SG10201508996WA - Roll-Type Processing Member, Pencil-Type Processing Member, And Substrate Processing Apparatus Including Any One Of These - Google Patents
Roll-Type Processing Member, Pencil-Type Processing Member, And Substrate Processing Apparatus Including Any One Of TheseInfo
- Publication number
- SG10201508996WA SG10201508996WA SG10201508996WA SG10201508996WA SG10201508996WA SG 10201508996W A SG10201508996W A SG 10201508996WA SG 10201508996W A SG10201508996W A SG 10201508996WA SG 10201508996W A SG10201508996W A SG 10201508996WA SG 10201508996W A SG10201508996W A SG 10201508996WA
- Authority
- SG
- Singapore
- Prior art keywords
- processing member
- type processing
- pencil
- roll
- apparatus including
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014223754A JP6316730B2 (ja) | 2014-10-31 | 2014-10-31 | ロール部材、ペンシル部材、及びそれらの少なくともいずれか一方を含む基板処理装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201508996WA true SG10201508996WA (en) | 2016-05-30 |
Family
ID=55853472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201508996WA SG10201508996WA (en) | 2014-10-31 | 2015-10-30 | Roll-Type Processing Member, Pencil-Type Processing Member, And Substrate Processing Apparatus Including Any One Of These |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US10471481B2 (enExample) |
| JP (1) | JP6316730B2 (enExample) |
| KR (1) | KR102443489B1 (enExample) |
| CN (2) | CN113276024B (enExample) |
| MY (1) | MY178652A (enExample) |
| SG (1) | SG10201508996WA (enExample) |
| TW (2) | TWI670141B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6956578B2 (ja) * | 2017-09-19 | 2021-11-02 | 株式会社荏原製作所 | ブレークイン装置及びブレークインシステム |
| JP7224128B2 (ja) * | 2018-08-09 | 2023-02-17 | 株式会社荏原製作所 | 基板用洗浄具、基板洗浄装置、基板処理装置、基板処理方法および基板用洗浄具の製造方法 |
| KR20220113493A (ko) * | 2019-12-13 | 2022-08-12 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판 세정 장치, 연마 장치, 버프 처리 장치, 기판 세정 방법, 기판 처리 장치, 및 기계 학습기 |
| CN112420574B (zh) * | 2020-11-25 | 2024-02-02 | 杭州众硅电子科技有限公司 | 一种可隔离防护晶圆的晶圆处理装置 |
| JP7564693B2 (ja) | 2020-11-26 | 2024-10-09 | 株式会社Ｓｃｒｅｅｎホールディングス | 下面ブラシ、ブラシユニットおよび基板洗浄装置 |
| JP7672908B2 (ja) * | 2021-07-28 | 2025-05-08 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板洗浄装置および基板洗浄方法 |
| US20230178360A1 (en) * | 2021-12-06 | 2023-06-08 | Tung An Development Ltd. | Device Having Cleaning Bodies |
| EP4630231A1 (en) * | 2022-12-07 | 2025-10-15 | Tcnv, Llc | Cylindrical brush and method of manufacture |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2480023A (en) * | 1948-05-28 | 1949-08-23 | Knickerbocker Rubber Company | Massage brush |
| US3583555A (en) * | 1969-01-31 | 1971-06-08 | George E Karsnak | Cleaning apparatus for conveyor belts or the like |
| US4217737A (en) * | 1979-04-16 | 1980-08-19 | Merit Abrasive Products, Inc. | Abrasive flap drum |
| EP1080797A3 (en) * | 1994-06-28 | 2005-10-05 | Ebara Corporation | Method and apparatus for cleaning workpiece |
| JP3114156B2 (ja) * | 1994-06-28 | 2000-12-04 | 株式会社荏原製作所 | 洗浄方法および装置 |
| JPH08141521A (ja) | 1994-11-24 | 1996-06-04 | Sumitomo Metal Ind Ltd | 洗浄装置 |
| US5779526A (en) * | 1996-02-27 | 1998-07-14 | Gill; Gerald L. | Pad conditioner |
| EP0837493B8 (en) * | 1996-10-21 | 2007-11-07 | Ebara Corporation | Cleaning apparatus |
| EP0937509A4 (en) | 1996-11-08 | 2005-01-19 | Aion Co Ltd | SPONGE ROLLER TO CLEAN |
| US6502273B1 (en) * | 1996-11-08 | 2003-01-07 | Kanebo, Ltd. | Cleaning sponge roller |
