JP7301889B2 - 基板コーティング用真空蒸着設備及び方法 - Google Patents
基板コーティング用真空蒸着設備及び方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Description
-金属蒸気が、走行する基板の片面S1に向かって、少なくとも1つの蒸気噴射器を通して噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が前記片面に形成され、少なくとも1つの蒸気噴射器であって、蒸気噴射器は、基板平面内にある軸線Aであって、基板の走行方向に直角な軸線Aと蒸気噴射器との角度αで位置決めされ、αは、
αは絶対値で0°より大きく、
D1及びD2は、軸線Aに沿った噴射器端部と各基板端部との間の距離であり、Wsは基板幅であり、D1及びD2は0mmより大きい工程を備え、
-前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定される。
-少なくとも1つの蒸気噴射器であって、蒸気噴射器は、基板平面内にある軸線Aであって、基板の走行方向に直角な軸線Aと蒸気噴射器との角度αで位置決めされ、αは以下の式、
α絶対値で0°より大きく、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の最小距離であり、Wsは基板幅であり、D1及びD2は0mmより大きい少なくとも1つの蒸気噴射器を備え、
-蒸気噴射器は、細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定される。
亜鉛蒸気を噴射する1つのジェット蒸気コータを備える方法の効率を評価するために、真空蒸着設備でテストを実施した。幅Wsが1200mmの鋼基板の片面S1に、Le=24mm、We=1750mmの少なくとも1つの噴射器を備える真空チャンバ内で、亜鉛蒸気を蒸着させた。試験では、D1及びD2は同じであり、-10mm~+20mmの間に固定した。ここで、-10mmとは、蒸気噴射器の端部が基板端部を10mm超えて延在していることを意味し、αは、本発明による数式を用いて、各試験について算出した。真空圧は10-1ミリバールであった。鋼基板の反対面S2の金属蓄積は、蛍光X線分光法によって測定した。結果を以下の表1に示す。
Claims (11)
- 真空チャンバ(2)を備える真空蒸着設備(1)内で、走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させる方法であって、方法が、
-前記真空チャンバ内で、金属蒸気が、走行する基板の片面(S1)に向かって、少なくとも1つの蒸気噴射器(3)を通して音速で噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が前記片面に形成され、少なくとも1つの蒸気噴射器が、基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度αで位置決めされ、αは以下の式、
αは絶対値で0°より大きい工程を備え、
-D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間のより小さい方の距離であり、Wsは基板幅であり、D1及びD2は0mmより大きい、すなわち、噴射器端部は基板端部を超えず、前記蒸気噴射器が、細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定される、方法。 - D1及びD2が、互いに独立して1mmより大きい、請求項1に記載の方法。
- 基板幅Wsが最大2200mmである、請求項1又は2に記載の方法。
- Wsが最小200mmである、請求項1~3のいずれか一項に記載の方法。
- αが絶対値で5°~80°である、請求項4に記載の方法。
- αが絶対値で20°~60°である、請求項5に記載の方法。
- αが絶対値で35°~55°である、請求項6に記載の方法。
- 噴射器スプリットの長さLeが5mm~50mmである、請求項1~7のいずれか一項に記載の方法。
- 噴射器が長方形又は台形である、請求項1~8のいずれか一項に記載の方法。
- D1がD2と同じである、請求項1~9のいずれか一項に記載の方法。
- 走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させる、請求項1~10のいずれか一項に記載の方法のための真空蒸着設備であって、設備(1)が、基板が所定の経路に沿って走行可能な真空チャンバ(2)を備え、真空チャンバが、
-少なくとも1つの蒸気噴射器(3)をさらに備え、蒸気噴射器(3)は、基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度αで位置決めされ、αは以下の式、
αは絶対値で0°より大きく、
D1及びD2は、軸線(A)に沿った、噴射器端部と各基板端部との間の最小距離であり、Wsは基板幅であり、D1及びD2は0mmより大きい、すなわち、噴射器端部は基板端部を超えず、
-少なくとも一つの蒸気噴射器は、細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定され、少なくとも1つの蒸気ジェットコータが、αが調整されるように、蒸気源に連結された供給管を中心に回転可能に取り付けられ、且つ、蒸気噴射器は、金属蒸気を音速で噴射することができる、真空蒸着。
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IBPCT/IB2018/054297 | 2018-06-13 | ||
PCT/IB2018/054297 WO2019239184A1 (en) | 2018-06-13 | 2018-06-13 | Vacuum deposition facility and method for coating a substrate |
PCT/IB2019/053337 WO2019239227A1 (en) | 2018-06-13 | 2019-04-23 | Vacuum deposition facility and method for coating a substrate |
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JP2021526590A JP2021526590A (ja) | 2021-10-07 |
JP7301889B2 true JP7301889B2 (ja) | 2023-07-03 |
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US (1) | US20210254205A1 (ja) |
EP (1) | EP3807437A1 (ja) |
JP (1) | JP7301889B2 (ja) |
KR (2) | KR20210009350A (ja) |
CN (1) | CN112272713B (ja) |
BR (1) | BR112020025130A2 (ja) |
CA (1) | CA3103206C (ja) |
MA (1) | MA52864A (ja) |
MX (1) | MX2020013581A (ja) |
RU (1) | RU2755324C1 (ja) |
UA (1) | UA126838C2 (ja) |
WO (2) | WO2019239184A1 (ja) |
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WO2019239185A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
DE102021117574A1 (de) * | 2021-07-07 | 2023-01-12 | Thyssenkrupp Steel Europe Ag | Beschichtungsanlage zur Beschichtung eines flächigen Gegenstands sowie ein Verfahren zum Beschichten eines flächigen Gegenstands |
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JP2014132102A (ja) | 2013-01-04 | 2014-07-17 | Panasonic Corp | 蒸着装置 |
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JPS6326351A (ja) * | 1986-07-18 | 1988-02-03 | Kawasaki Steel Corp | 真空蒸着用の蒸発源装置 |
JP3463693B2 (ja) * | 1992-10-29 | 2003-11-05 | 石川島播磨重工業株式会社 | 連続帯状物用真空蒸着装置 |
BE1010351A6 (fr) | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US6202591B1 (en) * | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
EP1174526A1 (en) * | 2000-07-17 | 2002-01-23 | Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO | Continuous vapour deposition |
JP4346336B2 (ja) * | 2003-04-02 | 2009-10-21 | 三洋電機株式会社 | 有機el表示装置の製造方法 |
JP2007262540A (ja) * | 2006-03-29 | 2007-10-11 | Jfe Steel Kk | 化学蒸着処理の原料ガス供給用ノズルと被膜形成方法および方向性電磁鋼板 |
US20080245300A1 (en) * | 2006-12-04 | 2008-10-09 | Leybold Optics Gmbh | Apparatus and method for continuously coating strip substrates |
EP1972699A1 (fr) * | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
EP2048261A1 (fr) * | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique |
EP2199425A1 (fr) * | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
DE102010040044B4 (de) * | 2010-08-31 | 2014-03-06 | Von Ardenne Anlagentechnik Gmbh | Beschichtungsanlage und Verfahren für eine physikalische Gasphasenabscheidung |
DE102013206598B4 (de) * | 2013-04-12 | 2019-06-27 | VON ARDENNE Asset GmbH & Co. KG | Vakuumbeschichtungsanlage |
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MA52864A (fr) | 2021-04-21 |
WO2019239227A1 (en) | 2019-12-19 |
CN112272713A (zh) | 2021-01-26 |
CA3103206A1 (en) | 2019-12-19 |
KR20230093348A (ko) | 2023-06-27 |
UA126838C2 (uk) | 2023-02-08 |
EP3807437A1 (en) | 2021-04-21 |
RU2755324C1 (ru) | 2021-09-15 |
JP2021526590A (ja) | 2021-10-07 |
CA3103206C (en) | 2022-10-25 |
BR112020025130A2 (pt) | 2021-03-23 |
US20210254205A1 (en) | 2021-08-19 |
ZA202007614B (en) | 2021-08-25 |
CN112272713B (zh) | 2023-09-19 |
KR20210009350A (ko) | 2021-01-26 |
WO2019239184A1 (en) | 2019-12-19 |
MX2020013581A (es) | 2021-02-26 |
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