JPS6490583A - Semiconductor laser element - Google Patents

Semiconductor laser element

Info

Publication number
JPS6490583A
JPS6490583A JP24898687A JP24898687A JPS6490583A JP S6490583 A JPS6490583 A JP S6490583A JP 24898687 A JP24898687 A JP 24898687A JP 24898687 A JP24898687 A JP 24898687A JP S6490583 A JPS6490583 A JP S6490583A
Authority
JP
Japan
Prior art keywords
layer
electrode
semiconductor laser
clad
clad layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24898687A
Other languages
Japanese (ja)
Inventor
Takashi Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP24898687A priority Critical patent/JPS6490583A/en
Publication of JPS6490583A publication Critical patent/JPS6490583A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce the impurity concentration of a clad layer as much as possible and to decrease the optical absorption of the clad layer by providing a current injection layer between an active layer and the clad layer, and injecting a current flowing from an electrode through the implanted layer into the active layer. CONSTITUTION:A substrate 2, a first clad layer 3, an active layer 4 and a regulating layer 5 are sequentially formed on a first electrode 1, and a second electrode 7 and a second clad layer 8 are formed through a current injection layer 6 thereon. Thus, since a current supplied from externally of a semiconductor laser element to the electrode 7 is injected through the layers 6, 5 directly to the layer 4 but not injected through the layer 8, the impurity concentration of the layer 8 can be reduced as much as possible. As a result, since the optical absorption of the clad layer is reduced, a semiconductor laser having high efficiency and a small threshold value current can be realized.
JP24898687A 1987-10-01 1987-10-01 Semiconductor laser element Pending JPS6490583A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24898687A JPS6490583A (en) 1987-10-01 1987-10-01 Semiconductor laser element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24898687A JPS6490583A (en) 1987-10-01 1987-10-01 Semiconductor laser element

Publications (1)

Publication Number Publication Date
JPS6490583A true JPS6490583A (en) 1989-04-07

Family

ID=17186327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24898687A Pending JPS6490583A (en) 1987-10-01 1987-10-01 Semiconductor laser element

Country Status (1)

Country Link
JP (1) JPS6490583A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0330487A (en) * 1989-06-28 1991-02-08 Nec Corp Semiconductor laser and manufacture thereof
JP2006041491A (en) * 2004-06-21 2006-02-09 Matsushita Electric Ind Co Ltd Semiconductor laser device and its manufacture
JP2010171183A (en) * 2009-01-22 2010-08-05 Sony Corp Semiconductor laser element and semiconductor laser device
JP2014170825A (en) * 2013-03-04 2014-09-18 Sumitomo Electric Ind Ltd Quantum cascade semiconductor laser
JP2017130605A (en) * 2016-01-22 2017-07-27 日本電信電話株式会社 Semiconductor optical device
JP2021153124A (en) * 2020-03-24 2021-09-30 住友電気工業株式会社 Quantum cascade laser

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0330487A (en) * 1989-06-28 1991-02-08 Nec Corp Semiconductor laser and manufacture thereof
JP2006041491A (en) * 2004-06-21 2006-02-09 Matsushita Electric Ind Co Ltd Semiconductor laser device and its manufacture
JP2010171183A (en) * 2009-01-22 2010-08-05 Sony Corp Semiconductor laser element and semiconductor laser device
US8175128B2 (en) 2009-01-22 2012-05-08 Sony Corporation Semiconductor laser element and semiconductor laser device
JP2014170825A (en) * 2013-03-04 2014-09-18 Sumitomo Electric Ind Ltd Quantum cascade semiconductor laser
JP2017130605A (en) * 2016-01-22 2017-07-27 日本電信電話株式会社 Semiconductor optical device
JP2021153124A (en) * 2020-03-24 2021-09-30 住友電気工業株式会社 Quantum cascade laser

Similar Documents

Publication Publication Date Title
JPS5752186A (en) Semiconductor laser
JPS5681994A (en) Field effect type semiconductor laser and manufacture thereof
JPS6490583A (en) Semiconductor laser element
JPS6482587A (en) Quantum well type semiconductor laser
JPS5493380A (en) Semiconductor light emitting device
CA2106596A1 (en) Semiconductor laser device
JPS57190384A (en) Wavelength sweeping laser
JPS648691A (en) Integrated semiconductor laser element
JPS57162382A (en) Semiconductor laser
JPS6490578A (en) Manufacture of semiconductor laser device
JPS56152289A (en) Stripe type semiconductor laser with gate electrode
JPS5736887A (en) Semiconductor laser
JPS6453487A (en) Semiconductor laser device
JPS56110288A (en) Semiconductor laser element
JPS5580386A (en) Manufacture of semiconductor light emitting device
JPS57145388A (en) Control method for laser light generation
JPS6425493A (en) Semiconductor laser device
JPS5638885A (en) Light emission semiconductor device
JPS6472577A (en) Optical semiconductor element
JPS6464388A (en) Semiconductor laser device
JPS5712590A (en) Buried type double heterojunction laser element
JPH02126692A (en) Semiconductor laser device
JPS6482586A (en) Semiconductor laser
JPS55166975A (en) Manufacture of semiconductor light emitting device
JPS6476784A (en) Edge light-emitting diode