MX2011012989A - Metodo para depositar una capa delgada, y producto obtenido. - Google Patents

Metodo para depositar una capa delgada, y producto obtenido.

Info

Publication number
MX2011012989A
MX2011012989A MX2011012989A MX2011012989A MX2011012989A MX 2011012989 A MX2011012989 A MX 2011012989A MX 2011012989 A MX2011012989 A MX 2011012989A MX 2011012989 A MX2011012989 A MX 2011012989A MX 2011012989 A MX2011012989 A MX 2011012989A
Authority
MX
Mexico
Prior art keywords
thin film
film
depositing
radiation
substrate
Prior art date
Application number
MX2011012989A
Other languages
English (en)
Inventor
Nicolas Nadaud
Andriy Kharchenko
Emmanuelle Peter
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Publication of MX2011012989A publication Critical patent/MX2011012989A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
    • C03C17/3678—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use in solar cells
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C23C14/5813—Thermal treatment using lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/355—Temporary coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24364—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] with transparent or protective coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Sustainable Development (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Laminated Bodies (AREA)

Abstract

La invención se refiere a un método para producir un sustrato recubierto en una primera cara con al menos una capa delgada transparente y eléctricamente conductora que contenga al menos un óxido, que incluye los pasos siguientes: depositar la al menos una capa delgada sobre el sustrato; someter a la al menos una capa delgada a un paso de tratamiento térmico en el cual la al menos una capa se irradia con una radiación que tiene una longitud de onda de entre 500 y 2000 nm y focalizada en una área de la al menos una capa, al menos una dimensión de la cual no excede de 10 cm, esa radiación es emitida por al menos un dispositivo de radiación colocado opuesto a la al menos una capa, y se genera un movimiento relativo entre el dispositivo de radiación y el sustrato de manera que se trate la superficie deseada, donde el tratamiento térmico es tal que la resistividad de la al menos una capa se reduce durante el tratamiento.
MX2011012989A 2009-06-05 2010-06-04 Metodo para depositar una capa delgada, y producto obtenido. MX2011012989A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0953742A FR2946335B1 (fr) 2009-06-05 2009-06-05 Procede de depot de couche mince et produit obtenu.
PCT/FR2010/051097 WO2010139908A1 (fr) 2009-06-05 2010-06-04 Procede de depot de couche mince et produit obtenu

Publications (1)

Publication Number Publication Date
MX2011012989A true MX2011012989A (es) 2011-12-16

Family

ID=41566175

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2011012989A MX2011012989A (es) 2009-06-05 2010-06-04 Metodo para depositar una capa delgada, y producto obtenido.

Country Status (14)

