IT202000000391A1 - Procedimento galvanico, e relativo bagno, di elettrodeposizione di palladio ad alta resistenza alla corrosione. - Google Patents

Procedimento galvanico, e relativo bagno, di elettrodeposizione di palladio ad alta resistenza alla corrosione.

Info

Publication number
IT202000000391A1
IT202000000391A1 IT102020000000391A IT202000000391A IT202000000391A1 IT 202000000391 A1 IT202000000391 A1 IT 202000000391A1 IT 102020000000391 A IT102020000000391 A IT 102020000000391A IT 202000000391 A IT202000000391 A IT 202000000391A IT 202000000391 A1 IT202000000391 A1 IT 202000000391A1
Authority
IT
Italy
Prior art keywords
electrodeposition
palladium
corrosion resistance
high corrosion
galvanic process
Prior art date
Application number
IT102020000000391A
Other languages
English (en)
Inventor
Luca Capaccioli
Andrea Capaccioli
Original Assignee
Italfimet Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Italfimet Srl filed Critical Italfimet Srl
Priority to IT102020000000391A priority Critical patent/IT202000000391A1/it
Publication of IT202000000391A1 publication Critical patent/IT202000000391A1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
IT102020000000391A 2020-01-13 2020-01-13 Procedimento galvanico, e relativo bagno, di elettrodeposizione di palladio ad alta resistenza alla corrosione. IT202000000391A1 (it)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IT102020000000391A IT202000000391A1 (it) 2020-01-13 2020-01-13 Procedimento galvanico, e relativo bagno, di elettrodeposizione di palladio ad alta resistenza alla corrosione.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT102020000000391A IT202000000391A1 (it) 2020-01-13 2020-01-13 Procedimento galvanico, e relativo bagno, di elettrodeposizione di palladio ad alta resistenza alla corrosione.

Publications (1)

Publication Number Publication Date
IT202000000391A1 true IT202000000391A1 (it) 2021-07-13

Family

ID=70480365

Family Applications (1)

Application Number Title Priority Date Filing Date
IT102020000000391A IT202000000391A1 (it) 2020-01-13 2020-01-13 Procedimento galvanico, e relativo bagno, di elettrodeposizione di palladio ad alta resistenza alla corrosione.

Country Status (1)

Country Link
IT (1) IT202000000391A1 (it)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2089374A (en) * 1980-12-11 1982-06-23 Hooker Chemicals Plastics Corp Electrodeposition of palladium and palladium alloys
US4430172A (en) * 1981-09-11 1984-02-07 Langbein-Pfanhauser Werke Ag Method of increasing corrosion resistance in galvanically deposited palladium/nickel coatings
US4911799A (en) * 1989-08-29 1990-03-27 At&T Bell Laboratories Electrodeposition of palladium films
EP0619386A1 (de) * 1993-04-07 1994-10-12 ATOTECH Deutschland GmbH Elektrolytische Abscheidung von Palladium oder Palladiumlegierungen
JP2000303199A (ja) * 1999-02-17 2000-10-31 Nisshin Kasei Kk パラジウム合金めっき液、パラジウム−銅合金めっき部材及び殺菌性部材
JP2010189753A (ja) * 2009-02-20 2010-09-02 Daiwa Fine Chemicals Co Ltd (Laboratory) めっき浴及びそれを用いためっき方法
US20170101389A1 (en) * 2013-12-26 2017-04-13 Shinhao Materials LLC Leveling composition and method for electrodeposition of metals in microelectronics
US20170211197A1 (en) * 2011-05-03 2017-07-27 Atotech Deutschland Gmbh Electroplating bath and method for producing dark chromium layers

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2089374A (en) * 1980-12-11 1982-06-23 Hooker Chemicals Plastics Corp Electrodeposition of palladium and palladium alloys
US4430172A (en) * 1981-09-11 1984-02-07 Langbein-Pfanhauser Werke Ag Method of increasing corrosion resistance in galvanically deposited palladium/nickel coatings
US4911799A (en) * 1989-08-29 1990-03-27 At&T Bell Laboratories Electrodeposition of palladium films
EP0619386A1 (de) * 1993-04-07 1994-10-12 ATOTECH Deutschland GmbH Elektrolytische Abscheidung von Palladium oder Palladiumlegierungen
JP2000303199A (ja) * 1999-02-17 2000-10-31 Nisshin Kasei Kk パラジウム合金めっき液、パラジウム−銅合金めっき部材及び殺菌性部材
JP2010189753A (ja) * 2009-02-20 2010-09-02 Daiwa Fine Chemicals Co Ltd (Laboratory) めっき浴及びそれを用いためっき方法
US20170211197A1 (en) * 2011-05-03 2017-07-27 Atotech Deutschland Gmbh Electroplating bath and method for producing dark chromium layers
US20170101389A1 (en) * 2013-12-26 2017-04-13 Shinhao Materials LLC Leveling composition and method for electrodeposition of metals in microelectronics

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