SE8107136L - STEERING ELECTRICAL EQUIPMENT - Google Patents

STEERING ELECTRICAL EQUIPMENT

Info

Publication number
SE8107136L
SE8107136L SE8107136A SE8107136A SE8107136L SE 8107136 L SE8107136 L SE 8107136L SE 8107136 A SE8107136 A SE 8107136A SE 8107136 A SE8107136 A SE 8107136A SE 8107136 L SE8107136 L SE 8107136L
Authority
SE
Sweden
Prior art keywords
rectifier
electrical equipment
steering electrical
insulator
induce
Prior art date
Application number
SE8107136A
Other languages
Unknown language ( )
Swedish (sv)
Inventor
B J Baliga
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Priority to EP82900577A priority Critical patent/EP0075558A1/en
Priority to GB08234157A priority patent/GB2108405B/en
Priority to NL8220037A priority patent/NL8220037A/en
Priority to PCT/SE1982/000052 priority patent/WO1982003340A1/en
Priority to DE823239724T priority patent/DE3239724A1/en
Priority to JP57500657A priority patent/JPS58500471A/en
Publication of SE8107136L publication Critical patent/SE8107136L/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
    • H01L29/7395Vertical transistors, e.g. vertical IGBT
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0834Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843Source or drain regions of field-effect devices
    • H01L29/0847Source or drain regions of field-effect devices of field-effect transistors with insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843Source or drain regions of field-effect devices
    • H01L29/0847Source or drain regions of field-effect devices of field-effect transistors with insulated gate
    • H01L29/0852Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42372Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
    • H01L29/42376Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the length or the sectional shape

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

A high power field effect controlled semiconductor rectifier is constructed so that the rectifier is normally off and can be switched on by applying a bias signal to a gate 68 of a metal-insulator-semiconductor structure monolithically integrated with the rectifier in such a manner as to induce a contacting channel including inversion layer 78 and accumulation layer 79, between the anode 62 and cathode 70 of the rectifier. The device has both forward and reverse blocking capability and a low forward voltage drop when in the conducting state. The device has a very high turn-off gain and both high dV/dt and di/dt capabilities. <IMAGE>
SE8107136A 1980-12-02 1981-04-01 STEERING ELECTRICAL EQUIPMENT SE8107136L (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP82900577A EP0075558A1 (en) 1981-04-01 1982-02-23 Fabric filter for cleaning of dustladen gases by filtering on filter cassettes
GB08234157A GB2108405B (en) 1981-04-01 1982-02-23 Fabric filter for cleaning of dustladen gases by filtering on filter cassettes
NL8220037A NL8220037A (en) 1981-04-01 1982-02-23 FILTER FROM TEXTILE MATERIAL FOR CLEANING DUST-LOADED GASES BY FILTRATION OVER FILTER CASSETTES.
PCT/SE1982/000052 WO1982003340A1 (en) 1981-04-01 1982-02-23 Fabric filter for cleaning of dustladen gases by filtering on filter cassettes
DE823239724T DE3239724A1 (en) 1981-04-01 1982-02-23 FABRIC FILTERS FOR CLEANING DUSTY GASES BY FILTERING ON FILTER CARTRIDGES
JP57500657A JPS58500471A (en) 1981-04-01 1982-02-23 Fabric filter for purifying dust-containing gas by filtering it through a filter cassette

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21218180A 1980-12-02 1980-12-02

Publications (1)

Publication Number Publication Date
SE8107136L true SE8107136L (en) 1982-06-03

Family

ID=22789906

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8107136A SE8107136L (en) 1980-12-02 1981-04-01 STEERING ELECTRICAL EQUIPMENT

Country Status (8)

Country Link
JP (1) JPS57120369A (en)
CH (1) CH657230A5 (en)
DE (1) DE3147075A1 (en)
FR (1) FR2495382B1 (en)
GB (1) GB2088631B (en)
IE (1) IE52758B1 (en)
MX (1) MX151412A (en)
SE (1) SE8107136L (en)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2524710B1 (en) * 1982-04-01 1986-03-14 Gen Electric SEMICONDUCTOR SWITCHING DEVICE
EP0091686B1 (en) * 1982-04-12 1989-06-28 General Electric Company Semiconductor device having a diffused region of reduced length and method of fabricating the same
JPS594077A (en) * 1982-06-30 1984-01-10 Toshiba Corp Field-effect transistor
JPS5927569A (en) * 1982-08-06 1984-02-14 Hitachi Ltd Semiconductor switch element
CA1200322A (en) * 1982-12-13 1986-02-04 General Electric Company Bidirectional insulated-gate rectifier structures and method of operation
EP0111803B1 (en) * 1982-12-13 1989-03-01 General Electric Company Lateral insulated-gate rectifier structures
EP0118007B1 (en) * 1983-02-04 1990-05-23 General Electric Company Electrical circuit comprising a hybrid power switching semiconductor device including an scr structure
JPS59211271A (en) * 1983-05-17 1984-11-30 Toshiba Corp Semiconductor device
JPS605568A (en) * 1983-06-23 1985-01-12 Sanken Electric Co Ltd Vertical insulated gate field effect transistor
EP0144654A3 (en) * 1983-11-03 1987-10-07 General Electric Company Semiconductor device structure including a dielectrically-isolated insulated-gate transistor
US4618872A (en) * 1983-12-05 1986-10-21 General Electric Company Integrated power switching semiconductor devices including IGT and MOSFET structures
JPS60174258U (en) * 1983-12-22 1985-11-19 株式会社明電舎 Electric field controlled semiconductor device
JPH0810763B2 (en) * 1983-12-28 1996-01-31 株式会社日立製作所 Semiconductor device
JPH0618255B2 (en) * 1984-04-04 1994-03-09 株式会社東芝 Semiconductor device
US4672407A (en) * 1984-05-30 1987-06-09 Kabushiki Kaisha Toshiba Conductivity modulated MOSFET
JPS61185971A (en) * 1985-02-14 1986-08-19 Toshiba Corp Conductivity modulation type semiconductor device
JPS61191071A (en) * 1985-02-20 1986-08-25 Toshiba Corp Conductivity modulation type semiconductor device and manufacture thereof
EP0199293B2 (en) * 1985-04-24 1995-08-30 General Electric Company Insulated gate semiconductor device
JPS6248073A (en) * 1985-08-27 1987-03-02 Mitsubishi Electric Corp Semiconductor device
DE3628857A1 (en) * 1985-08-27 1987-03-12 Mitsubishi Electric Corp SEMICONDUCTOR DEVICE
JPH0715998B2 (en) * 1985-08-27 1995-02-22 三菱電機株式会社 Semiconductor device
US4809045A (en) * 1985-09-30 1989-02-28 General Electric Company Insulated gate device
JPS62126668A (en) * 1985-11-27 1987-06-08 Mitsubishi Electric Corp Semiconductor device
JPH0821713B2 (en) * 1987-02-26 1996-03-04 株式会社東芝 Conduction modulation type MOSFET
JPH0624244B2 (en) * 1987-06-12 1994-03-30 株式会社日立製作所 Composite semiconductor device
JP2576173B2 (en) * 1988-02-02 1997-01-29 日本電装株式会社 Insulated gate semiconductor device
DE58909474D1 (en) * 1988-02-24 1995-11-30 Siemens Ag Method for producing a bipolar transistor which can be controlled by a field effect.
JPH07120799B2 (en) * 1988-04-01 1995-12-20 株式会社日立製作所 Semiconductor device
JPH0247874A (en) * 1988-08-10 1990-02-16 Fuji Electric Co Ltd Manufacture of mos semiconductor device
EP0409010A1 (en) * 1989-07-19 1991-01-23 Asea Brown Boveri Ag Switchable semiconductor power device
JP2752184B2 (en) * 1989-09-11 1998-05-18 株式会社東芝 Power semiconductor device
GB8921596D0 (en) * 1989-09-25 1989-11-08 Lucas Ind Plc Mos gated bipolar devices
DE3942490C2 (en) * 1989-12-22 1994-03-24 Daimler Benz Ag Field effect controlled semiconductor device
JP2808882B2 (en) * 1990-05-07 1998-10-08 富士電機株式会社 Insulated gate bipolar transistor
ES2085823B1 (en) * 1990-10-31 1997-01-01 Coffea Sa SET OF APPARATUS AND CARTRIDGE TO PREPARE A LIQUID PRODUCT, SUCH AS A DRINK OR A LIQUID FOOD.
JPH0548111A (en) * 1991-08-12 1993-02-26 Toshiba Corp Semiconductor device and its manufacture
JP2984478B2 (en) * 1992-08-15 1999-11-29 株式会社東芝 Conductivity modulation type semiconductor device and method of manufacturing the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2040657C3 (en) * 1970-08-17 1975-10-02 Siemens Ag, 1000 Berlin Und 8000 Muenchen Electronic switch for semiconductor crosspoints in telecommunications, in particular telephone switching systems
US3831187A (en) * 1973-04-11 1974-08-20 Rca Corp Thyristor having capacitively coupled control electrode
US4364073A (en) * 1980-03-25 1982-12-14 Rca Corporation Power MOSFET with an anode region

Also Published As

Publication number Publication date
GB2088631A (en) 1982-06-09
DE3147075A1 (en) 1982-07-01
GB2088631B (en) 1984-11-28
IE812693L (en) 1982-06-02
JPS57120369A (en) 1982-07-27
MX151412A (en) 1984-11-14
FR2495382B1 (en) 1988-04-29
CH657230A5 (en) 1986-08-15
IE52758B1 (en) 1988-02-17
FR2495382A1 (en) 1982-06-04

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