PL2180088T3 - Sposób galwanicznego nakładania warstwy twardego chromu - Google Patents

Sposób galwanicznego nakładania warstwy twardego chromu

Info

Publication number
PL2180088T3
PL2180088T3 PL08018462T PL08018462T PL2180088T3 PL 2180088 T3 PL2180088 T3 PL 2180088T3 PL 08018462 T PL08018462 T PL 08018462T PL 08018462 T PL08018462 T PL 08018462T PL 2180088 T3 PL2180088 T3 PL 2180088T3
Authority
PL
Poland
Prior art keywords
hard chrome
chrome layers
electroplating hard
electroplating
layers
Prior art date
Application number
PL08018462T
Other languages
English (en)
Other versions
PL2180088T5 (pl
Inventor
Helmut Horsthemke
Original Assignee
Enthone
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40427109&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL2180088(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Enthone filed Critical Enthone
Publication of PL2180088T3 publication Critical patent/PL2180088T3/pl
Publication of PL2180088T5 publication Critical patent/PL2180088T5/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/04—Removal of gases or vapours ; Gas or pressure control
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/10—Bearings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
PL08018462T 2008-10-22 2008-10-22 Sposób galwanicznego nakładania warstwy twardego chromu PL2180088T5 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08018462.5A EP2180088B2 (de) 2008-10-22 2008-10-22 Verfahren zur galvanischen Abscheidung von Hartchromschichten

Publications (2)

Publication Number Publication Date
PL2180088T3 true PL2180088T3 (pl) 2011-09-30
PL2180088T5 PL2180088T5 (pl) 2020-11-16

Family

ID=40427109

Family Applications (1)

Application Number Title Priority Date Filing Date
PL08018462T PL2180088T5 (pl) 2008-10-22 2008-10-22 Sposób galwanicznego nakładania warstwy twardego chromu

Country Status (9)

Country Link
US (1) US20110198226A1 (pl)
EP (1) EP2180088B2 (pl)
JP (1) JP5739341B2 (pl)
KR (1) KR101658254B1 (pl)
CN (1) CN102257184B (pl)
BR (1) BRPI0920600B1 (pl)
ES (1) ES2363566T5 (pl)
PL (1) PL2180088T5 (pl)
WO (1) WO2010048404A1 (pl)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2766775T3 (es) * 2013-09-05 2020-06-15 Macdermid Enthone Inc Composición acuosa de electrolito que tiene una emisión aérea reducida
CA2970332C (en) * 2014-12-19 2019-03-12 Weber-Hydraulik Gmbh Method for optically inscribing and/or marking round stock
US11566679B2 (en) * 2020-11-03 2023-01-31 DRiV Automotive Inc. Bumper cap for damper
CN114703516A (zh) * 2021-12-14 2022-07-05 西安昆仑工业（集团）有限责任公司 一种火炮身管快速镀铬工艺方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE494578A (pl) 1949-03-18
FI53841C (fi) 1975-05-07 1978-08-10 Teuvo Tapio Korpi Elektrolytisk ytbelaeggningsanordning
FR2462490A1 (fr) * 1979-08-03 1981-02-13 Centre Techn Ind Mecanique Dispositif de revetement electrolytique
US4261086A (en) 1979-09-04 1981-04-14 Ford Motor Company Method for manufacturing variable capacitance pressure transducers
JPS62263991A (ja) * 1986-05-07 1987-11-16 Adachi Shin Sangyo Kk 鍍金物製造法
JPH02217429A (ja) * 1989-02-17 1990-08-30 Fujitsu Ltd メッキ方法および装置
US5277785A (en) 1992-07-16 1994-01-11 Anglen Erik S Van Method and apparatus for depositing hard chrome coatings by brush plating
US20010054557A1 (en) 1997-06-09 2001-12-27 E. Jennings Taylor Electroplating of metals using pulsed reverse current for control of hydrogen evolution
USRE40386E1 (en) * 1998-11-06 2008-06-17 Hitachi Ltd. Chrome plated parts and chrome plating method
JP3918142B2 (ja) * 1998-11-06 2007-05-23 株式会社日立製作所 クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法
JP2002047595A (ja) * 2000-07-31 2002-02-15 Tokico Ltd クロムめっき方法およびクロムめっき装置
JP3423702B2 (ja) * 2000-08-29 2003-07-07 創輝株式会社 金属めっき方法
JP2007077494A (ja) * 2005-08-08 2007-03-29 Nanofilm Technologies Internatl Pte Ltd 金属コーティング

Also Published As

Publication number Publication date
CN102257184B (zh) 2014-01-15
PL2180088T5 (pl) 2020-11-16
CN102257184A (zh) 2011-11-23
KR20110075028A (ko) 2011-07-05
KR101658254B1 (ko) 2016-09-20
EP2180088B2 (de) 2019-06-12
EP2180088B1 (de) 2011-05-11
BRPI0920600B1 (pt) 2019-05-28
BRPI0920600A2 (pt) 2015-12-22
US20110198226A1 (en) 2011-08-18
WO2010048404A1 (en) 2010-04-29
ES2363566T5 (es) 2020-04-16
JP5739341B2 (ja) 2015-06-24
ES2363566T3 (es) 2011-08-09
JP2012506496A (ja) 2012-03-15
EP2180088A1 (de) 2010-04-28

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