JP7165755B2 - 基板コーティング用真空蒸着設備及び方法 - Google Patents
基板コーティング用真空蒸着設備及び方法 Download PDFInfo
- Publication number
- JP7165755B2 JP7165755B2 JP2020569900A JP2020569900A JP7165755B2 JP 7165755 B2 JP7165755 B2 JP 7165755B2 JP 2020569900 A JP2020569900 A JP 2020569900A JP 2020569900 A JP2020569900 A JP 2020569900A JP 7165755 B2 JP7165755 B2 JP 7165755B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- vacuum deposition
- width
- opening
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
-蒸発管から横方向にかつ所定の経路の幅を横切って延在する再分配チャンバであって、再分配チャンバ内に位置決めされた少なくとも1つの再加熱手段を備える再分配チャンバと、
-蒸気出口オリフィスと、を備え、
蒸気出口オリフィスは、蒸気出口オリフィスと再分配チャンバとを連結する基部開口部と、蒸着チャンバ内に蒸気を出すことができる上部開口部と、基部開口部と上部開口部とを連結する2つの側面と、を具備し、蒸気出口オリフィスの側面が、上部開口部の方向に向かって互いに収束する。
-蒸発管の入口での圧力:5869Pa
-蒸発管の入口での温度:953K
-側面の温度:1042K
-亜鉛の流量:170g/s
-蒸気弁は全開とした。
Claims (8)
- 走行する基板(S)上に、金属又は金属合金から形成されたコーティングを連続的に蒸着させるための真空蒸着設備(1)であって、設備が、
-金属又は金属合金の蒸気を供給するのに適した蒸発るつぼ(4)であって、蒸発管(7)を具備する蒸発るつぼ(4)と、
-基板(S)を所定の経路(P)に沿って走行させるのに適した蒸着チャンバ(2)と、
-蒸気ジェットコータを介して蒸発管を蒸着チャンバに連結する蒸気ジェットコータ(3)と、を備え、
蒸気ジェットコータがさらに、
-蒸発管から横方向にかつ所定の経路の幅を横切って延在する再分配チャンバ(31)であって、再分配チャンバ内に位置決めされた、カートリッジの形態である少なくとも1つの再加熱手段を備える再分配チャンバと、
-蒸気出口オリフィス(32)と、を備え、
蒸気出口オリフィス(32)は、蒸気出口オリフィスと再分配チャンバとを連結する基部開口部(9)と、蒸着チャンバ内に蒸気を出すことができる上部開口部(10)と、基部開口部と上部開口部とを連結する2つの側面(11、12)と、を具備し、蒸気出口オリフィスの側面が、上部開口部の方向に向かって互いに収束する、真空蒸着設備(1)。 - 蒸気出口オリフィスが、所与の経路の幅方向に垂直な平面に沿った断面が台形である、請求項1に記載の真空蒸着設備。
- 蒸気出口オリフィスが、所与の経路の幅方向に垂直な平面に沿った断面が等脚台形である、請求項2に記載の真空蒸着設備。
- 等脚台形の底角が60°より大きい値を有する、請求項3に記載の真空蒸着設備。
- 蒸気出口オリフィス(32)の側面(11、12)が、上部開口部(10)の方向に向かって互いに指数関数的に収束する、請求項1に記載の真空蒸着設備。
- 基部開口部(10)と各側面(11、12)との間の角度が、蒸気出口オリフィスの出口において60°を超える値を有する、請求項5に記載の真空蒸着設備。
- 蒸気出口オリフィスの、基部開口部(9)の幅と上部開口部(10)の幅との比率が1.6~2.4に含まれる、請求項1~6のいずれか一項に記載の真空蒸着設備。
- 側面の長さと基部開口部の幅との比率が4~8に含まれる、請求項1~7のいずれか一項に記載の真空蒸着設備。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IBPCT/IB2018/054419 | 2018-06-15 | ||
PCT/IB2018/054419 WO2019239192A1 (en) | 2018-06-15 | 2018-06-15 | Vacuum deposition facility and method for coating a substrate |
PCT/IB2019/054860 WO2019239314A1 (en) | 2018-06-15 | 2019-06-11 | Vacuum deposition facility and method for coating a substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021526592A JP2021526592A (ja) | 2021-10-07 |
JP7165755B2 true JP7165755B2 (ja) | 2022-11-04 |
Family
ID=63036251
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020569900A Active JP7165755B2 (ja) | 2018-06-15 | 2019-06-11 | 基板コーティング用真空蒸着設備及び方法 |
Country Status (12)
Country | Link |
---|---|
US (1) | US20210238734A1 (ja) |
EP (1) | EP3810822A1 (ja) |
JP (1) | JP7165755B2 (ja) |
KR (1) | KR102538729B1 (ja) |
CN (1) | CN112400034A (ja) |
BR (1) | BR112020025040A2 (ja) |
CA (1) | CA3103386C (ja) |
MA (1) | MA52974A (ja) |
MX (1) | MX2020013600A (ja) |
UA (1) | UA128066C2 (ja) |
WO (2) | WO2019239192A1 (ja) |
ZA (1) | ZA202007502B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113957389B (zh) * | 2020-07-21 | 2023-08-11 | 宝山钢铁股份有限公司 | 一种具有多孔降噪及均匀化分配金属蒸汽的真空镀膜装置 |
KR20230132853A (ko) * | 2021-02-16 | 2023-09-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 도가니, 분배 파이프, 재료 증착 어셈블리, 진공 증착 시스템 및 디바이스를 제조하는 방법 |
DE102021120004A1 (de) * | 2021-08-02 | 2023-02-02 | Thyssenkrupp Steel Europe Ag | Beschichtungsanlage zur Beschichtung eines Gegenstands, Verfahren zum Beschichten eines Gegenstands sowie Verwendung |
