MY160341A - Metal plating additive, and method for plating substrates and products therefrom. - Google Patents
Metal plating additive, and method for plating substrates and products therefrom.Info
- Publication number
- MY160341A MY160341A MYPI2011001188A MYPI2011001188A MY160341A MY 160341 A MY160341 A MY 160341A MY PI2011001188 A MYPI2011001188 A MY PI2011001188A MY PI2011001188 A MYPI2011001188 A MY PI2011001188A MY 160341 A MY160341 A MY 160341A
- Authority
- MY
- Malaysia
- Prior art keywords
- plating
- additive
- metal
- branched
- alkyl
- Prior art date
Links
- 238000007747 plating Methods 0.000 title abstract 5
- 239000000654 additive Substances 0.000 title abstract 4
- 230000000996 additive effect Effects 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 239000002184 metal Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title 1
- 239000000203 mixture Substances 0.000 abstract 4
- 239000013528 metallic particle Substances 0.000 abstract 2
- -1 FATTY ACID ESTER Chemical class 0.000 abstract 1
- 239000003638 chemical reducing agent Substances 0.000 abstract 1
- 239000008139 complexing agent Substances 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 235000014113 dietary fatty acids Nutrition 0.000 abstract 1
- 238000007772 electroless plating Methods 0.000 abstract 1
- 239000000194 fatty acid Substances 0.000 abstract 1
- 229930195729 fatty acid Natural products 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910021645 metal ion Inorganic materials 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/858—Producing a magnetic layer by electro-plating or electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
- C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10603808P | 2008-10-16 | 2008-10-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY160341A true MY160341A (en) | 2017-02-28 |
Family
ID=42106921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2011001188A MY160341A (en) | 2008-10-16 | 2009-10-16 | Metal plating additive, and method for plating substrates and products therefrom. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8557100B2 (https=) |
| EP (1) | EP2347413B1 (https=) |
| JP (1) | JP2012505970A (https=) |
| CN (1) | CN102187391A (https=) |
| MY (1) | MY160341A (https=) |
| WO (1) | WO2010045559A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012087386A (ja) * | 2010-10-21 | 2012-05-10 | Toyota Motor Corp | 無電解ニッケルめっき浴およびそれを用いた無電解ニッケルめっき法 |
| US9708693B2 (en) * | 2014-06-03 | 2017-07-18 | Macdermid Acumen, Inc. | High phosphorus electroless nickel |
| EP3026143A1 (en) | 2014-11-26 | 2016-06-01 | ATOTECH Deutschland GmbH | Plating bath and method for electroless deposition of nickel layers |
| US20180209047A1 (en) * | 2015-07-17 | 2018-07-26 | Coventya, Inc. | Electroless nickel-phosphorous plating baths with reduced ion concentration and methods of use |
| EP3409815B1 (en) | 2017-06-02 | 2020-08-05 | ATOTECH Deutschland GmbH | Electroless nickel alloy plating baths, a method for deposition of nickel alloys, nickel alloy deposits and uses of such formed nickel alloy deposits |
| EP3922753A1 (en) * | 2020-06-10 | 2021-12-15 | ATOTECH Deutschland GmbH | Electroless nickel or cobalt plating solution |
| CN116041229A (zh) * | 2023-02-21 | 2023-05-02 | 太原理工大学 | 蓖麻油基磺酸盐阴离子表面活性剂及其制备方法 |
Family Cites Families (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2383798A (en) * | 1940-12-11 | 1945-08-28 | Du Pont | Electroplating |
