MY178652A - Roll-type processing member, pencil-type processing member, and substrate processing apparatus including any one of these - Google Patents
Roll-type processing member, pencil-type processing member, and substrate processing apparatus including any one of theseInfo
- Publication number
- MY178652A MY178652A MYPI2015002682A MYPI2015002682A MY178652A MY 178652 A MY178652 A MY 178652A MY PI2015002682 A MYPI2015002682 A MY PI2015002682A MY PI2015002682 A MYPI2015002682 A MY PI2015002682A MY 178652 A MY178652 A MY 178652A
- Authority
- MY
- Malaysia
- Prior art keywords
- roll
- processing member
- type processing
- type
- pencil
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 3
- 238000004140 cleaning Methods 0.000 abstract 9
- 238000011144 upstream manufacturing Methods 0.000 abstract 2
- 238000005201 scrubbing Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014223754A JP6316730B2 (ja) | 2014-10-31 | 2014-10-31 | ロール部材、ペンシル部材、及びそれらの少なくともいずれか一方を含む基板処理装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY178652A true MY178652A (en) | 2020-10-20 |
Family
ID=55853472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2015002682A MY178652A (en) | 2014-10-31 | 2015-10-30 | Roll-type processing member, pencil-type processing member, and substrate processing apparatus including any one of these |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US10471481B2 (enExample) |
| JP (1) | JP6316730B2 (enExample) |
| KR (1) | KR102443489B1 (enExample) |
| CN (2) | CN105575851B (enExample) |
| MY (1) | MY178652A (enExample) |
| SG (1) | SG10201508996WA (enExample) |
| TW (2) | TWI678260B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6956578B2 (ja) * | 2017-09-19 | 2021-11-02 | 株式会社荏原製作所 | ブレークイン装置及びブレークインシステム |
| JP7224128B2 (ja) * | 2018-08-09 | 2023-02-17 | 株式会社荏原製作所 | 基板用洗浄具、基板洗浄装置、基板処理装置、基板処理方法および基板用洗浄具の製造方法 |
| JP7536039B2 (ja) * | 2019-12-13 | 2024-08-19 | 株式会社荏原製作所 | 基板洗浄装置、研磨装置、バフ処理装置、基板洗浄方法、基板処理装置、および機械学習器 |
| CN112420574B (zh) * | 2020-11-25 | 2024-02-02 | 杭州众硅电子科技有限公司 | 一种可隔离防护晶圆的晶圆处理装置 |
| JP7564693B2 (ja) | 2020-11-26 | 2024-10-09 | 株式会社Ｓｃｒｅｅｎホールディングス | 下面ブラシ、ブラシユニットおよび基板洗浄装置 |
| JP7672908B2 (ja) * | 2021-07-28 | 2025-05-08 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板洗浄装置および基板洗浄方法 |
| US20230178360A1 (en) * | 2021-12-06 | 2023-06-08 | Tung An Development Ltd. | Device Having Cleaning Bodies |
| WO2024124074A1 (en) * | 2022-12-07 | 2024-06-13 | Tech Core Pva, Llc | Cylindrical brush and method of manufacture |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2480023A (en) * | 1948-05-28 | 1949-08-23 | Knickerbocker Rubber Company | Massage brush |
| US3583555A (en) * | 1969-01-31 | 1971-06-08 | George E Karsnak | Cleaning apparatus for conveyor belts or the like |
| US4217737A (en) * | 1979-04-16 | 1980-08-19 | Merit Abrasive Products, Inc. | Abrasive flap drum |
| JP3114156B2 (ja) * | 1994-06-28 | 2000-12-04 | 株式会社荏原製作所 | 洗浄方法および装置 |
