BR0100910A - Monoacilarilfosfinas organometálicas - Google Patents

Monoacilarilfosfinas organometálicas

Info

Publication number
BR0100910A
BR0100910A BR0100910-9A BR0100910A BR0100910A BR 0100910 A BR0100910 A BR 0100910A BR 0100910 A BR0100910 A BR 0100910A BR 0100910 A BR0100910 A BR 0100910A
Authority
BR
Brazil
Prior art keywords
alkyl
once
hydrogen
unsubstituted
phenyl
Prior art date
Application number
BR0100910-9A
Other languages
English (en)
Portuguese (pt)
Inventor
Jean-Pierre Wolf
Beat Michael Aebli
Gebhard Hug
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR0100910A publication Critical patent/BR0100910A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62—Photochemical radical initiators
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6521—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Animal Behavior & Ethology (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Biophysics (AREA)
  • Plastic & Reconstructive Surgery (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Methods (AREA)
  • Materials For Photolithography (AREA)
BR0100910-9A 2000-02-08 2001-02-08 Monoacilarilfosfinas organometálicas BR0100910A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH2552000 2000-02-08

Publications (1)

Publication Number Publication Date
BR0100910A true BR0100910A (pt) 2001-10-02

Family

ID=4471003

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0100910-9A BR0100910A (pt) 2000-02-08 2001-02-08 Monoacilarilfosfinas organometálicas

Country Status (14)

Country Link
US (2) US6399805B2 (https=)
JP (2) JP2001270894A (https=)
KR (1) KR100769838B1 (https=)
CN (1) CN1200943C (https=)
BE (1) BE1013960A3 (https=)
BR (1) BR0100910A (https=)
CA (1) CA2334291A1 (https=)
DE (1) DE10105046A1 (https=)
ES (1) ES2195706B1 (https=)
FR (1) FR2804683B1 (https=)
GB (1) GB2360283B (https=)
IT (1) ITMI20010242A1 (https=)
NL (1) NL1017310C2 (https=)
TW (1) TW555762B (https=)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4265871B2 (ja) 1998-11-30 2009-05-20 チバ ホールディング インコーポレーテッド アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法
DK1230276T3 (da) 1999-10-20 2006-03-20 Ciba Sc Holding Ag Fotoinitiatorformuleringer
GB2365430B (en) 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
US20030164580A1 (en) * 2000-09-14 2003-09-04 Karsten Rinker Acylphosphine oxide photoinitiators in methacrylate casting resins
ES2324983T3 (es) * 2001-08-21 2009-08-21 Ciba Holding Inc. Oxidos y sulfuros de mono- y bis- acilfosfina batocromicos y su utilizacion como fotoiniciadores.
CN1589276A (zh) * 2001-11-20 2005-03-02 西巴特殊化学品控股有限公司 酰基膦及其衍生物的多聚体
DE10206096A1 (de) * 2002-02-13 2003-08-14 Basf Ag Mono- und Bisacylphosphinderivate
BR0312133A (pt) * 2002-06-11 2005-04-05 Ciba Sc Holding Ag Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável
JP5008978B2 (ja) * 2003-05-23 2012-08-22 チバ ホールディング インコーポレーテッド 強力接着性表面被覆
WO2005014605A1 (en) * 2003-07-18 2005-02-17 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphanes and derivatives thereof
EP1699385B1 (en) * 2003-12-29 2012-10-24 Abbott Medical Optics Inc. Intraocular lenses having a visible light-selective-transmissive-region
US20050154109A1 (en) * 2004-01-12 2005-07-14 Minyu Li Floor finish with lightening agent
CA2564921C (en) * 2004-04-30 2015-03-24 Advanced Medical Optics, Inc. Ophthalmic devices having a highly selective violet light transmissive filter and related methods
ATE525664T1 (de) * 2004-11-22 2011-10-15 Abbott Medical Optics Inc Copolymerisierbare methin- und anthrachinon- verbindungen und artikel damit
AU2005309835B2 (en) * 2004-11-22 2011-08-04 Johnson & Johnson Surgical Vision, Inc. Copolymerizable azo compounds and articles containing them
EP1814891B1 (en) * 2004-11-23 2011-01-26 Basf Se Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes
GB2422678B (en) * 2005-01-25 2009-03-11 Photocentric Ltd Method of making a photopolymer plate
JP2006252787A (ja) * 2005-03-08 2006-09-21 Toppan Printing Co Ltd 有機ｅｌ素子製造方法および有機ｅｌ素子
JP5232365B2 (ja) * 2005-06-01 2013-07-10 富士フイルム株式会社 フッ素化光重合開始剤を含む光学フィルム、反射防止フィルム、偏光板、およびそれを用いた画像表示装置
WO2010054471A1 (en) 2008-11-17 2010-05-20 Sierra Wireless, Inc. Method and apparatus for network port and network address translation
US8228848B2 (en) * 2008-11-17 2012-07-24 Sierra Wireless, Inc. Method and apparatus for facilitating push communication across a network boundary
US8924486B2 (en) * 2009-02-12 2014-12-30 Sierra Wireless, Inc. Method and system for aggregating communications
WO2010121387A1 (en) * 2009-04-20 2010-10-28 ETH Zürich Polymer nanoparticles
CN102471150B (zh) * 2010-06-30 2014-05-07 帝斯曼知识产权资产管理有限公司 D1492液体双酰基氧化膦光引发剂及其在可辐射固化组合物中的用途
WO2012106820A1 (en) 2011-02-08 2012-08-16 Sierra Wireless, Inc. Method and system for forwarding data between network devices
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
GB201213163D0 (en) * 2012-07-24 2012-09-05 Lambson Ltd Photopolymerisation processes and novel compounds therefor
JP6445438B2 (ja) * 2012-10-01 2018-12-26 イーティーエイチ・チューリッヒ アシルホスファン類の製造方法
CN105051087A (zh) 2012-12-18 2015-11-11 巴斯夫欧洲公司 基于萘二酰亚胺-亚乙烯基-低聚噻吩-亚乙烯基聚合物的半导体材料
WO2014095724A1 (en) * 2012-12-19 2014-06-26 Basf Se Derivatives of bisacylphosphinic acid, their preparation and use as photoinitiators
KR102575896B1 (ko) 2016-01-11 2023-09-07 헨켈 아게 운트 코. 카게아아 실리콘-상용성 화합물
EP3409680B1 (en) * 2017-05-30 2021-01-06 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
CN107082787B (zh) * 2017-06-09 2019-05-17 江苏富比亚化学品有限公司 一种苯甲酰基苯基次膦酸及其衍生物的制备方法
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
WO2019037016A1 (en) * 2017-08-24 2019-02-28 Henkel IP & Holding GmbH SILICONE POLYMER PHOTO-INITIATOR AND USES THEREOF
CN111527170B (zh) 2017-12-27 2022-12-09 汉高股份有限及两合公司 光学透明的压敏粘合剂及其用途
EP3861002B1 (en) 2018-10-01 2023-11-29 Dow Toray Co., Ltd. Organosilicon compound, method for producing thereof, and use thereof
US12517285B2 (en) * 2020-05-14 2026-01-06 3M Innovative Properties Company Multilayer optical films comprising at least one fluorinated (co)polymer layer made using a fluorinated photoinitiator, and methods of making and using the same
KR102651787B1 (ko) * 2021-07-14 2024-03-26 주식회사 엘지에너지솔루션 리튬 이차전지용 비수계 전해액 및 이를 포함하는 리튬 이차전지
CN114349788B (zh) * 2021-12-30 2023-06-20 华南理工大学 一种光引发剂及其制备方法与应用