WO2023062410A1 (en) | 2021-10-14 | 2023-04-20 | Arcelormittal | Vapour nozzle for pvd |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000096214A (ja) | 1998-09-24 | 2000-04-04 | Leybold Syst Gmbh | 真空蒸着装置のための蒸発装置 |
JP2004079541A (ja) | 2002-08-21 | 2004-03-11 | Eastman Kodak Co | 高分子電場発光材料の層を形成する方法 |
JP2004307877A (ja) | 2003-04-02 | 2004-11-04 | Nippon Biitec:Kk | 薄膜堆積用分子線源とそれを使用した薄膜堆積方法 |
JP2007039785A (ja) | 2005-07-04 | 2007-02-15 | Seiko Epson Corp | 真空蒸着装置及び電気光学装置の製造方法 |
JP2008150649A (ja) | 2006-12-15 | 2008-07-03 | Tokki Corp | 真空蒸着装置 |
JP2015209593A (ja) | 2014-04-24 | 2015-11-24 | リベル | 蒸発セル |
WO2018020311A1 (en) | 2016-07-27 | 2018-02-01 | Arcelormittal | Apparatus and method for vacuum deposition |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2426377A (en) * | 1943-12-07 | 1947-08-26 | Ruben Samuel | Selenium rectifier and method of making |
US2793609A (en) * | 1953-01-26 | 1957-05-28 | British Dielectric Res Ltd | Means for the deposition of materials by evaporation in a vacuum |
GB1483966A (en) * | 1974-10-23 | 1977-08-24 | Sharp Kk | Vapourized-metal cluster ion source and ionized-cluster beam deposition |
US4401052A (en) * | 1979-05-29 | 1983-08-30 | The University Of Delaware | Apparatus for continuous deposition by vacuum evaporation |
JPS5943874A (ja) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | 蒸発材料収容器及びその使用方法 |
JPS6353259A (ja) * | 1986-08-22 | 1988-03-07 | Mitsubishi Electric Corp | 薄膜形成方法 |
DE3923390A1 (de) * | 1988-07-14 | 1990-01-25 | Canon Kk | Vorrichtung zur bildung eines grossflaechigen aufgedampften films unter verwendung von wenigstens zwei getrennt gebildeten aktivierten gasen |
GB9300400D0 (en) * | 1993-01-11 | 1993-03-03 | Glaverbel | A device and method for forming a coating by pyrolysis |
US5820681A (en) * | 1995-05-03 | 1998-10-13 | Chorus Corporation | Unibody crucible and effusion cell employing such a crucible |
JPH09143692A (ja) * | 1995-11-29 | 1997-06-03 | Ishikawajima Harima Heavy Ind Co Ltd | 高蒸気圧金属の気相メッキ装置及び方法 |
BE1010351A6 (fr) * | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US6409839B1 (en) * | 1997-06-02 | 2002-06-25 | Msp Corporation | Method and apparatus for vapor generation and film deposition |
CN1226448C (zh) * | 2002-07-19 | 2005-11-09 | Lg电子株式会社 | 有机场致发光膜蒸镀用蒸镀源 |
US7232588B2 (en) * | 2004-02-23 | 2007-06-19 | Eastman Kodak Company | Device and method for vaporizing temperature sensitive materials |
US7951276B2 (en) * | 2006-06-08 | 2011-05-31 | The Board Of Trustees Of The University Of Illinois | Cluster generator |
US20090081365A1 (en) * | 2007-09-20 | 2009-03-26 | Cok Ronald S | Deposition apparatus for temperature sensitive materials |
EP2048261A1 (fr) | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique |
KR100977374B1 (ko) * | 2009-08-03 | 2010-08-20 | 텔리오솔라 테크놀로지스 인크 | 대면적 박막형 cigs 태양전지 고속증착 및 양산장비, 그 공정방법 |
KR101879805B1 (ko) * | 2012-01-20 | 2018-08-17 | 삼성디스플레이 주식회사 | 박막 증착 장치 및 방법 |
CN103589997A (zh) * | 2013-10-09 | 2014-02-19 | 昆山允升吉光电科技有限公司 | 一种蒸镀用掩模板 |
CN104078626B (zh) * | 2014-07-22 | 2016-07-06 | 深圳市华星光电技术有限公司 | 用于oled材料蒸镀的加热装置 |
WO2017051790A1 (ja) * | 2015-09-24 | 2017-03-30 | シャープ株式会社 | 蒸着源および蒸着装置並びに蒸着膜製造方法 |
KR102098455B1 (ko) * | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