Country Link
US (1) US9199874B2 (es)
EP (1) EP2438024B1 (es)
JP (1) JP6022935B2 (es)
KR (1) KR101677783B1 (es)
CN (1) CN102459110B (es)
AU (1) AU2010255583B2 (es)
BR (1) BRPI1012893B1 (es)
CA (1) CA2762312C (es)
DE (1) DE202010018224U1 (es)
EA (1) EA027401B1 (es)
EG (1) EG27173A (es)
FR (1) FR2946335B1 (es)
MX (1) MX2011012989A (es)
WO (1) WO2010139908A1 (es)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009033417C5 (de) * 2009-04-09 2022-10-06 Interpane Entwicklungs-Und Beratungsgesellschaft Mbh Verfahren und Anlage zur Herstellung eines beschichteten Gegenstands mittels Tempern
FR2950878B1 (fr) 2009-10-01 2011-10-21 Saint Gobain Procede de depot de couche mince
US11155493B2 (en) 2010-01-16 2021-10-26 Cardinal Cg Company Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods
US9862640B2 (en) 2010-01-16 2018-01-09 Cardinal Cg Company Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US8815059B2 (en) * 2010-08-31 2014-08-26 Guardian Industries Corp. System and/or method for heat treating conductive coatings using wavelength-tuned infrared radiation
DE102010054858C5 (de) † 2010-12-17 2024-04-11 Interpane Entwicklungs- Und Beratungsgesellschaft Mbh Verfahren und Vorrichtung zur Herstellung einer reflexionsmindernden Beschichtung
FR2971960B1 (fr) * 2011-02-25 2013-02-22 Saint Gobain Traitement thermique de revetement par laser
FR2972447B1 (fr) * 2011-03-08 2019-06-07 Saint-Gobain Glass France Procede d'obtention d'un substrat muni d'un revetement
EP2823079B1 (en) 2012-02-23 2023-02-22 Treadstone Technologies, Inc. Corrosion resistant and electrically conductive surface of metal
FR2989388B1 (fr) 2012-04-17 2019-10-18 Saint-Gobain Glass France Procede d'obtention d'un substrat muni d'un revetement
US9255029B2 (en) * 2012-04-17 2016-02-09 Guardian Industries Corp. Method of making heat treated coated article using TCO and removable protective film
CN103448323B (zh) * 2012-05-28 2015-05-20 中国南玻集团股份有限公司 透明导电氧化物镀膜玻璃及其制备方法
JPWO2013183457A1 (ja) * 2012-06-08 2016-01-28 旭硝子株式会社 光学素子
US20140170338A1 (en) * 2012-12-14 2014-06-19 Intermolecular Inc. pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
US9130113B2 (en) 2012-12-14 2015-09-08 Tsmc Solar Ltd. Method and apparatus for resistivity and transmittance optimization in TCO solar cell films
FR3001160B1 (fr) * 2013-01-18 2016-05-27 Saint Gobain Procede d'obtention d'un substrat muni d'un revetement
FR3002768B1 (fr) 2013-03-01 2015-02-20 Saint Gobain Procede de traitement thermique d'un revetement
FR3012133B1 (fr) * 2013-10-17 2021-01-01 Saint Gobain Procede d'obtention d'un substrat revetu par un empilement comprenant une couche d'oxyde transparent conducteur
FR3018802A1 (fr) * 2014-03-19 2015-09-25 Saint Gobain Substrat verrier a couche electroconductrice et tendance diminuee a la delamination
FR3021967B1 (fr) 2014-06-06 2021-04-23 Saint Gobain Procede d'obtention d'un substrat revetu d'une couche fonctionnelle
US9902644B2 (en) 2014-06-19 2018-02-27 Corning Incorporated Aluminosilicate glasses
FR3030492B1 (fr) * 2014-12-23 2021-09-03 Saint Gobain Vitrage comprenant une couche de protection superieure a base de carbone
FR3030490B1 (fr) * 2014-12-23 2019-12-20 Saint-Gobain Glass France Vitrage comprenant une couche de protection superieure a base de carbone hydrogene
WO2017078910A1 (en) * 2015-11-06 2017-05-11 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
WO2017078911A1 (en) * 2015-11-06 2017-05-11 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
EP3371122B1 (en) * 2015-11-06 2021-08-11 Cardinal CG Company Insulating glass unit transparent conductive coating technology
US9674895B1 (en) * 2015-12-15 2017-06-06 Cardinal Cg Company Glazing perimeter anticondensation coating production technology
US9810017B2 (en) 2015-12-15 2017-11-07 Cardinal Cg Company Glazing perimeter anticondensation coating technology
FR3048244B1 (fr) * 2016-02-26 2018-03-16 Saint-Gobain Glass France Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier
CN105821378B (zh) * 2016-05-20 2019-03-08 郑州大学 一种铌掺杂二氧化锡透明导电膜及其制备方法
US10253560B2 (en) 2017-03-03 2019-04-09 Guardian Glass, LLC Coated article with IR reflecting layer(s) and overcoat for improving solar gain and visible transmission
US10179946B2 (en) 2017-03-03 2019-01-15 Guardian Glass, LLC Coated article having low-E coating with IR reflecting layer(s) and niobium bismuth based high index layer and method of making same
US10196735B2 (en) 2017-03-03 2019-02-05 Guardian Glass, LLC Coated article having low-E coating with IR reflecting layer(s) and doped titanium oxide dielectric layer(s) and method of making same
US10287673B2 (en) 2017-03-07 2019-05-14 Guardian Glass, LLC Coated article having low-E coating with IR reflecting layer(S) and yttrium inclusive high index nitrided dielectric layer
US10138159B2 (en) 2017-03-09 2018-11-27 Guardian Glass, LLC Coated article having low-E coating with IR reflecting layer(s) and high index nitrided dielectric film having multiple layers
US10266937B2 (en) 2017-03-09 2019-04-23 Guardian Glass, LLC Coated article having low-E coating with IR reflecting layer(s) and hafnium inclusive high index nitrided dielectric layer
US10138158B2 (en) 2017-03-10 2018-11-27 Guardian Glass, LLC Coated article having low-E coating with IR reflecting layer(s) and high index nitrided dielectric layers
FR3072895B1 (fr) 2017-10-31 2019-10-18 Saint-Gobain Glass France Procede d'alignement d'une pluralite de lignes lasers
DE202019005371U1 (de) 2018-03-20 2020-05-29 Saint-Gobain Glass France Laserbehandelte heizbare Verglasung
US10822270B2 (en) 2018-08-01 2020-11-03 Guardian Glass, LLC Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
WO2020070393A1 (fr) 2018-10-03 2020-04-09 Saint-Gobain Glass France Procede d'obtention d'une feuille de verre revetue d'une couche fonctionnelle
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
FR3092106B1 (fr) 2019-01-29 2021-02-12 Saint Gobain Procede d’obtention d’un substrat revetu d’une couche fonctionnelle
CN109704592B (zh) * 2019-01-29 2021-12-17 西安理工大学 氟掺杂二氧化钛的纳米阵列电致变色薄膜及其制备方法
FR3092025B1 (fr) 2019-01-29 2021-06-18 Saint Gobain Procede d’obtention d’un substrat revetu d’une couche fonctionnelle
CN110642527B (zh) * 2019-09-21 2020-11-03 精电(河源)显示技术有限公司 抗龟裂ito导电玻璃的制作方法
FR3105212A1 (fr) 2019-12-20 2021-06-25 Saint-Gobain Glass France Procédé de traitement thermique rapide de couches minces sur substrats en verre trempé