| US2658841A (en) | 1950-11-08 | 1953-11-10 | Gen Am Transport | Process of chemical nickel plating and bath therefor |
| US2658842A (en) | 1951-01-04 | 1953-11-10 | Gen Am Transport | Process of chemical nickel plating and bath therefor |
| US2762723A (en) | 1953-06-03 | 1956-09-11 | Gen American Transporation Cor | Processes of chemical nickel plating and baths therefor |
| US2743288A (en) | 1953-06-24 | 1956-04-24 | Tennessee Corp | Production of monosulfonated carboxylic acids and their esters |
| US2847327A (en) | 1954-10-25 | 1958-08-12 | Gen Am Transport | Processes of chemical nickel plating and baths therefor |
| US2935425A (en) | 1954-12-29 | 1960-05-03 | Gen Am Transport | Chemical nickel plating processes and baths therefor |
| US3338726A (en) | 1958-10-01 | 1967-08-29 | Du Pont | Chemical reduction plating process and bath |
| NL281860A (https=) | 1961-08-08 | |||
| GB1234793A (en) * | 1967-06-26 | 1971-06-09 | Tesla Np | Brightening and hardening additive for electrolytic silvering baths |
| US3597266A (en) | 1968-09-23 | 1971-08-03 | Enthone | Electroless nickel plating |
| US3915716A (en) | 1969-04-17 | 1975-10-28 | Schering Ag | Chemical nickel plating bath |
| DE2028950B2 (de) | 1970-06-12 | 1976-05-13 | Shipley Co., Inc., Newton, Mass. (V.SLA.) | Waessrige loesung zum stromlosen abschneiden von nickel, kobalt oder legierungen davon |
| US3953654A (en) | 1973-08-13 | 1976-04-27 | Rca Corporation | Temperature-stable non-magnetic alloy |
| US4014761A (en) * | 1975-01-06 | 1977-03-29 | M & T Chemicals Inc. | Bright acid zinc plating |
| US3972788A (en) * | 1975-01-06 | 1976-08-03 | M & T Chemicals Inc. | Zinc anode benefaction |
| GB1563994A (en) | 1975-05-15 | 1980-04-02 | Albright & Wilson | Sulph(on)ation process and mixer |
| JPS5214725A (en) | 1975-07-21 | 1977-02-03 | Kao Corp | Method of sulfonation and its apparatus |
| JPS5892499A (ja) * | 1981-11-28 | 1983-06-01 | Nippon Nohyaku Co Ltd | スケ−ル除去剤 |
| US4466233A (en) | 1982-09-30 | 1984-08-21 | Thesman Industries, Inc. | Mower drive assembly |
| US4467067A (en) | 1982-12-27 | 1984-08-21 | Shipley Company | Electroless nickel plating |
| US4511614A (en) * | 1983-10-31 | 1985-04-16 | Ball Corporation | Substrate having high absorptance and emittance black electroless nickel coating and a process for producing the same |
| US4610895A (en) * | 1984-02-01 | 1986-09-09 | Shipley Company Inc. | Process for metallizing plastics |
| US4528245A (en) * | 1984-02-27 | 1985-07-09 | Allied Corporation | Pretreatment of plastic materials for metal plating |
| US4803097A (en) * | 1987-04-20 | 1989-02-07 | Allied-Signal Inc. | Metal plating of plastic materials |
| US4780342A (en) | 1987-07-20 | 1988-10-25 | General Electric Company | Electroless nickel plating composition and method for its preparation and use |
| JPH01201484A (ja) * | 1987-10-06 | 1989-08-14 | Hitachi Ltd | 化学ニッケルめっき液及びその使用方法 |
| US5405646A (en) | 1992-10-14 | 1995-04-11 | Nanis; Leonard | Method of manufacture thin film magnetic disk |
| US6251249B1 (en) * | 1996-09-20 | 2001-06-26 | Atofina Chemicals, Inc. | Precious metal deposition composition and process |
| JPH1192953A (ja) * | 1997-09-16 | 1999-04-06 | Ebara Corp | 微細窪みの充填方法及び装置 |
| JP3816241B2 (ja) * | 1998-07-14 | 2006-08-30 | 株式会社大和化成研究所 | 金属を還元析出させるための水溶液 |
| US6316097B1 (en) * | 1998-09-28 | 2001-11-13 | Seagate Technology Llc | Electroless plating process for alternative memory disk substrates |
