NL7704864A - Halfgeleidergeheugen. - Google Patents

Halfgeleidergeheugen.

Info

Publication number
NL7704864A
NL7704864A NL7704864A NL7704864A NL7704864A NL 7704864 A NL7704864 A NL 7704864A NL 7704864 A NL7704864 A NL 7704864A NL 7704864 A NL7704864 A NL 7704864A NL 7704864 A NL7704864 A NL 7704864A
Authority
NL
Netherlands
Prior art keywords
semiconductor memory
semiconductor
memory
Prior art date
Application number
NL7704864A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7704864A publication Critical patent/NL7704864A/nl

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7827Vertical transistors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/35Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices with charge storage in a depletion layer, e.g. charge coupled devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0727Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors
    • H01L27/0733Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors in combination with capacitors only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/34DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the transistor being at least partially in a trench in the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42356Disposition, e.g. buried gate electrode
    • H01L29/4236Disposition, e.g. buried gate electrode within a trench, e.g. trench gate electrode, groove gate electrode
NL7704864A 1976-05-04 1977-05-03 Halfgeleidergeheugen. NL7704864A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2619713A DE2619713C2 (de) 1976-05-04 1976-05-04 Halbleiterspeicher

Publications (1)

Publication Number Publication Date
NL7704864A true NL7704864A (nl) 1977-11-08

Family

ID=5977056

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7704864A NL7704864A (nl) 1976-05-04 1977-05-03 Halfgeleidergeheugen.

Country Status (7)

Country Link
US (1) US4109270A (nl)
JP (1) JPS6018149B2 (nl)
DE (1) DE2619713C2 (nl)
FR (1) FR2350666A1 (nl)
GB (1) GB1530094A (nl)
IT (1) IT1085458B (nl)
NL (1) NL7704864A (nl)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2737073C3 (de) * 1977-08-17 1981-09-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen eines Isolierschicht-Feldeffekttransistors für eine Ein-Transistor-Speicherzelle
GB2007430B (en) * 1977-11-03 1982-03-03 Western Electric Co Semicinductor device and fabrication method
JPS54154977A (en) * 1978-05-29 1979-12-06 Fujitsu Ltd Semiconductor device and its manufacture
NL184551C (nl) * 1978-07-24 1989-08-16 Philips Nv Veldeffekttransistor met geisoleerde stuurelektrode.
JPS5537250U (nl) * 1978-08-31 1980-03-10
US4238760A (en) * 1978-10-06 1980-12-09 Recognition Equipment Incorporated Multi-spectrum photodiode devices
US4206005A (en) * 1978-11-27 1980-06-03 Xerox Corporation Method of making split gate LSI VMOSFET
US4322822A (en) * 1979-01-02 1982-03-30 Mcpherson Roger K High density VMOS electrically programmable ROM
JPS5827667B2 (ja) * 1979-02-19 1983-06-10 富士通株式会社 半導体装置
US4263663A (en) * 1979-03-19 1981-04-21 Motorola, Inc. VMOS ROM Array
US4462040A (en) * 1979-05-07 1984-07-24 International Business Machines Corporation Single electrode U-MOSFET random access memory
US4271418A (en) * 1979-10-29 1981-06-02 American Microsystems, Inc. VMOS Memory cell and method for making same
US4369564A (en) * 1979-10-29 1983-01-25 American Microsystems, Inc. VMOS Memory cell and method for making same
US4335450A (en) * 1980-01-30 1982-06-15 International Business Machines Corporation Non-destructive read out field effect transistor memory cell system
NL8005673A (nl) * 1980-10-15 1982-05-03 Philips Nv Veldeffecttransistor en werkwijze ter vervaardiging van een dergelijke veldeffecttransistor.
GB2089119A (en) * 1980-12-10 1982-06-16 Philips Electronic Associated High voltage semiconductor devices
JPH0682800B2 (ja) * 1985-04-16 1994-10-19 株式会社東芝 半導体記憶装置
JPS6210328A (ja) * 1985-07-03 1987-01-19 Taisei Corp 水中コンクリ−ト打設装置
WO1987000690A2 (en) * 1985-07-25 1987-01-29 American Telephone & Telegraph Company High-performance dram arrays including trench capacitors
JPH0793372B2 (ja) * 1985-12-16 1995-10-09 株式会社東芝 半導体記憶装置
JPS6324660A (ja) * 1986-07-17 1988-02-02 Toshiba Corp 半導体記憶装置およびその製造方法
US4763180A (en) * 1986-12-22 1988-08-09 International Business Machines Corporation Method and structure for a high density VMOS dynamic ram array
JPS63189525A (ja) * 1987-01-30 1988-08-05 Shimizu Constr Co Ltd 水中コンクリ−ト打設装置
JPH04143316A (ja) * 1990-08-08 1992-05-18 Horimatsu Kensetsu Kogyo Kk コンクリート貯留筒を用いた水中コンクリート打設工法およびコンクリート貯留筒

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1248051A (en) * 1968-03-01 1971-09-29 Post Office Method of making insulated gate field effect transistors
US3924265A (en) * 1973-08-29 1975-12-02 American Micro Syst Low capacitance V groove MOS NOR gate and method of manufacture
JPS5066184A (nl) * 1973-10-12 1975-06-04
US4003036A (en) * 1975-10-23 1977-01-11 American Micro-Systems, Inc. Single IGFET memory cell with buried storage element

Also Published As

Publication number Publication date
FR2350666A1 (fr) 1977-12-02
DE2619713C2 (de) 1984-12-20
GB1530094A (en) 1978-10-25
US4109270A (en) 1978-08-22
IT1085458B (it) 1985-05-28
FR2350666B1 (nl) 1984-07-20
JPS52134385A (en) 1977-11-10
JPS6018149B2 (ja) 1985-05-09
DE2619713A1 (de) 1977-11-24

Similar Documents

Publication Publication Date Title
NL7707297A (nl) Halfgeleider-geheugeninrichting.
NL7801879A (nl) Halfgeleidergeheugen.
NL7806183A (nl) Halfgeleidergeheugen.
NL7500550A (nl) Halfgeleider-geheugeninrichting.
NL7614537A (nl) Halfgeleidergeheugeninrichting.
NL7712341A (nl) Geheugenstelsel.
NL7713945A (nl) Schijvengeheugen.
NL178729C (nl) Halfgeleidergeheugen.
NL7704864A (nl) Halfgeleidergeheugen.
NL7709931A (nl) Halfgeleider-geheugeninrichting.
NL173572C (nl) Halfgeleiderinrichting.
NL7711664A (nl) Halfgeleiderlaser.
NL171760C (nl) Halfgeleiderlaser.
NL7711511A (nl) Geheugenschijf.
NL179244C (nl) Halfgeleidergeheugen.
NL190211C (nl) Dynamische halfgeleidergeheugeninrichting.
DE3072204T2 (de) Halbleiterspeicheranordnung.
NL7607984A (nl) Halfgeleidergeheugen.
NL7710360A (nl) Halfgeleidergeheugen.
NL7712819A (nl) Dynamische geheugeninrichting.
DD130698A5 (de) Halbleiterspeicher
NL7701172A (nl) Halfgeleidergeheugeninrichting.
NL7710333A (nl) Geheugeninrichting.
NL7807820A (nl) Halfgeleider-geheugeninrichting.
NL7709822A (nl) Geheugencel.

Legal Events

Date Code Title Description
BV The patent application has lapsed