MX2009009914A - Metodo de revestimiento de un substrato e instalacion de deposicion al vacio de la aleacion metalica. - Google Patents

Metodo de revestimiento de un substrato e instalacion de deposicion al vacio de la aleacion metalica.

Info

Publication number
MX2009009914A
MX2009009914A MX2009009914A MX2009009914A MX2009009914A MX 2009009914 A MX2009009914 A MX 2009009914A MX 2009009914 A MX2009009914 A MX 2009009914A MX 2009009914 A MX2009009914 A MX 2009009914A MX 2009009914 A MX2009009914 A MX 2009009914A
Authority
MX
Mexico
Prior art keywords
substrate
metal alloy
vacuum deposition
coating
deposition facility
Prior art date
Application number
MX2009009914A
Other languages
English (en)
Inventor
Daniel Chaleix
Patrick Choquet
Eric Silberberg
Bruno Schmitz
Original Assignee
Arcelormittal France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=38370938&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=MX2009009914(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Arcelormittal France filed Critical Arcelormittal France
Publication of MX2009009914A publication Critical patent/MX2009009914A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

La invención se refiere a un método de revestimiento de un substrato (S) según el cual se deposita continuamente sobre el substrato (S) una capa de aleación metálica que comprende al menos dos elementos metálicos, por medio de una instalación de deposición al vacío (1) que comprende un dispositivo de revestimiento por chorro de vapor (7), que permite proyectar sobre el substrato (S) un vapor que contiene elementos metálicos en una proporción relativa predeterminada y constante, el vapor es llevado previamente a una velocidad sónica. El método está destinado más particularmente al depósito de los revestimientos de Zn-Mg. El mismo se refiere igualmente a una instalación de deposición al vacío (1) continua de revestimientos formados de aleaciones metálicas para la implementación del método.
MX2009009914A 2007-03-20 2008-03-19 Metodo de revestimiento de un substrato e instalacion de deposicion al vacio de la aleacion metalica. MX2009009914A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07290342A EP1972699A1 (fr) 2007-03-20 2007-03-20 Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
PCT/FR2008/000347 WO2008142222A1 (fr) 2007-03-20 2008-03-19 Procédé de revêtement d'un substrat et installation de dépôt sous vide d'alliage métallique

Publications (1)

Publication Number Publication Date
MX2009009914A true MX2009009914A (es) 2009-10-20

Family

ID=38370938

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2009009914A MX2009009914A (es) 2007-03-20 2008-03-19 Metodo de revestimiento de un substrato e instalacion de deposicion al vacio de la aleacion metalica.

Country Status (16)

Country Link
US (3) US8481120B2 (es)
EP (2) EP1972699A1 (es)
JP (1) JP5873621B2 (es)
KR (1) KR101453583B1 (es)
CN (1) CN101680080B (es)
BR (1) BRPI0809194B1 (es)
CA (1) CA2681329C (es)
ES (1) ES2599364T3 (es)
HU (1) HUE031482T2 (es)
MA (1) MA31417B1 (es)
MX (1) MX2009009914A (es)
PL (1) PL2129810T3 (es)
RU (1) RU2456372C2 (es)
UA (1) UA99280C2 (es)
WO (1) WO2008142222A1 (es)
ZA (1) ZA200906306B (es)

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KR101940885B1 (ko) 2016-12-26 2019-01-21 주식회사 포스코 점용접성 및 내식성이 우수한 단층 아연합금도금강재 및 그 제조방법
WO2019043424A1 (en) * 2017-08-30 2019-03-07 Arcelormittal COATED METALLIC SUBSTRATE
WO2019043422A1 (en) * 2017-08-30 2019-03-07 Arcelormittal COATED METALLIC SUBSTRATE
WO2019116082A1 (en) * 2017-12-14 2019-06-20 Arcelormittal Vacuum deposition facility and method for coating a substrate
KR102109242B1 (ko) 2017-12-26 2020-05-11 주식회사 포스코 점용접성 및 내식성이 우수한 다층 아연합금도금강재
WO2019239186A1 (en) * 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019239185A1 (en) 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019239184A1 (en) * 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
RU185096U1 (ru) * 2018-08-09 2018-11-21 Акционерное общество "Новосибирский приборостроительный завод" Устройство для измерения спектров отражения слоев многослойного покрытия в процессе их напыления
JP2019060021A (ja) * 2018-11-09 2019-04-18 アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ 亜鉛コーティングを備えた塗装鋼板
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CN112575294B (zh) * 2019-09-29 2023-02-10 宝山钢铁股份有限公司 一种具有双隔板的真空镀膜装置
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Also Published As

Publication number Publication date
JP2010522272A (ja) 2010-07-01
HUE031482T2 (en) 2017-07-28
ES2599364T3 (es) 2017-02-01
US20100104752A1 (en) 2010-04-29
CN101680080A (zh) 2010-03-24
KR101453583B1 (ko) 2014-11-03
CA2681329C (fr) 2012-05-22
UA99280C2 (ru) 2012-08-10
ZA200906306B (en) 2010-05-26
CA2681329A1 (fr) 2008-11-27
RU2009138469A (ru) 2011-04-27
CN101680080B (zh) 2012-07-11
EP2129810B1 (fr) 2016-07-20
BRPI0809194B1 (pt) 2018-12-04
KR20090122247A (ko) 2009-11-26
US20130239890A1 (en) 2013-09-19
BRPI0809194A2 (pt) 2014-09-23
MA31417B1 (fr) 2010-06-01
EP2129810A1 (fr) 2009-12-09
US8481120B2 (en) 2013-07-09
PL2129810T3 (pl) 2017-08-31
US20180112305A1 (en) 2018-04-26
EP1972699A1 (fr) 2008-09-24
JP5873621B2 (ja) 2016-03-01
RU2456372C2 (ru) 2012-07-20
WO2008142222A1 (fr) 2008-11-27

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