JP2012505970A5 - - Google Patents

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Publication number
JP2012505970A5
JP2012505970A5 JP2011532287A JP2011532287A JP2012505970A5 JP 2012505970 A5 JP2012505970 A5 JP 2012505970A5 JP 2011532287 A JP2011532287 A JP 2011532287A JP 2011532287 A JP2011532287 A JP 2011532287A JP 2012505970 A5 JP2012505970 A5 JP 2012505970A5
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JP
Japan
Prior art keywords
ion
metal
nickel
composition according
metal plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011532287A
Other languages
English (en)
Japanese (ja)
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JP2012505970A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2009/061011 external-priority patent/WO2010045559A1/en
Publication of JP2012505970A publication Critical patent/JP2012505970A/ja
Publication of JP2012505970A5 publication Critical patent/JP2012505970A5/ja
Pending legal-status Critical Current

Links

JP2011532287A 2008-10-16 2009-10-16 金属めっき添加剤並びに基板のめっき方法およびこの方法により得られる製品 Pending JP2012505970A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10603808P 2008-10-16 2008-10-16
US61/106,038 2008-10-16
PCT/US2009/061011 WO2010045559A1 (en) 2008-10-16 2009-10-16 Metal plating additive, and method for plating substrates and products therefrom

Publications (2)

Publication Number Publication Date
JP2012505970A JP2012505970A (ja) 2012-03-08
JP2012505970A5 true JP2012505970A5 (https=) 2012-11-29

Family

ID=42106921

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011532287A Pending JP2012505970A (ja) 2008-10-16 2009-10-16 金属めっき添加剤並びに基板のめっき方法およびこの方法により得られる製品

Country Status (6)

Country Link
US (1) US8557100B2 (https=)
EP (1) EP2347413B1 (https=)
JP (1) JP2012505970A (https=)
CN (1) CN102187391A (https=)
MY (1) MY160341A (https=)
WO (1) WO2010045559A1 (https=)

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US9708693B2 (en) * 2014-06-03 2017-07-18 Macdermid Acumen, Inc. High phosphorus electroless nickel
EP3026143A1 (en) 2014-11-26 2016-06-01 ATOTECH Deutschland GmbH Plating bath and method for electroless deposition of nickel layers
US20180209047A1 (en) * 2015-07-17 2018-07-26 Coventya, Inc. Electroless nickel-phosphorous plating baths with reduced ion concentration and methods of use
EP3409815B1 (en) 2017-06-02 2020-08-05 ATOTECH Deutschland GmbH Electroless nickel alloy plating baths, a method for deposition of nickel alloys, nickel alloy deposits and uses of such formed nickel alloy deposits
EP3922753A1 (en) * 2020-06-10 2021-12-15 ATOTECH Deutschland GmbH Electroless nickel or cobalt plating solution
CN116041229A (zh) * 2023-02-21 2023-05-02 太原理工大学 蓖麻油基磺酸盐阴离子表面活性剂及其制备方法

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