| DE69522617T2 (de) * | 1994-06-28 | 2002-07-04 | Ebara Corp., Tokio/Tokyo | Verfahren und Vorrichtung zum Reinigen von Werkstücken |
| JPH08141521A (ja) | 1994-11-24 | 1996-06-04 | Sumitomo Metal Ind Ltd | 洗浄装置 |
| US5779526A (en) * | 1996-02-27 | 1998-07-14 | Gill; Gerald L. | Pad conditioner |
| EP0837493B8 (en) * | 1996-10-21 | 2007-11-07 | Ebara Corporation | Cleaning apparatus |
| EP0937509A4 (en) | 1996-11-08 | 2005-01-19 | Aion Co Ltd | SPONGE ROLLER TO CLEAN |
| US6502273B1 (en) * | 1996-11-08 | 2003-01-07 | Kanebo, Ltd. | Cleaning sponge roller |
| TW358764B (en) * | 1997-07-07 | 1999-05-21 | Super Silicon Crystal Res Inst | A method of double-side lapping a wafer and an apparatus therefor |
| US6202658B1 (en) * | 1998-11-11 | 2001-03-20 | Applied Materials, Inc. | Method and apparatus for cleaning the edge of a thin disc |
| JP4091187B2 (ja) * | 1998-12-08 | 2008-05-28 | 株式会社荏原製作所 | 洗浄具、基板洗浄装置及び基板洗浄方法 |
| JP2000270929A (ja) * | 1999-03-26 | 2000-10-03 | Shibaura Mechatronics Corp | 洗浄用ブラシ |
| JP2000311878A (ja) * | 1999-04-27 | 2000-11-07 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
| KR100613919B1 (ko) * | 1999-07-26 | 2006-08-18 | 동경 엘렉트론 주식회사 | 기판세정구, 기판세정장치 및 기판세정방법 |
| US6406358B1 (en) * | 1999-08-05 | 2002-06-18 | Micron Technology, Inc. | Method and apparatus for cleaning a surface of a microelectronic substrate |
| US6467120B1 (en) * | 1999-09-08 | 2002-10-22 | International Business Machines Corporation | Wafer cleaning brush profile modification |
| US6367613B1 (en) * | 2000-04-28 | 2002-04-09 | Preston D. Montgomery | Belt cleaning sprocket |
| US6904637B2 (en) * | 2001-10-03 | 2005-06-14 | Applied Materials, Inc. | Scrubber with sonic nozzle |
| JP2004273530A (ja) * | 2003-03-05 | 2004-09-30 | Nec Kyushu Ltd | 洗浄装置およびその方法 |
| KR101158137B1 (ko) * | 2003-08-08 | 2012-06-19 | 엔테그리스, 아이엔씨. | 회전식 기부 상에 주조된 일체형 다공성 패드를 제조하기위한 방법 및 재료 |
| CN1872546A (zh) * | 2005-05-26 | 2006-12-06 | 日东电工株式会社 | 清洁片及使用该清洁片的清洁方法 |
| JP2007000860A (ja) * | 2005-05-26 | 2007-01-11 | Nitto Denko Corp | 清浄用シート及びそれを用いた清浄方法 |
| CN100449704C (zh) * | 2006-08-11 | 2009-01-07 | 中芯国际集成电路制造(上海)有限公司 | 研磨头的清洗装置 |
| KR101155623B1 (ko) * | 2010-01-08 | 2012-06-13 | 세메스 주식회사 | 기판 세정 유닛 및 이를 갖는 기판 세정 장치 |
| JP2014534615A (ja) * | 2011-09-26 | 2014-12-18 | インテグリス・インコーポレーテッド | Ｃｍｐ後クリーニング装置および方法 |
| US9202723B2 (en) * | 2011-11-29 | 2015-12-01 | Illinois Tool Works, Inc. | Brush with cantilevered nodules |
| US20130255721A1 (en) * | 2012-04-03 | 2013-10-03 | Illinois Tool Works Inc. | Concave nodule sponge brush |
| JP6352158B2 (ja) * | 2014-11-20 | 2018-07-04 | 株式会社荏原製作所 | 洗浄具、洗浄具の製造方法、および、基板洗浄装置 |
-
2014
- 2014-10-31 JP JP2014223754A patent/JP6316730B2/ja active Active
-
2015
- 2015-09-25 TW TW107140682A patent/TWI678260B/zh active
- 2015-09-25 TW TW104131754A patent/TWI670141B/zh active
- 2015-10-22 US US14/920,045 patent/US10471481B2/en active Active
- 2015-10-27 KR KR1020150149207A patent/KR102443489B1/ko active Active
