NL1017310C2 - Organonmetallieke monoacylarylfosfinen. - Google Patents

Organonmetallieke monoacylarylfosfinen. Download PDF

Info

Publication number
NL1017310C2
NL1017310C2 NL1017310A NL1017310A NL1017310C2 NL 1017310 C2 NL1017310 C2 NL 1017310C2 NL 1017310 A NL1017310 A NL 1017310A NL 1017310 A NL1017310 A NL 1017310A NL 1017310 C2 NL1017310 C2 NL 1017310C2
Authority
NL
Netherlands
Prior art keywords
alkyl
lithium
oxide
substituted
phosphine
Prior art date
Application number
NL1017310A
Other languages
English (en)
Dutch (nl)
Other versions
NL1017310A1 (nl
Inventor
Jean-Pierre Wolf
Gebhard Hug
Beat Michael Aebli
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of NL1017310A1 publication Critical patent/NL1017310A1/xx
Application granted granted Critical
Publication of NL1017310C2 publication Critical patent/NL1017310C2/nl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00Preparations for dentistry
    • A61K6/60Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62Photochemical radical initiators
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00Preparations for dentistry
    • A61K6/80Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/5036Phosphines containing the structure -C(=X)-P or NC-P
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6521Six-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0755Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/124Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Public Health (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Veterinary Medicine (AREA)
  • Animal Behavior & Ethology (AREA)
  • Epidemiology (AREA)
  • Polymers & Plastics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Biophysics (AREA)
  • Plastic & Reconstructive Surgery (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)
NL1017310A 2000-02-08 2001-02-08 Organonmetallieke monoacylarylfosfinen. NL1017310C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH2552000 2000-02-08
CH2552000 2000-02-08

Publications (2)

Publication Number Publication Date
NL1017310A1 NL1017310A1 (nl) 2001-08-09
NL1017310C2 true NL1017310C2 (nl) 2002-06-18

Family

ID=4471003

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1017310A NL1017310C2 (nl) 2000-02-08 2001-02-08 Organonmetallieke monoacylarylfosfinen.

Country Status (14)

