NL1013684C2 - Verknopingsmiddel voor fotolaklaag, en fotolaklaagsamenstelling welke dezelfde omvat. - Google Patents

Verknopingsmiddel voor fotolaklaag, en fotolaklaagsamenstelling welke dezelfde omvat. Download PDF

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Publication number
NL1013684C2
NL1013684C2 NL1013684A NL1013684A NL1013684C2 NL 1013684 C2 NL1013684 C2 NL 1013684C2 NL 1013684 A NL1013684 A NL 1013684A NL 1013684 A NL1013684 A NL 1013684A NL 1013684 C2 NL1013684 C2 NL 1013684C2
Authority
NL
Netherlands
Prior art keywords
branched
straight
chemical formula
hydroxyl group
photoresist
Prior art date
Application number
NL1013684A
Other languages
English (en)
Dutch (nl)
Other versions
NL1013684A1 (nl
Inventor
Jae Chang Jung
Ki Ho Baik
Keun Kyu Kong
Myoung Soo Kim
Hyoung Gi Kim
Hyeong Soo Kim
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-1998-0051356A external-priority patent/KR100400297B1/ko
Priority claimed from KR1019990005825A external-priority patent/KR20000056474A/ko
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of NL1013684A1 publication Critical patent/NL1013684A1/xx
Application granted granted Critical
Publication of NL1013684C2 publication Critical patent/NL1013684C2/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
    • C07D407/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings
    • C07D407/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
    • C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
    • C07D317/12—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/04—1,3-Dioxanes; Hydrogenated 1,3-dioxanes
    • C07D319/06—1,3-Dioxanes; Hydrogenated 1,3-dioxanes not condensed with other rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1013684A 1998-11-27 1999-11-26 Verknopingsmiddel voor fotolaklaag, en fotolaklaagsamenstelling welke dezelfde omvat. NL1013684C2 (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-1998-0051356A KR100400297B1 (ko) 1998-11-27 1998-11-27 신규의포토레지스트가교제및이를이용한포토레지스트조성물
KR19980051356 1998-11-27
KR19990005825 1999-02-22
KR1019990005825A KR20000056474A (ko) 1999-02-22 1999-02-22 신규의 포토레지스트 가교제 및 이를 이용한 포토레지스트 조성물

Publications (2)

Publication Number Publication Date
NL1013684A1 NL1013684A1 (nl) 2000-05-30
NL1013684C2 true NL1013684C2 (nl) 2001-05-28

Family

ID=36597853

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1013684A NL1013684C2 (nl) 1998-11-27 1999-11-26 Verknopingsmiddel voor fotolaklaag, en fotolaklaagsamenstelling welke dezelfde omvat.

Country Status (9)

Country Link
US (1) US6482565B1 (ja)
JP (1) JP3732695B2 (ja)
CN (1) CN1162752C (ja)
DE (1) DE19956532A1 (ja)
FR (1) FR2786492B1 (ja)
GB (1) GB2344105B (ja)
IT (1) IT1308660B1 (ja)
NL (1) NL1013684C2 (ja)
TW (1) TWI234567B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0019251D0 (en) * 2000-08-04 2000-09-27 Lintfield Limited Photoinitiated reactions
JP4790153B2 (ja) * 2000-09-01 2011-10-12 富士通株式会社 ネガ型レジスト組成物、レジストパターンの形成方法及び電子デバイスの製造方法
KR100749494B1 (ko) * 2001-04-03 2007-08-14 삼성에스디아이 주식회사 화학증폭형 네가티브 포토레지스트용 중합체 및 포토레지스트 조성물
JP2005008757A (ja) * 2003-06-19 2005-01-13 Daicel Chem Ind Ltd 重合性単量体、高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法
JP4393258B2 (ja) * 2003-08-29 2010-01-06 富士フイルム株式会社 画像記録材料及び平版印刷版
KR100680405B1 (ko) * 2003-11-19 2007-02-08 주식회사 하이닉스반도체 Ｅｕｖ용 포토레지스트 조성물 및 이를 이용한포토레지스트 패턴 형성 방법
KR101156975B1 (ko) * 2005-06-24 2012-06-20 주식회사 동진쎄미켐 포토레지스트용 폴리머 및 이를 포함하는 포토레지스트 조성물
JP4882788B2 (ja) * 2007-02-21 2012-02-22 Ｊｓｒ株式会社 感放射線性樹脂組成物、スペーサーとその製法および液晶表示素子
GB2476976A (en) 2010-01-18 2011-07-20 Lintfield Ltd Protected aryl ketones and their use as photoinitiators
CN101943862B (zh) * 2010-09-17 2012-05-23 同济大学 一类以二苯乙烯为主体的硫鎓盐类光生酸剂及其制备方法
EP2472326A1 (en) * 2010-12-31 2012-07-04 Rohm and Haas Electronic Materials LLC Polymers, photoresist compositions and methods of forming photolithographic patterns
EP2472325A1 (en) * 2010-12-31 2012-07-04 Rohm and Haas Electronic Materials LLC Polymers, photoresist compositions and methods of forming photolithographic patterns
EP2472324A1 (en) * 2010-12-31 2012-07-04 Rohm and Haas Electronic Materials LLC Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
JP6215586B2 (ja) * 2012-11-02 2017-10-18 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置
JP6458455B2 (ja) * 2014-11-06 2019-01-30 Jsr株式会社 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物
JP6981767B2 (ja) * 2016-05-13 2021-12-17 住友化学株式会社 化合物