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4412900A (en) * 1981-03-13 1983-11-01 Hitachi, Ltd. Method of manufacturing photosensors
JPS61176012A (ja) * 1985-01-31 1986-08-07 日立コンデンサ株式会社 透明電極の製造方法
JPS61183813A (ja) * 1985-02-08 1986-08-16 トヨタ自動車株式会社 導電膜の形成方法
US4623601A (en) * 1985-06-04 1986-11-18 Atlantic Richfield Company Photoconductive device containing zinc oxide transparent conductive layer
JPH0414705A (ja) * 1990-05-07 1992-01-20 Toyobo Co Ltd 透明導電膜およびその製造方法
JPH0417212A (ja) * 1990-05-10 1992-01-22 Toyobo Co Ltd 透明導電膜とその製法
JPH06140650A (ja) * 1992-09-14 1994-05-20 Sanyo Electric Co Ltd 透光性導電酸化膜の改質方法とこれを用いた光起電力装置の製造方法
JPH10199346A (ja) * 1997-01-17 1998-07-31 Japan Steel Works Ltd:The 透明電極の形成方法および形成装置
JPH11106935A (ja) * 1997-09-30 1999-04-20 Fuji Photo Film Co Ltd 金属酸化物薄膜の製造方法及び金属酸化物薄膜
FR2810118B1 (fr) 2000-06-07 2005-01-21 Saint Gobain Vitrage Substrat transparent comportant un revetement antireflet
JP4744700B2 (ja) * 2001-01-29 2011-08-10 株式会社日立製作所 薄膜半導体装置及び薄膜半導体装置を含む画像表示装置
FR2832811B1 (fr) 2001-11-28 2004-01-30 Saint Gobain Plaque transparente texturee a forte transmission de lumiere
FR2833107B1 (fr) 2001-12-05 2004-02-20 Saint Gobain Electrode de dispositifs electrochimiques/electrocommandables
JP2004327578A (ja) * 2003-04-23 2004-11-18 Hitachi Cable Ltd 結晶薄膜半導体装置およびその製造方法
US7492090B2 (en) * 2003-09-19 2009-02-17 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing the same
JP2005183346A (ja) * 2003-12-24 2005-07-07 Konica Minolta Holdings Inc 電気光学素子及び透明導電膜の形成方法
FR2869897B1 (fr) 2004-05-10 2006-10-27 Saint Gobain Substrat a revetement photocatalytique
DE102005027799B4 (de) 2005-06-16 2007-09-27 Saint-Gobain Glass Deutschland Gmbh Verfahren zum Herstellen einer transparenten Scheibe mit einer Oberflächenstruktur und Vorrichtung zum Durchführen des Verfahrens
DE102005027737B4 (de) 2005-06-16 2013-03-28 Saint-Gobain Glass Deutschland Gmbh Verwendung einer transparenten Scheibe mit einer dreidimensionalen Oberflächenstruktur als Deckscheibe für Bauelemente zur Nutzung des Sonnenlichts
GB2428689A (en) * 2005-08-01 2007-02-07 Johnson Matthey Plc Process for preparing transparent conducting metal oxides
US20070029186A1 (en) 2005-08-02 2007-02-08 Alexey Krasnov Method of thermally tempering coated article with transparent conductive oxide (TCO) coating using inorganic protective layer during tempering and product made using same
FR2889525A1 (fr) 2005-08-04 2007-02-09 Palumed Sa Nouveaux derives de polyquinoleines et leur utilisation therapeutique.
CN100463935C (zh) * 2005-08-17 2009-02-25 长春迪高实业有限公司 阳光控制低辐射透明薄膜及其制备方法和用途
KR100717276B1 (ko) * 2005-10-29 2007-05-15 삼성전자주식회사 발광 소자용 구조체, 이를 이용한 발광 소자 및 그 제조 방법
FR2895522B1 (fr) 2005-12-23 2008-04-11 Saint Gobain Substrat transparent comportant un revetement antireflet
JP4734569B2 (ja) * 2006-07-12 2011-07-27 国立大学法人長岡技術科学大学 ガラス材料の加工法
FR2911130B1 (fr) 2007-01-05 2009-11-27 Saint Gobain Procede de depot de couche mince et produit obtenu
FI123798B (fi) * 2007-04-23 2013-10-31 Beneq Oy Energiansäästölasi ja menetelmä sen valmistamiseksi
FR2921356B1 (fr) 2007-09-21 2011-01-21 Saint Gobain Composition de verre silico-sodo-calcique
FR2921357B1 (fr) 2007-09-21 2011-01-21 Saint Gobain Composition de verre silico-sodo-calcique
JP4896854B2 (ja) * 2007-11-02 2012-03-14 株式会社カネカ 透明導電膜の製造方法
DE102007052782B4 (de) * 2007-11-02 2017-02-16 Saint-Gobain Glass France S.A. Verfahren zur Veränderung der Eigenschaften einer TCO-Schicht
US20090124064A1 (en) * 2007-11-13 2009-05-14 Varian Semiconductor Equipment Associates, Inc. Particle beam assisted modification of thin film materials
CN101959805A (zh) 2008-03-03 2011-01-26 法国圣戈班玻璃厂 制备玻璃的方法
JP2010098003A (ja) * 2008-10-14 2010-04-30 Osaka Univ レーザー結晶化法