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2830928A1 (de) * 1978-07-14 1980-01-31 Basf Ag Lichthaertbare form-, traenk- und ueberzugsmassen
DE3020092A1 (de) * 1980-05-27 1981-12-10 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen und ihre verwendung
DE3114341A1 (de) * 1981-04-09 1982-11-11 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen, ihre herstellung und verwendung
DE3133419A1 (de) * 1981-08-24 1983-03-10 Basf Ag, 6700 Ludwigshafen Acylphosphinoxidverbindungen und ihre verwendung
DE3443221A1 (de) * 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
WO1988008434A1 (fr) * 1987-05-01 1988-11-03 Mitsubishi Rayon Co., Ltd. Composition durcissable par radiation actinique pour polymerisation par coulees et produit de polymerisation par coulees
JPH01309001A (ja) * 1988-02-15 1989-12-13 Mitsubishi Rayon Co Ltd プラスチックレンズ材料
US5218009A (en) 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
ES2098260T3 (es) * 1989-08-04 1997-05-01 Ciba Geigy Ag Oxidos de mono- y diacilfosfina.
RU2091385C1 (ru) 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
DE4230555A1 (de) * 1992-09-12 1994-03-17 Basf Ag Verfahren zur Herstellung von alpha-Carbonylphosphinoxiden
CA2143607A1 (en) * 1992-09-30 1994-04-14 Peter J. Gorzalski Pigmented compositions and methods for producing radiation curable coatings of very low gloss
ZA941879B (en) 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators
TW381106B (en) * 1994-09-02 2000-02-01 Ciba Sc Holding Ag Alkoxyphenyl-substituted bisacylphosphine oxides
CH691970A5 (de) * 1996-03-04 2001-12-14 Ciba Sc Holding Ag Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.
JPH09241312A (ja) * 1996-03-08 1997-09-16 Showa Denko Kk 光硬化性人造大理石用組成物及びその硬化方法
JP4265871B2 (ja) 1998-11-30 2009-05-20 チバ ホールディング インコーポレーテッド アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法
SE9904080D0 (sv) * 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
SG98433A1 (en) * 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors

Also Published As

Publication number Publication date
JP2001270894A (ja) 2001-10-02
GB0102398D0 (en) 2001-03-14
ITMI20010242A1 (it) 2002-08-07
DE10105046A1 (de) 2001-08-09
US6579663B2 (en) 2003-06-17
KR20010083161A (ko) 2001-08-31
FR2804683A1 (fr) 2001-08-10
CN1200943C (zh) 2005-05-11
GB2360283A (en) 2001-09-19
US20010031898A1 (en) 2001-10-18
CA2334291A1 (en) 2001-08-08
NL1017310C2 (nl) 2002-06-18
FR2804683B1 (fr) 2005-04-08
JP2011140524A (ja) 2011-07-21
US20020107413A1 (en) 2002-08-08
ES2195706B1 (es) 2005-03-01
NL1017310A1 (nl) 2001-08-09
TW555762B (en) 2003-10-01
ES2195706A1 (es) 2003-12-01
CN1308081A (zh) 2001-08-15
GB2360283B (en) 2002-08-21
BE1013960A3 (fr) 2003-01-14
KR100769838B1 (ko) 2007-10-24
US6399805B2 (en) 2002-06-04

Similar Documents

Publication Publication Date Title
BR0100910A (pt) Monoacilarilfosfinas organometálicas
CY1124503T1 (el) Βοριοφθαλιδια για θεραπευτικη χρηση
IL160304A (en) Compounds and composition for activating peroxisome proliferators-responsive receptor ??
BR9714787A (pt) Compostos de 4- fenilpiperidina e processo para sua preparação
BR0213207A (pt) remodelagem e glicoconjugação de peptìdeos
DK1379239T3 (da) N(2-aryl-ethyl)-benzyl-aminer som antagonister af 5 HT6 receptoren
CY1116145T1 (el) S-φθορομεθυλεστερας 6.αλφα.,9.αλφα-διφθορο-17.αλφα.-'(2-φουρανυλκαρβοξυλ) οξυ]-11.βητα.-υδροξυ-16.αλφα.-μεθυλ-3-οξο-ανδροστ-1,4-διεν-17-καρβοθειοτικου οξεος ως αντιφλεγμονωδης παραγοντας
DK0792264T3 (da) Som hypocholesterolemiske midler velegnede, svovlsubstituerede azetidinonforbindelser
BR0005866A (pt) Composição de resina fotossensìvel
SG161302A1 (en) DERIVATIVES OF 4-(2-AMINO-1-HYDROXYETHYL)PHENOL AS AGONISTS OF THE ss2 ADRENERGIC RECEPTOR
NO20006323D0 (no) Glykopeptidderivater og farmasöytiske sammensetninger som inneholder disse
DE60235900D1 (de) Osuppressivum
HRP20030383B1 (hr) Laktamski spoj
BR9813989A (pt) Composto, processo para prepará-lo, uso do mesmo, composição farmacêutica, e, processo para o tratamento de um paciente sofrendo de uma condição
SE0302760D0 (sv) New compounds
CY1113054T1 (el) Παραγωγα διαμινης
EA200300933A1 (ru) Новое применение соединения из класса пептидов для лечения аллодинии или других различных типов хронической или фантомной боли
EP1354880A4 (en) HALOGEN COMPOUNDS HAVING AGONISM TOWARDS THROMBOPOIETIN RECEPTOR
BR0210028A (pt) Agentes antibacterianos
DK1254134T3 (da) Derivater af 1,3-dihydro-2H-indol-2-on og deres anvendelse som ligander for argininvasopressinreceptorerne V1B eller V1B og V1A
CO5550439A2 (es) Compuestos derivados de arilsulfonil-piperazina que tienen afinidad al receptor 5-ht6 y composiciones farmaceuticas que los contienen
DE602005027213D1 (de) Neue imidazolidinderivate
ATE453389T1 (de) Bestimmte pharmazeutisch wertvolle substituierte aminoalkyl-heterocyclen
BR0314515A (pt) Novas formulações farmacêuticas de modafinil
MXPA04003935A (es) Derivados de piridina como bloqueadores del subtipo de receptores n-metil-d-aspartato.

Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements