NL1012840C2 - Polymeren om te worden toegepast in antireflectiedeklagen en werkwijzen ter bereiding hiervan. - Google Patents
Polymeren om te worden toegepast in antireflectiedeklagen en werkwijzen ter bereiding hiervan. Download PDFInfo
- Publication number
- NL1012840C2 NL1012840C2 NL1012840A NL1012840A NL1012840C2 NL 1012840 C2 NL1012840 C2 NL 1012840C2 NL 1012840 A NL1012840 A NL 1012840A NL 1012840 A NL1012840 A NL 1012840A NL 1012840 C2 NL1012840 C2 NL 1012840C2
- Authority
- NL
- Netherlands
- Prior art keywords
- formula
- general formula
- fluorene
- anthracene
- carboxylic acid
- Prior art date
Links
- 239000006117 anti-reflective coating Substances 0.000 title claims abstract description 50
- 229920000642 polymer Polymers 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000002360 preparation method Methods 0.000 title abstract description 15
- 239000000203 mixture Substances 0.000 claims abstract description 31
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 239000004065 semiconductor Substances 0.000 claims abstract description 14
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 238000000206 photolithography Methods 0.000 claims abstract 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 28
- 229910052739 hydrogen Inorganic materials 0.000 claims description 25
- 239000001257 hydrogen Substances 0.000 claims description 25
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 24
- 229920005989 resin Polymers 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- 238000006243 chemical reaction Methods 0.000 claims description 22
- -1 diazonaphthoquinone halide Chemical class 0.000 claims description 21
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 15
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 14
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 12
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 10
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 10
- 229920003986 novolac Polymers 0.000 claims description 10
- 150000008376 fluorenones Chemical class 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 claims description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 8
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 8
- 125000004858 cycloalkoxyalkyl group Chemical group 0.000 claims description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 8
- AFMVESZOYKHDBJ-UHFFFAOYSA-N fluoren-9-ol Chemical compound C1=CC=C2C(O)C3=CC=CC=C3C2=C1 AFMVESZOYKHDBJ-UHFFFAOYSA-N 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- GUEIZVNYDFNHJU-UHFFFAOYSA-N quinizarin Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(O)=CC=C2O GUEIZVNYDFNHJU-UHFFFAOYSA-N 0.000 claims description 6
- NJVOHKFLBKQLIZ-UHFFFAOYSA-N (2-ethenylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C=C NJVOHKFLBKQLIZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- 239000000376 reactant Substances 0.000 claims description 5
