NL8503515A - Halfgeleiderinrichting. - Google Patents
Halfgeleiderinrichting. Download PDFInfo
- Publication number
- NL8503515A NL8503515A NL8503515A NL8503515A NL8503515A NL 8503515 A NL8503515 A NL 8503515A NL 8503515 A NL8503515 A NL 8503515A NL 8503515 A NL8503515 A NL 8503515A NL 8503515 A NL8503515 A NL 8503515A
- Authority
- NL
- Netherlands
- Prior art keywords
- layer
- hemt
- gaas
- type
- gate electrode
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 12
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 35
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 claims description 7
- 239000012535 impurity Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 3
- 229910017401 Au—Ge Inorganic materials 0.000 description 16
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000005669 field effect Effects 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 230000005533 two-dimensional electron gas Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- -1 polycide or silicide Chemical compound 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors having potential barriers
- H01L29/94—Metal-insulator-semiconductors, e.g. MOS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/432—Heterojunction gate for field effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27035084 | 1984-12-21 | ||
| JP59270350A JPS61147578A (ja) | 1984-12-21 | 1984-12-21 | 半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8503515A true NL8503515A (nl) | 1986-07-16 |
Family
ID=17485034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8503515A NL8503515A (nl) | 1984-12-21 | 1985-12-19 | Halfgeleiderinrichting. |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS61147578A (ko) |
| KR (1) | KR940010557B1 (ko) |
| CA (1) | CA1238122A (ko) |
| DE (1) | DE3545434C2 (ko) |
| FR (1) | FR2582152B1 (ko) |
| GB (1) | GB2168847B (ko) |
| NL (1) | NL8503515A (ko) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2600821B1 (fr) * | 1986-06-30 | 1988-12-30 | Thomson Csf | Dispositif semi-conducteur a heterojonction et double canal, son application a un transistor a effet de champ, et son application a un dispositif de transductance negative |
| DE59010851D1 (de) * | 1989-04-27 | 1998-11-12 | Max Planck Gesellschaft | Halbleiterstruktur mit einer 2D-Ladungsträgerschicht und Herstellungsverfahren |
| US5385865A (en) * | 1990-04-26 | 1995-01-31 | Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften | Method of generating active semiconductor structures by means of starting structures which have a 2D charge carrier layer parallel to the surface |
| CA2774934A1 (en) | 2008-09-23 | 2010-04-01 | Aerovironment, Inc. | Stator winding heat sink configuraton |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58212182A (ja) * | 1982-06-03 | 1983-12-09 | Fujitsu Ltd | 半導体装置 |
| JPS61295671A (ja) * | 1985-06-21 | 1986-12-26 | ハネウエル・インコ−ポレ−テツド | 相補形プレ−ナ・ヘテロ構造ｉｃおよびその製造方法 |
-
1984
- 1984-12-21 JP JP59270350A patent/JPS61147578A/ja active Pending
-
1985
- 1985-12-13 KR KR1019850009394A patent/KR940010557B1/ko not_active IP Right Cessation
- 1985-12-16 CA CA000497744A patent/CA1238122A/en not_active Expired
- 1985-12-19 NL NL8503515A patent/NL8503515A/nl unknown
- 1985-12-20 GB GB08531441A patent/GB2168847B/en not_active Expired
- 1985-12-20 DE DE3545434A patent/DE3545434C2/de not_active Expired - Fee Related
- 1985-12-20 FR FR858518969A patent/FR2582152B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| KR940010557B1 (ko) | 1994-10-24 |
| GB2168847A (en) | 1986-06-25 |
| CA1238122A (en) | 1988-06-14 |
| KR860005452A (ko) | 1986-07-23 |
| DE3545434C2 (de) | 1995-07-20 |
| DE3545434A1 (de) | 1986-07-03 |
| GB2168847B (en) | 1988-05-25 |
| JPS61147578A (ja) | 1986-07-05 |
| FR2582152B1 (fr) | 1989-12-08 |
| FR2582152A1 (fr) | 1986-11-21 |
| GB8531441D0 (en) | 1986-02-05 |
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