DE10105046A1 - Metallorganische Monoacyl-Aryl-Phosphine - Google Patents

Metallorganische Monoacyl-Aryl-Phosphine

Info

Publication number
DE10105046A1
DE10105046A1 DE10105046A DE10105046A DE10105046A1 DE 10105046 A1 DE10105046 A1 DE 10105046A1 DE 10105046 A DE10105046 A DE 10105046A DE 10105046 A DE10105046 A DE 10105046A DE 10105046 A1 DE10105046 A1 DE 10105046A1
Authority
DE
Germany
Prior art keywords
phenyl
alkyl
lithium
substituted
phosphine oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10105046A
Other languages
German (de)
English (en)
Inventor
Jean-Pierre Wolf
Beat Michael Aebli
Gebhard Hug
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of DE10105046A1 publication Critical patent/DE10105046A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00Preparations for dentistry
    • A61K6/60Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62Photochemical radical initiators
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00Preparations for dentistry
    • A61K6/80Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/5036Phosphines containing the structure -C(=X)-P or NC-P
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6521Six-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0755Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/124Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Animal Behavior & Ethology (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Biophysics (AREA)
  • Plastic & Reconstructive Surgery (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Methods (AREA)
  • Materials For Photolithography (AREA)
DE10105046A 2000-02-08 2001-02-05 Metallorganische Monoacyl-Aryl-Phosphine Withdrawn DE10105046A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH2552000 2000-02-08

Publications (1)

Publication Number Publication Date
DE10105046A1 true DE10105046A1 (de) 2001-08-09

Family

ID=4471003

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10105046A Withdrawn DE10105046A1 (de) 2000-02-08 2001-02-05 Metallorganische Monoacyl-Aryl-Phosphine

Country Status (14)

Country Link
US (2) US6399805B2 (https=)
JP (2) JP2001270894A (https=)
KR (1) KR100769838B1 (https=)
CN (1) CN1200943C (https=)
BE (1) BE1013960A3 (https=)
BR (1) BR0100910A (https=)
CA (1) CA2334291A1 (https=)
DE (1) DE10105046A1 (https=)
ES (1) ES2195706B1 (https=)
FR (1) FR2804683B1 (https=)
GB (1) GB2360283B (https=)
IT (1) ITMI20010242A1 (https=)
NL (1) NL1017310C2 (https=)
TW (1) TW555762B (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003044030A1 (en) * 2001-11-20 2003-05-30 Ciba Specialty Chemicals Holding Inc. Multimer forms of acylphosphines and their derivatives
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
EP3409680A1 (en) * 2017-05-30 2018-12-05 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
EP4178002A4 (en) * 2021-07-14 2024-04-10 LG Energy Solution, Ltd. NON-AQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY THEREOF