- WFSMJMTYIMFHPV-UHFFFAOYSA-N 2-(9h-fluoren-9-yl)acetic acid Chemical compound C1=CC=C2C(CC(=O)O)C3=CC=CC=C3C2=C1 WFSMJMTYIMFHPV-UHFFFAOYSA-N 0.000 claims description 4
- FIHZWZBEAXASKA-UHFFFAOYSA-N Anthron Natural products COc1cc2Cc3cc(C)cc(O)c3C(=O)c2c(O)c1C=CC(C)C FIHZWZBEAXASKA-UHFFFAOYSA-N 0.000 claims description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N Methyl ethyl ketone Natural products CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- JCJNNHDZTLRSGN-UHFFFAOYSA-N anthracen-9-ylmethanol Chemical compound C1=CC=C2C(CO)=C(C=CC=C3)C3=CC2=C1 JCJNNHDZTLRSGN-UHFFFAOYSA-N 0.000 claims description 4
- NUZWLKWWNNJHPT-UHFFFAOYSA-N anthralin Chemical compound C1C2=CC=CC(O)=C2C(=O)C2=C1C=CC=C2O NUZWLKWWNNJHPT-UHFFFAOYSA-N 0.000 claims description 4
- SYGWYBOJXOGMRU-UHFFFAOYSA-N chembl233051 Chemical compound C1=CC=C2C3=CC(C(N(CCN(C)C)C4=O)=O)=C5C4=CC=CC5=C3SC2=C1 SYGWYBOJXOGMRU-UHFFFAOYSA-N 0.000 claims description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- 229960002311 dithranol Drugs 0.000 claims description 4
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 claims description 4
- XXSCONYSQQLHTH-UHFFFAOYSA-N 9h-fluoren-9-ylmethanol Chemical compound C1=CC=C2C(CO)C3=CC=CC=C3C2=C1 XXSCONYSQQLHTH-UHFFFAOYSA-N 0.000 claims description 3
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical compound COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 claims description 2
- KCNKJCHARANTIP-SNAWJCMRSA-N allyl-{4-[3-(4-bromo-phenyl)-benzofuran-6-yloxy]-but-2-enyl}-methyl-amine Chemical compound C=1OC2=CC(OC/C=C/CN(CC=C)C)=CC=C2C=1C1=CC=C(Br)C=C1 KCNKJCHARANTIP-SNAWJCMRSA-N 0.000 claims description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 150000002431 hydrogen Chemical group 0.000 claims 15
- ASDLSKCKYGVMAI-UHFFFAOYSA-N 9,10-dioxoanthracene-2-carboxylic acid Chemical compound C1=CC=C2C(=O)C3=CC(C(=O)O)=CC=C3C(=O)C2=C1 ASDLSKCKYGVMAI-UHFFFAOYSA-N 0.000 claims 6
- XGWFJBFNAQHLEF-UHFFFAOYSA-N 9-anthroic acid Chemical compound C1=CC=C2C(C(=O)O)=C(C=CC=C3)C3=CC2=C1 XGWFJBFNAQHLEF-UHFFFAOYSA-N 0.000 claims 6
- 150000002221 fluorine Chemical class 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 4
- APAJFZPFBHMFQR-UHFFFAOYSA-N anthraflavic acid Chemical compound OC1=CC=C2C(=O)C3=CC(O)=CC=C3C(=O)C2=C1 APAJFZPFBHMFQR-UHFFFAOYSA-N 0.000 claims 4
- HLGMTCSSRBPNOQ-MHWRWJLKSA-N (ne)-n-(anthracen-9-ylmethylidene)hydroxylamine Chemical compound C1=CC=C2C(/C=N/O)=C(C=CC=C3)C3=CC2=C1 HLGMTCSSRBPNOQ-MHWRWJLKSA-N 0.000 claims 3
- KHUFHLFHOQVFGB-UHFFFAOYSA-N 1-aminoanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2N KHUFHLFHOQVFGB-UHFFFAOYSA-N 0.000 claims 3
- CCFAKBRKTKVJPO-UHFFFAOYSA-N 1-anthroic acid Chemical class C1=CC=C2C=C3C(C(=O)O)=CC=CC3=CC2=C1 CCFAKBRKTKVJPO-UHFFFAOYSA-N 0.000 claims 3
- YVXRKDVOSYFSPJ-UHFFFAOYSA-N 2-amino-7-methyl-5-oxochromeno[2,3-b]pyridine-3-carbonitrile Chemical compound NC1=C(C#N)C=C2C(=O)C3=CC(C)=CC=C3OC2=N1 YVXRKDVOSYFSPJ-UHFFFAOYSA-N 0.000 claims 3
- HTPXFGUCAUTOEL-UHFFFAOYSA-N 9h-fluorene-1-carboxylic acid Chemical compound C1C2=CC=CC=C2C2=C1C(C(=O)O)=CC=C2 HTPXFGUCAUTOEL-UHFFFAOYSA-N 0.000 claims 3