| TW358764B (en) * | 1997-07-07 | 1999-05-21 | Super Silicon Crystal Res Inst | A method of double-side lapping a wafer and an apparatus therefor |
| US6202658B1 (en) * | 1998-11-11 | 2001-03-20 | Applied Materials, Inc. | Method and apparatus for cleaning the edge of a thin disc |
| JP4091187B2 (ja) * | 1998-12-08 | 2008-05-28 | 株式会社荏原製作所 | 洗浄具、基板洗浄装置及び基板洗浄方法 |
| JP2000270929A (ja) * | 1999-03-26 | 2000-10-03 | Shibaura Mechatronics Corp | 洗浄用ブラシ |
| JP2000311878A (ja) * | 1999-04-27 | 2000-11-07 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
| KR100613919B1 (ko) * | 1999-07-26 | 2006-08-18 | 동경 엘렉트론 주식회사 | 기판세정구, 기판세정장치 및 기판세정방법 |
| US6406358B1 (en) * | 1999-08-05 | 2002-06-18 | Micron Technology, Inc. | Method and apparatus for cleaning a surface of a microelectronic substrate |
| US6467120B1 (en) * | 1999-09-08 | 2002-10-22 | International Business Machines Corporation | Wafer cleaning brush profile modification |
| US6367613B1 (en) * | 2000-04-28 | 2002-04-09 | Preston D. Montgomery | Belt cleaning sprocket |
| US6904637B2 (en) * | 2001-10-03 | 2005-06-14 | Applied Materials, Inc. | Scrubber with sonic nozzle |
| JP2004273530A (ja) * | 2003-03-05 | 2004-09-30 | Nec Kyushu Ltd | 洗浄装置およびその方法 |
| EP1680260B1 (en) * | 2003-08-08 | 2014-04-30 | Entegris, Inc. | Methods and materials for making a monolithic porous pad cast onto a rotatable base |
| CN1872546A (zh) * | 2005-05-26 | 2006-12-06 | 日东电工株式会社 | 清洁片及使用该清洁片的清洁方法 |
| JP2007000860A (ja) * | 2005-05-26 | 2007-01-11 | Nitto Denko Corp | 清浄用シート及びそれを用いた清浄方法 |
| CN100449704C (zh) * | 2006-08-11 | 2009-01-07 | 中芯国际集成电路制造(上海)有限公司 | 研磨头的清洗装置 |
| KR101155623B1 (ko) * | 2010-01-08 | 2012-06-13 | 세메스 주식회사 | 기판 세정 유닛 및 이를 갖는 기판 세정 장치 |
| TW201318779A (zh) * | 2011-09-26 | 2013-05-16 | Entegris Inc | 清潔基板之刷具 |
| US9202723B2 (en) * | 2011-11-29 | 2015-12-01 | Illinois Tool Works, Inc. | Brush with cantilevered nodules |
| US20130255721A1 (en) * | 2012-04-03 | 2013-10-03 | Illinois Tool Works Inc. | Concave nodule sponge brush |
| JP6352158B2 (ja) * | 2014-11-20 | 2018-07-04 | 株式会社荏原製作所 | 洗浄具、洗浄具の製造方法、および、基板洗浄装置 |
-
2014
- 2014-10-31 JP JP2014223754A patent/JP6316730B2/ja active Active
-
2015
- 2015-09-25 TW TW104131754A patent/TWI670141B/zh active
- 2015-09-25 TW TW107140682A patent/TWI678260B/zh active
- 2015-10-22 US US14/920,045 patent/US10471481B2/en active Active
- 2015-10-27 KR KR1020150149207A patent/KR102443489B1/ko active Active
- 2015-10-29 CN CN202110546709.1A patent/CN113276024B/zh active Active
- 2015-10-29 CN CN201510724374.2A patent/CN105575851B/zh active Active
- 2015-10-30 MY MYPI2015002682A patent/MY178652A/en unknown
- 2015-10-30 SG SG10201508996WA patent/SG10201508996WA/en unknown
-
2019
- 2019-10-01 US US16/590,089 patent/US11642704B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US11642704B2 (en) | 2023-05-09 |
| TW201615340A (zh) | 2016-05-01 |
| TWI678260B (zh) | 2019-12-01 |
| CN105575851A (zh) | 2016-05-11 |
| MY178652A (en) | 2020-10-20 |
| KR20160052343A (ko) | 2016-05-12 |
| CN113276024B (zh) | 2023-08-29 |
| US20160126113A1 (en) | 2016-05-05 |
| KR102443489B1 (ko) | 2022-09-15 |
| JP6316730B2 (ja) | 2018-04-25 |
| TW201906689A (zh) | 2019-02-16 |
| CN105575851B (zh) | 2021-08-27 |
| US10471481B2 (en) | 2019-11-12 |
| US20200030855A1 (en) | 2020-01-30 |
| CN113276024A (zh) | 2021-08-20 |
| JP2016092158A (ja) | 2016-05-23 |
| TWI670141B (zh) | 2019-09-01 |
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