TWI843810B (zh) * | 2019-02-28 | 2024-06-01 | 日商東京威力科創股份有限公司 | 基板處理方法及基板處理裝置 |
-
2018
- 2018-06-15 WO PCT/IB2018/054419 patent/WO2019239192A1/en active Application Filing
-
2019
- 2019-06-11 CN CN201980039758.7A patent/CN112400034A/zh active Pending
- 2019-06-11 MX MX2020013600A patent/MX2020013600A/es unknown
- 2019-06-11 MA MA052974A patent/MA52974A/fr unknown
- 2019-06-11 UA UAA202100142A patent/UA128066C2/uk unknown
- 2019-06-11 KR KR1020207035855A patent/KR102538729B1/ko active IP Right Grant
- 2019-06-11 BR BR112020025040-6A patent/BR112020025040A2/pt unknown
- 2019-06-11 US US16/972,176 patent/US20210238734A1/en active Pending
- 2019-06-11 EP EP19746157.7A patent/EP3810822A1/en active Pending
- 2019-06-11 WO PCT/IB2019/054860 patent/WO2019239314A1/en active Application Filing
- 2019-06-11 JP JP2020569900A patent/JP7165755B2/ja active Active
- 2019-06-11 CA CA3103386A patent/CA3103386C/en active Active
-
2020
- 2020-12-02 ZA ZA2020/07502A patent/ZA202007502B/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000096214A (ja) | 1998-09-24 | 2000-04-04 | Leybold Syst Gmbh | 真空蒸着装置のための蒸発装置 |
JP2004079541A (ja) | 2002-08-21 | 2004-03-11 | Eastman Kodak Co | 高分子電場発光材料の層を形成する方法 |
JP2004307877A (ja) | 2003-04-02 | 2004-11-04 | Nippon Biitec:Kk | 薄膜堆積用分子線源とそれを使用した薄膜堆積方法 |
JP2007039785A (ja) | 2005-07-04 | 2007-02-15 | Seiko Epson Corp | 真空蒸着装置及び電気光学装置の製造方法 |
JP2008150649A (ja) | 2006-12-15 | 2008-07-03 | Tokki Corp | 真空蒸着装置 |
JP2015209593A (ja) | 2014-04-24 | 2015-11-24 | リベル | 蒸発セル |
WO2018020311A1 (en) | 2016-07-27 | 2018-02-01 | Arcelormittal | Apparatus and method for vacuum deposition |
Also Published As
Publication number | Publication date |
---|---|
EP3810822A1 (en) | 2021-04-28 |
MA52974A (fr) | 2021-04-28 |
UA128066C2 (uk) | 2024-03-27 |
US20210238734A1 (en) | 2021-08-05 |
MX2020013600A (es) | 2021-03-09 |
WO2019239192A1 (en) | 2019-12-19 |
CN112400034A (zh) | 2021-02-23 |
WO2019239314A1 (en) | 2019-12-19 |
CA3103386C (en) | 2022-08-30 |
ZA202007502B (en) | 2021-08-25 |
BR112020025040A2 (pt) | 2021-03-23 |
KR20210008095A (ko) | 2021-01-20 |
CA3103386A1 (en) | 2019-12-19 |
JP2021526592A (ja) | 2021-10-07 |
KR102538729B1 (ko) | 2023-05-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7165755B2 (ja) | 基板コーティング用真空蒸着設備及び方法 | |
KR101453583B1 (ko) | 기재를 코팅하는 방법 및 금속 합금 진공 증착 장치 | |
JP7299927B2 (ja) | 基板コーティング用真空蒸着設備及び方法 | |
JP7219780B2 (ja) | 基板コーティング用真空蒸着設備及び方法 | |
JP7301889B2 (ja) | 基板コーティング用真空蒸着設備及び方法 | |
CA3084328C (en) | Vacuum deposition facility and method for coating a substrate | |
RU2775991C1 (ru) | Установка для вакуумного осаждения покрытий и способ нанесения покрытий на подложку | |
AU2018385555B2 (en) | Vacuum deposition facility and method for coating a substrate | |
CA3233070A1 (en) | Vapour nozzle for pvd |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210128 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220128 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220215 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20220510 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220802 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220927 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221024 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7165755 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |