MX2020006058A - Instalacion de deposicion en vacio y metodo para recubrir un sustrato. - Google Patents
Instalacion de deposicion en vacio y metodo para recubrir un sustrato.Info
- Publication number
- MX2020006058A MX2020006058A MX2020006058A MX2020006058A MX2020006058A MX 2020006058 A MX2020006058 A MX 2020006058A MX 2020006058 A MX2020006058 A MX 2020006058A MX 2020006058 A MX2020006058 A MX 2020006058A MX 2020006058 A MX2020006058 A MX 2020006058A
- Authority
- MX
- Mexico
- Prior art keywords
- substrate
- metal
- central casing
- vacuum chamber
- vacuum deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
La invención se refiere a una instalación de deposición en vacío para depositar de manera continua, sobre un sustrato movible, recubrimientos formados a partir de metal o aleación metálica, la instalación comprende una cámara de vacío y un medio para mover el sustrato a través de la cámara de vacío a lo largo de una trayectoria dada, en donde la cámara de vacío comprende, además: - una carcasa central que comprende una entrada de sustrato y una salida de sustrato ubicadas en dos lados opuestos de la carcasa central y un recubridor de chorro de vapor, las paredes internas de la carcasa central que son adecuadas para calentarse a una temperatura arriba de la temperatura de condensación de los vapores de metal o aleación metálica, - una trampa de vapor en la forma de una carcasa externa ubicada en la salida de sustrato de la carcasa central, las paredes internas de la trampa de vapor que son adecuadas para mantenerse a una temperatura por debajo de la temperatura de condensación de los vapores de metal o aleación metálica,.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/IB2017/057943 WO2019116081A1 (en) | 2017-12-14 | 2017-12-14 | Vacuum deposition facility and method for coating a substrate |
| PCT/IB2018/059856 WO2019116214A1 (en) | 2017-12-14 | 2018-12-11 | Vacuum deposition facility and method for coating a substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2020006058A true MX2020006058A (es) | 2020-08-20 |
Family
ID=60937822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2020006058A MX2020006058A (es) | 2017-12-14 | 2018-12-11 | Instalacion de deposicion en vacio y metodo para recubrir un sustrato. |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US20210164088A1 (es) |
| EP (1) | EP3724367A1 (es) |
| JP (1) | JP7089031B2 (es) |
| KR (1) | KR102503599B1 (es) |
| CN (1) | CN111479950A (es) |
| AU (1) | AU2018385554B2 (es) |
| CA (1) | CA3084328C (es) |
| MA (1) | MA51143A (es) |
| MX (1) | MX2020006058A (es) |
| RU (1) | RU2741042C1 (es) |
| UA (1) | UA125835C2 (es) |
| WO (2) | WO2019116081A1 (es) |
| ZA (1) | ZA202003072B (es) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102021101383A1 (de) | 2021-01-22 | 2022-07-28 | Thyssenkrupp Steel Europe Ag | Verfahren zur kontinuierlichen Beschichtung eines Bands und Beschichtungsanlage |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE1010351A6 (fr) | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
| JP2002294456A (ja) | 2001-03-30 | 2002-10-09 | Oki Electric Ind Co Ltd | 膜の形成方法及びその方法を実施するためのｃｖｄ装置 |
| JP3694470B2 (ja) | 2001-05-31 | 2005-09-14 | 沖電気工業株式会社 | 半導体装置の製造方法 |
| EP1423553A4 (en) * | 2001-08-01 | 2008-12-17 | Danieli Technology Inc | METAL VAPOR COATING |
| DE102004041855B4 (de) * | 2004-04-27 | 2007-09-13 | Von Ardenne Anlagentechnik Gmbh | Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung |
| DE102004041854B4 (de) | 2004-04-27 | 2008-11-13 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur thermischen Vakuumbeschichtung |
| KR101235457B1 (ko) * | 2005-05-31 | 2013-02-20 | 타타 스틸 네덜란드 테크날러지 베.뷔. | 기판 코팅장치 및 방법 |
| EP1945830A1 (en) * | 2005-11-08 | 2008-07-23 | Hilmar Weinert | Carrier with porous vacuum coating |
| US20080072822A1 (en) * | 2006-09-22 | 2008-03-27 | White John M | System and method including a particle trap/filter for recirculating a dilution gas |
| US20080213477A1 (en) * | 2007-03-02 | 2008-09-04 | Arno Zindel | Inline vacuum processing apparatus and method for processing substrates therein |
| JP5730496B2 (ja) * | 2009-05-01 | 2015-06-10 | 株式会社日立国際電気 | 熱処理装置、半導体デバイスの製造方法および基板処理方法 |
| CN101608301B (zh) * | 2009-06-24 | 2011-12-07 | 江苏常松机械集团有限公司 | 连续真空等离子蒸发金属复合材料生产线 |
| US8187555B2 (en) * | 2009-12-15 | 2012-05-29 | Primestar Solar, Inc. | System for cadmium telluride (CdTe) reclamation in a vapor deposition conveyor assembly |
| KR101010196B1 (ko) * | 2010-01-27 | 2011-01-21 | 에스엔유 프리시젼 주식회사 | 진공 증착 장비 |
| US20120034733A1 (en) * | 2010-08-05 | 2012-02-09 | Aventa Technologies Llc | System and method for fabricating thin-film photovoltaic devices |
| KR101114832B1 (ko) * | 2011-05-31 | 2012-03-06 | 에스엔유 프리시젼 주식회사 | 진공증착장치 |
| JP6559423B2 (ja) * | 2011-08-05 | 2019-08-14 | スリーエム イノベイティブ プロパティズ カンパニー | 蒸気を処理するためのシステム及び方法 |
| KR101184679B1 (ko) * | 2012-04-26 | 2012-09-24 | (주)이화 | 엘씨디 유기물 처리용 콜드트랩 장치 |
| UA116262C2 (uk) * | 2013-08-01 | 2018-02-26 | Арселорміттал | Сталевий лист з цинковим покриттям |
| US10760155B2 (en) | 2015-09-24 | 2020-09-01 | Sharp Kabushiki Kaisha | Vapor deposition source and vapor deposition device for producing vapor deposition film with high material usage efficiency |
| CN106198125A (zh) * | 2016-08-30 | 2016-12-07 | 中国科学院寒区旱区环境与工程研究所 | 一种气体提取与收集装置 |
-
2017
- 2017-12-14 WO PCT/IB2017/057943 patent/WO2019116081A1/en active Application Filing
-
2018
- 2018-12-11 MA MA051143A patent/MA51143A/fr unknown
- 2018-12-11 CA CA3084328A patent/CA3084328C/en active Active
- 2018-12-11 UA UAA202004225A patent/UA125835C2/uk unknown
- 2018-12-11 US US16/770,850 patent/US20210164088A1/en active Pending
- 2018-12-11 KR KR1020207018127A patent/KR102503599B1/ko active IP Right Grant
- 2018-12-11 JP JP2020532619A patent/JP7089031B2/ja active Active
- 2018-12-11 CN CN201880080355.2A patent/CN111479950A/zh active Pending
- 2018-12-11 RU RU2020123166A patent/RU2741042C1/ru active
- 2018-12-11 EP EP18833519.4A patent/EP3724367A1/en active Pending
- 2018-12-11 WO PCT/IB2018/059856 patent/WO2019116214A1/en unknown
- 2018-12-11 MX MX2020006058A patent/MX2020006058A/es unknown
- 2018-12-11 AU AU2018385554A patent/AU2018385554B2/en active Active
-
2020
- 2020-05-25 ZA ZA2020/03072A patent/ZA202003072B/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR102503599B1 (ko) | 2023-02-23 |
| CA3084328A1 (en) | 2019-06-20 |
| AU2018385554B2 (en) | 2021-02-25 |
| KR20200092996A (ko) | 2020-08-04 |
| AU2018385554A1 (en) | 2020-06-11 |
| US20210164088A1 (en) | 2021-06-03 |
| CN111479950A (zh) | 2020-07-31 |
| RU2741042C1 (ru) | 2021-01-22 |
| WO2019116214A1 (en) | 2019-06-20 |
| JP7089031B2 (ja) | 2022-06-21 |
| BR112020010757A2 (pt) | 2020-11-17 |
| JP2021507101A (ja) | 2021-02-22 |
| CA3084328C (en) | 2022-05-31 |
| MA51143A (fr) | 2021-03-24 |
| ZA202003072B (en) | 2021-08-25 |
| EP3724367A1 (en) | 2020-10-21 |
| UA125835C2 (uk) | 2022-06-15 |
| WO2019116081A1 (en) | 2019-06-20 |
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