RU2005132825A - Термический способ снижения концентрации дифтордиазина и тетрафторгидразина в трифториде азота - Google Patents
Термический способ снижения концентрации дифтордиазина и тетрафторгидразина в трифториде азота Download PDFInfo
- Publication number
- RU2005132825A RU2005132825A RU2005132825/15A RU2005132825A RU2005132825A RU 2005132825 A RU2005132825 A RU 2005132825A RU 2005132825/15 A RU2005132825/15 A RU 2005132825/15A RU 2005132825 A RU2005132825 A RU 2005132825A RU 2005132825 A RU2005132825 A RU 2005132825A
- Authority
- RU
- Russia
- Prior art keywords
- reactor
- nitrogen trifluoride
- wall
- heating
- impurity
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims 20
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 title claims 15
- 239000000203 mixture Substances 0.000 claims 14
- 239000012535 impurity Substances 0.000 claims 12
- 239000007789 gas Substances 0.000 claims 8
- 238000010438 heat treatment Methods 0.000 claims 8
- 229910052751 metal Inorganic materials 0.000 claims 7
- 239000002184 metal Substances 0.000 claims 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 6
- BFUXVNFVPPCFIT-UHFFFAOYSA-N 3,4-difluoropyridazine Chemical compound FC1=CC=NN=C1F BFUXVNFVPPCFIT-UHFFFAOYSA-N 0.000 claims 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 5
- 239000011737 fluorine Substances 0.000 claims 5
- 229910052731 fluorine Inorganic materials 0.000 claims 5
- GFADZIUESKAXAK-UHFFFAOYSA-N tetrafluorohydrazine Chemical compound FN(F)N(F)F GFADZIUESKAXAK-UHFFFAOYSA-N 0.000 claims 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 4
- 239000000919 ceramic Substances 0.000 claims 4
- 229910052594 sapphire Inorganic materials 0.000 claims 4
- 239000010980 sapphire Substances 0.000 claims 4
- 229910052759 nickel Inorganic materials 0.000 claims 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 238000002161 passivation Methods 0.000 claims 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910000792 Monel Inorganic materials 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 239000012159 carrier gas Substances 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 229910017052 cobalt Inorganic materials 0.000 claims 1
- 239000010941 cobalt Substances 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 238000000605 extraction Methods 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910000856 hastalloy Inorganic materials 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 229910001026 inconel Inorganic materials 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 239000011135 tin Substances 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/002—Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
- B01J19/2415—Tubular reactors
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
- C01B21/0832—Binary compounds of nitrogen with halogens
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
- C01B21/0832—Binary compounds of nitrogen with halogens
- C01B21/0835—Nitrogen trifluoride
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/00094—Jackets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/00099—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor the reactor being immersed in the heat exchange medium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00132—Controlling the temperature using electric heating or cooling elements
- B01J2219/00135—Electric resistance heaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00157—Controlling the temperature by means of a burner
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00245—Avoiding undesirable reactions or side-effects
- B01J2219/00247—Fouling of the reactor or the process equipment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00245—Avoiding undesirable reactions or side-effects
- B01J2219/00252—Formation of deposits other than coke
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
- B01J2219/0218—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components of ceramic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/396,926 | 2003-03-25 | ||
| US10/396,926 US20040191155A1 (en) | 2003-03-25 | 2003-03-25 | Thermal process for reducing the concentration of dinitrogen difluoride and dinitrogen tetrafluoride in nitrogen trifluoride |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| RU2005132825A true RU2005132825A (ru) | 2006-01-27 |
Family
ID=32988892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2005132825/15A RU2005132825A (ru) | 2003-03-25 | 2004-03-25 | Термический способ снижения концентрации дифтордиазина и тетрафторгидразина в трифториде азота |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20040191155A1 (enExample) |
