NL7806294A - Geintegreerde halfgeleider -geheugeninrichting. - Google Patents

Geintegreerde halfgeleider -geheugeninrichting.

Info

Publication number
NL7806294A
NL7806294A NL7806294A NL7806294A NL7806294A NL 7806294 A NL7806294 A NL 7806294A NL 7806294 A NL7806294 A NL 7806294A NL 7806294 A NL7806294 A NL 7806294A NL 7806294 A NL7806294 A NL 7806294A
Authority
NL
Netherlands
Prior art keywords
memory device
semiconductor memory
integrated semiconductor
integrated
semiconductor
Prior art date
Application number
NL7806294A
Other languages
English (en)
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of NL7806294A publication Critical patent/NL7806294A/nl

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/4063—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
    • G11C11/407—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/02—Disposition of storage elements, e.g. in the form of a matrix array
    • G11C5/025—Geometric lay-out considerations of storage- and peripheral-blocks in a semiconductor storage device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/105—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
NL7806294A 1977-06-10 1978-06-09 Geintegreerde halfgeleider -geheugeninrichting. NL7806294A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6908577A JPS544086A (en) 1977-06-10 1977-06-10 Memory circuit unit

Publications (1)

Publication Number Publication Date
NL7806294A true NL7806294A (nl) 1978-12-12

Family

ID=13392390

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7806294A NL7806294A (nl) 1977-06-10 1978-06-09 Geintegreerde halfgeleider -geheugeninrichting.

Country Status (6)

Country Link
US (1) US4156939A (nl)
JP (1) JPS544086A (nl)
DE (1) DE2823854C3 (nl)
FR (1) FR2394144A1 (nl)
GB (1) GB1602948A (nl)
NL (1) NL7806294A (nl)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4239993A (en) * 1978-09-22 1980-12-16 Texas Instruments Incorporated High performance dynamic sense amplifier with active loads
DE2921993A1 (de) * 1979-05-30 1980-12-04 Siemens Ag Halbleiterspeicher
DE2923995C2 (de) * 1979-06-13 1985-11-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von integrierten MOS-Schaltungen mit MOS-Transistoren und MNOS-Speichertransistoren in Silizium-Gate-Technologie
JPS5847862B2 (ja) * 1979-08-30 1983-10-25 富士通株式会社 半導体記憶装置及びその製造方法
JPS5678266U (nl) * 1979-11-09 1981-06-25
JPS5745267A (en) * 1980-09-01 1982-03-15 Nec Corp Semiconductor device
US4402126A (en) * 1981-05-18 1983-09-06 Texas Instruments Incorporated Method for fabrication of a non-volatile JRAM cell
DE3280064D1 (de) * 1981-06-29 1990-01-18 Fujitsu Ltd Dynamische direktzugriffspeicheranordnung.
US4608668A (en) * 1981-09-03 1986-08-26 Tokyo Shibaura Denki Kabushiki Kaisha Semiconductor device
US4641165A (en) * 1982-04-28 1987-02-03 Tokyo Shibaura Denki Kabushiki Kaisha Dynamic memory device with an RC circuit for inhibiting the effects of alpha particle radiation
JPH0632538Y2 (ja) * 1985-05-29 1994-08-24 三井東圧化学株式会社 地下埋設管用不透水膜
JPS62229870A (ja) * 1986-01-22 1987-10-08 Mitsubishi Electric Corp 半導体集積回路
JPH0821691B2 (ja) * 1990-11-26 1996-03-04 三菱電機株式会社 半導体メモリセル
JP2687829B2 (ja) * 1992-12-21 1997-12-08 松下電器産業株式会社 メモリ及びメモリ作成方式
JP2956645B2 (ja) * 1997-04-07 1999-10-04 日本電気株式会社 半導体装置
US5895253A (en) * 1997-08-22 1999-04-20 Micron Technology, Inc. Trench isolation for CMOS devices
JP2001110908A (ja) * 1999-10-06 2001-04-20 Nec Corp 半導体装置及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3512099A (en) * 1967-09-28 1970-05-12 Tokyo Shibaura Electric Co Semiconductor amplifier wherein several metal oxide semiconductor field effect transistors are coupled on a substrate
US3618051A (en) * 1969-05-09 1971-11-02 Sperry Rand Corp Nonvolatile read-write memory with addressing
US3810124A (en) * 1972-06-30 1974-05-07 Ibm Memory accessing system
US3747072A (en) * 1972-07-19 1973-07-17 Sperry Rand Corp Integrated static mnos memory circuit
US3876991A (en) * 1973-07-11 1975-04-08 Bell Telephone Labor Inc Dual threshold, three transistor dynamic memory cell
US3868274A (en) * 1974-01-02 1975-02-25 Gen Instrument Corp Method for fabricating MOS devices with a multiplicity of thresholds on a semiconductor substrate
US3971001A (en) * 1974-06-10 1976-07-20 Sperry Rand Corporation Reprogrammable read only variable threshold transistor memory with isolated addressing buffer
US3938108A (en) * 1975-02-03 1976-02-10 Intel Corporation Erasable programmable read-only memory
US4003035A (en) * 1975-07-03 1977-01-11 Motorola, Inc. Complementary field effect transistor sense amplifier for one transistor per bit ram cell
US4094012A (en) * 1976-10-01 1978-06-06 Intel Corporation Electrically programmable MOS read-only memory with isolated decoders
US4112575A (en) * 1976-12-20 1978-09-12 Texas Instruments Incorporated Fabrication methods for the high capacity ram cell

Also Published As

Publication number Publication date
DE2823854C3 (de) 1986-10-23
FR2394144A1 (fr) 1979-01-05
DE2823854A1 (de) 1978-12-21
JPS544086A (en) 1979-01-12
DE2823854B2 (nl) 1980-04-17
FR2394144B1 (nl) 1983-02-04
GB1602948A (en) 1981-11-18
US4156939A (en) 1979-05-29

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Legal Events

Date Code Title Description
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
BV The patent application has lapsed