Also Published As

Publication number Publication date
CN102459110B (zh) 2016-08-03
EP2438024B1 (fr) 2020-12-23
KR20120030405A (ko) 2012-03-28
EA201171299A1 (ru) 2012-06-29
US20120094075A1 (en) 2012-04-19
CA2762312C (fr) 2019-02-26
JP6022935B2 (ja) 2016-11-09
KR101677783B1 (ko) 2016-11-18
AU2010255583B2 (en) 2015-05-14
FR2946335B1 (fr) 2011-09-02
FR2946335A1 (fr) 2010-12-10
DE202010018224U1 (de) 2014-10-29
EG27173A (en) 2015-08-31
EP2438024A1 (fr) 2012-04-11
JP2012528779A (ja) 2012-11-15
BRPI1012893B1 (pt) 2020-01-28
CN102459110A (zh) 2012-05-16
EA027401B1 (ru) 2017-07-31
US9199874B2 (en) 2015-12-01
BRPI1012893A2 (pt) 2018-03-13
WO2010139908A1 (fr) 2010-12-09
AU2010255583A1 (en) 2012-02-02
CA2762312A1 (fr) 2010-12-09

Similar Documents

Publication Publication Date Title
MX2011012989A (es) Metodo para depositar una capa delgada, y producto obtenido.
JP5236405B2 (ja) 透明電極膜の改質方法及び透明電極膜付基板の製造方法
WO2010077018A3 (en) Laser firing apparatus for high efficiency solar cell and fabrication method thereof
JPWO2007037358A1 (ja) 有機ｅｌディスプレイおよびその製造方法
MY155485A (en) Process for producing electrodes for solar cells
MX346709B (es) Procedimiento de deposicion de pelicula delgada y producto que se obtiene.
JP6688225B2 (ja) グラフェン層の製造方法
SG10201407169UA (en) Method and apparatus for treating substrates
TW200629416A (en) Semiconductor device and fabrication method thereof
JP2013546165A5 (es)
US20160116650A1 (en) Color filter substrate and its manufacturing method, display panel and its manufacturing method, and display device
Gokhale et al. Controlling the crack formation in inkjet-printed silver nanoparticle thin-films for high resolution patterning using intense pulsed light treatment
WO2009008156A1 (ja) 配線形成方法および配線形成装置
JP2010109353A5 (es)
TW200503065A (en) Method and apparatus for forming crystallized semiconductor layer, and method for manufacturing semiconductor apparatus
JP2009200480A5 (es)
US9315389B2 (en) Hydrogen surface-treated graphene, formation method thereof and electronic device comprising the same
JP2012517123A5 (es)
JP2009260299A5 (ja) 半導体基板の作製方法、半導体基板及び半導体装置
KR101780441B1 (ko) 레이저를 이용한 그래핀 필름 제조장치 및 이의 제조방법
WO2011139640A3 (en) Improved radiation heating efficiency by increasing absorption of a silicon containing material
WO2011107092A3 (de) Verfahren zur dotierung eines halbleitersubstrats und solarzelle mit zweistufiger dotierung
KR20140075502A (ko) 적층 구조의 복합 전극 제조방법
TWI552204B (zh) 金屬氧化膜之製造方法及金屬氧化膜
JP2012160713A5 (es)

Legal Events

Date Code Title Description
FA Abandonment or withdrawal