JPS6425493A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPS6425493A
JPS6425493A JP18191087A JP18191087A JPS6425493A JP S6425493 A JPS6425493 A JP S6425493A JP 18191087 A JP18191087 A JP 18191087A JP 18191087 A JP18191087 A JP 18191087A JP S6425493 A JPS6425493 A JP S6425493A
Authority
JP
Japan
Prior art keywords
region
current
layer
laser oscillation
active layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18191087A
Other languages
Japanese (ja)
Inventor
Misao Hironaka
Toshio Sogo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP18191087A priority Critical patent/JPS6425493A/en
Publication of JPS6425493A publication Critical patent/JPS6425493A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To suppress a leakage current by so increasing the resistance of a region irrespective of a laser oscillation as to selectively apply a forward voltage to a specific region of an active layer which contributes to the laser oscillation. CONSTITUTION:In order to inject a current selectively only to a region directly above a current construction groove 3 which contributes particularly to a laser oscillation in an active layer 5, protons are, for example, implanted to a cap layer 7, a clad layer 6, an active layer 5, a lower clad layer 4 and a current block layer 2 of the region except the region directly above the groove 3 for narrowing the current to form a high resistance region 10 on the region. Thus, the effective junction area generated in the forward electric field of the layer 5 is much smaller than that of the conventional one. Accordingly, its leakage current is less, a low threshold current is obtained, and temperature characteristic and reliability are improved.
JP18191087A 1987-07-21 1987-07-21 Semiconductor laser device Pending JPS6425493A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18191087A JPS6425493A (en) 1987-07-21 1987-07-21 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18191087A JPS6425493A (en) 1987-07-21 1987-07-21 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPS6425493A true JPS6425493A (en) 1989-01-27

Family

ID=16109034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18191087A Pending JPS6425493A (en) 1987-07-21 1987-07-21 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS6425493A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03195734A (en) * 1989-12-25 1991-08-27 Idemitsu Petrochem Co Ltd Production of granular polyarylenesulfide having high molecular weight
US7750111B2 (en) 2005-09-22 2010-07-06 Toray Industries, Inc. Polyarylene sulfide and its production method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03195734A (en) * 1989-12-25 1991-08-27 Idemitsu Petrochem Co Ltd Production of granular polyarylenesulfide having high molecular weight
US7750111B2 (en) 2005-09-22 2010-07-06 Toray Industries, Inc. Polyarylene sulfide and its production method

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