- 2015-10-29 CN CN201510724374.2A patent/CN105575851B/zh active Active
- 2015-10-29 CN CN202110546709.1A patent/CN113276024B/zh active Active
- 2015-10-30 SG SG10201508996WA patent/SG10201508996WA/en unknown
- 2015-10-30 MY MYPI2015002682A patent/MY178652A/en unknown
-
2019
- 2019-10-01 US US16/590,089 patent/US11642704B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016092158A (ja) | 2016-05-23 |
| CN113276024B (zh) | 2023-08-29 |
| JP6316730B2 (ja) | 2018-04-25 |
| SG10201508996WA (en) | 2016-05-30 |
| US20200030855A1 (en) | 2020-01-30 |
| TW201615340A (zh) | 2016-05-01 |
| TW201906689A (zh) | 2019-02-16 |
| US11642704B2 (en) | 2023-05-09 |
| US10471481B2 (en) | 2019-11-12 |
| US20160126113A1 (en) | 2016-05-05 |
| TWI678260B (zh) | 2019-12-01 |
| KR102443489B1 (ko) | 2022-09-15 |
| KR20160052343A (ko) | 2016-05-12 |
| CN105575851A (zh) | 2016-05-11 |
| TWI670141B (zh) | 2019-09-01 |
| CN113276024A (zh) | 2021-08-20 |
| CN105575851B (zh) | 2021-08-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| MY178652A (en) | Roll-type processing member, pencil-type processing member, and substrate processing apparatus including any one of these | |
| TW201614382A (en) | Metrology method, target and substrate | |
| EP3117453A4 (en) | In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning | |
| WO2016156495A3 (en) | Article for use with apparatus for heating smokable material | |
| IL257040B (en) | Systems and processes for executing private programs on untrusted computers | |
| EP3219825A4 (en) | Insulating coating composition for oriented electrical steel sheet, oriented electrical steel sheet having insulating coating formed on surface thereof by using same, and preparation method therefor | |
| EP3861570A4 (en) | SUBSTRATE TREATMENT APPARATUS | |
| TR201820827T4 (tr) | Çamaşır İşleme Aparatı | |
| IL247889A0 (en) | Dispatching multiple threads in a computer | |
| JP2015135545A5 (enExample) | ||
| JP2017030946A5 (enExample) | ||
| EP3112178A4 (en) | On-machine development type lithographic printing plate precursor processing method and printing method | |
| ZA201801217B (en) | Running applications on a computing device | |
| KR102330098B9 (ko) | 기판 처리 장치 | |
| KR102039240B9 (ko) | 기판 처리 장치 | |
| IN2015MU00084A (enExample) | ||
| SG11202002299UA (en) | Substrate processing device | |
| IL271422A (en) | Parallel processing of information in multi-core systems | |
| SG10201909553YA (en) | Substrate processing apparatus | |
| GB2539037B (en) | Apparatus having processing pipeline with first and second execution circuitry, and method | |
| EP3135936A4 (en) | Bearing device, conveyance device, inspection device and machine tool | |
| TW201612714A (en) | Touch panel having relatively narrow trace area and manufacturing method thereof | |
| EP3644702A4 (en) | DEVICE FOR CARRYING OUT WORK ON A SUBSTRATE | |
| JP2016184825A5 (enExample) | ||
| JP2019086093A5 (enExample) |