| US6685990B1 (en) * | 1999-04-20 | 2004-02-03 | Seagate Technology Llc | Nodule-free electroless nip plating |
| JP4847648B2 (ja) * | 2001-06-29 | 2011-12-28 | ブリヂストンスポーツ株式会社 | アクリル酸亜鉛組成物およびその製造方法ならびに当該組成物を用いてなるゴルフボール |
| JP4932094B2 (ja) * | 2001-07-02 | 2012-05-16 | 日本リーロナール有限会社 | 無電解金めっき液および無電解金めっき方法 |
| DE10141089A1 (de) * | 2001-08-22 | 2003-03-13 | Henkel Kgaa | Oberflächenfilm mit Depotfunktion, dessen Herstellung und Verwendung |
| US6500482B1 (en) * | 2001-08-31 | 2002-12-31 | Boules H. Morcos | Electroless nickel plating solution and process for its use |
| WO2003051126A1 (de) * | 2001-12-18 | 2003-06-26 | Henkel Kommanditgesellschaft Auf Aktien | Adhäsionshemmung von schimmelpilzen |
| JP2003342483A (ja) * | 2002-03-20 | 2003-12-03 | Sanyo Chem Ind Ltd | 導電性エラストマー |
| JP2004059998A (ja) * | 2002-07-29 | 2004-02-26 | Konica Minolta Holdings Inc | 無電解メッキ液及び無電解メッキ被覆方法 |
| US20060243604A1 (en) * | 2003-04-30 | 2006-11-02 | Sota Nakagawa | Method and apparatus for treating waste water |
| US6837923B2 (en) * | 2003-05-07 | 2005-01-04 | David Crotty | Polytetrafluoroethylene dispersion for electroless nickel plating applications |
| JP2005044488A (ja) * | 2003-07-09 | 2005-02-17 | Fuji Electric Device Technology Co Ltd | 磁気記録媒体用基板及び磁気記録媒体の製造方法並びに基板洗浄装置 |
| JP4407311B2 (ja) * | 2004-02-20 | 2010-02-03 | セイコーエプソン株式会社 | 薄膜トランジスタの製造方法 |
| JP2005264256A (ja) * | 2004-03-19 | 2005-09-29 | Rikogaku Shinkokai | 共重合体高分子、金属被覆物、金属配線基板及びそれらの製造方法 |
| US20080124552A1 (en) * | 2004-05-24 | 2008-05-29 | Nisshinbo Industries, Inc. | Particle With Rough Surface For Plating Or Vapor Deposition |
| DE102004039472A1 (de) * | 2004-08-14 | 2006-03-02 | Henkel Kgaa | Verfahren zur Herstellung portionierter Wasch- oder Reinigungsmittel |
| DE102004047423C5 (de) * | 2004-09-28 | 2011-04-21 | AHC-Oberflächentechnik GmbH & Co. OHG | Außenstromlos aufgebrachte Nickellegierung und ihre Verwendung |
| DE102004056554A1 (de) * | 2004-11-23 | 2006-05-24 | Buck-Chemie Gmbh | Haftendes Sanitärreinigungs- und Beduftungsmittel |
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| DE102006031149A1 (de) * | 2006-07-04 | 2008-01-10 | Merck Patent Gmbh | Fluortenside |
| CN103465525B (zh) * | 2006-12-27 | 2015-10-21 | 日立化成株式会社 | 凹版和使用该凹版的带有导体层图形的基材 |
| US9574093B2 (en) * | 2007-09-28 | 2017-02-21 | Ppg Industries Ohio, Inc. | Methods for coating a metal substrate and related coated metal substrates |
| JP5353705B2 (ja) * | 2007-10-26 | 2013-11-27 | コニカミノルタ株式会社 | 透明導電性フィルム及びその製造方法 |
| JP5080312B2 (ja) * | 2008-02-27 | 2012-11-21 | 富士フイルム株式会社 | 磁気記録媒体の製造方法 |
-
2009
- 2009-10-16 WO PCT/US2009/061011 patent/WO2010045559A1/en not_active Ceased
- 2009-10-16 EP EP09821323.4A patent/EP2347413B1/en not_active Not-in-force
- 2009-10-16 CN CN2009801408782A patent/CN102187391A/zh active Pending
- 2009-10-16 MY MYPI2011001188A patent/MY160341A/en unknown
- 2009-10-16 JP JP2011532287A patent/JP2012505970A/ja active Pending
- 2009-10-16 US US13/123,778 patent/US8557100B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP2347413A1 (en) | 2011-07-27 |
| WO2010045559A1 (en) | 2010-04-22 |
| EP2347413A4 (en) | 2012-02-29 |
| JP2012505970A (ja) | 2012-03-08 |
| EP2347413B1 (en) | 2016-06-22 |
| US20110195278A1 (en) | 2011-08-11 |
| CN102187391A (zh) | 2011-09-14 |
| US8557100B2 (en) | 2013-10-15 |
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