JP2012528779A - 薄膜層堆積方法及び得られる製品 - Google Patents
薄膜層堆積方法及び得られる製品 Download PDFInfo
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- JP2012528779A JP2012528779A JP2012513664A JP2012513664A JP2012528779A JP 2012528779 A JP2012528779 A JP 2012528779A JP 2012513664 A JP2012513664 A JP 2012513664A JP 2012513664 A JP2012513664 A JP 2012513664A JP 2012528779 A JP2012528779 A JP 2012528779A
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- thin film
- substrate
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- glass
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- Granted
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Classifications
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
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- C03C17/245—Oxides by deposition from the vapour phase
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
- C03C17/3678—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use in solar cells
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/5813—Thermal treatment using lasers
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- C—CHEMISTRY; METALLURGY
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
- Y10T428/24364—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] with transparent or protective coating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Sustainable Development (AREA)
- Thermal Sciences (AREA)
- Optics & Photonics (AREA)
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Abstract
前記少なくとも1層の薄膜層を前記基材上に堆積させること、
少なくとも1つの寸法が10cmを超えない前記少なくとも1層の薄膜層の領域に焦点が合わされた、波長が500〜2000nmである放射線を用いて前記少なくとも1層の薄膜層を照射する熱処理工程に前記少なくとも1層の薄膜層を付し、ここで、前記放射線を前記少なくとも1層の薄膜層に対面して配置されている少なくとも1つの放射線デバイスにより送達させ、所望の表面を処理するように前記放射線デバイスと前記基材とを相対的に移動させ、前記少なくとも1層の薄膜層の抵抗率が前記熱処理の間に低減される、熱処理工程に付すこと、
を含む方法に関する。
Description
前記少なくとも1層の薄膜層を前記基材上に堆積させること、
少なくとも1つの寸法が10cmを超えない前記少なくとも1層の薄膜層の領域に焦点が合わされた、波長が500〜2000nmである放射線を用いて前記少なくとも1層の薄膜層を照射する熱処理工程に前記少なくとも1層の薄膜層を付し、ここで、前記放射線を前記少なくとも1層の薄膜層に対面して配置されている少なくとも1つの放射線デバイスにより送達させ、所望の表面を処理するように前記放射線デバイスと前記基材とを相対的に移動させ、前記少なくとも1層の薄膜層の抵抗率が前記熱処理の間に低減される、熱処理工程に付すこと、
を含む方法に関する。
例1(比較例):
本例は出願WO2008/096089の例12に対応する。厚さが190nmであるアルミニウムでドープした酸化亜鉛をベースとする透明導電層を、マグネトロン法によりガラス基材上に堆積させる。
本発明に係るこれらの例において、アルミニウムでドープした酸化亜鉛タイプのTCO層を堆積させる。Saint-Gobain Glass France により品名SGG Diamant(登録商標)で販売されている超透明ガラスからできている3mmの厚さである基材上にマグネトロンカソードスパッタリングによりこれらの層を堆積させる。堆積はアルゴン雰囲気下にてアルミニウムでドープした酸化亜鉛ターゲットにより既知の様式で行う(非反応性スパッタリング)。
nmでの層の厚さ;
ドーピングレベル(質量基準でのAl2O3の含有分);
レーザーの下での基材の進行速度(メートル/分);
処理の前及び後でのシート抵抗、Rsで示し、Ωで表す;
処理により得られる抵抗率、Ω・cmで表す;
被覆された基材の光透過率、TLで示し、標準ISO9050:2003により算出され、%で表す;
層の光吸収率、ALで示し、%で表す。
本発明に係るこの例においては、酸化インジウムスズ(ITO)の層をガラスシート上にマグネトロンカソードスパッタリングにより堆積させる。層の厚さは500nmである。
処理の前のシート抵抗は15Ωであり、処理後に、それは約4〜5Ωに低下する。
例2〜6の被覆された基材を、今度は、厚さが約1又は2nmであるマグネトロンカソードスパッタリングにより得られる炭素の薄膜層により被覆する。スパッタリングはアルゴンプラズマ中のグラファイトターゲットにより行う。
