KR950702326A - 비소멸성 메모리장치, 비소멸성 메모리셀 및 다수의 트랜지스터의 각각과 비소멸성 메모리셀의 스레솔드값의 조절방법(non-volatile memory device, non-volatile memory cell and method of adjusting the threshold value of the non-volatile memory cell and each of plural transistors) - Google Patents

비소멸성 메모리장치, 비소멸성 메모리셀 및 다수의 트랜지스터의 각각과 비소멸성 메모리셀의 스레솔드값의 조절방법(non-volatile memory device, non-volatile memory cell and method of adjusting the threshold value of the non-volatile memory cell and each of plural transistors)

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Publication number
KR950702326A
KR950702326A KR1019940704807A KR19940704807A KR950702326A KR 950702326 A KR950702326 A KR 950702326A KR 1019940704807 A KR1019940704807 A KR 1019940704807A KR 19940704807 A KR19940704807 A KR 19940704807A KR 950702326 A KR950702326 A KR 950702326A
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KR
South Korea
Prior art keywords
volatile memory
adjusting
transistors
memory cell
memory cells
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KR1019940704807A
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English (en)
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KR0156590B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR950702326A publication Critical patent/KR950702326A/ko
Application granted granted Critical
Publication of KR0156590B1 publication Critical patent/KR0156590B1/ko

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/3468Prevention of overerasure or overprogramming, e.g. by verifying whilst erasing or writing
    • G11C16/3477Circuits or methods to prevent overerasing of nonvolatile memory cells, e.g. by detecting onset or cessation of current flow in cells and using the detector output to terminate erasing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628Programming or writing circuits; Data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628Programming or writing circuits; Data input circuits
    • G11C11/5635Erasing circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5642Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0491Virtual ground arrays
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • G11C16/16Circuits for erasing electrically, e.g. erase voltage switching circuits for erasing blocks, e.g. arrays, words, groups
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/26Sensing or reading circuits; Data output circuits
    • G11C16/28Sensing or reading circuits; Data output circuits using differential sensing or reference cells, e.g. dummy cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/30Power supply circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/3468Prevention of overerasure or overprogramming, e.g. by verifying whilst erasing or writing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C27/00Electric analogue stores, e.g. for storing instantaneous values
    • G11C27/005Electric analogue stores, e.g. for storing instantaneous values with non-volatile charge storage, e.g. on floating gate or MNOS
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/24Bit-line control circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2211/00Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/56Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
    • G11C2211/564Miscellaneous aspects
    • G11C2211/565Multilevel memory comprising elements in triple well structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)
  • Static Random-Access Memory (AREA)
KR1019940704807A 1993-05-11 1994-05-11 비소멸성 메모리장치, 비소멸성 메모리셀 및 다수의 트랜지스터의 각각과 비소멸성 메모리셀의 스레솔드값의 조절방법 KR0156590B1 (ko)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP10957393 1993-05-11
JP93-109573 1993-05-11
JP93-210295 1993-08-25
JP21029593 1993-08-25
JP93-298103 1993-11-29
JP29810393 1993-11-29
JP93-327213 1993-12-24
JP32721393 1993-12-24
PCT/JP1994/000759 WO1994027295A1 (en) 1993-05-11 1994-05-11 Non-volatile memory device and method for adjusting the threshold value thereof

Publications (2)

Publication Number Publication Date
KR950702326A true KR950702326A (ko) 1995-06-19
KR0156590B1 KR0156590B1 (ko) 1998-12-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940704807A KR0156590B1 (ko) 1993-05-11 1994-05-11 비소멸성 메모리장치, 비소멸성 메모리셀 및 다수의 트랜지스터의 각각과 비소멸성 메모리셀의 스레솔드값의 조절방법

Country Status (7)

Country Link
US (2) US5748530A (ko)
JP (1) JPH07508121A (ko)
KR (1) KR0156590B1 (ko)
DE (2) DE4493150C2 (ko)
GB (1) GB2283345B (ko)
TW (1) TW357336B (ko)
WO (1) WO1994027295A1 (ko)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5576991A (en) * 1994-07-01 1996-11-19 Advanced Micro Devices, Inc. Multistepped threshold convergence for a flash memory array
JPH08329691A (ja) * 1995-05-30 1996-12-13 Nkk Corp 不揮発性半導体記憶装置
US5912489A (en) * 1996-06-18 1999-06-15 Advanced Micro Devices, Inc. Dual source side polysilicon select gate structure utilizing single tunnel oxide for NAND array flash memory
KR980005016A (ko) * 1996-06-29 1998-03-30 김주용 플래쉬 메모리 소자의 소거방법
US5822250A (en) * 1996-08-30 1998-10-13 Texas Instruments Incorporated Circuit and process for autotrim of embedded threshold voltage reference bit
JP3114630B2 (ja) * 1996-10-03 2000-12-04 日本電気株式会社 不揮発性半導体メモリおよび書込み読出し方法
JP3299900B2 (ja) * 1996-12-27 2002-07-08 シャープ株式会社 不揮発性メモリ及びその動作方法
JPH10222994A (ja) * 1997-02-06 1998-08-21 Mitsubishi Electric Corp 半導体記憶装置の読み出し電圧制御装置
GB2325546B (en) * 1997-05-21 2001-10-17 Motorola Inc Electrically programmable memory and method of programming
JPH1186579A (ja) * 1997-09-09 1999-03-30 Rohm Co Ltd Eeprom装置
US5903499A (en) * 1997-09-12 1999-05-11 Taiwan Semiconductor Manufacturing Company, Ltd. Method to erase a flash EEPROM using negative gate source erase followed by a high negative gate erase
US5828605A (en) * 1997-10-14 1998-10-27 Taiwan Semiconductor Manufacturing Company Ltd. Snapback reduces the electron and hole trapping in the tunneling oxide of flash EEPROM
US5978278A (en) * 1997-11-24 1999-11-02 Aplus Integrated Circuits, Inc. Flash memory having low threshold voltage distribution
EP0936626B1 (de) * 1998-02-12 2004-02-11 Infineon Technologies AG Elektrisch programmierbarer Nur-Lese-Speicher sowie Verfahren zum Programmieren und Lesen dieses Speichers
EP1012846B1 (en) * 1998-06-12 2004-03-31 Macronix International Co., Ltd. Channel fn program/erase recovery scheme
US7139196B2 (en) * 1999-01-14 2006-11-21 Silicon Storage Technology, Inc. Sub-volt sensing for digital multilevel flash memory
JP3425881B2 (ja) * 1999-02-25 2003-07-14 Necエレクトロニクス株式会社 不揮発性半導体記憶装置及び不揮発性半導体記憶装置におけるデータの消去方法
US6297989B1 (en) 1999-02-26 2001-10-02 Micron Technology, Inc. Applications for non-volatile memory cells
US6256225B1 (en) 1999-02-26 2001-07-03 Micron Technology, Inc. Construction and application for non-volatile reprogrammable switches
US6452856B1 (en) 1999-02-26 2002-09-17 Micron Technology, Inc. DRAM technology compatible processor/memory chips
US6380581B1 (en) 1999-02-26 2002-04-30 Micron Technology, Inc. DRAM technology compatible non volatile memory cells with capacitors connected to the gates of the transistors
JP3892612B2 (ja) * 1999-04-09 2007-03-14 株式会社東芝 半導体装置
KR100370164B1 (ko) * 2000-12-20 2003-01-30 주식회사 하이닉스반도체 비트라인의 누설전류 보상이 가능한 풀업회로
DE50212506D1 (de) * 2002-02-25 2008-08-28 Infineon Technologies Ag Verfahren zum Auslesen des Inhalts einer Speicherzelle zum Speichern von Daten
US6809986B2 (en) * 2002-08-29 2004-10-26 Micron Technology, Inc. System and method for negative word line driver circuit
EP1597733B1 (de) * 2003-02-27 2009-12-02 Infineon Technologies AG Verfahren zum auslesen von uniform-channel-program-flash memory zellen
US6839299B1 (en) * 2003-07-24 2005-01-04 International Business Machines Corporation Method and structure for reducing gate leakage and threshold voltage fluctuation in memory cells
US7177199B2 (en) * 2003-10-20 2007-02-13 Sandisk Corporation Behavior based programming of non-volatile memory
US20070012661A1 (en) * 2005-07-13 2007-01-18 Vasilyeva Irina V Silicon nitride passivation layers having oxidized interface
US7301817B2 (en) 2005-10-27 2007-11-27 Sandisk Corporation Method for programming of multi-state non-volatile memory using smart verify
US7366022B2 (en) * 2005-10-27 2008-04-29 Sandisk Corporation Apparatus for programming of multi-state non-volatile memory using smart verify
JP5012802B2 (ja) * 2006-07-25 2012-08-29 富士通株式会社 不揮発性半導体記憶装置
US7570520B2 (en) * 2006-12-27 2009-08-04 Sandisk Corporation Non-volatile storage system with initial programming voltage based on trial
US7551482B2 (en) * 2006-12-27 2009-06-23 Sandisk Corporation Method for programming with initial programming voltage based on trial
US7630246B2 (en) * 2007-06-18 2009-12-08 Micron Technology, Inc. Programming rate identification and control in a solid state memory
US7599224B2 (en) 2007-07-03 2009-10-06 Sandisk Corporation Systems for coarse/fine program verification in non-volatile memory using different reference levels for improved sensing
US7508715B2 (en) 2007-07-03 2009-03-24 Sandisk Corporation Coarse/fine program verification in non-volatile memory using different reference levels for improved sensing
US8391078B2 (en) * 2008-02-12 2013-03-05 Chip Memory Technology, Inc. Method and apparatus of operating a non-volatile DRAM
US8460947B2 (en) * 2008-09-24 2013-06-11 Hewlett-Packard Development Company, L.P. Fluid ejection device and method
CN102005242B (zh) * 2009-08-28 2013-05-29 中芯国际集成电路制造(上海)有限公司 电阻随机存储器及其驱动方法
FR3041807B1 (fr) * 2015-09-24 2017-12-08 Stmicroelectronics Rousset Procede de controle d'un cycle d'ecriture de memoire de type eeprom et dispositif correspondant

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5346621A (en) * 1976-10-08 1978-04-26 Maruzen Sewing Machine Control device for motorrdriven sewing machine
US4282446A (en) * 1979-10-01 1981-08-04 Texas Instruments Incorporated High density floating gate EPROM programmable by charge storage
US4432072A (en) * 1981-12-31 1984-02-14 International Business Machines Corporation Non-volatile dynamic RAM cell
EP0103681B1 (de) * 1982-07-28 1986-07-30 F. HOFFMANN-LA ROCHE & CO. Aktiengesellschaft Tetra- und pentacyclische Monoester
AU2012483A (en) * 1982-10-13 1984-04-19 Commonwealth Of Australia, The Cheese production using spectrophotometric analysis
EP0108681A3 (en) * 1982-11-04 1986-10-15 FAIRCHILD CAMERA & INSTRUMENT CORPORATION Bit erasable electrically erasable programmable read only memory
JPS5990292A (ja) * 1982-11-12 1984-05-24 Toshiba Corp 電圧変換回路
US4649520A (en) * 1984-11-07 1987-03-10 Waferscale Integration Inc. Single layer polycrystalline floating gate
JP2530821B2 (ja) * 1985-07-01 1996-09-04 日本電気株式会社 半導体メモリ
JPS62266793A (ja) * 1986-05-13 1987-11-19 Mitsubishi Electric Corp 不揮発性半導体記憶装置
US4931997A (en) * 1987-03-16 1990-06-05 Hitachi Ltd. Semiconductor memory having storage buffer to save control data during bulk erase
US4797856A (en) * 1987-04-16 1989-01-10 Intel Corporation Self-limiting erase scheme for EEPROM
JPS6432494A (en) * 1987-07-27 1989-02-02 Mitsubishi Electric Corp Non-volatile semiconductor storage device
US5075888A (en) * 1988-01-09 1991-12-24 Sharp Kabushiki Kaisha Semiconductor memory device having a volatile memory device and a non-volatile memory device
JPH01184781A (ja) * 1988-01-18 1989-07-24 Tokyo Keiki Co Ltd メモリパッケージシステム
JPH02166764A (ja) * 1988-12-20 1990-06-27 Mitsubishi Electric Corp 容量素子を有する半導体装置およびその製造方法
JP2645122B2 (ja) * 1989-01-20 1997-08-25 株式会社東芝 不揮発性半導体メモリ
US5179536A (en) * 1989-01-31 1993-01-12 Fujitsu Limited Semiconductor memory device having means for replacing defective memory cells
US5283758A (en) * 1989-06-13 1994-02-01 Mitsubishi Denki Kabushiki Kaisha Non-volatile semiconductor memory device
JP2726503B2 (ja) * 1989-08-09 1998-03-11 川崎製鉄株式会社 集積回路
US5126808A (en) * 1989-10-23 1992-06-30 Advanced Micro Devices, Inc. Flash EEPROM array with paged erase architecture
JP3099887B2 (ja) * 1990-04-12 2000-10-16 株式会社東芝 不揮発性半導体記憶装置
US5132935A (en) * 1990-04-16 1992-07-21 Ashmore Jr Benjamin H Erasure of eeprom memory arrays to prevent over-erased cells
DE69032937T2 (de) * 1990-07-24 1999-06-17 St Microelectronics Srl Verfahren zur Herstellung einer N-Kanal-EPROM-Zelle mit einer einzigen Polysiliziumschicht
JP2754887B2 (ja) * 1990-08-24 1998-05-20 三菱電機株式会社 不揮発性半導体記憶装置及びその書き込み・消去方法
JPH04155694A (ja) * 1990-10-18 1992-05-28 Fujitsu Ltd 半導体記憶装置
US5282161A (en) * 1990-12-31 1994-01-25 Sgs-Thomson Microelectronics S.R.L. Eeprom cell having a read interface isolated from the write/erase interface
JPH05109292A (ja) * 1991-10-14 1993-04-30 Toshiba Corp 不揮発性半導体記憶装置
JPH05189988A (ja) * 1992-01-10 1993-07-30 Sharp Corp 半導体記憶装置
JPH05235368A (ja) * 1992-02-19 1993-09-10 Nec Corp データ消去方法
US5491656A (en) * 1992-04-24 1996-02-13 Nippon Steel Corporation Non-volatile semiconductor memory device and a method of using the same
JP2541087B2 (ja) * 1992-10-30 1996-10-09 日本電気株式会社 不揮発性半導体記憶装置のデ―タ消去方法

Also Published As

Publication number Publication date
GB2283345B (en) 1997-11-12
WO1994027295A1 (en) 1994-11-24
GB2283345A (en) 1995-05-03
DE4493150T1 (de) 1995-07-20
JPH07508121A (ja) 1995-09-07
TW357336B (en) 1999-05-01
US5748530A (en) 1998-05-05
US5729494A (en) 1998-03-17
DE4493150C2 (de) 2000-10-26
KR0156590B1 (ko) 1998-12-01
GB9424539D0 (en) 1995-02-15

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