JP2021527168A - 基板コーティング用真空蒸着設備及び方法 - Google Patents
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- 239000000758 substrate Substances 0.000 title claims abstract description 98
- 238000000034 method Methods 0.000 title claims abstract description 34
- 238000000576 coating method Methods 0.000 title claims abstract description 19
- 239000011248 coating agent Substances 0.000 title claims abstract description 18
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 41
- 239000002184 metal Substances 0.000 claims abstract description 40
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 229910000831 Steel Inorganic materials 0.000 claims description 18
- 239000010959 steel Substances 0.000 claims description 18
- 238000009833 condensation Methods 0.000 claims description 8
- 230000005494 condensation Effects 0.000 claims description 8
- 239000011701 zinc Substances 0.000 claims description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 5
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 238000010793 Steam injection (oil industry) Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 abstract description 3
- 238000001816 cooling Methods 0.000 description 17
- 238000010438 heat treatment Methods 0.000 description 6
- 229910009369 Zn Mg Inorganic materials 0.000 description 5
- 229910007573 Zn-Mg Inorganic materials 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000005489 elastic deformation Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- PGTXKIZLOWULDJ-UHFFFAOYSA-N [Mg].[Zn] Chemical compound [Mg].[Zn] PGTXKIZLOWULDJ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000001540 jet deposition Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- Physical Vapour Deposition (AREA)
Abstract
Description
−前記真空チャンバ内で、金属蒸気が、走行する基板の両面に向かって、少なくとも2つの蒸気噴射器を通して噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が各面に形成され、互いに対向する少なくとも2つの蒸気噴射器が、基板平面内にある軸線Aであって、基板の走行方向に直角な軸線Aと蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって規定され、前記蒸気噴射器が同じ回転軸を有する工程を備える。
互いに対向する少なくとも2つの蒸気噴射器を備え、蒸気噴射器は、基板平面内にある軸線Aであって、基板の走行方向に直角な軸線A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって画定され、前記蒸気噴射器が同じ回転軸を有する。
2つの蒸気噴射器から亜鉛蒸気を噴射する方法の効率を評価するために、真空蒸着設備を用いたモデリングテストを実施した。
Claims (19)
- 真空チャンバ(2)を備える真空蒸着設備(1)内で、走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させる方法であって、本方法が、
−前記真空チャンバ内で、金属蒸気が、走行する基板の両面に向かって、少なくとも2つの蒸気噴射器(3、3’)を通して噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が各面に形成され、互いに対向する少なくとも2つの蒸気噴射器が、基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって画定され、前記蒸気噴射器が同じ回転軸を有する工程を備える方法。 - 噴射器と基板端部との距離D1及びD2が、0mmより大きい、つまり、噴射器端部が基板端部を超えない、請求項1に記載の方法。
- D1及び2が0mmである、すなわち、基板端部が噴射器端部と同じ平面にある、請求項1に記載の方法。
- D1及びD2が0mm未満、すなわち、噴射器端部が基板端部を超える、請求項1に記載の方法。
- 基板幅Wsが最大2200mmである、請求項1〜4のいずれか一項に記載の方法。
- Wsが最小200mmである、請求項1〜5のいずれか一項に記載の方法。
- α’が、絶対値でα−α’<10°であるような、請求項1〜6のいずれか一項に記載の方法。
- αが絶対値で0°〜60°である、請求項7に記載の方法。
- αが絶対値で10°〜50°である、請求項8に記載の方法。
- αが絶対値で20°〜35°である、請求項9に記載の方法。
- 噴射器(3、3’)が長方形又は台形である、請求項1〜10のいずれか一項に記載の方法。
- D1がD2と同じである、請求項1〜11のいずれか一項に記載の方法。
- 真空チャンバが、基板を囲む中央ケーシング(6)をさらに備え、前記中央ケーシングが、中央ケーシングの2つの反対側に配置された基板入口(7)及び基板出口(8)と、少なくとも2つの蒸気噴射器とを備える、請求項1〜12のいずれか一項に記載の方法。
- 中央ケーシング(6)の内壁が、金属又は金属合金の蒸気の凝縮温度よりも高い温度で加熱されるのに適している、請求項13項に記載の方法。
- 長手方向の最大変形が2mm未満であり、横方向の最大変形が5mm未満である、基板の両面に少なくとも1つの金属でコーティングされた、請求項1〜14のいずれか一項に記載の方法から得ることができる金属基板。
- 金属が、亜鉛、クロム、ニッケル、チタン、マンガン、マグネシウム、ケイ素及びアルミニウム、又はそれらの混合物から選択される、請求項15に記載の金属基板。
- 金属基板が鋼基板である、請求項15又は16に記載の金属基板。
- 走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させる、請求項1〜14のいずれか一項に記載の方法のための真空蒸着設備であって、設備(1)は、基板(3)が所定の経路に沿って走行可能な真空チャンバ(2)を備え、真空チャンバが、
−互いに対向する少なくとも2つの蒸気噴射器を備え、蒸気噴射器は、基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の距離であり、Wsは基板幅であり、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの幅Weによって画定され、前記蒸気噴射器が、同じ回転軸を有する、真空蒸着設備。 - 少なくとも2つの蒸気噴射器が、α及びα’が調整されるように、蒸気源に連結された供給管を中心に回転可能に取り付けられる、請求項18に記載の真空蒸着。
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DE102021117574A1 (de) | 2021-07-07 | 2023-01-12 | Thyssenkrupp Steel Europe Ag | Beschichtungsanlage zur Beschichtung eines flächigen Gegenstands sowie ein Verfahren zum Beschichten eines flächigen Gegenstands |
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WO2019239186A1 (en) | 2019-12-19 |
CN112272714B (zh) | 2023-02-17 |
CN112272714A (zh) | 2021-01-26 |
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MA52866A (fr) | 2021-04-28 |
US12091744B2 (en) | 2024-09-17 |
UA128404C2 (uk) | 2024-07-03 |
KR20210009354A (ko) | 2021-01-26 |
ZA202007642B (en) | 2022-01-26 |
BR112020025193A2 (pt) | 2021-03-09 |
US20210238735A1 (en) | 2021-08-05 |
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CA3103376C (en) | 2023-03-28 |
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JP7299927B2 (ja) | 2023-06-28 |
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RU2755323C1 (ru) | 2021-09-15 |
KR102493115B1 (ko) | 2023-01-27 |
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