KR950034579A - 플라즈마 처리방법 및 장치 - Google Patents

플라즈마 처리방법 및 장치 Download PDF

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Publication number
KR950034579A
KR950034579A KR1019950005081A KR19950005081A KR950034579A KR 950034579 A KR950034579 A KR 950034579A KR 1019950005081 A KR1019950005081 A KR 1019950005081A KR 19950005081 A KR19950005081 A KR 19950005081A KR 950034579 A KR950034579 A KR 950034579A
Authority
KR
South Korea
Prior art keywords
microwave
plasma processing
microwaves
processing apparatus
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019950005081A
Other languages
English (en)
Korean (ko)
Inventor
세이이찌 와따나베
무네오 후루세
시게루 시라요네
데쯔노리 가지
Original Assignee
가나이 쯔도무
가부시끼가이샤 히다찌 세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가나이 쯔도무, 가부시끼가이샤 히다찌 세이사꾸쇼 filed Critical 가나이 쯔도무
Publication of KR950034579A publication Critical patent/KR950034579A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32266—Means for controlling power transmitted to the plasma
    • H01J37/32284—Means for controlling or selecting resonance mode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32293—Microwave generated discharge using particular waveforms, e.g. polarised waves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Waveguide Aerials (AREA)
KR1019950005081A 1994-03-18 1995-03-13 플라즈마 처리방법 및 장치 Withdrawn KR950034579A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6048287A JPH07263187A (ja) 1994-03-18 1994-03-18 プラズマ処理装置
JP94-048287 1994-03-18

Publications (1)

Publication Number Publication Date
KR950034579A true KR950034579A (ko) 1995-12-28

Family

ID=12799229

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950005081A Withdrawn KR950034579A (ko) 1994-03-18 1995-03-13 플라즈마 처리방법 및 장치

Country Status (4)

Country Link
EP (1) EP0674334A1 (enExample)
JP (1) JPH07263187A (enExample)
KR (1) KR950034579A (enExample)
TW (1) TW265508B (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6742022B1 (en) 1995-12-11 2004-05-25 Openwave Systems Inc. Centralized service management system for two-way interactive communication devices in data networks
US5809415A (en) 1995-12-11 1998-09-15 Unwired Planet, Inc. Method and architecture for an interactive two-way data communication network
US6473609B1 (en) 1995-12-11 2002-10-29 Openwave Systems Inc. Method and architecture for interactive two-way communication devices to interact with a network
JP3739137B2 (ja) * 1996-06-18 2006-01-25 日本電気株式会社 プラズマ発生装置及びこのプラズマ発生装置を使用した表面処理装置
DE69736081T2 (de) * 1996-09-27 2007-01-11 Surface Technoloy Systems Plc Plasmabearbeitungsvorrichtung
US6534922B2 (en) 1996-09-27 2003-03-18 Surface Technology Systems, Plc Plasma processing apparatus
WO1999012184A2 (en) * 1997-09-05 1999-03-11 Alcad Pro, Inc. Microwave power applicator for generating reactive chemical species from gaseous reagent species
JP4593741B2 (ja) * 2000-08-02 2010-12-08 東京エレクトロン株式会社 ラジアルアンテナ及びそれを用いたプラズマ処理装置
JP3625197B2 (ja) * 2001-01-18 2005-03-02 東京エレクトロン株式会社 プラズマ装置およびプラズマ生成方法
JP4163432B2 (ja) * 2002-03-26 2008-10-08 矢崎総業株式会社 プラズマ処理装置
CN100546098C (zh) * 2004-03-10 2009-09-30 东京毅力科创株式会社 分配器和分配方法，等离子处理系统和方法，以及lcd的制造方法
US7603963B2 (en) * 2006-05-02 2009-10-20 Babcock & Wilcox Technical Services Y-12, Llc Controlled zone microwave plasma system
JP2010140679A (ja) * 2008-12-09 2010-06-24 Tohoku Univ 金属表面波計測装置および金属表面波計測方法
JP5667368B2 (ja) * 2010-02-24 2015-02-12 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP5255024B2 (ja) * 2010-07-23 2013-08-07 東京エレクトロン株式会社 ラジアルアンテナ及びそれを用いたプラズマ処理装置
JP6700127B2 (ja) * 2016-07-07 2020-05-27 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
CN112967920B (zh) * 2021-02-01 2022-07-19 湖南红太阳光电科技有限公司 一种微波等离子体刻蚀装置及方法
CN113193312B (zh) * 2021-04-25 2022-05-03 电子科技大学 圆波导TE0n模式超宽带输出窗结构

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5134965A (en) * 1989-06-16 1992-08-04 Hitachi, Ltd. Processing apparatus and method for plasma processing
FR2693619B1 (fr) * 1992-07-08 1994-10-07 Valeo Vision Dispositif pour le dépôt de polymère par l'intermédiaire d'un plasma excité par micro-ondes.
JPH07142444A (ja) * 1993-11-12 1995-06-02 Hitachi Ltd マイクロ波プラズマ処理装置および処理方法

Also Published As

Publication number Publication date
JPH07263187A (ja) 1995-10-13
EP0674334A1 (en) 1995-09-27
TW265508B (enExample) 1995-12-11

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PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

PC1203 Withdrawal of no request for examination

St.27 status event code: N-1-6-B10-B12-nap-PC1203

WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid
R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000