SG10201704081TA - Processing apparatus and processing method - Google Patents

Processing apparatus and processing method

Info

Publication number
SG10201704081TA
SG10201704081TA SG10201704081TA SG10201704081TA SG10201704081TA SG 10201704081T A SG10201704081T A SG 10201704081TA SG 10201704081T A SG10201704081T A SG 10201704081TA SG 10201704081T A SG10201704081T A SG 10201704081TA SG 10201704081T A SG10201704081T A SG 10201704081TA
Authority
SG
Singapore
Prior art keywords
processing
processing apparatus
processing method
Prior art date
Application number
SG10201704081TA
Other languages
English (en)
Inventor
Shigematsu Koichi
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201704081TA publication Critical patent/SG10201704081TA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/402—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for positioning, e.g. centring a tool relative to a hole in the workpiece, additional detection means to correct position
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50—Working by transmitting the laser beam through or within the workpiece
    • B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/401—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for measuring, e.g. calibration and initialisation, measuring workpiece for machining purposes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/34—Director, elements to supervisory
    • G05B2219/34465—Safety, control of correct operation, abnormal states
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/37—Measurements
    • G05B2219/37559—Camera, vision of tool, compute tool center, detect tool wear
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/50—Machine tool, machine tool null till machine tool work handling
    • G05B2219/50064—Camera inspects workpiece for errors, correction of workpiece at desired position
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Automation & Control Theory (AREA)
  • Optics & Photonics (AREA)
  • Human Computer Interaction (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)
  • Numerical Control (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • General Factory Administration (AREA)
SG10201704081TA 2016-05-31 2017-05-18 Processing apparatus and processing method SG10201704081TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016108601A JP6716160B2 (ja) 2016-05-31 2016-05-31 加工装置及び加工方法

Publications (1)

Publication Number Publication Date
SG10201704081TA true SG10201704081TA (en) 2017-12-28

Family

ID=60420499

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201704081TA SG10201704081TA (en) 2016-05-31 2017-05-18 Processing apparatus and processing method

Country Status (6)

Country Link
US (1) US11181883B2 (zh)
JP (1) JP6716160B2 (zh)
KR (1) KR102219150B1 (zh)
CN (1) CN107452652B (zh)
SG (1) SG10201704081TA (zh)
TW (1) TWI739823B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7064887B2 (ja) * 2018-01-12 2022-05-11 株式会社ディスコ 加工装置の管理方法および加工装置
ES2898300T3 (es) 2018-10-12 2022-03-07 Dallan Spa Aparatos para el corte por láser o plasma de piezas de material laminar

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JP3031053B2 (ja) * 1992-04-15 2000-04-10 三菱電機株式会社 洗浄能力評価方法
JP3050746B2 (ja) * 1994-02-28 2000-06-12 株式会社アドバンテスト レーザリペア装置及びその位置チェック方法
US5627624A (en) * 1994-10-31 1997-05-06 Lsi Logic Corporation Integrated circuit test reticle and alignment mark optimization method
US6556949B1 (en) * 1999-05-18 2003-04-29 Applied Materials, Inc. Semiconductor processing techniques
US6303395B1 (en) * 1999-06-01 2001-10-16 Applied Materials, Inc. Semiconductor processing techniques
EP1273907A4 (en) 2000-11-17 2006-08-30 Ebara Corp METHOD AND INSTRUMENT FOR WAFER INSPECTION AND ELECTRON BEAM
JP3765985B2 (ja) * 2001-02-01 2006-04-12 横河電機株式会社 計器評価システム
KR100537684B1 (ko) * 2001-09-19 2005-12-20 올림푸스 가부시키가이샤 반도체웨이퍼검사장치
US7746446B2 (en) * 2004-03-31 2010-06-29 Nikon Corporation Alignment condition determination method and apparatus of the same, and exposure method and apparatus of the same
JP4715749B2 (ja) * 2004-08-19 2011-07-06 株式会社ニコン アライメント情報表示方法とそのプログラム、アライメント方法、露光方法、デバイス製造方法、表示システム、表示装置
JP5030542B2 (ja) * 2006-11-10 2012-09-19 株式会社日立ハイテクノロジーズ 真空処理装置
JP2011122990A (ja) * 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 欠陥検査装置及び欠陥検査方法
JP5835934B2 (ja) * 2011-04-28 2015-12-24 株式会社ディスコ レーザー加工装置
JP5139569B1 (ja) * 2011-09-27 2013-02-06 ヤマハ発動機株式会社 基板搬送装置、基板搬送方法および表面実装機
US8750597B2 (en) * 2011-11-23 2014-06-10 International Business Machines Corporation Robust inspection alignment of semiconductor inspection tools using design information
KR101325150B1 (ko) * 2012-05-23 2013-11-06 한국생산기술연구원 세팅 오차를 반영한 가공 공정 감시 장치 및 방법
JP2014026436A (ja) * 2012-07-26 2014-02-06 Disco Abrasive Syst Ltd 加工装置
JP6224350B2 (ja) * 2013-05-17 2017-11-01 株式会社ディスコ 加工装置
KR102084712B1 (ko) * 2013-05-30 2020-03-05 삼성디스플레이 주식회사 표시 장치용 기판 및 박막 증착 방법
WO2015046090A1 (ja) * 2013-09-26 2015-04-02 株式会社フジミインコーポレーテッド 研磨用組成物、研磨用組成物の製造方法およびシリコンウェーハ製造方法
JP2015097048A (ja) * 2013-11-15 2015-05-21 株式会社ディスコ 加工装置のメンテナンス方法
JP6349096B2 (ja) * 2014-02-03 2018-06-27 株式会社タカコ 工具検査方法及び工具検査装置
CN104359915B (zh) * 2014-12-08 2017-05-10 合肥京东方光电科技有限公司 一种涂胶检测方法及涂胶检测装置
US10747106B2 (en) * 2014-12-09 2020-08-18 Canon Kabushiki Kaisha Imprint apparatus
CN104820302B (zh) * 2015-05-19 2018-05-18 合肥京东方光电科技有限公司 取向膜检测装置及方法

Also Published As

Publication number Publication date
TW201804271A (zh) 2018-02-01
KR20170135683A (ko) 2017-12-08
JP2017216333A (ja) 2017-12-07
US20170343979A1 (en) 2017-11-30
US11181883B2 (en) 2021-11-23
TWI739823B (zh) 2021-09-21
KR102219150B1 (ko) 2021-02-22
JP6716160B2 (ja) 2020-07-01
CN107452652B (zh) 2023-07-21
CN107452652A (zh) 2017-12-08

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