12-24 | 株式会社アモルファス・電子デバイス研究所 | 磁性薄膜及びその製造方法 |
JP3786453B2 (ja) * | 1994-07-11 | 2006-06-14 | 株式会社東芝 | 磁気記録媒体および磁気記録再生装置 |
JPH0950618A (ja) * | 1995-08-04 | 1997-02-18 | Victor Co Of Japan Ltd | 磁気記録媒体及びその製造方法 |
JP3328692B2 (ja) * | 1999-04-26 | 2002-09-30 | 東北大学長 | 磁気記録媒体の製造方法 |
JP4175829B2 (ja) * | 2002-04-22 | 2008-11-05 | 株式会社東芝 | 記録媒体用スパッタリングターゲットと磁気記録媒体 |
US20080210555A1 (en) * | 2007-03-01 | 2008-09-04 | Heraeus Inc. | High density ceramic and cermet sputtering targets by microwave sintering |
CN101255546A (zh) * | 2007-03-01 | 2008-09-03 | 贺利氏有限公司 | 通过微波烧结制备高密度陶瓷和金属陶瓷溅射靶 |
-
2013
- 2013-10-18 CN CN201380046762.9A patent/CN104781446B/zh active Active
- 2013-10-18 JP JP2014543263A patent/JP5913620B2/ja active Active
- 2013-10-18 MY MYPI2015700905A patent/MY175025A/en unknown
- 2013-10-18 SG SG11201500762SA patent/SG11201500762SA/en unknown
- 2013-10-18 WO PCT/JP2013/078264 patent/WO2014065201A1/ja active Application Filing
- 2013-10-21 TW TW102137884A patent/TWI616548B/zh active
Also Published As
Publication number | Publication date |
---|---|
MY175025A (en) | 2020-06-03 |
CN104781446B (zh) | 2017-03-08 |
TW201428119A (zh) | 2014-07-16 |
CN104781446A (zh) | 2015-07-15 |
TWI616548B (zh) | 2018-03-01 |
JP5913620B2 (ja) | 2016-04-27 |
WO2014065201A1 (ja) | 2014-05-01 |
JPWO2014065201A1 (ja) | 2016-09-08 |
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