Country Link
US (2) US6399805B2 (https=)
JP (2) JP2001270894A (https=)
KR (1) KR100769838B1 (https=)
CN (1) CN1200943C (https=)
BE (1) BE1013960A3 (https=)
BR (1) BR0100910A (https=)
CA (1) CA2334291A1 (https=)
DE (1) DE10105046A1 (https=)
ES (1) ES2195706B1 (https=)
FR (1) FR2804683B1 (https=)
GB (1) GB2360283B (https=)
IT (1) ITMI20010242A1 (https=)
NL (1) NL1017310C2 (https=)
TW (1) TW555762B (https=)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6888031B1 (en) * 1998-11-30 2005-05-03 Ciba Specialty Chemicals Corporation Process for the preparation of acylphosphines, acyl oxides and acyl sulfides
EP1230276B1 (en) 1999-10-20 2005-12-14 Ciba SC Holding AG Photoinitiator formulations
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
DE60111405T2 (de) * 2000-09-14 2006-05-11 Ciba Speciality Chemicals Holding Inc. Acylphosphinoxid-photoinitiatoren in methacrylatgiessharzen
CN100437354C (zh) * 2001-08-21 2008-11-26 西巴特殊化学品控股有限公司 红移单-和双-酰基氧化膦和硫化膦及其作为光引发剂的应用
AU2002366198A1 (en) * 2001-11-20 2003-06-10 Ciba Specialty Chemicals Holding Inc. Multimer forms of acylphosphines and their derivatives
DE10206096A1 (de) * 2002-02-13 2003-08-14 Basf Ag Mono- und Bisacylphosphinderivate
BR0312133A (pt) * 2002-06-11 2005-04-05 Ciba Sc Holding Ag Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável
CN1791473A (zh) * 2003-05-23 2006-06-21 西巴特殊化学品控股有限公司 强粘合性表面涂料
PL1648908T3 (pl) * 2003-07-18 2007-01-31 Igm Malta Ltd Sposób wytwarzania acylofosfanów i ich pochodnych
JP4896737B2 (ja) 2003-12-29 2012-03-14 アボット・メディカル・オプティクス・インコーポレイテッド 可視光選択的透過領域を有する眼内レンズ
US20050154109A1 (en) * 2004-01-12 2005-07-14 Minyu Li Floor finish with lightening agent
US7278737B2 (en) 2004-04-30 2007-10-09 Advanced Medical Optics, Inc. Ophthalmic devices having a highly selective violet light transmissive filter and related methods
US20060115516A1 (en) 2004-11-22 2006-06-01 Pearson Jason C Copolymerizable methine and anthraquinone compounds and articles containing them
EP2261696B1 (en) * 2004-11-22 2012-03-14 Abbott Medical Optics Inc. Copolymerizable azo compounds and articles containing them
CN101065388B (zh) * 2004-11-23 2011-12-21 西巴特殊化学品控股有限公司 制备酰基磷烷及其衍生物的方法
GB2422678B (en) * 2005-01-25 2009-03-11 Photocentric Ltd Method of making a photopolymer plate
JP2006252787A (ja) * 2005-03-08 2006-09-21 Toppan Printing Co Ltd 有機el素子製造方法および有機el素子
JP5232365B2 (ja) * 2005-06-01 2013-07-10 富士フイルム株式会社 フッ素化光重合開始剤を含む光学フィルム、反射防止フィルム、偏光板、およびそれを用いた画像表示装置
US8924486B2 (en) * 2009-02-12 2014-12-30 Sierra Wireless, Inc. Method and system for aggregating communications
WO2010054471A1 (en) 2008-11-17 2010-05-20 Sierra Wireless, Inc. Method and apparatus for network port and network address translation
US8228848B2 (en) * 2008-11-17 2012-07-24 Sierra Wireless, Inc. Method and apparatus for facilitating push communication across a network boundary
EP2421903B1 (en) * 2009-04-20 2014-11-19 ETH Zurich Polymer nanoparticles
US8633258B2 (en) 2010-06-30 2014-01-21 Dsm Ip Assets B.V. D1492 liquid BAPO photoinitiator and its use in radiation curable compositions
EP2673927A4 (en) 2011-02-08 2016-08-24 Sierra Wireless Inc METHOD AND DATA-TRANSFER SYSTEM BETWEEN NETWORK DEVICES
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
GB201213163D0 (en) 2012-07-24 2012-09-05 Lambson Ltd Photopolymerisation processes and novel compounds therefor
ES2720760T3 (es) * 2012-10-01 2019-07-24 Eth Zuerich Un procedimiento para la preparación de acilofosfanos
EP2935393A4 (en) 2012-12-18 2016-06-01 Basf Se SEMICONDUCTOR MATERIALS BASED ON NAPHTHALENDIIMIDE VINYLENE OLIGOTHIOPHENO VINYLENE POLYMERS
CN110845530A (zh) * 2012-12-19 2020-02-28 Igm集团公司 双酰基次膦酸的衍生物、其制备及其作为光敏引发剂的用途
ES2804199T3 (es) 2016-01-11 2021-02-04 Henkel IP & Holding GmbH Compuestos compatibles con silicona
EP3409680B1 (en) * 2017-05-30 2021-01-06 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
CN107082787B (zh) * 2017-06-09 2019-05-17 江苏富比亚化学品有限公司 一种苯甲酰基苯基次膦酸及其衍生物的制备方法
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
KR20200044732A (ko) * 2017-08-24 2020-04-29 쑤저우 레인보우 매터리얼즈 컴퍼니 리미티드 실리콘 중합체성 광개시제 및 그 용도
KR20230148381A (ko) 2017-12-27 2023-10-24 헨켈 아게 운트 코. 카게아아 광학적으로 투명한 감압성 접착제 및 그의 용도
US12024535B2 (en) 2018-10-01 2024-07-02 Dow Toray Co., Ltd. Organosilicon compound, method for producing thereof, and use thereof
EP4149758A4 (en) * 2020-05-14 2024-09-11 3M Innovative Properties Company MULTILAYER OPTICAL FILMS COMPRISING AT LEAST ONE LAYER OF FLUORINATED (CO)POLYMER PREPARED USING A FLUORINATED PHOTOINITIATOR, AND METHODS OF PREPARATION AND USE THEREOF
KR102651787B1 (ko) * 2021-07-14 2024-03-26 주식회사 엘지에너지솔루션 리튬 이차전지용 비수계 전해액 및 이를 포함하는 리튬 이차전지
CN114349788B (zh) * 2021-12-30 2023-06-20 华南理工大学 一种光引发剂及其制备方法与应用

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184095A2 (de) * 1984-11-27 1986-06-11 ESPE Stiftung & Co Produktions- und Vertriebs KG Bisacylphosphinoxide, ihre Herstellung und Verwendung
EP0615980A2 (de) * 1993-03-18 1994-09-21 Ciba-Geigy Ag Härtung von Bisacylphosphinoxid-Photoinitiatoren enthaltenden Zusammensetzungen
GB2292740A (en) * 1994-09-02 1996-03-06 Ciba Geigy Ag Alkoxyphenyl-substituted bisacylphosphine oxides
GB2310855A (en) * 1996-03-04 1997-09-10 Ciba Geigy Ag Alkylphenylbisacylphosphine oxides and photoinitiator mixtures
WO2000032612A1 (en) * 1998-11-30 2000-06-08 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphines and derivatives