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4265871B2 (ja) 1998-11-30 2009-05-20 チバ ホールディング インコーポレーテッド アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法
DK1230276T3 (da) 1999-10-20 2006-03-20 Ciba Sc Holding Ag Fotoinitiatorformuleringer
GB2365430B (en) 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
US20030164580A1 (en) * 2000-09-14 2003-09-04 Karsten Rinker Acylphosphine oxide photoinitiators in methacrylate casting resins
ES2324983T3 (es) * 2001-08-21 2009-08-21 Ciba Holding Inc. Oxidos y sulfuros de mono- y bis- acilfosfina batocromicos y su utilizacion como fotoiniciadores.
DE10206096A1 (de) * 2002-02-13 2003-08-14 Basf Ag Mono- und Bisacylphosphinderivate
BR0312133A (pt) * 2002-06-11 2005-04-05 Ciba Sc Holding Ag Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável
JP5008978B2 (ja) * 2003-05-23 2012-08-22 チバ ホールディング インコーポレーテッド 強力接着性表面被覆
WO2005014605A1 (en) * 2003-07-18 2005-02-17 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphanes and derivatives thereof
EP1699385B1 (en) * 2003-12-29 2012-10-24 Abbott Medical Optics Inc. Intraocular lenses having a visible light-selective-transmissive-region
US20050154109A1 (en) * 2004-01-12 2005-07-14 Minyu Li Floor finish with lightening agent
CA2564921C (en) * 2004-04-30 2015-03-24 Advanced Medical Optics, Inc. Ophthalmic devices having a highly selective violet light transmissive filter and related methods
ATE525664T1 (de) * 2004-11-22 2011-10-15 Abbott Medical Optics Inc Copolymerisierbare methin- und anthrachinon- verbindungen und artikel damit
AU2005309835B2 (en) * 2004-11-22 2011-08-04 Johnson & Johnson Surgical Vision, Inc. Copolymerizable azo compounds and articles containing them
EP1814891B1 (en) * 2004-11-23 2011-01-26 Basf Se Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes
GB2422678B (en) * 2005-01-25 2009-03-11 Photocentric Ltd Method of making a photopolymer plate
JP2006252787A (ja) * 2005-03-08 2006-09-21 Toppan Printing Co Ltd 有機el素子製造方法および有機el素子
JP5232365B2 (ja) * 2005-06-01 2013-07-10 富士フイルム株式会社 フッ素化光重合開始剤を含む光学フィルム、反射防止フィルム、偏光板、およびそれを用いた画像表示装置
WO2010054471A1 (en) 2008-11-17 2010-05-20 Sierra Wireless, Inc. Method and apparatus for network port and network address translation
US8228848B2 (en) * 2008-11-17 2012-07-24 Sierra Wireless, Inc. Method and apparatus for facilitating push communication across a network boundary
US8924486B2 (en) * 2009-02-12 2014-12-30 Sierra Wireless, Inc. Method and system for aggregating communications
WO2010121387A1 (en) * 2009-04-20 2010-10-28 ETH Zürich Polymer nanoparticles
CN102471150B (zh) * 2010-06-30 2014-05-07 帝斯曼知识产权资产管理有限公司 D1492液体双酰基氧化膦光引发剂及其在可辐射固化组合物中的用途
WO2012106820A1 (en) 2011-02-08 2012-08-16 Sierra Wireless, Inc. Method and system for forwarding data between network devices
GB201213163D0 (en) * 2012-07-24 2012-09-05 Lambson Ltd Photopolymerisation processes and novel compounds therefor
JP6445438B2 (ja) * 2012-10-01 2018-12-26 イーティーエイチ・チューリッヒ アシルホスファン類の製造方法
CN105051087A (zh) 2012-12-18 2015-11-11 巴斯夫欧洲公司 基于萘二酰亚胺-亚乙烯基-低聚噻吩-亚乙烯基聚合物的半导体材料
WO2014095724A1 (en) * 2012-12-19 2014-06-26 Basf Se Derivatives of bisacylphosphinic acid, their preparation and use as photoinitiators
KR102575896B1 (ko) 2016-01-11 2023-09-07 헨켈 아게 운트 코. 카게아아 실리콘-상용성 화합물
CN107082787B (zh) * 2017-06-09 2019-05-17 江苏富比亚化学品有限公司 一种苯甲酰基苯基次膦酸及其衍生物的制备方法
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
WO2019037016A1 (en) * 2017-08-24 2019-02-28 Henkel IP & Holding GmbH SILICONE POLYMER PHOTO-INITIATOR AND USES THEREOF
CN111527170B (zh) 2017-12-27 2022-12-09 汉高股份有限及两合公司 光学透明的压敏粘合剂及其用途
EP3861002B1 (en) 2018-10-01 2023-11-29 Dow Toray Co., Ltd. Organosilicon compound, method for producing thereof, and use thereof
US12517285B2 (en) * 2020-05-14 2026-01-06 3M Innovative Properties Company Multilayer optical films comprising at least one fluorinated (co)polymer layer made using a fluorinated photoinitiator, and methods of making and using the same
CN114349788B (zh) * 2021-12-30 2023-06-20 华南理工大学 一种光引发剂及其制备方法与应用

