JP7299927B2 - 基板コーティング用真空蒸着設備及び方法 - Google Patents
基板コーティング用真空蒸着設備及び方法 Download PDFInfo
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- Physical Vapour Deposition (AREA)
Description
-前記真空チャンバ内で、金属蒸気が、走行する基板の両面に向かって、少なくとも2つの蒸気噴射器を通して噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が各面に形成され、互いに対向する少なくとも2つの蒸気噴射器が、基板平面内にある軸線Aであって、基板の走行方向に直角な軸線Aと蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって規定され、前記蒸気噴射器が同じ回転軸を有する工程を備える。
互いに対向する少なくとも2つの蒸気噴射器を備え、蒸気噴射器は、基板平面内にある軸線Aであって、基板の走行方向に直角な軸線A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって画定され、前記蒸気噴射器が同じ回転軸を有する。
2つの蒸気噴射器から亜鉛蒸気を噴射する方法の効率を評価するために、真空蒸着設備を用いたモデリングテストを実施した。
Claims (15)
- 真空チャンバ(2)を備える真空蒸着設備(1)内で、走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させる方法であって、本方法が、
-前記真空チャンバ内で、金属蒸気が、走行する基板の両面に向かって、少なくとも2つの蒸気噴射器(3、3’)を通して噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が各面に形成され、互いに対向する少なくとも2つの蒸気噴射器が、基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって画定され、一方の前記蒸気噴射器の回転中心と、他方の前記蒸気噴射器の回転中心とは、同じ直線上にある工程を備える方法。 - 噴射器と基板端部との距離D1及びD2が、0mmより大きい、つまり、噴射器端部が基板端部を超えない、請求項1に記載の方法。
- D1及び2が0mmである、すなわち、基板端部が噴射器端部と同じ平面にある、請求項1に記載の方法。
- D1及びD2が0mm未満、すなわち、噴射器端部が基板端部を超える、請求項1に記載の方法。
- 基板幅Wsが最大2200mmである、請求項1~4のいずれか一項に記載の方法。
- Wsが最小200mmである、請求項1~5のいずれか一項に記載の方法。
- α’が、絶対値でα-α’<10°であるような、請求項1~6のいずれか一項に記載の方法。
- αが絶対値で0°~60°である、請求項7に記載の方法。
- αが絶対値で10°~50°である、請求項8に記載の方法。
- αが絶対値で20°~35°である、請求項9に記載の方法。
- 噴射器(3、3’)が長方形又は台形である、請求項1~10のいずれか一項に記載の方法。
- D1がD2と同じである、請求項1~11のいずれか一項に記載の方法。
- 真空チャンバが、基板を囲む中央ケーシング(6)をさらに備え、前記中央ケーシングが、中央ケーシングの2つの反対側に配置された基板入口(7)及び基板出口(8)と、少なくとも2つの蒸気噴射器とを備える、請求項1~12のいずれか一項に記載の方法。
- 中央ケーシング(6)の内壁が、金属又は金属合金の蒸気の凝縮温度よりも高い温度で加熱されるのに適している、請求項13項に記載の方法。
- 走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させる、請求項1~14のいずれか一項に記載の方法のための真空蒸着設備であって、設備(1)は、基板(3)が所定の経路に沿って走行可能な真空チャンバ(2)を備え、真空チャンバが、
-互いに対向する少なくとも2つの蒸気噴射器を備え、蒸気噴射器は、基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって画定され、一方の前記蒸気噴射器の回転中心と、他方の前記蒸気噴射器の回転中心とは、同じ直線上にあり、少なくとも2つの蒸気噴射器が、α及びα’が調整されるように、蒸気源に連結された供給管を中心に回転可能に取り付けられる、真空蒸着。
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Application Number | Priority Date | Filing Date | Title |
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PCT/IB2018/054302 WO2019239186A1 (en) | 2018-06-13 | 2018-06-13 | Vacuum deposition facility and method for coating a substrate |
IBPCT/IB2018/054302 | 2018-06-13 | ||
PCT/IB2019/053341 WO2019239229A1 (en) | 2018-06-13 | 2019-04-23 | Vacuum deposition facility and method for coating a substrate |
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JP2021527168A JP2021527168A (ja) | 2021-10-11 |
JP7299927B2 true JP7299927B2 (ja) | 2023-06-28 |
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US (1) | US20210238735A1 (ja) |
EP (1) | EP3807439A1 (ja) |
JP (1) | JP7299927B2 (ja) |
KR (1) | KR102493115B1 (ja) |
CN (1) | CN112272714B (ja) |
BR (1) | BR112020025193A2 (ja) |
CA (1) | CA3103376C (ja) |
MA (1) | MA52866A (ja) |
MX (1) | MX2020013582A (ja) |
RU (1) | RU2755323C1 (ja) |
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WO2019239185A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
DE102021117574A1 (de) | 2021-07-07 | 2023-01-12 | Thyssenkrupp Steel Europe Ag | Beschichtungsanlage zur Beschichtung eines flächigen Gegenstands sowie ein Verfahren zum Beschichten eines flächigen Gegenstands |
DE102021117576B4 (de) | 2021-07-07 | 2023-02-09 | Thyssenkrupp Steel Europe Ag | Beschichtungsanlage zur Beschichtung eines Gegenstands |
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JP2007262540A (ja) | 2006-03-29 | 2007-10-11 | Jfe Steel Kk | 化学蒸着処理の原料ガス供給用ノズルと被膜形成方法および方向性電磁鋼板 |
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JPS6326351A (ja) * | 1986-07-18 | 1988-02-03 | Kawasaki Steel Corp | 真空蒸着用の蒸発源装置 |
JP3463693B2 (ja) * | 1992-10-29 | 2003-11-05 | 石川島播磨重工業株式会社 | 連続帯状物用真空蒸着装置 |
BE1010351A6 (fr) * | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US6202591B1 (en) * | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
JP4346336B2 (ja) * | 2003-04-02 | 2009-10-21 | 三洋電機株式会社 | 有機el表示装置の製造方法 |
CA2572817C (en) * | 2004-07-16 | 2014-02-11 | Dofasco Inc. | Monitor system for coating apparatus |
US20080245300A1 (en) * | 2006-12-04 | 2008-10-09 | Leybold Optics Gmbh | Apparatus and method for continuously coating strip substrates |
EP1972699A1 (fr) * | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
EP2048261A1 (fr) | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique |
EP2199425A1 (fr) * | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
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DE102013206598B4 (de) * | 2013-04-12 | 2019-06-27 | VON ARDENNE Asset GmbH & Co. KG | Vakuumbeschichtungsanlage |
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JP2007262540A (ja) | 2006-03-29 | 2007-10-11 | Jfe Steel Kk | 化学蒸着処理の原料ガス供給用ノズルと被膜形成方法および方向性電磁鋼板 |
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EP3807439A1 (en) | 2021-04-21 |
MX2020013582A (es) | 2021-02-26 |
US20210238735A1 (en) | 2021-08-05 |
MA52866A (fr) | 2021-04-28 |
CN112272714A (zh) | 2021-01-26 |
JP2021527168A (ja) | 2021-10-11 |
CN112272714B (zh) | 2023-02-17 |
WO2019239229A1 (en) | 2019-12-19 |
BR112020025193A2 (pt) | 2021-03-09 |
KR102493115B1 (ko) | 2023-01-27 |
KR20210009354A (ko) | 2021-01-26 |
RU2755323C1 (ru) | 2021-09-15 |
CA3103376A1 (en) | 2019-12-19 |
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