| EP (1) | EP1606217A2 (enExample) |
| JP (1) | JP2006521279A (enExample) |
| KR (1) | KR20050114686A (enExample) |
| CN (1) | CN1761615A (enExample) |
| CA (1) | CA2514345A1 (enExample) |
| RU (1) | RU2005132825A (enExample) |
| TW (1) | TW200502161A (enExample) |
| WO (1) | WO2004087569A2 (enExample) |
| ZA (1) | ZA200505304B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2639621T3 (es) | 2004-12-30 | 2017-10-27 | Janssen Pharmaceutica N.V. | Derivados de fenilamida del ácido 4-(bencil)-piperazina-1-carboxílico y compuestos relacionados como moduladores de la amida hidrolasa de ácidos grasos (FAAH) para el tratamiento de la ansiedad, el dolor y otras afecciones |
| CN1328160C (zh) * | 2005-07-27 | 2007-07-25 | 中国船舶重工集团公司第七一八研究所 | 三氟化氮气体的纯化方法 |
| US8201619B2 (en) * | 2005-12-21 | 2012-06-19 | Exxonmobil Research & Engineering Company | Corrosion resistant material for reduced fouling, a heat transfer component having reduced fouling and a method for reducing fouling in a refinery |
| US8286695B2 (en) * | 2005-12-21 | 2012-10-16 | Exxonmobil Research & Engineering Company | Insert and method for reducing fouling in a process stream |
| UA108233C2 (uk) | 2010-05-03 | 2015-04-10 | Модулятори активності гідролази амідів жирних кислот | |
| CN104548927B (zh) * | 2015-01-07 | 2017-01-25 | 黎明化工研究设计院有限责任公司 | 一种四氟化碳中微量三氟化氮的去除工艺 |
| KR102366148B1 (ko) | 2017-09-25 | 2022-02-23 | 사이머 엘엘씨 | 가스 방전 광원에서의 불소 검출 방법 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3032400A (en) * | 1960-01-14 | 1962-05-01 | Du Pont | Method of producing nitrogen fluorides |
| DE1186857B (de) * | 1962-09-22 | 1965-02-11 | Huels Chemische Werke Ag | Verwendung von elektropoliertem, nichtrostendem Stahl als Apparatematerial bei der Oxydation organischer Verbindungen |
| US4193976A (en) * | 1978-04-06 | 1980-03-18 | Air Products & Chemicals, Inc. | Removal of dinitrogen difluoride from nitrogen trifluoride |
| US4156598A (en) * | 1978-06-08 | 1979-05-29 | Air Products And Chemicals, Inc. | Purification of nitrogen trifluoride atmospheres |
| CA1318108C (en) * | 1988-04-11 | 1993-05-25 | Isao Harada | Process for purifying nitrogen trifluoride gas |
| JPH01261208A (ja) * | 1988-04-11 | 1989-10-18 | Mitsui Toatsu Chem Inc | 三弗化窒素ガスの精製方法 |
| JPH01261209A (ja) * | 1988-04-13 | 1989-10-18 | Mitsui Toatsu Chem Inc | 三弗化窒素ガスの精製方法 |
| JPH0218309A (ja) * | 1988-07-05 | 1990-01-22 | Mitsui Toatsu Chem Inc | 三弗化窒素ガスの精製方法 |
| JP2867376B2 (ja) * | 1988-12-09 | 1999-03-08 | ステラケミファ株式会社 | フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法 |
| US5009963A (en) * | 1988-07-20 | 1991-04-23 | Tadahiro Ohmi | Metal material with film passivated by fluorination and apparatus composed of the metal material |
| EP0366078B1 (en) * | 1988-10-25 | 1996-06-26 | MITSUI TOATSU CHEMICALS, Inc. | Method for Purifying nitrogen trifluoride gas |
| JPH0446672A (ja) * | 1990-06-14 | 1992-02-17 | Fuaiaaransu Kogyo Kk | 継手付ランスパイプの製造方法及び継手付ランスパイプ |
| JP3782151B2 (ja) * | 1996-03-06 | 2006-06-07 | キヤノン株式会社 | エキシマレーザー発振装置のガス供給装置 |
| JP3532345B2 (ja) * | 1996-05-14 | 2004-05-31 | 日本エア・リキード株式会社 | 超高純度三弗化窒素製造方法及びその装置 |
| JPH11326160A (ja) * | 1998-05-13 | 1999-11-26 | L'air Liquide | 反応性フッ素系ガスのサンプリング装置及び方法 |
-
2003
- 2003-03-25 US US10/396,926 patent/US20040191155A1/en not_active Abandoned
-
2004
- 2004-03-19 TW TW093107561A patent/TW200502161A/zh unknown
- 2004-03-25 JP JP2006509297A patent/JP2006521279A/ja active Pending
- 2004-03-25 RU RU2005132825/15A patent/RU2005132825A/ru not_active Application Discontinuation
- 2004-03-25 KR KR1020057017857A patent/KR20050114686A/ko not_active Withdrawn
- 2004-03-25 CA CA002514345A patent/CA2514345A1/en not_active Abandoned
- 2004-03-25 WO PCT/US2004/009183 patent/WO2004087569A2/en not_active Ceased
- 2004-03-25 ZA ZA200505304A patent/ZA200505304B/en unknown
- 2004-03-25 CN CNA2004800077489A patent/CN1761615A/zh active Pending
- 2004-03-25 EP EP04758350A patent/EP1606217A2/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004087569A2 (en) | 2004-10-14 |
| WO2004087569A3 (en) | 2004-12-09 |
| JP2006521279A (ja) | 2006-09-21 |
| TW200502161A (en) | 2005-01-16 |
| EP1606217A2 (en) | 2005-12-21 |
| CN1761615A (zh) | 2006-04-19 |
| CA2514345A1 (en) | 2004-10-14 |
| ZA200505304B (en) | 2006-09-27 |
| US20040191155A1 (en) | 2004-09-30 |
| KR20050114686A (ko) | 2005-12-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA94 | Acknowledgement of application withdrawn (non-payment of fees) |
Effective date: 20091015 |