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2830928A1 (de) * 1978-07-14 1980-01-31 Basf Ag Lichthaertbare form-, traenk- und ueberzugsmassen
DE3020092A1 (de) * 1980-05-27 1981-12-10 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen und ihre verwendung
DE3114341A1 (de) * 1981-04-09 1982-11-11 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen, ihre herstellung und verwendung
DE3133419A1 (de) * 1981-08-24 1983-03-10 Basf Ag, 6700 Ludwigshafen Acylphosphinoxidverbindungen und ihre verwendung
DE3443221A1 (de) * 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
WO1988008434A1 (fr) * 1987-05-01 1988-11-03 Mitsubishi Rayon Co., Ltd. Composition durcissable par radiation actinique pour polymerisation par coulees et produit de polymerisation par coulees
JPH01309001A (ja) * 1988-02-15 1989-12-13 Mitsubishi Rayon Co Ltd プラスチックレンズ材料
US5218009A (en) 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
ES2098260T3 (es) * 1989-08-04 1997-05-01 Ciba Geigy Ag Oxidos de mono- y diacilfosfina.
RU2091385C1 (ru) 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
DE4230555A1 (de) * 1992-09-12 1994-03-17 Basf Ag Verfahren zur Herstellung von alpha-Carbonylphosphinoxiden
CA2143607A1 (en) * 1992-09-30 1994-04-14 Peter J. Gorzalski Pigmented compositions and methods for producing radiation curable coatings of very low gloss
ZA941879B (en) 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators
TW381106B (en) * 1994-09-02 2000-02-01 Ciba Sc Holding Ag Alkoxyphenyl-substituted bisacylphosphine oxides
CH691970A5 (de) * 1996-03-04 2001-12-14 Ciba Sc Holding Ag Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.
JPH09241312A (ja) * 1996-03-08 1997-09-16 Showa Denko Kk 光硬化性人造大理石用組成物及びその硬化方法
JP4265871B2 (ja) 1998-11-30 2009-05-20 チバ ホールディング インコーポレーテッド アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法
SE9904080D0 (sv) * 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
SG98433A1 (en) * 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003044030A1 (en) * 2001-11-20 2003-05-30 Ciba Specialty Chemicals Holding Inc. Multimer forms of acylphosphines and their derivatives
US7109250B2 (en) 2001-11-20 2006-09-19 Ciba Specialty Chemicals Corp. Multimer forms of acylphosphines and their derivatives
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
EP3409680A1 (en) * 2017-05-30 2018-12-05 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
WO2018219994A1 (en) * 2017-05-30 2018-12-06 Igm Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
EP4178002A4 (en) * 2021-07-14 2024-04-10 LG Energy Solution, Ltd. NON-AQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY THEREOF

Also Published As

Publication number Publication date
JP2001270894A (ja) 2001-10-02
GB0102398D0 (en) 2001-03-14
ITMI20010242A1 (it) 2002-08-07
US6579663B2 (en) 2003-06-17
KR20010083161A (ko) 2001-08-31
FR2804683A1 (fr) 2001-08-10
CN1200943C (zh) 2005-05-11
GB2360283A (en) 2001-09-19
US20010031898A1 (en) 2001-10-18
CA2334291A1 (en) 2001-08-08
NL1017310C2 (nl) 2002-06-18
FR2804683B1 (fr) 2005-04-08
JP2011140524A (ja) 2011-07-21
US20020107413A1 (en) 2002-08-08
BR0100910A (pt) 2001-10-02
ES2195706B1 (es) 2005-03-01
NL1017310A1 (nl) 2001-08-09
TW555762B (en) 2003-10-01
ES2195706A1 (es) 2003-12-01
CN1308081A (zh) 2001-08-15
GB2360283B (en) 2002-08-21
BE1013960A3 (fr) 2003-01-14
KR100769838B1 (ko) 2007-10-24
US6399805B2 (en) 2002-06-04

Similar Documents

Publication Publication Date Title
DE10105046A1 (de) Metallorganische Monoacyl-Aryl-Phosphine
DE10127171A1 (de) Metallorganische Monoacyl-Alkyl-Phosphine
DE60304035T2 (de) Einbaufähiger photoinitiator
AT402298B (de) Alkoxyphenyl-substituierte bisbenzoylphosphinoxide
AT404729B (de) Alkylphenylbisacylphosphinoxide und photoinitiatormischungen
EP0826692B1 (de) Molekülkomplexverbindungen als Photoinitiatoren
EP1423757B1 (en) Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators
DE60028738T2 (de) Oximderivate und ihre verwendung als photoinitiatoren
EP0670323B1 (de) Dimere Bisacylphosphine, -oxide und -sulfide
EP1446410A1 (en) Multimer forms of acylphosphines and their derivatives
CH694732A5 (de) Metallorganische Monoacyl-Aryl-Phosphine.
CH695057A5 (de) Metallorganische Monoacyl-Alkyl-Phosphine.
CH689774A5 (de) Alkoxyphenyl-substituierte Bisacylphosphinoxide.
MXPA01001448A (en) Organometallic monoacylarylphosphines

Legal Events

Date Code Title Description
8128 New person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8110 Request for examination paragraph 44
8127 New person/name/address of the applicant

Owner name: CIBA HOLDING INC., BASEL, CH

8128 New person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC

R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: C07F0009530000

Ipc: C07F0019000000

Effective date: 20110608

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20130903