MX2020013600A - Instalacion de deposicion al vacio y metodo para recubrir un sustrato. - Google Patents

Instalacion de deposicion al vacio y metodo para recubrir un sustrato.

Info

Publication number
MX2020013600A
MX2020013600A MX2020013600A MX2020013600A MX2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A
Authority
MX
Mexico
Prior art keywords
vapor
chamber
substrate
repartition
facility
Prior art date
Application number
MX2020013600A
Other languages
English (en)
Inventor
Eric Silberberg
Bruno Schmitz
Sergio Pace
Didier Marneffe
Original Assignee
Arcelormittal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcelormittal filed Critical Arcelormittal
Publication of MX2020013600A publication Critical patent/MX2020013600A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La invención se refiere a una instalación de deposición al vacío 1 para depositar de manera continua, sobre un sustrato en funcionamiento S, recubrimientos formados a partir de metal o aleación metálica, comprendiendo la instalación un crisol de evaporación 4 adecuado para suministrar vapor de metal o aleación de metal y que comprende un tubería de evaporación 7, una cámara de deposición 2 adecuada para tener el sustrato S que pasa a lo largo de una ruta predetermimada P y un recubridor por chorro de vapor 3 que une la tubería de evaporación a la cámara de deposición, en donde el recubridor por chorro de vapor comprende además una cámara de reparto 31 que comprende por lo menos un medio de recalentamiento 33 colocado dentro de la cámara de reparto y un orificio de salida de vapor 32 que comprende una abertura de base que une el orificio de salida de vapor a la cámara de reparto, una abertura superior a través de la cual el vapor puede salir en la cámara de deposición y dos lados convergentes entre sí en la dirección de la abertura superior.
MX2020013600A 2018-06-15 2019-06-11 Instalacion de deposicion al vacio y metodo para recubrir un sustrato. MX2020013600A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/IB2018/054419 WO2019239192A1 (en) 2018-06-15 2018-06-15 Vacuum deposition facility and method for coating a substrate
PCT/IB2019/054860 WO2019239314A1 (en) 2018-06-15 2019-06-11 Vacuum deposition facility and method for coating a substrate

Publications (1)

Publication Number Publication Date
MX2020013600A true MX2020013600A (es) 2021-03-09

Family

ID=63036251

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2020013600A MX2020013600A (es) 2018-06-15 2019-06-11 Instalacion de deposicion al vacio y metodo para recubrir un sustrato.

Country Status (12)

Country Link
US (1) US20210238734A1 (es)
EP (1) EP3810822A1 (es)
JP (1) JP7165755B2 (es)
KR (1) KR102538729B1 (es)
CN (1) CN112400034A (es)
BR (1) BR112020025040A2 (es)
CA (1) CA3103386C (es)
MA (1) MA52974A (es)
MX (1) MX2020013600A (es)
UA (1) UA128066C2 (es)
WO (2) WO2019239192A1 (es)
ZA (1) ZA202007502B (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113957389B (zh) * 2020-07-21 2023-08-11 宝山钢铁股份有限公司 一种具有多孔降噪及均匀化分配金属蒸汽的真空镀膜装置
WO2022175703A1 (en) * 2021-02-16 2022-08-25 Applied Materials, Inc. Crucible, distribution pipe, material deposition assembly, vacuum deposition system and method of manufacturing a device
DE102021120004A1 (de) * 2021-08-02 2023-02-02 Thyssenkrupp Steel Europe Ag Beschichtungsanlage zur Beschichtung eines Gegenstands, Verfahren zum Beschichten eines Gegenstands sowie Verwendung
WO2023062410A1 (en) * 2021-10-14 2023-04-20 Arcelormittal Vapour nozzle for pvd

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US2793609A (en) * 1953-01-26 1957-05-28 British Dielectric Res Ltd Means for the deposition of materials by evaporation in a vacuum
JPS5943874A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発材料収容器及びその使用方法
JPS6353259A (ja) * 1986-08-22 1988-03-07 Mitsubishi Electric Corp 薄膜形成方法
DE3923390A1 (de) * 1988-07-14 1990-01-25 Canon Kk Vorrichtung zur bildung eines grossflaechigen aufgedampften films unter verwendung von wenigstens zwei getrennt gebildeten aktivierten gasen
GB9300400D0 (en) * 1993-01-11 1993-03-03 Glaverbel A device and method for forming a coating by pyrolysis
US5820681A (en) * 1995-05-03 1998-10-13 Chorus Corporation Unibody crucible and effusion cell employing such a crucible
JPH09143692A (ja) * 1995-11-29 1997-06-03 Ishikawajima Harima Heavy Ind Co Ltd 高蒸気圧金属の気相メッキ装置及び方法
BE1010351A6 (fr) * 1996-06-13 1998-06-02 Centre Rech Metallurgique Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique.
US6409839B1 (en) * 1997-06-02 2002-06-25 Msp Corporation Method and apparatus for vapor generation and film deposition
DE19843818A1 (de) * 1998-09-24 2000-03-30 Leybold Systems Gmbh Bedampfungsvorrichtung für Vakuum-Bedampfungsanlagen
US20040043140A1 (en) * 2002-08-21 2004-03-04 Ramesh Jagannathan Solid state lighting using compressed fluid coatings
JP4041005B2 (ja) * 2003-04-02 2008-01-30 長州産業株式会社 薄膜堆積用分子線源とそれを使用した薄膜堆積方法
US7232588B2 (en) * 2004-02-23 2007-06-19 Eastman Kodak Company Device and method for vaporizing temperature sensitive materials
JP2007039785A (ja) * 2005-07-04 2007-02-15 Seiko Epson Corp 真空蒸着装置及び電気光学装置の製造方法
US7951276B2 (en) * 2006-06-08 2011-05-31 The Board Of Trustees Of The University Of Illinois Cluster generator
JP5013591B2 (ja) * 2006-12-15 2012-08-29 キヤノントッキ株式会社 真空蒸着装置
US20090081365A1 (en) * 2007-09-20 2009-03-26 Cok Ronald S Deposition apparatus for temperature sensitive materials
EP2048261A1 (fr) * 2007-10-12 2009-04-15 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique
KR101879805B1 (ko) * 2012-01-20 2018-08-17 삼성디스플레이 주식회사 박막 증착 장치 및 방법
CN103589997A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种蒸镀用掩模板
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WO2018020296A1 (en) * 2016-07-27 2018-02-01 Arcelormittal Apparatus and method for vacuum deposition
CN111627806A (zh) * 2019-02-28 2020-09-04 东京毅力科创株式会社 基片处理方法和基片处理装置

Also Published As

Publication number Publication date
MA52974A (fr) 2021-04-28
CA3103386A1 (en) 2019-12-19
JP7165755B2 (ja) 2022-11-04
WO2019239314A1 (en) 2019-12-19
CN112400034A (zh) 2021-02-23
ZA202007502B (en) 2021-08-25
KR20210008095A (ko) 2021-01-20
JP2021526592A (ja) 2021-10-07
UA128066C2 (uk) 2024-03-27
BR112020025040A2 (pt) 2021-03-23
EP3810822A1 (en) 2021-04-28
WO2019239192A1 (en) 2019-12-19
CA3103386C (en) 2022-08-30
US20210238734A1 (en) 2021-08-05
KR102538729B1 (ko) 2023-05-31

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