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2830928A1 (de) * 1978-07-14 1980-01-31 Basf Ag Lichthaertbare form-, traenk- und ueberzugsmassen
DE3020092A1 (de) * 1980-05-27 1981-12-10 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen und ihre verwendung
DE3114341A1 (de) * 1981-04-09 1982-11-11 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen, ihre herstellung und verwendung
DE3133419A1 (de) * 1981-08-24 1983-03-10 Basf Ag, 6700 Ludwigshafen Acylphosphinoxidverbindungen und ihre verwendung
US4985472A (en) * 1987-05-01 1991-01-15 Mitsubishi Rayon Company, Ltd. Actinic ray curable composition for casting polymerization and casting polymerization molded products
JPH01309001A (ja) * 1988-02-15 1989-12-13 Mitsubishi Rayon Co Ltd プラスチックレンズ材料
US5218009A (en) 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
EP0736540A3 (de) * 1989-08-04 1997-06-18 Ciba Geigy Mono- und Diacylphosphinoxide
RU2091385C1 (ru) 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
DE4230555A1 (de) * 1992-09-12 1994-03-17 Basf Ag Verfahren zur Herstellung von alpha-Carbonylphosphinoxiden
EP0662991A1 (en) * 1992-09-30 1995-07-19 Ppg Industries, Inc. Pigmented compositions and methods for producing radiation curable coatings of very low gloss
JPH09241312A (ja) * 1996-03-08 1997-09-16 Showa Denko Kk 光硬化性人造大理石用組成物及びその硬化方法
SE9904080D0 (sv) * 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
SG98433A1 (en) * 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184095A2 (de) * 1984-11-27 1986-06-11 ESPE Stiftung & Co Produktions- und Vertriebs KG Bisacylphosphinoxide, ihre Herstellung und Verwendung
EP0615980A2 (de) * 1993-03-18 1994-09-21 Ciba-Geigy Ag Härtung von Bisacylphosphinoxid-Photoinitiatoren enthaltenden Zusammensetzungen
GB2292740A (en) * 1994-09-02 1996-03-06 Ciba Geigy Ag Alkoxyphenyl-substituted bisacylphosphine oxides
GB2310855A (en) * 1996-03-04 1997-09-10 Ciba Geigy Ag Alkylphenylbisacylphosphine oxides and photoinitiator mixtures
WO2000032612A1 (en) * 1998-11-30 2000-06-08 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphines and derivatives

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
ISSLEIB K. ET AL.: "Sekundäre Carbonsäurephosphide R-CO-PH-R'", ZEITSCHRIFT FUR NATURFORSCHUNG, TEIL B: ANORGANISCHE CHEMIE, ORGANISCHE CHEMIE., vol. 22b, no. 7, 1967, VERLAG DER ZEITSCHRIFT FUR NATURFORSCHUNG. TUBINGEN., DE, pages 784 - 785, XP001053016, ISSN: 0932-0776 *
LIOTTA C. L. ET AL.: "The synthesis and reactions of potassium benzoylphosphide, benzoylphosphine and benzoylmethyl- phosphine", TETRAHEDRON LETTERS., vol. 25, no. 12, 1984, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM., NL, pages 1249 - 1252, XP002191367, ISSN: 0040-4039 *

Also Published As

Publication number Publication date
CN1308081A (zh) 2001-08-15
JP2011140524A (ja) 2011-07-21
FR2804683B1 (fr) 2005-04-08
US6579663B2 (en) 2003-06-17
FR2804683A1 (fr) 2001-08-10
JP2001270894A (ja) 2001-10-02
CN1200943C (zh) 2005-05-11
ES2195706B1 (es) 2005-03-01
KR20010083161A (ko) 2001-08-31
BE1013960A3 (fr) 2003-01-14
CA2334291A1 (en) 2001-08-08
DE10105046A1 (de) 2001-08-09
TW555762B (en) 2003-10-01
ES2195706A1 (es) 2003-12-01
GB0102398D0 (en) 2001-03-14
ITMI20010242A1 (it) 2002-08-07
GB2360283A (en) 2001-09-19
GB2360283B (en) 2002-08-21
KR100769838B1 (ko) 2007-10-24
US20020107413A1 (en) 2002-08-08
NL1017310A1 (nl) 2001-08-09
US6399805B2 (en) 2002-06-04
US20010031898A1 (en) 2001-10-18
BR0100910A (pt) 2001-10-02

Similar Documents

Publication Publication Date Title
NL1017310C2 (nl) Organonmetallieke monoacylarylfosfinen.
US6737549B2 (en) Organometallic monoacylalkylphosphines
US20040204613A1 (en) Bathochromic mono-and bis-acylphosphine oxides and sulfides and their use as photoinitiators
US5723512A (en) Dimeric bisacylphosphines, oxides and sulfides
CN113518805B (zh) 光引发剂
AU682793B2 (en) Novel acylphosphine oxides
US7109250B2 (en) Multimer forms of acylphosphines and their derivatives
MXPA01001448A (en) Organometallic monoacylarylphosphines

Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20020416

PD2B A search report has been drawn up
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20020416

VD1 Lapsed due to non-payment of the annual fee

Effective date: 20080901