- MNQGEQSXFDKAPY-UHFFFAOYSA-N 9h-fluorene-2-carbaldehyde Chemical compound C1=CC=C2C3=CC=C(C=O)C=C3CC2=C1 MNQGEQSXFDKAPY-UHFFFAOYSA-N 0.000 claims 3
- IBIDFEWDKNJSRD-UHFFFAOYSA-N 9h-fluorene-2-carboxylic acid Chemical compound C1=CC=C2C3=CC=C(C(=O)O)C=C3CC2=C1 IBIDFEWDKNJSRD-UHFFFAOYSA-N 0.000 claims 3
- WJNBLUOXTBTGMB-UHFFFAOYSA-N 9h-fluorene-4-carboxylic acid Chemical compound C1C2=CC=CC=C2C2=C1C=CC=C2C(=O)O WJNBLUOXTBTGMB-UHFFFAOYSA-N 0.000 claims 3
- YMNKUHIVVMFOFO-UHFFFAOYSA-N anthracene-9-carbaldehyde Chemical compound C1=CC=C2C(C=O)=C(C=CC=C3)C3=CC2=C1 YMNKUHIVVMFOFO-UHFFFAOYSA-N 0.000 claims 3
- TZIQWQARHPGHIG-UHFFFAOYSA-N anthrarobin Chemical compound C1=CC=CC2=CC3=C(O)C(O)=CC=C3C(O)=C21 TZIQWQARHPGHIG-UHFFFAOYSA-N 0.000 claims 3
- 229910052736 halogen Inorganic materials 0.000 claims 3
- 150000002367 halogens Chemical class 0.000 claims 3
- MNCMBBIFTVWHIP-UHFFFAOYSA-N 1-anthracen-9-yl-2,2,2-trifluoroethanone Chemical compound C1=CC=C2C(C(=O)C(F)(F)F)=C(C=CC=C3)C3=CC2=C1 MNCMBBIFTVWHIP-UHFFFAOYSA-N 0.000 claims 2
- DNVJGJUGFFYUPT-UHFFFAOYSA-N 9h-fluorene-9-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)C3=CC=CC=C3C2=C1 DNVJGJUGFFYUPT-UHFFFAOYSA-N 0.000 claims 2
- KEQZHLAEKAVZLY-UHFFFAOYSA-N anthracene-9-carbonitrile Chemical compound C1=CC=C2C(C#N)=C(C=CC=C3)C3=CC2=C1 KEQZHLAEKAVZLY-UHFFFAOYSA-N 0.000 claims 2
- JPICKYUTICNNNJ-UHFFFAOYSA-N anthrarufin Chemical compound O=C1C2=C(O)C=CC=C2C(=O)C2=C1C=CC=C2O JPICKYUTICNNNJ-UHFFFAOYSA-N 0.000 claims 2
- URQUNWYOBNUYJQ-UHFFFAOYSA-N diazonaphthoquinone Chemical compound C1=CC=C2C(=O)C(=[N]=[N])C=CC2=C1 URQUNWYOBNUYJQ-UHFFFAOYSA-N 0.000 claims 2
- 229920000058 polyacrylate Polymers 0.000 claims 2
- RNDGADNGORZKGH-UHFFFAOYSA-N 9h-fluorene-9-carbaldehyde Chemical compound C1=CC=C2C(C=O)C3=CC=CC=C3C2=C1 RNDGADNGORZKGH-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- XOYSEKDQVVSNNB-UHFFFAOYSA-N anthracene-2-carbonitrile Chemical compound C1=CC=CC2=CC3=CC(C#N)=CC=C3C=C21 XOYSEKDQVVSNNB-UHFFFAOYSA-N 0.000 claims 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 229960001156 mitoxantrone Drugs 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 7
- 230000003667 anti-reflective effect Effects 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 229920001688 coating polymer Polymers 0.000 abstract description 3
- 230000008030 elimination Effects 0.000 abstract description 2
- 238000003379 elimination reaction Methods 0.000 abstract description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- 229920001577 copolymer Polymers 0.000 description 8
- MNTQBEGDRNCNDF-UHFFFAOYSA-N 2-diazonaphthalene-1,4-dione hydrochloride Chemical compound Cl.C1=CC=C2C([O-])=C([N+]#N)CC(=O)C2=C1 MNTQBEGDRNCNDF-UHFFFAOYSA-N 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- 238000000059 patterning Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 4