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB922747A (en) * 1960-02-25 1963-04-03 Du Pont Improvements relating to organic film-forming compositions
US3468857A (en) * 1965-10-04 1969-09-23 Ashland Oil Inc Thermosetting polymers of unsaturated acetals
DE3714276A1 (de) * 1987-04-29 1988-11-17 Hoechst Ag Hydrophile, vernetzte polymerisate, verfahren zu ihrer herstellung und ihre verwendung
EP0347381A1 (de) * 1988-06-13 1989-12-20 Ciba-Geigy Ag Ungesättigte beta-Ketoesteracetale und ihre Anwendungen
EP0422888A2 (en) * 1989-10-11 1991-04-17 Fuji Photo Film Co., Ltd. An electrophotographic lithographic printing plate precursor
EP0875789A1 (en) * 1997-04-30 1998-11-04 Wako Pure Chemical Industries Ltd Resist composition and its use for forming pattern

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05216294A (ja) * 1992-02-04 1993-08-27 Fuji Photo Film Co Ltd 平版印刷版の製造方法
US5412041A (en) * 1994-07-11 1995-05-02 Rohm And Haas Company Method for forming (meth)acrolein-containing polymers
JP3549682B2 (ja) * 1996-09-13 2004-08-04 株式会社クラレ 高耐湿熱性ポリビニルアルコール系繊維
JP3725662B2 (ja) * 1997-06-30 2005-12-14 新日本製鐵株式会社 リチウム二次電池負極用高黒鉛化炭素粉末
JPH11315075A (ja) 1998-02-25 1999-11-16 Nippon Shokubai Co Ltd ２―アルケニル―１，３―ジオキソ化合物の製造方法
US5998092A (en) * 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
US6060212A (en) * 1998-06-11 2000-05-09 Clariant Finance (Bvi) Limited 193 nm positive-working photoresist composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB922747A (en) * 1960-02-25 1963-04-03 Du Pont Improvements relating to organic film-forming compositions
US3468857A (en) * 1965-10-04 1969-09-23 Ashland Oil Inc Thermosetting polymers of unsaturated acetals
DE3714276A1 (de) * 1987-04-29 1988-11-17 Hoechst Ag Hydrophile, vernetzte polymerisate, verfahren zu ihrer herstellung und ihre verwendung
EP0347381A1 (de) * 1988-06-13 1989-12-20 Ciba-Geigy Ag Ungesättigte beta-Ketoesteracetale und ihre Anwendungen
EP0422888A2 (en) * 1989-10-11 1991-04-17 Fuji Photo Film Co., Ltd. An electrophotographic lithographic printing plate precursor
EP0875789A1 (en) * 1997-04-30 1998-11-04 Wako Pure Chemical Industries Ltd Resist composition and its use for forming pattern

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MASLINSKA-SOLICH ET AL.: "Studies on Co(II) and Mn(II) complexes of some maleic anhydride copolymers", REACTIVE POLYMERS (ELSEVIER SCIENCE PUBLISHERS B. V., AMSTERDAM), vol. 18, no. 2, 1992, pages 159 - 166, XP002158196 *

Also Published As

Publication number Publication date
JP3732695B2 (ja) 2006-01-05
GB2344105A (en) 2000-05-31
JP2000162772A (ja) 2000-06-16
ITTO991043A0 (it) 1999-11-26
FR2786492B1 (fr) 2003-08-22
IT1308660B1 (it) 2002-01-09
GB2344105B (en) 2004-06-09
NL1013684A1 (nl) 2000-05-30
GB9927638D0 (en) 2000-01-19
DE19956532A1 (de) 2000-05-31
CN1255653A (zh) 2000-06-07
ITTO991043A1 (it) 2001-05-26
TWI234567B (en) 2005-06-21
US6482565B1 (en) 2002-11-19
FR2786492A1 (fr) 2000-06-02
CN1162752C (zh) 2004-08-18

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Effective date: 20100601