JPS6472577A - Optical semiconductor element - Google Patents
Optical semiconductor elementInfo
- Publication number
- JPS6472577A JPS6472577A JP22933387A JP22933387A JPS6472577A JP S6472577 A JPS6472577 A JP S6472577A JP 22933387 A JP22933387 A JP 22933387A JP 22933387 A JP22933387 A JP 22933387A JP S6472577 A JPS6472577 A JP S6472577A
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode
- type
- type inp
- semiconductor element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0608—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06203—Transistor-type lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
Abstract
PURPOSE:To obtain an optical semiconductor element simple in structure and easy to manufacture by providing a superconductor film between the electrode of a semiconductor element for light emission and an external conductor, and introducing a signal light to the film to control the quantity of light emitted by the element. CONSTITUTION:A superconductor film 20 is provided between the electrode 18 of a light emitting semiconductor element and an external lead, a signal light is introduced to the film 20 to control the quantity of the emitting light of the element. For example, after a P-type InP buffer layer 12, an InGaAsP active layer 13 and an N-type InP layer 14 are crystalline grown on a P-type InP substrate 11, a stripelike reverse mesa structure is formed by etching. Then, the side face is buried with an N-type InP block layer 15 and a P-type InP layer 16 by twice crystal growths, thereby manufacturing a semiconductor laser. Thereafter, an insulating film 17 is formed on the top, the film 17 of the part of the N-type side of the laser is removed, and an N-type electrode 18 is formed. Further, the part of the electrode 18 is removed, and the superconductor film 20 is adhered. Further, a P-type electrode 19 is formed on the lower part of the laser.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22933387A JPS6472577A (en) | 1987-09-11 | 1987-09-11 | Optical semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22933387A JPS6472577A (en) | 1987-09-11 | 1987-09-11 | Optical semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6472577A true JPS6472577A (en) | 1989-03-17 |
Family
ID=16890512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22933387A Pending JPS6472577A (en) | 1987-09-11 | 1987-09-11 | Optical semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6472577A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6077613B1 (en) * | 2015-09-02 | 2017-02-08 | 日本電信電話株式会社 | Optical trigger pulse generator |
-
1987
- 1987-09-11 JP JP22933387A patent/JPS6472577A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6077613B1 (en) * | 2015-09-02 | 2017-02-08 | 日本電信電話株式会社 | Optical trigger pulse generator |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS55115386A (en) | Semiconductor laser unit | |
JPS5681994A (en) | Field effect type semiconductor laser and manufacture thereof | |
JPS6432692A (en) | Semiconductor laser and manufacture thereof | |
US4862230A (en) | Double heterostructure light emitting diode | |
JPS6432694A (en) | Manufacture of semiconductor device in which laser diode and photodiode with expanded light receiving plane are unified | |
ES459664A1 (en) | Light emitting diode having increased light emitting efficiency and method of producing same | |
JPS6472577A (en) | Optical semiconductor element | |
JPS5493380A (en) | Semiconductor light emitting device | |
JPS55121693A (en) | Manufacture of band-like semiconductor laser by selective melt-back process | |
US5100833A (en) | Method of producing a semiconductor light emitting device disposed in an insulating substrate | |
US5194399A (en) | Method of producing a semiconductor light emitting device disposed in an insulating substrate | |
JPS648691A (en) | Integrated semiconductor laser element | |
JPS55140286A (en) | Buried heterogeneous structure semiconductor for use in laser | |
JPS5618484A (en) | Manufacture of semiconductor laser | |
JPS5642388A (en) | Semiconductor light emitting device | |
JPS6450591A (en) | Semiconductor device and manufacture thereof | |
JPS6482590A (en) | Manufacture of semiconductor device | |
JPS56142691A (en) | Semiconductor light emitting device | |
JPS61242091A (en) | Semiconductor light-emitting element | |
JPS55125690A (en) | Semiconductor laser | |
JPS55154792A (en) | Semiconductor laser | |
JPS6476784A (en) | Edge light-emitting diode | |
JPS5595387A (en) | Semiconductor light emitting device | |
JPS57136385A (en) | Manufacture of semiconductor laser | |
JPS5580386A (en) | Manufacture of semiconductor light emitting device |