- HTSGKJQDMSTCGS-UHFFFAOYSA-N 1,4-bis(4-chlorophenyl)-2-(4-methylphenyl)sulfonylbutane-1,4-dione Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C(=O)C=1C=CC(Cl)=CC=1)CC(=O)C1=CC=C(Cl)C=C1 HTSGKJQDMSTCGS-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 125000001153 fluoro group Chemical class F* 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- HTQAWUWYTPJXMS-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate 2-phenylethenol Chemical compound OCCOC(=O)C=C.OC=Cc1ccccc1 HTQAWUWYTPJXMS-UHFFFAOYSA-N 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ALSTYHKOOCGGFT-KTKRTIGZSA-N (9Z)-octadecen-1-ol Chemical compound CCCCCCCC\C=C/CCCCCCCCO ALSTYHKOOCGGFT-KTKRTIGZSA-N 0.000 description 1
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 1
- UWQPDVZUOZVCBH-UHFFFAOYSA-N 2-diazonio-4-oxo-3h-naphthalen-1-olate Chemical group C1=CC=C2C(=O)C(=[N+]=[N-])CC(=O)C2=C1 UWQPDVZUOZVCBH-UHFFFAOYSA-N 0.000 description 1
- KWFDMDKGDNUIAY-UHFFFAOYSA-N 2-hydroxyethyl 2-methylprop-2-enoate;2-phenylethenol Chemical compound CC(=C)C(=O)OCCO.OC=CC1=CC=CC=C1 KWFDMDKGDNUIAY-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- MKHXOKALQIHXPI-UHFFFAOYSA-N 2-phenylprop-1-en-1-ol Chemical compound OC=C(C)C1=CC=CC=C1 MKHXOKALQIHXPI-UHFFFAOYSA-N 0.000 description 1
- SERVTOXIOYSDQO-UHFFFAOYSA-N 2h-chromen-2-ol Chemical compound C1=CC=C2C=CC(O)OC2=C1 SERVTOXIOYSDQO-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- FKLJPTJMIBLJAV-UHFFFAOYSA-N Compound IV Chemical compound O1N=C(C)C=C1CCCCCCCOC1=CC=C(C=2OCCN=2)C=C1 FKLJPTJMIBLJAV-UHFFFAOYSA-N 0.000 description 1
- LELOWRISYMNNSU-UHFFFAOYSA-N Hydrocyanic acid Natural products N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- NLFBCYMMUAKCPC-KQQUZDAGSA-N ethyl (e)-3-[3-amino-2-cyano-1-[(e)-3-ethoxy-3-oxoprop-1-enyl]sulfanyl-3-oxoprop-1-enyl]sulfanylprop-2-enoate Chemical compound CCOC(=O)\C=C\SC(=C(C#N)C(N)=O)S\C=C\C(=O)OCC NLFBCYMMUAKCPC-KQQUZDAGSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/16—Halogens
- C08F212/20—Fluorine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Formation Of Insulating Films (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR19980063695 | 1998-12-31 | ||
| KR10-1998-0063695A KR100363695B1 (ko) | 1998-12-31 | 1998-12-31 | 유기난반사방지중합체및그의제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL1012840A1 NL1012840A1 (nl) | 2000-07-03 |
| NL1012840C2 true NL1012840C2 (nl) | 2001-06-07 |
Family
ID=19570257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL1012840A NL1012840C2 (nl) | 1998-12-31 | 1999-08-17 | Polymeren om te worden toegepast in antireflectiedeklagen en werkwijzen ter bereiding hiervan. |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US6350818B1 (it) |
| JP (2) | JP4253088B2 (it) |
| KR (1) | KR100363695B1 (it) |
| CN (1) | CN1166704C (it) |
| DE (1) | DE19940320B4 (it) |
| FR (1) | FR2788060B1 (it) |
| GB (1) | GB2345289B (it) |
| IT (1) | IT1308658B1 (it) |
| NL (1) | NL1012840C2 (it) |
| TW (1) | TWI227259B (it) |
