TW265508B - - Google Patents
Info
- Publication number
- TW265508B TW265508B TW084102171A TW84102171A TW265508B TW 265508 B TW265508 B TW 265508B TW 084102171 A TW084102171 A TW 084102171A TW 84102171 A TW84102171 A TW 84102171A TW 265508 B TW265508 B TW 265508B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H10P50/242—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32293—Microwave generated discharge using particular waveforms, e.g. polarised waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32678—Electron cyclotron resonance
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- ing And Chemical Polishing (AREA)
- Waveguide Aerials (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6048287A JPH07263187A (ja) | 1994-03-18 | 1994-03-18 | プラズマ処理装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW265508B true TW265508B (enExample) | 1995-12-11 |
Family
ID=12799229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW084102171A TW265508B (enExample) | 1994-03-18 | 1995-03-06 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0674334A1 (enExample) |
| JP (1) | JPH07263187A (enExample) |
| KR (1) | KR950034579A (enExample) |
| TW (1) | TW265508B (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5809415A (en) | 1995-12-11 | 1998-09-15 | Unwired Planet, Inc. | Method and architecture for an interactive two-way data communication network |
| US6473609B1 (en) | 1995-12-11 | 2002-10-29 | Openwave Systems Inc. | Method and architecture for interactive two-way communication devices to interact with a network |
| US6742022B1 (en) | 1995-12-11 | 2004-05-25 | Openwave Systems Inc. | Centralized service management system for two-way interactive communication devices in data networks |
| JP3739137B2 (ja) * | 1996-06-18 | 2006-01-25 | 日本電気株式会社 | プラズマ発生装置及びこのプラズマ発生装置を使用した表面処理装置 |
| US6534922B2 (en) | 1996-09-27 | 2003-03-18 | Surface Technology Systems, Plc | Plasma processing apparatus |
| ATE396494T1 (de) * | 1996-09-27 | 2008-06-15 | Surface Technology Systems Plc | Plasmabearbeitungsgerät |
| WO1999012184A2 (en) * | 1997-09-05 | 1999-03-11 | Alcad Pro, Inc. | Microwave power applicator for generating reactive chemical species from gaseous reagent species |
| JP4593741B2 (ja) * | 2000-08-02 | 2010-12-08 | 東京エレクトロン株式会社 | ラジアルアンテナ及びそれを用いたプラズマ処理装置 |
| JP3625197B2 (ja) * | 2001-01-18 | 2005-03-02 | 東京エレクトロン株式会社 | プラズマ装置およびプラズマ生成方法 |
| JP4163432B2 (ja) * | 2002-03-26 | 2008-10-08 | 矢崎総業株式会社 | プラズマ処理装置 |
| CN100546098C (zh) * | 2004-03-10 | 2009-09-30 | 东京毅力科创株式会社 | 分配器和分配方法，等离子处理系统和方法，以及lcd的制造方法 |
| US7603963B2 (en) * | 2006-05-02 | 2009-10-20 | Babcock & Wilcox Technical Services Y-12, Llc | Controlled zone microwave plasma system |
| JP2010140679A (ja) * | 2008-12-09 | 2010-06-24 | Tohoku Univ | 金属表面波計測装置および金属表面波計測方法 |
| JP5667368B2 (ja) * | 2010-02-24 | 2015-02-12 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP5255024B2 (ja) * | 2010-07-23 | 2013-08-07 | 東京エレクトロン株式会社 | ラジアルアンテナ及びそれを用いたプラズマ処理装置 |
| JP6700127B2 (ja) * | 2016-07-07 | 2020-05-27 | 東京エレクトロン株式会社 | マイクロ波プラズマ処理装置 |
| CN112967920B (zh) * | 2021-02-01 | 2022-07-19 | 湖南红太阳光电科技有限公司 | 一种微波等离子体刻蚀装置及方法 |
| CN113193312B (zh) * | 2021-04-25 | 2022-05-03 | 电子科技大学 | 圆波导TE0n模式超宽带输出窗结构 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5134965A (en) * | 1989-06-16 | 1992-08-04 | Hitachi, Ltd. | Processing apparatus and method for plasma processing |
| FR2693619B1 (fr) * | 1992-07-08 | 1994-10-07 | Valeo Vision | Dispositif pour le dépôt de polymère par l'intermédiaire d'un plasma excité par micro-ondes. |
| JPH07142444A (ja) * | 1993-11-12 | 1995-06-02 | Hitachi Ltd | マイクロ波プラズマ処理装置および処理方法 |
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1994
- 1994-03-18 JP JP6048287A patent/JPH07263187A/ja active Pending
-
1995
- 1995-03-06 TW TW084102171A patent/TW265508B/zh active
- 1995-03-13 KR KR1019950005081A patent/KR950034579A/ko not_active Withdrawn
- 1995-03-15 EP EP95103754A patent/EP0674334A1/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP0674334A1 (en) | 1995-09-27 |
| KR950034579A (ko) | 1995-12-28 |
| JPH07263187A (ja) | 1995-10-13 |