MY207744A - Photovoltaic devices with textured tco layers, and methods of making tco stacks - Google Patents
Photovoltaic devices with textured tco layers, and methods of making tco stacksInfo
- Publication number
- MY207744A MY207744A MYPI2021001559A MYPI2021001559A MY207744A MY 207744 A MY207744 A MY 207744A MY PI2021001559 A MYPI2021001559 A MY PI2021001559A MY PI2021001559 A MYPI2021001559 A MY PI2021001559A MY 207744 A MY207744 A MY 207744A
- Authority
- MY
- Malaysia
- Prior art keywords
- tco
- textured
- methods
- stacks
- making
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
- H10F77/247—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising indium tin oxide [ITO]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means
- H10F77/484—Refractive light-concentrating means, e.g. lenses
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/543—Solar cells from Group II-VI materials
Landscapes
- Chemical & Material Sciences (AREA)
- Photovoltaic Devices (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862735328P | 2018-09-24 | 2018-09-24 | |
| PCT/US2019/052370 WO2020068630A1 (en) | 2018-09-24 | 2019-09-23 | Photovoltaic devices with textured tco layers, and methods of making tco stacks |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY207744A true MY207744A (en) | 2025-03-15 |
Family
ID=68136588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2021001559A MY207744A (en) | 2018-09-24 | 2019-09-23 | Photovoltaic devices with textured tco layers, and methods of making tco stacks |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US12336321B2 (https=) |
| EP (1) | EP3853908A1 (https=) |
| JP (1) | JP7470677B2 (https=) |
| MY (1) | MY207744A (https=) |
| WO (1) | WO2020068630A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11155493B2 (en) * | 2010-01-16 | 2021-10-26 | Cardinal Cg Company | Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
| US12249664B2 (en) | 2020-09-21 | 2025-03-11 | First Solar, Inc. | Transparent conducting layers and photovoltaic devices including the same |
| JP2023548537A (ja) * | 2020-11-03 | 2023-11-17 | ファースト・ソーラー・インコーポレーテッド | 導電層相互接続を備える光起電デバイス |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6743488B2 (en) * | 2001-05-09 | 2004-06-01 | Cpfilms Inc. | Transparent conductive stratiform coating of indium tin oxide |
| JPWO2003101158A1 (ja) | 2002-05-29 | 2005-09-29 | 旭硝子株式会社 | 透明導電膜付き基板および有機el素子 |
| JP2006249554A (ja) | 2005-03-14 | 2006-09-21 | Fuji Electric Holdings Co Ltd | スパッタリングターゲット及びその調製方法ならびにスパッタ方法 |
| US20070029186A1 (en) * | 2005-08-02 | 2007-02-08 | Alexey Krasnov | Method of thermally tempering coated article with transparent conductive oxide (TCO) coating using inorganic protective layer during tempering and product made using same |
| US7601558B2 (en) | 2006-10-24 | 2009-10-13 | Applied Materials, Inc. | Transparent zinc oxide electrode having a graded oxygen content |
| US8076571B2 (en) | 2006-11-02 | 2011-12-13 | Guardian Industries Corp. | Front electrode for use in photovoltaic device and method of making same |
| US8203073B2 (en) * | 2006-11-02 | 2012-06-19 | Guardian Industries Corp. | Front electrode for use in photovoltaic device and method of making same |
| US20080153280A1 (en) | 2006-12-21 | 2008-06-26 | Applied Materials, Inc. | Reactive sputter deposition of a transparent conductive film |
| US20080308411A1 (en) * | 2007-05-25 | 2008-12-18 | Energy Photovoltaics, Inc. | Method and process for deposition of textured zinc oxide thin films |
| US7888594B2 (en) * | 2007-11-20 | 2011-02-15 | Guardian Industries Corp. | Photovoltaic device including front electrode having titanium oxide inclusive layer with high refractive index |
| US20090194155A1 (en) | 2008-02-01 | 2009-08-06 | Guardian Industries Corp. | Front electrode having etched surface for use in photovoltaic device and method of making same |
| JP2008153714A (ja) * | 2008-04-02 | 2008-07-03 | Masayoshi Murata | 薄膜太陽電池用基板及びその製造方法、並びにそれを用いた薄膜太陽電池 |
| JP2010080358A (ja) | 2008-09-29 | 2010-04-08 | Hitachi Ltd | 透明導電膜付基板、及びそれを用いた表示素子及び太陽電池 |
| WO2010038954A2 (ko) | 2008-09-30 | 2010-04-08 | 주식회사 엘지화학 | 투명 도전막 및 이를 구비한 투명 전극 |
| WO2010144460A1 (en) | 2009-06-08 | 2010-12-16 | University Of Toledo | Flexible photovoltaic cells having a polyimide material layer and method of producing same |
| US20110126875A1 (en) | 2009-12-01 | 2011-06-02 | Hien-Minh Huu Le | Conductive contact layer formed on a transparent conductive layer by a reactive sputter deposition |
| JP5590922B2 (ja) | 2010-03-04 | 2014-09-17 | 株式会社カネカ | 透明電極付き基板及びその製造方法 |
| JP5445395B2 (ja) | 2010-08-25 | 2014-03-19 | 住友金属鉱山株式会社 | 透明導電膜の製造方法、及び薄膜太陽電池の製造方法 |
| JP5542025B2 (ja) | 2010-10-18 | 2014-07-09 | 三菱電機株式会社 | 光電変換装置 |
| JP5729595B2 (ja) | 2011-03-11 | 2015-06-03 | 三菱マテリアル株式会社 | 太陽電池用透明導電膜およびその製造方法 |
| EP2523227A1 (en) | 2011-05-13 | 2012-11-14 | Applied Materials, Inc. | Thin-film solar fabrication process, deposition method for TCO layer, and solar cell precursor layer stack |
| JP2013058638A (ja) | 2011-09-08 | 2013-03-28 | Ulvac Japan Ltd | 太陽電池用透明導電性基板の製造方法及び太陽電池用透明導電性基板 |
| JP2014010211A (ja) | 2012-06-28 | 2014-01-20 | Seiko Epson Corp | 液晶装置、液晶装置の製造方法、電子機器 |
| JP6261988B2 (ja) * | 2013-01-16 | 2018-01-17 | 日東電工株式会社 | 透明導電フィルムおよびその製造方法 |
| JP2016127179A (ja) | 2015-01-06 | 2016-07-11 | 三菱電機株式会社 | 薄膜太陽電池およびその製造方法 |
| JP6600492B2 (ja) | 2015-03-26 | 2019-10-30 | 株式会社Screenホールディングス | スパッタリング装置およびスパッタリング方法 |
-
2019
- 2019-09-23 MY MYPI2021001559A patent/MY207744A/en unknown
- 2019-09-23 WO PCT/US2019/052370 patent/WO2020068630A1/en not_active Ceased
- 2019-09-23 EP EP19782876.7A patent/EP3853908A1/en active Pending
- 2019-09-23 US US17/279,254 patent/US12336321B2/en active Active
- 2019-09-23 JP JP2021516602A patent/JP7470677B2/ja active Active
-
2025
- 2025-06-16 US US19/239,412 patent/US20250311473A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP3853908A1 (en) | 2021-07-28 |
| JP2022502847A (ja) | 2022-01-11 |
| US20250311473A1 (en) | 2025-10-02 |
| JP7470677B2 (ja) | 2024-04-18 |
| US12336321B2 (en) | 2025-06-17 |
| US20220013674A1 (en) | 2022-01-13 |
| WO2020068630A1 (en) | 2020-04-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| MY207744A (en) | Photovoltaic devices with textured tco layers, and methods of making tco stacks | |
| Graniel et al. | Atomic layer deposition for biosensing applications | |
| CN102387920B (zh) | 气体阻隔性层叠膜 | |
| Kylián et al. | Hydrophobic and super-hydrophobic coatings based on nanoparticles overcoated by fluorocarbon plasma polymer | |
| MY152524A (en) | Adhesive polymer composition | |
| US20110036399A1 (en) | Process for making a multi-layer structure having transparent conductive oxide layers with textured surface and the structure made thereby | |
| WO2009044938A3 (en) | Method of forming a ceramic silicon oxide type coating, method of producing an inorganic base material, agent for forming a ceramic silicon oxide type coating, and semiconductor device | |
| WO2012066018A3 (en) | Metal coating of objects using a plasma polymerisation pretreatment | |
| SG183079A1 (en) | Reduced residual formation in etched multi-layerstacks | |
| WO2009139833A3 (en) | Aluminide barrier layers and methods of making and using thereof | |
| MY164612A (en) | Surface treated aluminum material, method for producing same, and resin-coated surface treated aluminum material | |
| EP2034044A3 (en) | Impurity control in HDP-CVD DEP/ETCH/DEP processes | |
| CN106282950A (zh) | 一种提高锂电池负极铝箔集电极电性能的方法 | |
| EP2019155A3 (en) | Gallium nitride substrate and gallium nitride film deposition method | |
| CN103741102A (zh) | 一种水晶灯挂件玻璃的制作方法 | |
| MX2014001786A (es) | Unidad de acristalamiento antirreflejante con un recubrimiento poroso. | |
| Du et al. | Tribological performance of magnetron-sputtered MoS2/SiC composites on silicon substrates: Influence of composition and ambient conditions | |
| JP2017503354A5 (ja) | 真空プロセス下で基板を保持する保持アレンジメント、基板上に層を堆積する装置、及び保持アレンジメントを搬送する方法 | |
| CN102776476A (zh) | 触摸屏用复合薄膜及其制造方法 | |
| CN105779948A (zh) | 一种TiAlN/MoN多层膜复合涂层及其制备方法 | |
| SG11201900415RA (en) | Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device | |
| MY207300A (en) | Chemical bonding method and joined structure | |
| WO2021030372A3 (en) | Acid-resistant inorganic composite material and method of forming same | |
| WO2016161233A3 (en) | Multilayer articles comprising a release surface and methods thereof | |
| FR2927013B1 (fr) | Dispositif pour la fabrication d'une piece en materiau composite comprenant des toles de lissage a jonctions glissantes et procede de fabrication de toles de lissage a jonctions glissantes |