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| AU5600200A (en) * | 1999-06-10 | 2001-01-02 | Allied-Signal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| KR100557606B1 (ko) * | 1999-08-31 | 2006-03-10 | 주식회사 하이닉스반도체 | 유기 난반사 방지용 중합체 |
| KR100427440B1 (ko) * | 1999-12-23 | 2004-04-17 | 주식회사 하이닉스반도체 | 유기 반사방지 화합물 및 그의 제조방법 |
| US7132219B2 (en) * | 2001-02-02 | 2006-11-07 | Brewer Science Inc. | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
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| KR100465866B1 (ko) * | 2001-10-26 | 2005-01-13 | 주식회사 하이닉스반도체 | 유기반사방지막 조성물 및 그의 제조방법 |
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| US7488771B2 (en) * | 2005-09-02 | 2009-02-10 | International Business Machines Corporation | Stabilization of vinyl ether materials |
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| US8642246B2 (en) * | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| CN101784958B (zh) * | 2007-08-24 | 2013-03-27 | 东丽株式会社 | 感光性组合物、由该组合物形成的固化膜、以及具有固化膜的元件 |
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| JP5842503B2 (ja) * | 2010-09-29 | 2016-01-13 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びその形成方法 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| JP6160068B2 (ja) * | 2011-12-16 | 2017-07-12 | Jsr株式会社 | レジスト下層膜形成用樹脂組成物、レジスト下層膜、その形成方法及びパターン形成方法 |
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| US10544329B2 (en) | 2015-04-13 | 2020-01-28 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| CN107797384B (zh) * | 2016-09-07 | 2020-10-09 | 上海飞凯电子材料有限公司 | 一种感光树脂、正性光刻胶及应用 |
| TWI862734B (zh) | 2019-11-19 | 2024-11-21 | 德商馬克專利公司 | 無光酸產生劑(pag)之正型化學增幅光阻組合物及其使用方法 |
| CN117820910A (zh) * | 2022-06-30 | 2024-04-05 | 华为技术有限公司 | 涂层材料和集成电路及制备方法、电子设备 |
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- 1999-07-30 FR FR9909924A patent/FR2788060B1/fr not_active Expired - Fee Related
- 1999-08-17 NL NL1012840A patent/NL1012840C2/nl not_active IP Right Cessation
- 1999-08-25 DE DE19940320A patent/DE19940320B4/de not_active Expired - Fee Related
- 1999-09-22 TW TW088116247A patent/TWI227259B/zh not_active IP Right Cessation
- 1999-10-07 US US09/413,679 patent/US6350818B1/en not_active Expired - Fee Related
- 1999-10-12 JP JP28983199A patent/JP4253088B2/ja not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| NL1012840A1 (nl) | 2000-07-03 |
| ITTO991027A1 (it) | 2001-05-24 |
| KR20010016643A (ko) | 2001-03-05 |
| GB2345289A (en) | 2000-07-05 |
| FR2788060B1 (fr) | 2003-10-17 |
| TWI227259B (en) | 2005-02-01 |
| FR2788060A1 (fr) | 2000-07-07 |
| JP2000204115A (ja) | 2000-07-25 |
| GB2345289B (en) | 2003-03-26 |
| JP2007231270A (ja) | 2007-09-13 |
| KR100363695B1 (ko) | 2003-04-11 |
| US20020120070A1 (en) | 2002-08-29 |
| US6350818B1 (en) | 2002-02-26 |
| DE19940320A1 (de) | 2000-07-06 |
| CN1166704C (zh) | 2004-09-15 |
| IT1308658B1 (it) | 2002-01-09 |
| CN1260355A (zh) | 2000-07-19 |
| DE19940320B4 (de) | 2006-09-21 |
| JP4253088B2 (ja) | 2009-04-08 |
| GB9917218D0 (en) | 1999-09-22 |
| US6492441B2 (en) | 2002-12-10 |
| ITTO991027A0 (it) | 1999-11-24 |
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