NL193666C - Inrichting voor het vervaardigen van een monokristallijn kristallichaam. - Google Patents

Inrichting voor het vervaardigen van een monokristallijn kristallichaam. Download PDF

Info

Publication number
NL193666C
NL193666C NL8502286A NL8502286A NL193666C NL 193666 C NL193666 C NL 193666C NL 8502286 A NL8502286 A NL 8502286A NL 8502286 A NL8502286 A NL 8502286A NL 193666 C NL193666 C NL 193666C
Authority
NL
Netherlands
Prior art keywords
heat generator
crucible
crystal body
melt
heat
Prior art date
Application number
NL8502286A
Other languages
English (en)
Dutch (nl)
Other versions
NL193666B (nl
NL8502286A (nl
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of NL8502286A publication Critical patent/NL8502286A/nl
Publication of NL193666B publication Critical patent/NL193666B/xx
Application granted granted Critical
Publication of NL193666C publication Critical patent/NL193666C/nl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/14Heating of the melt or the crystallised materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
NL8502286A 1984-08-24 1985-08-19 Inrichting voor het vervaardigen van een monokristallijn kristallichaam. NL193666C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17642084 1984-08-24
JP59176420A JPS6153187A (ja) 1984-08-24 1984-08-24 単結晶成長装置

Publications (3)

Publication Number Publication Date
NL8502286A NL8502286A (nl) 1986-03-17
NL193666B NL193666B (nl) 2000-02-01
NL193666C true NL193666C (nl) 2000-06-06

Family

ID=16013382

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8502286A NL193666C (nl) 1984-08-24 1985-08-19 Inrichting voor het vervaardigen van een monokristallijn kristallichaam.

Country Status (10)

Country Link
JP (1) JPS6153187A (de)
AT (1) AT400848B (de)
CA (1) CA1290654C (de)
DE (1) DE3530231A1 (de)
FR (1) FR2569430B1 (de)
GB (1) GB2163367B (de)
IT (1) IT1200719B (de)
MY (1) MY101257A (de)
NL (1) NL193666C (de)
SE (1) SE467258B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62105998A (ja) * 1985-10-31 1987-05-16 Sony Corp シリコン基板の製法
JPS62223090A (ja) * 1986-03-20 1987-10-01 Shin Etsu Handotai Co Ltd 半導体単結晶引上装置
JPS6389488A (ja) * 1986-09-30 1988-04-20 Toshiba Corp 単結晶の製造方法
DE3733487C2 (de) * 1987-10-03 1997-08-14 Leybold Ag Vorrichtung zum Ziehen von Einkristallen
US5139750A (en) * 1989-10-16 1992-08-18 Nkk Corporation Silicon single crystal manufacturing apparatus
JPH03183689A (ja) * 1989-12-11 1991-08-09 Mitsubishi Materials Corp 単結晶引上装置および引上方法
JP3016897B2 (ja) * 1991-03-20 2000-03-06 信越半導体株式会社 シリコン単結晶の製造方法及び装置
US5363795A (en) * 1991-09-04 1994-11-15 Kawasaki Steel Corporation Czochralski crystal pulling process and an apparatus for carrying out the same
EP0530397A1 (de) * 1991-09-04 1993-03-10 Kawasaki Steel Corporation Verfahren und Vorrichtung den Kristallziehungsprozess nach dem Czochralski Verfahren
JP2862158B2 (ja) * 1993-08-27 1999-02-24 信越半導体株式会社 シリコン単結晶の製造装置
JPH1179889A (ja) 1997-07-09 1999-03-23 Shin Etsu Handotai Co Ltd 結晶欠陥が少ないシリコン単結晶の製造方法、製造装置並びにこの方法、装置で製造されたシリコン単結晶とシリコンウエーハ
US6285011B1 (en) 1999-10-12 2001-09-04 Memc Electronic Materials, Inc. Electrical resistance heater for crystal growing apparatus
KR101105526B1 (ko) * 2008-12-30 2012-01-13 주식회사 엘지실트론 단결정 잉곳 제조용 히터 및 이를 구비하는 단결정 잉곳 제조장치

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2979386A (en) * 1956-08-02 1961-04-11 Shockley William Crystal growing apparatus
FR1316707A (fr) * 1961-12-22 1963-02-01 Radiotechnique Perfectionnements aux dispositifs d'obtention de monocristaux par tirage
DE1289950B (de) * 1963-07-24 1969-02-27 Siemens Ag Vorrichtung zum Ziehen von Halbleiterkristallen
US3359077A (en) * 1964-05-25 1967-12-19 Globe Union Inc Method of growing a crystal
DE1769860A1 (de) * 1968-07-26 1971-11-11 Siemens Ag Vorrichtung zum Ziehen von versetzungsfreien Halbleitereinkristallstaeben
JPS4921063A (de) * 1972-06-15 1974-02-25
JPS6027464B2 (ja) * 1976-09-28 1985-06-28 日本電気株式会社 高画素密度変換装置
DE2821481C2 (de) * 1978-05-17 1985-12-05 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Vorrichtung zum Ziehen von hochreinen Halbleiterstäben aus der Schmelze
US4277441A (en) * 1979-01-15 1981-07-07 Mobil Tyco Solar Energy Corporation Apparatus for monitoring crystal growth
DE3005492C2 (de) * 1980-02-14 1983-10-27 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Herstellung reinster Einkristalle durch Tiegelziehen nach Czochralski
JPS5711897A (en) * 1980-06-27 1982-01-21 Sumitomo Electric Ind Ltd Method of pulling up single crystal and device therefor
JPS5645890A (en) * 1980-06-30 1981-04-25 Sony Corp Crystal growing apparatus
DE3027262A1 (de) * 1980-07-18 1982-02-11 Skf Kugellagerfabriken Gmbh, 8720 Schweinfurt Im ziehverfahren hergestellte, duennwandige lagerbuechse
JPH0244799B2 (ja) * 1981-10-26 1990-10-05 Sony Corp Ketsushoseichohoho
JPS5964591A (ja) * 1982-09-30 1984-04-12 Sumitomo Electric Ind Ltd 単結晶引上装置
JPH0669917B2 (ja) * 1982-10-08 1994-09-07 住友電気工業株式会社 複数段ヒ−タ−の制御方法
JPS59137399A (ja) * 1983-01-28 1984-08-07 Nippon Telegr & Teleph Corp <Ntt> 低転位密度単結晶の育成方法及びその装置
JPS60103097A (ja) * 1983-11-08 1985-06-07 Sumitomo Electric Ind Ltd 単結晶引上装置

Also Published As

Publication number Publication date
SE467258B (sv) 1992-06-22
JPS6153187A (ja) 1986-03-17
GB2163367B (en) 1988-04-07
NL193666B (nl) 2000-02-01
ATA247085A (de) 1995-08-15
IT8521977A0 (it) 1985-08-23
DE3530231A1 (de) 1986-02-27
IT1200719B (it) 1989-01-27
GB2163367A (en) 1986-02-26
FR2569430B1 (fr) 1993-12-03
SE8503935L (sv) 1986-02-25
AT400848B (de) 1996-03-25
SE8503935D0 (sv) 1985-08-23
FR2569430A1 (fr) 1986-02-28
JPH0357072B2 (de) 1991-08-30
CA1290654C (en) 1991-10-15
MY101257A (en) 1991-08-17
DE3530231C2 (de) 1991-01-17
GB8520574D0 (en) 1985-09-25
NL8502286A (nl) 1986-03-17

Similar Documents

Publication Publication Date Title
NL193666C (nl) Inrichting voor het vervaardigen van een monokristallijn kristallichaam.
JP2002517366A (ja) 結晶成長装置用電気抵抗ヒータ
UA89491C2 (uk) Монокристал сапфіру та спосіб його виготовлення
JP4567192B2 (ja) 結晶成長装置用電気抵抗ヒータ及びその使用方法
US6285011B1 (en) Electrical resistance heater for crystal growing apparatus
KR102422122B1 (ko) 실리콘 융액의 대류 패턴 제어 방법, 실리콘 단결정의 제조 방법 및, 실리콘 단결정의 인상 장치
US3961905A (en) Crucible and heater assembly for crystal growth from a melt
EP0798404B1 (de) Vorrichtung zur Herstellung Silizium-Einkristallen
US5911825A (en) Low oxygen heater
WO2019230701A1 (ja) チューブ状単結晶体の製造装置および製造方法
US4032390A (en) Plural crystal pulling from a melt in an annular crucible heated on both inner and outer walls
JPH0524969A (ja) 結晶成長装置
GB2159728A (en) Method of and apparatus for the drawing of bars of monocrystalline silicon
GB2084046A (en) Method and apparatus for crystal growth
US6251182B1 (en) Susceptor for float-zone apparatus
US3046100A (en) Zone melting of semiconductive material
JPS61261288A (ja) シリコン単結晶引上装置
KR930007852B1 (ko) 단결성 성장장치
JPH0660080B2 (ja) 単結晶成長装置
JPH03265593A (ja) 結晶成長装置
JPH06279170A (ja) 単結晶の製造方法及びその装置
JP2017193469A (ja) アフターヒータ及びサファイア単結晶製造装置
JPH09202685A (ja) 単結晶引き上げ装置
JP2023549206A (ja) サイドヒータの下方に配置されるヒートシールドを有するインゴット引上げ装置及びそのような装置でインゴットを製造する方法
JP2914077B2 (ja) 高周波誘導加熱コイル

Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
V1 Lapsed because of non-payment of the annual fee

Effective date: 20030301