MA51143A - Installation de dépôt sous vide et procédé de revêtement d'un substrat - Google Patents

Installation de dépôt sous vide et procédé de revêtement d'un substrat

Info

Publication number
MA51143A
MA51143A MA051143A MA51143A MA51143A MA 51143 A MA51143 A MA 51143A MA 051143 A MA051143 A MA 051143A MA 51143 A MA51143 A MA 51143A MA 51143 A MA51143 A MA 51143A
Authority
MA
Morocco
Prior art keywords
coating process
substrate coating
vacuum deposit
deposit installation
installation
Prior art date
Application number
MA051143A
Other languages
English (en)
Inventor
Rémy Bonnemann
Didier Marneffe
Sergio Pace
Bruno Schmitz
Eric Silberberg
Original Assignee
Arcelormittal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcelormittal filed Critical Arcelormittal
Publication of MA51143A publication Critical patent/MA51143A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
MA051143A 2017-12-14 2018-12-11 Installation de dépôt sous vide et procédé de revêtement d'un substrat MA51143A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IB2017/057943 WO2019116081A1 (fr) 2017-12-14 2017-12-14 Installation de dépôt sous vide et procédé pour revêtir un substrat

Publications (1)

Publication Number Publication Date
MA51143A true MA51143A (fr) 2021-03-24

Family

ID=60937822

Family Applications (1)

Application Number Title Priority Date Filing Date
MA051143A MA51143A (fr) 2017-12-14 2018-12-11 Installation de dépôt sous vide et procédé de revêtement d'un substrat

Country Status (13)

Country Link
US (1) US20210164088A1 (fr)
EP (1) EP3724367A1 (fr)
JP (1) JP7089031B2 (fr)
KR (1) KR102503599B1 (fr)
CN (1) CN111479950A (fr)
AU (1) AU2018385554B2 (fr)
CA (1) CA3084328C (fr)
MA (1) MA51143A (fr)
MX (1) MX2020006058A (fr)
RU (1) RU2741042C1 (fr)
UA (1) UA125835C2 (fr)
WO (2) WO2019116081A1 (fr)
ZA (1) ZA202003072B (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021101383A1 (de) 2021-01-22 2022-07-28 Thyssenkrupp Steel Europe Ag Verfahren zur kontinuierlichen Beschichtung eines Bands und Beschichtungsanlage

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1010351A6 (fr) 1996-06-13 1998-06-02 Centre Rech Metallurgique Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique.
JP2002294456A (ja) * 2001-03-30 2002-10-09 Oki Electric Ind Co Ltd 膜の形成方法及びその方法を実施するためのｃｖｄ装置
JP3694470B2 (ja) * 2001-05-31 2005-09-14 沖電気工業株式会社 半導体装置の製造方法
US7122221B2 (en) * 2001-08-01 2006-10-17 Danieli Technology, Inc. Method and apparatus for metal vapor coating
DE102004041855B4 (de) * 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
DE102004041854B4 (de) * 2004-04-27 2008-11-13 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur thermischen Vakuumbeschichtung
CA2605147C (fr) * 2005-05-31 2011-12-13 Corus Technology Bv Dispositif et procede de revetement d'un substrat
WO2007054229A1 (fr) * 2005-11-08 2007-05-18 Hilmar Weinert Support dote d’un revetement poreux depose sous vide
US20080072822A1 (en) * 2006-09-22 2008-03-27 White John M System and method including a particle trap/filter for recirculating a dilution gas
CN102505115B (zh) * 2007-03-02 2014-09-03 欧瑞康太阳能股份公司(特吕巴赫) 真空涂覆装置
JP5730496B2 (ja) * 2009-05-01 2015-06-10 株式会社日立国際電気 熱処理装置、半導体デバイスの製造方法および基板処理方法
CN101608301B (zh) * 2009-06-24 2011-12-07 江苏常松机械集团有限公司 连续真空等离子蒸发金属复合材料生产线
US8187555B2 (en) * 2009-12-15 2012-05-29 Primestar Solar, Inc. System for cadmium telluride (CdTe) reclamation in a vapor deposition conveyor assembly
KR101010196B1 (ko) * 2010-01-27 2011-01-21 에스엔유 프리시젼 주식회사 진공 증착 장비
US20120034733A1 (en) * 2010-08-05 2012-02-09 Aventa Technologies Llc System and method for fabricating thin-film photovoltaic devices
KR101114832B1 (ko) * 2011-05-31 2012-03-06 에스엔유 프리시젼 주식회사 진공증착장치
WO2013022669A2 (fr) * 2011-08-05 2013-02-14 3M Innovative Properties Company Systèmes et procédés pour traiter la vapeur
KR101184679B1 (ko) * 2012-04-26 2012-09-24 (주)이화 엘씨디 유기물 처리용 콜드트랩 장치
UA116262C2 (uk) * 2013-08-01 2018-02-26 Арселорміттал Сталевий лист з цинковим покриттям
CN108026630B (zh) * 2015-09-24 2020-07-07 夏普株式会社 蒸镀源和蒸镀装置以及蒸镀膜制造方法
CN106198125A (zh) * 2016-08-30 2016-12-07 中国科学院寒区旱区环境与工程研究所 一种气体提取与收集装置
WO2019239185A1 (fr) * 2018-06-13 2019-12-19 Arcelormittal Installation de dépôt sous vide et procédé de revêtement d'un substrat

Also Published As

Publication number Publication date
BR112020010757A2 (pt) 2020-11-17
MX2020006058A (es) 2020-08-20
JP2021507101A (ja) 2021-02-22
RU2741042C1 (ru) 2021-01-22
KR102503599B1 (ko) 2023-02-23
KR20200092996A (ko) 2020-08-04
JP7089031B2 (ja) 2022-06-21
ZA202003072B (en) 2021-08-25
CA3084328A1 (fr) 2019-06-20
WO2019116214A1 (fr) 2019-06-20
CN111479950A (zh) 2020-07-31
EP3724367A1 (fr) 2020-10-21
UA125835C2 (uk) 2022-06-15
AU2018385554B2 (en) 2021-02-25
WO2019116081A1 (fr) 2019-06-20
CA3084328C (fr) 2022-05-31
US20210164088A1 (en) 2021-06-03
AU2018385554A1 (en) 2020-06-11

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