MX2020013600A - Instalacion de deposicion al vacio y metodo para recubrir un sustrato. - Google Patents

Instalacion de deposicion al vacio y metodo para recubrir un sustrato.

Info

Publication number
MX2020013600A
MX2020013600A MX2020013600A MX2020013600A MX2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A MX 2020013600 A MX2020013600 A MX 2020013600A
Authority
MX
Mexico
Prior art keywords
vapor
chamber
substrate
repartition
facility
Prior art date
Application number
MX2020013600A
Other languages
English (en)
Inventor
Eric Silberberg
Bruno Schmitz
Sergio Pace
Didier Marneffe
Original Assignee
Arcelormittal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcelormittal filed Critical Arcelormittal
Publication of MX2020013600A publication Critical patent/MX2020013600A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La invención se refiere a una instalación de deposición al vacío 1 para depositar de manera continua, sobre un sustrato en funcionamiento S, recubrimientos formados a partir de metal o aleación metálica, comprendiendo la instalación un crisol de evaporación 4 adecuado para suministrar vapor de metal o aleación de metal y que comprende un tubería de evaporación 7, una cámara de deposición 2 adecuada para tener el sustrato S que pasa a lo largo de una ruta predetermimada P y un recubridor por chorro de vapor 3 que une la tubería de evaporación a la cámara de deposición, en donde el recubridor por chorro de vapor comprende además una cámara de reparto 31 que comprende por lo menos un medio de recalentamiento 33 colocado dentro de la cámara de reparto y un orificio de salida de vapor 32 que comprende una abertura de base que une el orificio de salida de vapor a la cámara de reparto, una abertura superior a través de la cual el vapor puede salir en la cámara de deposición y dos lados convergentes entre sí en la dirección de la abertura superior.
MX2020013600A 2018-06-15 2019-06-11 Instalacion de deposicion al vacio y metodo para recubrir un sustrato. MX2020013600A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/IB2018/054419 WO2019239192A1 (en) 2018-06-15 2018-06-15 Vacuum deposition facility and method for coating a substrate
PCT/IB2019/054860 WO2019239314A1 (en) 2018-06-15 2019-06-11 Vacuum deposition facility and method for coating a substrate

Publications (1)

Publication Number Publication Date
MX2020013600A true MX2020013600A (es) 2021-03-09

Family

ID=63036251

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2020013600A MX2020013600A (es) 2018-06-15 2019-06-11 Instalacion de deposicion al vacio y metodo para recubrir un sustrato.

Country Status (12)

Country Link
US (1) US20210238734A1 (es)
EP (1) EP3810822A1 (es)
JP (1) JP7165755B2 (es)
KR (1) KR102538729B1 (es)
CN (1) CN112400034A (es)
BR (1) BR112020025040A2 (es)
CA (1) CA3103386C (es)
MA (1) MA52974A (es)
MX (1) MX2020013600A (es)
UA (1) UA128066C2 (es)
WO (2) WO2019239192A1 (es)
ZA (1) ZA202007502B (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113957389B (zh) * 2020-07-21 2023-08-11 宝山钢铁股份有限公司 一种具有多孔降噪及均匀化分配金属蒸汽的真空镀膜装置
WO2022175703A1 (en) * 2021-02-16 2022-08-25 Applied Materials, Inc. Crucible, distribution pipe, material deposition assembly, vacuum deposition system and method of manufacturing a device
DE102021120004A1 (de) * 2021-08-02 2023-02-02 Thyssenkrupp Steel Europe Ag Beschichtungsanlage zur Beschichtung eines Gegenstands, Verfahren zum Beschichten eines Gegenstands sowie Verwendung
WO2023062410A1 (en) * 2021-10-14 2023-04-20 Arcelormittal Vapour nozzle for pvd

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Also Published As

Publication number Publication date
CA3103386C (en) 2022-08-30
KR20210008095A (ko) 2021-01-20
US20210238734A1 (en) 2021-08-05
KR102538729B1 (ko) 2023-05-31
EP3810822A1 (en) 2021-04-28
MA52974A (fr) 2021-04-28
CN112400034A (zh) 2021-02-23
JP7165755B2 (ja) 2022-11-04
ZA202007502B (en) 2021-08-25
CA3103386A1 (en) 2019-12-19
UA128066C2 (uk) 2024-03-27
JP2021526592A (ja) 2021-10-07
WO2019239314A1 (en) 2019-12-19
WO2019239192A1 (en) 2019-12-19
BR112020025040A2 (pt) 2021-03-23

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