PL3067437T3 - Ulepszony sposób powlekania próżniowego - Google Patents

Ulepszony sposób powlekania próżniowego

Info

Publication number
PL3067437T3
PL3067437T3 PL16159684.6T PL16159684T PL3067437T3 PL 3067437 T3 PL3067437 T3 PL 3067437T3 PL 16159684 T PL16159684 T PL 16159684T PL 3067437 T3 PL3067437 T3 PL 3067437T3
Authority
PL
Poland
Prior art keywords
coating method
vacuum coating
improved vacuum
improved
vacuum
Prior art date
Application number
PL16159684.6T
Other languages
English (en)
Inventor
Nicholas John COPELAND
Stefan Ivan SEREDNYCKY
Original Assignee
Bobst Manchester Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bobst Manchester Limited filed Critical Bobst Manchester Limited
Publication of PL3067437T3 publication Critical patent/PL3067437T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
PL16159684.6T 2015-03-10 2016-03-10 Ulepszony sposób powlekania próżniowego PL3067437T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB1504061.1A GB2536252B (en) 2015-03-10 2015-03-10 Method of operating a vacuum coater for coating a web
GBGB1511671.8A GB201511671D0 (en) 2015-03-10 2015-07-03 Improved Vacuum coater

Publications (1)

Publication Number Publication Date
PL3067437T3 true PL3067437T3 (pl) 2023-05-15

Family

ID=52998706

Family Applications (1)

Application Number Title Priority Date Filing Date
PL16159684.6T PL3067437T3 (pl) 2015-03-10 2016-03-10 Ulepszony sposób powlekania próżniowego

Country Status (4)

Country Link
EP (2) EP3067437B1 (pl)
ES (1) ES2934134T3 (pl)
GB (3) GB2559685B (pl)
PL (1) PL3067437T3 (pl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL3419044T3 (pl) * 2017-06-22 2023-06-12 Bobst Manchester Limited Maszyna do pepvd
CN111041446A (zh) * 2019-12-31 2020-04-21 广东铭丰包装材料有限公司 一种镀铝机的送气装置
DE102022131875A1 (de) 2022-12-01 2024-06-06 Huhtamaki Flexible Packaging Germany Gmbh & Co. Kg Laminat, insbesondere zur Herstellung von Verpackungen, Verwendung des Laminats zur Herstellung einer Verpackung sowie aus dem Laminat hergestellte Verpackung und Verfahren zur Herstellung des Laminats

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5788531A (en) * 1980-11-20 1982-06-02 Matsushita Electric Ind Co Ltd Manufacture for magnetic recording medium
JPS5927954A (ja) 1982-08-10 1984-02-14 Nippon Hodo Co Ltd 舗装用アスフアルトの改質材料
CA1235808A (en) * 1984-03-22 1988-04-26 Tetsuo Oka Vertical magnetic recording medium and process for preparation thereof
JPS6126941A (ja) * 1984-07-17 1986-02-06 Mitsubishi Electric Corp 磁気記録媒体の製造方法
JPH0699798B2 (ja) * 1985-10-29 1994-12-07 東洋メタライジング株式会社 透明ガス遮断性フイルムの製造方法
JPS62228461A (ja) * 1986-03-31 1987-10-07 Toyo Metaraijingu Kk 金属蒸着フイルムおよびその製造方法
JPH0798868B2 (ja) 1992-03-26 1995-10-25 三菱化学株式会社 繊維強化ポリプロピレン樹脂シートの製造方法
JP3331622B2 (ja) * 1992-06-05 2002-10-07 東レ株式会社 透明ガスバリア性フィルムの製造方法
JPH064862A (ja) * 1992-06-23 1994-01-14 Matsushita Electric Ind Co Ltd 磁気記録媒体の製造方法
JPH0798868A (ja) * 1993-09-30 1995-04-11 Kao Corp 磁気記録媒体の製造装置
JP3173549B2 (ja) * 1994-06-17 2001-06-04 松下電器産業株式会社 磁気記録媒体の製造方法
US5759710A (en) * 1994-08-18 1998-06-02 Matsushita Electric Industrial Co., Ltd. Magnetic recording medium with a magnetic layer having a specific oxygen signal strength profile in the thickness direction
JPH1053868A (ja) * 1996-08-07 1998-02-24 Kao Corp 薄膜形成装置
JPH1091958A (ja) * 1996-09-19 1998-04-10 Kao Corp 磁気記録媒体の製造方法
JP3076774B2 (ja) * 1997-05-29 2000-08-14 株式会社麗光 透明なバリアフィルムとその製造方法
US6652998B2 (en) * 2000-06-26 2003-11-25 Jvc Victor Company Of Japan, Ltd. Producing method of thin film magnetic tape and the thin film magnetic tape
DE50312204D1 (de) * 2003-10-10 2010-01-21 Fraunhofer Ges Forschung Verfahren zur Beschichtung von bandförmigem Material mit schwarzem Aluminiumoxid
JP2007270251A (ja) * 2006-03-31 2007-10-18 Toray Ind Inc 多層薄膜付き積層体の製造方法および製造装置
JP2009197340A (ja) * 2008-02-19 2009-09-03 Toray Ind Inc 金銀糸用金属蒸着ポリエステルフィルムおよび金銀糸
JP5239483B2 (ja) * 2008-04-28 2013-07-17 東レ株式会社 金属酸化物薄膜付きシートの製造方法および製造装置
JP5964411B2 (ja) * 2011-04-29 2016-08-03 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ コーティングプロセスにおいてフレキシブル基板をパッシベーションするためのデバイスおよび方法
JP2013189701A (ja) * 2012-02-14 2013-09-26 Tokyo Electron Ltd 成膜装置
JP2013234364A (ja) * 2012-05-09 2013-11-21 Mitsubishi Plastics Inc ガスバリア性フィルムの製造方法

Also Published As

Publication number Publication date
GB2536252A (en) 2016-09-14
GB2559685A (en) 2018-08-15
GB201801583D0 (en) 2018-03-14
EP3067437B1 (en) 2022-11-23
GB2559685B (en) 2019-06-12
ES2934134T3 (es) 2023-02-17
GB201511671D0 (en) 2015-08-19
EP3067437A1 (en) 2016-09-14
EP3879000A1 (en) 2021-09-15
GB2536252B (en) 2018-10-10
GB201504061D0 (en) 2015-04-22

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