RU2015104902A - Композиция, используемая в изготовлении интегральных схем, оптических устройств, микромашин и механических прецизионных устройств - Google Patents
Композиция, используемая в изготовлении интегральных схем, оптических устройств, микромашин и механических прецизионных устройств Download PDFInfo
- Publication number
- RU2015104902A RU2015104902A RU2015104902A RU2015104902A RU2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A
- Authority
- RU
- Russia
- Prior art keywords
- independently selected
- aqueous composition
- alkyl
- composition according
- optionally
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 230000003287 optical effect Effects 0.000 title claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract 11
- 239000000758 substrate Substances 0.000 claims abstract 9
- 125000004122 cyclic group Chemical group 0.000 claims abstract 6
- 239000000126 substance Substances 0.000 claims abstract 6
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims abstract 4
- 239000004065 semiconductor Substances 0.000 claims abstract 4
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims abstract 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract 2
- 229920006395 saturated elastomer Polymers 0.000 claims abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims 7
- 125000004103 aminoalkyl group Chemical group 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- 125000005842 heteroatom Chemical group 0.000 claims 4
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 229910052757 nitrogen Inorganic materials 0.000 claims 4
- 229910052760 oxygen Inorganic materials 0.000 claims 4
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 230000010354 integration Effects 0.000 claims 3
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims 2
- 238000007654 immersion Methods 0.000 claims 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 1
- 125000006737 (C6-C20) arylalkyl group Chemical group 0.000 claims 1
- 125000002877 alkyl aryl group Chemical group 0.000 claims 1
- 125000002837 carbocyclic group Chemical group 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- -1 cyclodecyl Chemical group 0.000 claims 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 239000012634 fragment Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 125000002950 monocyclic group Chemical group 0.000 claims 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261671806P | 2012-07-16 | 2012-07-16 | |
| US61/671806 | 2012-07-16 | ||
| PCT/IB2013/055728 WO2014013396A2 (en) | 2012-07-16 | 2013-07-12 | Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| RU2015104902A true RU2015104902A (ru) | 2016-09-10 |
Family
ID=49949313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2015104902A RU2015104902A (ru) | 2012-07-16 | 2013-07-12 | Композиция, используемая в изготовлении интегральных схем, оптических устройств, микромашин и механических прецизионных устройств |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US20150192854A1 (https=) |
| EP (1) | EP2875406A4 (https=) |
| JP (1) | JP6328630B2 (https=) |
| KR (1) | KR102107370B1 (https=) |
| CN (1) | CN104471487B (https=) |
| IL (1) | IL236457B (https=) |
| MY (1) | MY171072A (https=) |
| RU (1) | RU2015104902A (https=) |
| SG (1) | SG11201500235XA (https=) |
| TW (1) | TWI665177B (https=) |
| WO (1) | WO2014013396A2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015028576A (ja) * | 2013-07-01 | 2015-02-12 | 富士フイルム株式会社 | パターン形成方法 |
| KR102374206B1 (ko) | 2017-12-05 | 2022-03-14 | 삼성전자주식회사 | 반도체 장치 제조 방법 |
| US12518960B2 (en) * | 2020-07-09 | 2026-01-06 | Basf Se | Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 NM or below |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4628023A (en) * | 1981-04-10 | 1986-12-09 | Shipley Company Inc. | Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant |
| JP3707856B2 (ja) * | 1996-03-07 | 2005-10-19 | 富士通株式会社 | レジストパターンの形成方法 |
| KR19990037527A (ko) * | 1997-10-31 | 1999-05-25 | 후지쯔 가부시끼가이샤 | 폴리이미드계 감광성 수지조성물용 현상액 |
| JPH11218932A (ja) * | 1997-10-31 | 1999-08-10 | Nippon Zeon Co Ltd | ポリイミド系感光性樹脂組成物用現像液 |
| JP4265741B2 (ja) * | 2003-02-28 | 2009-05-20 | 日本カーリット株式会社 | レジスト剥離剤 |
| JP3993549B2 (ja) * | 2003-09-30 | 2007-10-17 | 株式会社東芝 | レジストパターン形成方法 |
| US7157213B2 (en) * | 2004-03-01 | 2007-01-02 | Think Laboratory Co., Ltd. | Developer agent for positive type photosensitive compound |
| US8808976B2 (en) * | 2005-06-13 | 2014-08-19 | Tokuyama Corporation | Photoresist developer and method for fabricating substrate by using the developer thereof |
| JP5206304B2 (ja) * | 2008-10-15 | 2013-06-12 | 東ソー株式会社 | 第四級アンモニウム塩の回収方法 |
| US8772547B2 (en) * | 2009-03-12 | 2014-07-08 | Basf Se | Method for producing 1-adamantyl trimethylammonium hydroxide |
| JP5836932B2 (ja) * | 2009-05-07 | 2015-12-24 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | レジストストリッピング組成物及び電気装置を製造するための方法 |
| TWI474378B (zh) * | 2009-06-26 | 2015-02-21 | 羅門哈斯電子材料有限公司 | 形成電子裝置的方法 |
| CN101993377A (zh) * | 2009-08-07 | 2011-03-30 | 出光兴产株式会社 | 具有金刚烷骨架的胺类和季铵盐的制造方法 |
| JP2011145557A (ja) * | 2010-01-15 | 2011-07-28 | Tokyo Ohka Kogyo Co Ltd | フォトリソグラフィ用現像液 |
| JP6213296B2 (ja) * | 2013-04-10 | 2017-10-18 | 信越化学工業株式会社 | 現像液を用いたパターン形成方法 |
-
2013
- 2013-07-12 SG SG11201500235XA patent/SG11201500235XA/en unknown
- 2013-07-12 JP JP2015522210A patent/JP6328630B2/ja active Active
- 2013-07-12 MY MYPI2015000076A patent/MY171072A/en unknown
- 2013-07-12 US US14/413,252 patent/US20150192854A1/en not_active Abandoned
- 2013-07-12 WO PCT/IB2013/055728 patent/WO2014013396A2/en not_active Ceased
- 2013-07-12 KR KR1020157004223A patent/KR102107370B1/ko active Active
- 2013-07-12 EP EP13819208.3A patent/EP2875406A4/en not_active Withdrawn
- 2013-07-12 RU RU2015104902A patent/RU2015104902A/ru not_active Application Discontinuation
- 2013-07-12 CN CN201380037762.2A patent/CN104471487B/zh active Active
- 2013-07-15 TW TW102125198A patent/TWI665177B/zh active
-
2014
- 2014-12-25 IL IL236457A patent/IL236457B/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| CN104471487B (zh) | 2019-07-09 |
| JP6328630B2 (ja) | 2018-05-23 |
| WO2014013396A2 (en) | 2014-01-23 |
| SG11201500235XA (en) | 2015-02-27 |
| KR102107370B1 (ko) | 2020-05-07 |
| EP2875406A2 (en) | 2015-05-27 |
| WO2014013396A3 (en) | 2014-03-06 |
| TWI665177B (zh) | 2019-07-11 |
| IL236457B (en) | 2020-04-30 |
| TW201425279A (zh) | 2014-07-01 |
| KR20150042796A (ko) | 2015-04-21 |
| CN104471487A (zh) | 2015-03-25 |
| EP2875406A4 (en) | 2016-11-09 |
| IL236457A0 (en) | 2015-02-26 |
| MY171072A (en) | 2019-09-24 |
| US20150192854A1 (en) | 2015-07-09 |
| JP2015524577A (ja) | 2015-08-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA92 | Acknowledgement of application withdrawn (lack of supplementary materials submitted) |
Effective date: 20171020 |