MY179890A - Sputtering target for magnetic recording film formation and production method therefor - Google Patents

Sputtering target for magnetic recording film formation and production method therefor

Info

Publication number
MY179890A
MY179890A MYPI2017701004A MYPI2017701004A MY179890A MY 179890 A MY179890 A MY 179890A MY PI2017701004 A MYPI2017701004 A MY PI2017701004A MY PI2017701004 A MYPI2017701004 A MY PI2017701004A MY 179890 A MY179890 A MY 179890A
Authority
MY
Malaysia
Prior art keywords
sputtering target
magnetic recording
production method
film formation
recording film
Prior art date
Application number
MYPI2017701004A
Other languages
English (en)
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY179890A publication Critical patent/MY179890A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
MYPI2017701004A 2014-09-26 2015-09-18 Sputtering target for magnetic recording film formation and production method therefor MY179890A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014197407 2014-09-26

Publications (1)

Publication Number Publication Date
MY179890A true MY179890A (en) 2020-11-18

Family

ID=55581105

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2017701004A MY179890A (en) 2014-09-26 2015-09-18 Sputtering target for magnetic recording film formation and production method therefor

Country Status (5)

Country Link
JP (1) JP6084711B2 (ja)
CN (2) CN107075665A (ja)
MY (1) MY179890A (ja)
SG (1) SG11201701838XA (ja)
WO (1) WO2016047578A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201800871SA (en) * 2016-09-12 2018-05-30 Jx Nippon Mining & Metals Corp Ferromagnetic material sputtering target
JP7057692B2 (ja) * 2018-03-20 2022-04-20 田中貴金属工業株式会社 スパッタリングターゲット用Ｆｅ－Ｐｔ－酸化物－ＢＮ系焼結体
JP6878349B2 (ja) * 2018-04-27 2021-05-26 田中貴金属工業株式会社 Ｃ含有スパッタリングターゲット及びその製造方法
TWI702294B (zh) * 2018-07-31 2020-08-21 日商田中貴金屬工業股份有限公司 磁氣記錄媒體用濺鍍靶
JP7104001B2 (ja) * 2019-06-28 2022-07-20 田中貴金属工業株式会社 Ｆｅ－Ｐｔ－ＢＮ系スパッタリングターゲット及びその製造方法
CN114072536B (zh) * 2019-07-12 2024-06-07 田中贵金属工业株式会社 Fe-Pt-BN系溅射靶及其制造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4885333B1 (ja) * 2010-09-03 2012-02-29 Ｊｘ日鉱日石金属株式会社 強磁性材スパッタリングターゲット
CN103270554B (zh) * 2010-12-20 2016-09-28 吉坤日矿日石金属株式会社 分散有C粒子的Fe-Pt型溅射靶
JP5041261B2 (ja) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法
JP5041262B2 (ja) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法
US9683284B2 (en) * 2011-03-30 2017-06-20 Jx Nippon Mining & Metals Corporation Sputtering target for magnetic recording film
SG2014013940A (en) * 2011-12-22 2014-08-28 Jx Nippon Mining & Metals Corp Fe-Pt-BASED SPUTTERING TARGET IN WHICH C PARTICLES ARE DISPERSED
JP5592022B2 (ja) * 2012-06-18 2014-09-17 Ｊｘ日鉱日石金属株式会社 磁気記録膜用スパッタリングターゲット
JP5457615B1 (ja) * 2012-07-20 2014-04-02 Ｊｘ日鉱日石金属株式会社 磁気記録膜形成用スパッタリングターゲット及びその製造方法
WO2014034390A1 (ja) * 2012-08-31 2014-03-06 Jx日鉱日石金属株式会社 Ｆｅ系磁性材焼結体
MY169260A (en) * 2012-09-21 2019-03-20 Jx Nippon Mining & Metals Corp Fe-pt-based magnetic materials sintered compact
JP6366095B2 (ja) * 2014-07-29 2018-08-01 株式会社フルヤ金属 磁気記録媒体用スパッタリングターゲット

Also Published As

Publication number Publication date
SG11201701838XA (en) 2017-04-27
CN114959599A (zh) 2022-08-30
JP6084711B2 (ja) 2017-02-22
WO2016047578A1 (ja) 2016-03-31
JPWO2016047578A1 (ja) 2017-04-27
CN107075665A (zh) 2017-08-18

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