PL2886683T3 - Kąpiel galwaniczna i sposób wytwarzania warstw z ciemnego chromu - Google Patents

Kąpiel galwaniczna i sposób wytwarzania warstw z ciemnego chromu

Info

Publication number
PL2886683T3
PL2886683T3 PL14198132T PL14198132T PL2886683T3 PL 2886683 T3 PL2886683 T3 PL 2886683T3 PL 14198132 T PL14198132 T PL 14198132T PL 14198132 T PL14198132 T PL 14198132T PL 2886683 T3 PL2886683 T3 PL 2886683T3
Authority
PL
Poland
Prior art keywords
electroplating bath
chromium layers
dark chromium
producing dark
producing
Prior art date
Application number
PL14198132T
Other languages
English (en)
Inventor
Klaus-Dieter Schulz
Philipp Wachter
Philip Hartmann
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=44645302&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL2886683(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of PL2886683T3 publication Critical patent/PL2886683T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/08—Deposition of black chromium, e.g. hexavalent chromium, CrVI
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
PL14198132T 2011-05-03 2012-04-27 Kąpiel galwaniczna i sposób wytwarzania warstw z ciemnego chromu PL2886683T3 (pl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP11164641 2011-05-03
EP12717725.1A EP2705176B1 (en) 2011-05-03 2012-04-27 Electroplating bath and method for producing dark chromium layers
EP14198132.4A EP2886683B1 (en) 2011-05-03 2012-04-27 Electroplating bath and method for producing dark chromium layers
PCT/EP2012/057830 WO2012150198A2 (en) 2011-05-03 2012-04-27 Electroplating bath and method for producing dark chromium layers

Publications (1)

Publication Number Publication Date
PL2886683T3 true PL2886683T3 (pl) 2020-06-15

Family

ID=44645302

Family Applications (2)

Application Number Title Priority Date Filing Date
PL14198132T PL2886683T3 (pl) 2011-05-03 2012-04-27 Kąpiel galwaniczna i sposób wytwarzania warstw z ciemnego chromu
PL12717725.1T PL2705176T3 (pl) 2011-05-03 2012-04-27 Kąpiel galwaniczna i sposób wytwarzania warstw z ciemnego chromu

Family Applications After (1)

Application Number Title Priority Date Filing Date
PL12717725.1T PL2705176T3 (pl) 2011-05-03 2012-04-27 Kąpiel galwaniczna i sposób wytwarzania warstw z ciemnego chromu

Country Status (11)

Country Link
US (3) US9689081B2 (pl)
EP (2) EP2705176B1 (pl)
JP (2) JP6192636B2 (pl)
KR (1) KR101932785B1 (pl)
BR (2) BR122019020336B1 (pl)
CA (1) CA2834109C (pl)
ES (2) ES2774265T3 (pl)
PL (2) PL2886683T3 (pl)
PT (2) PT2886683T (pl)
TW (1) TWI550138B (pl)
WO (1) WO2012150198A2 (pl)

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US11047064B2 (en) 2013-01-10 2021-06-29 Coventya, Inc. Apparatus and method to maintaining trivalent chromium bath plating
CN103484900A (zh) * 2013-09-18 2014-01-01 湖南工业大学 一种离子液体中直接电沉积晶态纳米晶无微裂纹铬镀层的方法
TWI551435B (zh) 2014-05-05 2016-10-01 國立臺灣大學 鋼材及其製造方法
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EP3147388A1 (en) 2015-09-25 2017-03-29 Enthone, Incorporated Flexible color adjustment for dark cr(iii)-platings
JP6414001B2 (ja) * 2015-10-06 2018-10-31 豊田合成株式会社 黒色めっき樹脂部品及びその製造方法
KR101646160B1 (ko) * 2015-11-13 2016-08-08 (주)에스에이치팩 내식성이 우수한 크롬도금액
US20170306515A1 (en) 2016-04-21 2017-10-26 Macdermid Acumen, Inc Dark Colored Chromium Based Electrodeposits
US10718059B2 (en) * 2017-07-10 2020-07-21 Rohm And Haas Electronic Materials Llc Nickel electroplating compositions with cationic polymers and methods of electroplating nickel
KR20200096239A (ko) * 2017-12-13 2020-08-11 가부시끼가이샤 제이씨유 3 가 크롬 도금액 및 이를 사용한 크롬 도금 방법
CN111479956A (zh) * 2017-12-14 2020-07-31 株式会社杰希优 三价铬镀液以及使用其的三价铬镀敷方法
PL3502320T3 (pl) * 2017-12-22 2021-03-08 Atotech Deutschland Gmbh Sposób zwiększania odporności na korozję podłoża zawierającego najbardziej zewnętrzną warstwę ze stopu chromu
JP6927061B2 (ja) * 2018-01-19 2021-08-25 豊田合成株式会社 めっき構造体の製造方法
WO2019215287A1 (en) 2018-05-09 2019-11-14 Atotech Deutschland Gmbh Nickel comprising layer array and a method for its manufacturing
US20210317589A1 (en) * 2018-07-03 2021-10-14 Jcu Corporation Trivalent chromium plating solution and chromium plating method using same
US11198944B2 (en) 2018-09-26 2021-12-14 Toyoda Gosei Co., Ltd. Black plated resin part and method for producing the same
JP2023507017A (ja) * 2019-12-18 2023-02-20 アトテック ドイチェランド ゲーエムベーハー ウント コ カーゲー 基材上にクロムコーティングを堆積させるための電気めっき組成物及び方法
IT202000000391A1 (it) * 2020-01-13 2021-07-13 Italfimet Srl Procedimento galvanico, e relativo bagno, di elettrodeposizione di palladio ad alta resistenza alla corrosione.
FI129420B (en) 2020-04-23 2022-02-15 Savroc Ltd AQUATIC ELECTRIC COATING BATH
US20220049369A1 (en) * 2020-08-17 2022-02-17 Vapor Technologies, Inc. Antimicrobial chromium electroplating
JP7538321B2 (ja) * 2020-12-11 2024-08-21 アトテック ドイチュラント ゲー・エム・ベー・ハー ウント コー． カー・ゲー 黒色クロム層を堆積させるための電気めっき浴、堆積方法およびかかる層を備える基板
CN116635576A (zh) * 2020-12-11 2023-08-22 德国艾托特克有限两合公司 镀黑衬底
EP4259855A1 (en) * 2020-12-11 2023-10-18 Atotech Deutschland GmbH & Co. KG Black plated substrate
KR20230121833A (ko) * 2020-12-18 2023-08-21 아토테크 도이칠란트 게엠베하 운트 콤파니 카게 전기도금 조성물 및 기재 상에 크롬 코팅을 전기도금하는방법
JP7227338B2 (ja) * 2021-01-07 2023-02-21 豊田合成株式会社 黒色めっき樹脂部品の黄味がかり抑制方法
JP7015403B2 (ja) * 2021-01-07 2022-02-02 豊田合成株式会社 黒色めっき樹脂部品
EP4101947A1 (en) * 2021-06-10 2022-12-14 Atotech Deutschland GmbH & Co. KG Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereof
JP7811093B2 (ja) * 2021-07-28 2026-02-04 株式会社Jcu 白色３価クロムめっき浴およびこれを利用した被めっき物への白色３価クロムめっき方法
EP4477785A4 (en) * 2022-04-08 2025-01-22 JFE Steel Corporation SURFACE-TREATED STEEL SHEET AND METHOD FOR THE PRODUCTION THEREOF
EP4491772A4 (en) * 2022-04-08 2025-09-03 Jfe Steel Corp SURFACE-TREATED STEEL SHEET AND PROCESS FOR PRODUCING THE SAME
WO2023195251A1 (ja) * 2022-04-08 2023-10-12 Ｊｆｅスチール株式会社 表面処理鋼板およびその製造方法
WO2023195252A1 (ja) * 2022-04-08 2023-10-12 Ｊｆｅスチール株式会社 表面処理鋼板およびその製造方法
GB202409943D0 (en) 2024-07-09 2024-08-21 Macdermid Inc Trivalent chromium plating bath and method of electroplating an article
EP4703500A1 (en) 2024-08-26 2026-03-04 Dr.-Ing. Max Schlötter GmbH & Co. KG Trivalent chromium plating bath

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JP5322083B2 (ja) * 2007-07-12 2013-10-23 奥野製薬工業株式会社 ３価クロムめっき浴及びその製造方法
BRPI0817924B1 (pt) * 2007-10-02 2019-02-12 Atotech Deutschland Gmbh Depósito de liga de cromo funcional cristalino eletrodepositado, banho de eletrodeposição para eletrodepositar um depósito de liga de cromo funcional cristalinonanogranular, e processo para eletrodepositar um depósito de liga de cromo cristalino funcional nanogranular em um substrato
EP2358924A2 (de) 2008-11-17 2011-08-24 Basf Se Saure wässrige thiodiglykolethoxlat zusammensetzung und ihre verwendung in einem beizverfahren von metallischen oberflächen
US9765437B2 (en) 2009-03-24 2017-09-19 Roderick D. Herdman Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments
CN101665960A (zh) * 2009-09-04 2010-03-10 厦门大学 一种硫酸盐三价铬电镀液与制备方法
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Also Published As

Publication number Publication date
JP6192636B2 (ja) 2017-09-06
US20160068983A1 (en) 2016-03-10
EP2705176B1 (en) 2016-04-13
JP2014513214A (ja) 2014-05-29
PT2886683T (pt) 2020-03-26
US20140042033A1 (en) 2014-02-13
PT2705176T (pt) 2016-07-08
WO2012150198A3 (en) 2013-07-25
KR20140027200A (ko) 2014-03-06
CA2834109C (en) 2020-02-11
EP2705176A2 (en) 2014-03-12
ES2578503T3 (es) 2016-07-27
BR112013027921B1 (pt) 2020-10-06
EP2886683A2 (en) 2015-06-24
CN103534388A (zh) 2014-01-22
PL2705176T3 (pl) 2016-10-31
JP2016172933A (ja) 2016-09-29
JP6227062B2 (ja) 2017-11-08
US10174432B2 (en) 2019-01-08
KR101932785B1 (ko) 2018-12-27
BR112013027921A2 (pt) 2017-01-17
US9689081B2 (en) 2017-06-27
TWI550138B (zh) 2016-09-21
EP2886683B1 (en) 2019-12-18
ES2774265T3 (es) 2020-07-20
BR122019020336B1 (pt) 2020-08-11
WO2012150198A2 (en) 2012-11-08
EP2886683A3 (en) 2015-07-01
US10006135B2 (en) 2018-06-26
CA2834109A1 (en) 2012-11-08
US20170211197A1 (en) 2017-07-27
TW201250065A (en) 2012-12-16

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