SG11201701838XA - Sputtering target for magnetic recording film formation and production method therefor - Google Patents

Sputtering target for magnetic recording film formation and production method therefor

Info

Publication number
SG11201701838XA
SG11201701838XA SG11201701838XA SG11201701838XA SG11201701838XA SG 11201701838X A SG11201701838X A SG 11201701838XA SG 11201701838X A SG11201701838X A SG 11201701838XA SG 11201701838X A SG11201701838X A SG 11201701838XA SG 11201701838X A SG11201701838X A SG 11201701838XA
Authority
SG
Singapore
Prior art keywords
production method
magnetic recording
film formation
sputtering target
recording film
Prior art date
Application number
SG11201701838XA
Other languages
English (en)
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of SG11201701838XA publication Critical patent/SG11201701838XA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
SG11201701838XA 2014-09-26 2015-09-18 Sputtering target for magnetic recording film formation and production method therefor SG11201701838XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014197407 2014-09-26
PCT/JP2015/076628 WO2016047578A1 (ja) 2014-09-26 2015-09-18 磁気記録膜形成用スパッタリングターゲット及びその製造方法

Publications (1)

Publication Number Publication Date
SG11201701838XA true SG11201701838XA (en) 2017-04-27

Family

ID=55581105

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201701838XA SG11201701838XA (en) 2014-09-26 2015-09-18 Sputtering target for magnetic recording film formation and production method therefor

Country Status (5)

Country Link
JP (1) JP6084711B2 (ja)
CN (2) CN114959599A (ja)
MY (1) MY179890A (ja)
SG (1) SG11201701838XA (ja)
WO (1) WO2016047578A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636149B (zh) * 2016-09-12 2018-09-21 日商Ｊｘ金屬股份有限公司 強磁性材濺鍍靶
JP7057692B2 (ja) * 2018-03-20 2022-04-20 田中貴金属工業株式会社 スパッタリングターゲット用Ｆｅ－Ｐｔ－酸化物－ＢＮ系焼結体
JP6878349B2 (ja) * 2018-04-27 2021-05-26 田中貴金属工業株式会社 Ｃ含有スパッタリングターゲット及びその製造方法
TWI702294B (zh) * 2018-07-31 2020-08-21 日商田中貴金屬工業股份有限公司 磁氣記錄媒體用濺鍍靶
JP7104001B2 (ja) * 2019-06-28 2022-07-20 田中貴金属工業株式会社 Ｆｅ－Ｐｔ－ＢＮ系スパッタリングターゲット及びその製造方法
WO2021010019A1 (ja) * 2019-07-12 2021-01-21 田中貴金属工業株式会社 Ｆｅ－Ｐｔ－ＢＮ系スパッタリングターゲット及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY160775A (en) * 2010-09-03 2017-03-15 Jx Nippon Mining & Metals Corp Ferromagnetic material sputtering target
US9945026B2 (en) * 2010-12-20 2018-04-17 Jx Nippon Mining & Metals Corporation Fe-Pt-based sputtering target with dispersed C grains
JP5041262B2 (ja) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法
JP5041261B2 (ja) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法
US9683284B2 (en) * 2011-03-30 2017-06-20 Jx Nippon Mining & Metals Corporation Sputtering target for magnetic recording film
CN103930592B (zh) * 2011-12-22 2016-03-16 吉坤日矿日石金属株式会社 分散有C粒子的Fe-Pt型溅射靶
MY167825A (en) * 2012-06-18 2018-09-26 Jx Nippon Mining & Metals Corp Sputtering target for magnetic recording film
SG11201404072YA (en) * 2012-07-20 2014-10-30 Jx Nippon Mining & Metals Corp Sputtering target for forming magnetic recording film and process for producing same
WO2014034390A1 (ja) * 2012-08-31 2014-03-06 Jx日鉱日石金属株式会社 Ｆｅ系磁性材焼結体
US10755737B2 (en) * 2012-09-21 2020-08-25 Jx Nippon Mining & Metals Corporation Fe-Pt based magnetic material sintered compact
JP6366095B2 (ja) * 2014-07-29 2018-08-01 株式会社フルヤ金属 磁気記録媒体用スパッタリングターゲット

Also Published As

Publication number Publication date
MY179890A (en) 2020-11-18
JP6084711B2 (ja) 2017-02-22
CN114959599A (zh) 2022-08-30
JPWO2016047578A1 (ja) 2017-04-27
WO2016047578A1 (ja) 2016-03-31
CN107075665A (zh) 2017-08-18

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