Claims (15)
- 少なくとも1種の酸化物をベースとする少なくとも1層の透明でかつ導電性の薄膜層により第一面が被覆された基材を得る方法であって、下記工程:
前記少なくとも1層の薄膜層を前記基材上に堆積させること、
少なくとも1つの寸法が10cmを超えない前記少なくとも1層の薄膜層の領域に焦点が合わされた、波長が500〜2000nmである放射線を用いて前記少なくとも1層の薄膜層を照射する熱処理工程に前記少なくとも1層の薄膜層を付し、ここで、前記放射線を前記少なくとも1層の薄膜層に対面して配置されている少なくとも1つの放射線デバイスにより送達させ、所望の表面を処理するように前記放射線デバイスと前記基材とを相対的に移動させ、前記少なくとも1層の薄膜層の抵抗率が前記熱処理の間に低減される、熱処理工程に付すこと、
を含む方法。 - 前記透明でかつ導電性の薄膜層の抵抗率又はそのシート抵抗が、熱処理前に測定された抵抗率又はシート抵抗に対して少なくとも60%、または少なくとも70%、さらには少なくとも75%低減される、請求項1に記載の方法。
- 前記基材が、ガラスまたは有機ポリマー材料からできている、請求項1または2に記載の方法。
- 前記少なくとも1層の薄膜層が、インジウム及びスズの混合酸化物、インジウム及び亜鉛の混合酸化物、ガリウム及び/またはアルミニウム及び/またはチタン及び/またはインジウムによりドープされた酸化亜鉛、ニオブ及び/またはタンタルによりドープされた酸化チタン、スズ酸カドミウムまたはスズ酸亜鉛、フッ素及び/またはアンチモンによりドープされた酸化スズから選ばれる少なくとも1種の酸化物をベースとする、請求項1〜3のいずれか一項に記載の方法。
- 前記少なくとも1層の薄膜層は、前記熱処理後に、抵抗率が7×10-4Ω・cm以下、特に、6×10-4Ω・cm以下であり、吸収率が層の厚さ100nmで1.2%以下、特に1%以下である、請求項1〜4のいずれか一項に記載の方法。
- 前記少なくとも1層の薄膜層は、熱処理工程の前に、炭素、特にグラファイトまたはアモルファスタイプの炭素をベースとする薄膜層により被覆される、請求項1〜5のいずれか一項に記載の方法。
- 前記第一面とは反対側の前記基材の面の温度が、前記熱処理の際に100℃を超えない、または50℃を超えない、特に30℃を超えない、請求項1〜6のいずれか一項に記載の方法。
- 前記放射線の表面出力密度が10kW/cm2以上である、請求項1〜7のいずれか一項に記載の方法。
- 前記放射線が焦点合わせされる領域の少なくとも1つの寸法が5cmを超えず、特に、1cm、さらには5mmを超えず、または1mm、さらには0.5mmを超えない、請求項1〜8のいずれか一項に記載の方法。
- 前記放射線デバイス又は前記放射線デバイスの各々はレーザーである、請求項1〜9のいずれか一項に記載の方法。
- 前記放射線デバイスが、前記基材の幅のすべてまたは一部を同時に照射する線形レーザー光線を放出する、請求項1〜10のいずれか一項に記載の方法。
- 前記少なくとも1層の薄膜層が、磁場強化カソードスパッタリングにより堆積される、請求項1〜11のいずれか一項に記載の方法。
- 請求項1〜12のいずれか一項に記載の方法によって得ることができる、少なくとも1種の酸化物をベースとする少なくとも1層の透明でかつ導電性の薄膜層により被覆された基材。
- アルミニウム及び/またはガリウムによりドープされた酸化亜鉛をベースとする少なくとも1層の薄膜層により被覆された、焼き戻しされていないガラスまたは有機プラスチック材料からできた基材であって、該薄膜層が、6×10-4Ω・cm以下の抵抗率を有し、100nmの層の厚さで1.2%以下の吸収率を有し、並びに100〜200nmの寸法のグレインであって複数の基本グレインに細分化されている表面モルホロジーを有するグレインを有する、請求項13に記載の基材。
- 請求項13または14に記載の基材を少なくとも1つ含む、光起電性ガラスもしくは光電池、ソーラーパネル、LCD(液晶ディスプレイ)、OLED(有機発光ダイオード)、もしくはFED(電界発光ディスプレイ)のタイプのディスプレイスクリーン、またはエレクトロクロミックガラス。
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Also Published As
Publication number | Publication date |
---|---|
CN102459110B (zh) | 2016-08-03 |
EP2438024B1 (fr) | 2020-12-23 |
KR20120030405A (ko) | 2012-03-28 |
EA201171299A1 (ru) | 2012-06-29 |
US20120094075A1 (en) | 2012-04-19 |
CA2762312C (fr) | 2019-02-26 |
JP6022935B2 (ja) | 2016-11-09 |
KR101677783B1 (ko) | 2016-11-18 |
AU2010255583B2 (en) | 2015-05-14 |
FR2946335B1 (fr) | 2011-09-02 |
FR2946335A1 (fr) | 2010-12-10 |
MX2011012989A (es) | 2011-12-16 |
DE202010018224U1 (de) | 2014-10-29 |
EG27173A (en) | 2015-08-31 |
EP2438024A1 (fr) | 2012-04-11 |
BRPI1012893B1 (pt) | 2020-01-28 |
CN102459110A (zh) | 2012-05-16 |
EA027401B1 (ru) | 2017-07-31 |
US9199874B2 (en) | 2015-12-01 |
BRPI1012893A2 (pt) | 2018-03-13 |
WO2010139908A1 (fr) | 2010-12-09 |
AU2010255583A1 (en) | 2012-02-02 |
CA2762312A1 (fr) | 2010-12-09 |
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